TW200630746A - Photosensitive composition for forming light blocking film and black matrix formed with the photosensitive composition for forming light blocking film - Google Patents

Photosensitive composition for forming light blocking film and black matrix formed with the photosensitive composition for forming light blocking film

Info

Publication number
TW200630746A
TW200630746A TW094139471A TW94139471A TW200630746A TW 200630746 A TW200630746 A TW 200630746A TW 094139471 A TW094139471 A TW 094139471A TW 94139471 A TW94139471 A TW 94139471A TW 200630746 A TW200630746 A TW 200630746A
Authority
TW
Taiwan
Prior art keywords
light blocking
photosensitive composition
blocking film
forming light
black matrix
Prior art date
Application number
TW094139471A
Other languages
Chinese (zh)
Other versions
TWI308257B (en
Inventor
Kenji Maruyama
Masaru Shida
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200630746A publication Critical patent/TW200630746A/en
Application granted granted Critical
Publication of TWI308257B publication Critical patent/TWI308257B/en

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  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

This photosensitive composition for forming a light blocking film includes (a) carbon black as a light blocking pigment, (b) photopolymerizable compound, and (c) photosensitive composition for forming light blocking film, containing a photopolymerization initiator, in which dispersing particle size of the carbon black ranges from 100 to 250 nm, preferably ranges from 150 to 200 nm.
TW94139471A 2004-12-03 2005-11-10 Photosensitive composition for forming light blocking film and black matrix formed with the photosensitive composition for forming light blocking film TWI308257B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004350590A JP4611724B2 (en) 2004-12-03 2004-12-03 Photosensitive composition for forming light-shielding film, and black matrix formed with the photosensitive composition for forming light-shielding film

Publications (2)

Publication Number Publication Date
TW200630746A true TW200630746A (en) 2006-09-01
TWI308257B TWI308257B (en) 2009-04-01

Family

ID=36664845

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94139471A TWI308257B (en) 2004-12-03 2005-11-10 Photosensitive composition for forming light blocking film and black matrix formed with the photosensitive composition for forming light blocking film

Country Status (4)

Country Link
JP (1) JP4611724B2 (en)
KR (1) KR100730530B1 (en)
CN (1) CN100520577C (en)
TW (1) TWI308257B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891616B1 (en) * 2006-08-04 2009-04-03 주식회사 코오롱 Photosensitive resin composition, cured products and material for color filter
JP4949809B2 (en) * 2006-11-14 2012-06-13 東京応化工業株式会社 Colored photosensitive resin composition
KR100904068B1 (en) * 2007-09-04 2009-06-23 제일모직주식회사 Photosensitive resin composition for color filter and color filter using same
KR101148548B1 (en) 2008-09-30 2012-05-21 코오롱인더스트리 주식회사 Photopolymerizable resin composition
WO2010038978A2 (en) * 2008-09-30 2010-04-08 Kolon Industries, Inc. Photopolymer resin composition
KR20150115514A (en) * 2014-04-04 2015-10-14 동우 화인켐 주식회사 Black-colored photosensitive resin composition and black matrix prepared by using the same
CN108089400B (en) * 2017-12-28 2020-06-05 深圳市华星光电技术有限公司 Photoresist and preparation method thereof
JP7514058B2 (en) * 2018-03-30 2024-07-10 太陽ホールディングス株式会社 Photosensitive film laminate and its cured product, and electronic parts

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970006519B1 (en) * 1993-09-28 1997-04-28 제일합섬 주식회사 Black matrix resist composition for liquid crystal display color filter
JPH0836257A (en) * 1994-07-21 1996-02-06 Sekisui Chem Co Ltd Colored resist composition
JPH08278630A (en) * 1995-04-07 1996-10-22 Nippon Steel Chem Co Ltd Ink for color filter excellent in storage stability and color filter formed by using the ink
TW425484B (en) 1995-04-28 2001-03-11 Toray Industries A resin black matrix for liquid crystal display device
JPH09133806A (en) * 1995-11-08 1997-05-20 Dainippon Printing Co Ltd Hologram color filter and its production
JP3869517B2 (en) * 1997-03-14 2007-01-17 三菱化学株式会社 Black matrix resist composition and black matrix using the same
JP3824285B2 (en) * 1997-03-14 2006-09-20 富士写真フイルム株式会社 Radiation-sensitive coloring composition
JPH1180583A (en) * 1997-08-29 1999-03-26 Mitsubishi Chem Corp Carbon black for forming black resist pattern
JP3915201B2 (en) * 1997-11-11 2007-05-16 三菱化学株式会社 Light-shielding photosensitive resin composition and color filter using the same
JPH11349842A (en) * 1998-04-09 1999-12-21 Dainippon Printing Co Ltd Photopolymerizable pigment dispersant, photosensitive coloring composition and composition for shading layer
JP2000104005A (en) * 1998-09-28 2000-04-11 Dainippon Printing Co Ltd Pigment dispersant, photosensitive coloring composition and composition for light protecting layer
JP4404330B2 (en) * 2001-01-09 2010-01-27 東京応化工業株式会社 Photopolymerizable composition and method for producing color filter using the composition
KR100396070B1 (en) * 2001-03-24 2003-08-27 (주)펨텍 Composition of black toner for organic black matrix and preparation method thereof
WO2004079454A1 (en) * 2003-03-07 2004-09-16 Asahi Glass Company Limited Photosensitive resin composition and cured coating film
JP3938375B2 (en) * 2003-03-12 2007-06-27 三菱化学株式会社 Photosensitive coloring composition, color filter, and liquid crystal display device

Also Published As

Publication number Publication date
JP2006162716A (en) 2006-06-22
CN100520577C (en) 2009-07-29
JP4611724B2 (en) 2011-01-12
CN1782874A (en) 2006-06-07
TWI308257B (en) 2009-04-01
KR20060063678A (en) 2006-06-12
KR100730530B1 (en) 2007-06-20

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