SG144907A1 - Liquid immersion type lens system, projection exposure apparatus, and device fabricating method - Google Patents

Liquid immersion type lens system, projection exposure apparatus, and device fabricating method

Info

Publication number
SG144907A1
SG144907A1 SG200804997-5A SG2008049975A SG144907A1 SG 144907 A1 SG144907 A1 SG 144907A1 SG 2008049975 A SG2008049975 A SG 2008049975A SG 144907 A1 SG144907 A1 SG 144907A1
Authority
SG
Singapore
Prior art keywords
lens system
type lens
exposure apparatus
projection exposure
immersion type
Prior art date
Application number
SG200804997-5A
Other languages
English (en)
Inventor
Noriaki Okada
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34386114&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG144907(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG144907A1 publication Critical patent/SG144907A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
SG200804997-5A 2003-09-29 2004-09-29 Liquid immersion type lens system, projection exposure apparatus, and device fabricating method SG144907A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003337087 2003-09-29

Publications (1)

Publication Number Publication Date
SG144907A1 true SG144907A1 (en) 2008-08-28

Family

ID=34386114

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200804997-5A SG144907A1 (en) 2003-09-29 2004-09-29 Liquid immersion type lens system, projection exposure apparatus, and device fabricating method

Country Status (8)

Country Link
US (1) US20060164616A1 (ja)
EP (1) EP1670042A4 (ja)
JP (1) JP4492539B2 (ja)
CN (1) CN1860585B (ja)
IL (1) IL174566A0 (ja)
SG (1) SG144907A1 (ja)
TW (1) TW200513809A (ja)
WO (1) WO2005031823A1 (ja)

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JP4826755B2 (ja) * 2006-03-28 2011-11-30 株式会社ニコン 露光装置、露光装置の調整方法、およびデバイスの製造方法
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US8068208B2 (en) 2006-12-01 2011-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving immersion scanner overlay performance
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法
CN101815969B (zh) 2007-10-02 2013-07-17 卡尔蔡司Smt有限责任公司 用于微光刻的投射物镜
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
ATE548679T1 (de) * 2008-05-08 2012-03-15 Asml Netherlands Bv Lithografische immersionsvorrichtung, trocknungsvorrichtung, immersionsmetrologievorrichtung und verfahren zur herstellung einer vorrichtung
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP5482784B2 (ja) 2009-03-10 2014-05-07 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP6261357B2 (ja) * 2014-01-30 2018-01-17 オリンパス株式会社 顕微鏡および観察方法
CN103885301B (zh) * 2014-03-21 2015-09-16 浙江大学 浸没式光刻机中浸液传送***的控制时序的模型匹配方法
DE102015200927A1 (de) * 2015-01-21 2016-07-21 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Ausbildung eines Immersionsmittelfilms
EP3460558A1 (en) * 2017-09-20 2019-03-27 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Cryo-light microscope and immersion medium for cryo-light microscopy
CN109407474A (zh) * 2018-12-26 2019-03-01 长春长光智欧科技有限公司 一种带保护玻璃的浸没头
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US7362508B2 (en) * 2002-08-23 2008-04-22 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
CN101424881B (zh) * 2002-11-12 2011-11-30 Asml荷兰有限公司 光刻投射装置
SG131766A1 (en) * 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420302A1 (en) * 2002-11-18 2004-05-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
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Also Published As

Publication number Publication date
EP1670042A1 (en) 2006-06-14
CN1860585B (zh) 2010-04-28
TW200513809A (en) 2005-04-16
WO2005031823A1 (ja) 2005-04-07
US20060164616A1 (en) 2006-07-27
CN1860585A (zh) 2006-11-08
JPWO2005031823A1 (ja) 2007-11-15
IL174566A0 (en) 2006-08-20
JP4492539B2 (ja) 2010-06-30
EP1670042A4 (en) 2008-01-30

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