TW200513809A - Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method - Google Patents
Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing methodInfo
- Publication number
- TW200513809A TW200513809A TW093129326A TW93129326A TW200513809A TW 200513809 A TW200513809 A TW 200513809A TW 093129326 A TW093129326 A TW 093129326A TW 93129326 A TW93129326 A TW 93129326A TW 200513809 A TW200513809 A TW 200513809A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- soaked
- lens system
- plane
- exposure apparatus
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 abstract 7
- 239000007788 liquid Substances 0.000 abstract 3
- 230000005540 biological transmission Effects 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Lens Barrels (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003337087 | 2003-09-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200513809A true TW200513809A (en) | 2005-04-16 |
Family
ID=34386114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093129326A TW200513809A (en) | 2003-09-29 | 2004-09-29 | Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method |
Country Status (8)
Country | Link |
---|---|
US (1) | US20060164616A1 (zh) |
EP (1) | EP1670042A4 (zh) |
JP (1) | JP4492539B2 (zh) |
CN (1) | CN1860585B (zh) |
IL (1) | IL174566A0 (zh) |
SG (1) | SG144907A1 (zh) |
TW (1) | TW200513809A (zh) |
WO (1) | WO2005031823A1 (zh) |
Cited By (2)
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US8724075B2 (en) | 2005-08-31 | 2014-05-13 | Nikon Corporation | Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice |
TWI450044B (zh) * | 2005-08-31 | 2014-08-21 | 尼康股份有限公司 | An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element |
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US7385764B2 (en) | 2003-12-15 | 2008-06-10 | Carl Zeiss Smt Ag | Objectives as a microlithography projection objective with at least one liquid lens |
CN100592210C (zh) | 2004-02-13 | 2010-02-24 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
CN1954408B (zh) * | 2004-06-04 | 2012-07-04 | 尼康股份有限公司 | 曝光装置、曝光方法及元件制造方法 |
US20070103661A1 (en) * | 2004-06-04 | 2007-05-10 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US20070222959A1 (en) * | 2004-06-10 | 2007-09-27 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
KR20170010906A (ko) | 2004-06-10 | 2017-02-01 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 및 디바이스 제조 방법 |
US7180572B2 (en) * | 2004-06-23 | 2007-02-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion optical projection system |
US7251013B2 (en) * | 2004-11-12 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006059636A1 (ja) * | 2004-12-02 | 2006-06-08 | Nikon Corporation | 露光装置及びデバイス製造方法 |
JP2006179759A (ja) * | 2004-12-24 | 2006-07-06 | Nikon Corp | 光学素子及び投影露光装置 |
SG124351A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP2006261606A (ja) * | 2005-03-18 | 2006-09-28 | Canon Inc | 露光装置、露光方法及びデバイス製造方法 |
EP1873816A4 (en) | 2005-04-18 | 2010-11-24 | Nikon Corp | EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENTS MANUFACTURING METHOD |
US7317507B2 (en) * | 2005-05-03 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1881520A4 (en) * | 2005-05-12 | 2010-06-02 | Nikon Corp | OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD |
KR20080007383A (ko) * | 2005-05-24 | 2008-01-18 | 가부시키가이샤 니콘 | 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법 |
DE102006021161A1 (de) * | 2005-05-25 | 2006-11-30 | Carl Zeiss Smt Ag | Projektionsobjektiv insbesondere für die Mirkolithographie |
US20090021706A1 (en) * | 2005-06-01 | 2009-01-22 | Nikon Corporation | Immersion fluid containment system and method for immersion lithogtraphy |
US8049964B2 (en) * | 2005-06-14 | 2011-11-01 | Carl Zeiss Smt Gmbh | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element |
JP2007005525A (ja) * | 2005-06-23 | 2007-01-11 | Nikon Corp | 露光装置及びデバイス製造方法 |
US7474379B2 (en) * | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2007027438A (ja) * | 2005-07-15 | 2007-02-01 | Nikon Corp | 投影光学系、露光装置、およびデバイスの製造方法 |
JP4735186B2 (ja) * | 2005-10-21 | 2011-07-27 | 株式会社ニコン | 液浸顕微鏡装置 |
JP4826755B2 (ja) * | 2006-03-28 | 2011-11-30 | 株式会社ニコン | 露光装置、露光装置の調整方法、およびデバイスの製造方法 |
US7969548B2 (en) * | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
US8068208B2 (en) | 2006-12-01 | 2011-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving immersion scanner overlay performance |
JP2008218653A (ja) * | 2007-03-02 | 2008-09-18 | Canon Inc | 露光装置及びデバイス製造方法 |
CN101815969B (zh) | 2007-10-02 | 2013-07-17 | 卡尔蔡司Smt有限责任公司 | 用于微光刻的投射物镜 |
US8654306B2 (en) * | 2008-04-14 | 2014-02-18 | Nikon Corporation | Exposure apparatus, cleaning method, and device fabricating method |
ATE548679T1 (de) * | 2008-05-08 | 2012-03-15 | Asml Netherlands Bv | Lithografische immersionsvorrichtung, trocknungsvorrichtung, immersionsmetrologievorrichtung und verfahren zur herstellung einer vorrichtung |
US8421993B2 (en) * | 2008-05-08 | 2013-04-16 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
JP5482784B2 (ja) | 2009-03-10 | 2014-05-07 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
JP6261357B2 (ja) * | 2014-01-30 | 2018-01-17 | オリンパス株式会社 | 顕微鏡および観察方法 |
CN103885301B (zh) * | 2014-03-21 | 2015-09-16 | 浙江大学 | 浸没式光刻机中浸液传送***的控制时序的模型匹配方法 |
DE102015200927A1 (de) * | 2015-01-21 | 2016-07-21 | Carl Zeiss Microscopy Gmbh | Vorrichtung und Verfahren zur Ausbildung eines Immersionsmittelfilms |
EP3460558A1 (en) * | 2017-09-20 | 2019-03-27 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Cryo-light microscope and immersion medium for cryo-light microscopy |
CN109407474A (zh) * | 2018-12-26 | 2019-03-01 | 长春长光智欧科技有限公司 | 一种带保护玻璃的浸没头 |
DE102020111715A1 (de) * | 2020-04-29 | 2021-11-04 | Carl Zeiss Microscopy Gmbh | Immersionsobjektiv und verfahren zur immersionsmikroskopie |
Family Cites Families (34)
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US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
DD221563A1 (de) * | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur |
DD224448A1 (de) * | 1984-03-01 | 1985-07-03 | Zeiss Jena Veb Carl | Einrichtung zur fotolithografischen strukturuebertragung |
JP2844696B2 (ja) * | 1989-07-24 | 1999-01-06 | 株式会社ニコン | レーザ処理装置 |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
US5825407A (en) * | 1993-09-13 | 1998-10-20 | Albrit Technologies Ltd. | Cable television audio messaging systems |
JPH08316124A (ja) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
JPH1054932A (ja) * | 1996-08-08 | 1998-02-24 | Nikon Corp | 投影光学装置及びそれを装着した投影露光装置 |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
DE69738910D1 (de) * | 1996-11-28 | 2008-09-25 | Nikon Corp | Ausrichtvorrichtung und belichtungsverfahren |
WO1998028665A1 (en) * | 1996-12-24 | 1998-07-02 | Koninklijke Philips Electronics N.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
US6208407B1 (en) * | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
AU2747999A (en) * | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
JP4453939B2 (ja) * | 1999-09-16 | 2010-04-21 | 信越石英株式会社 | F2エキシマレーザー透過用光学シリカガラス部材及びその製造方法 |
JP2001168000A (ja) * | 1999-12-03 | 2001-06-22 | Nikon Corp | 露光装置の製造方法、および該製造方法によって製造された露光装置を用いたマイクロデバイスの製造方法 |
JP2001223422A (ja) * | 2000-02-10 | 2001-08-17 | Komatsu Ltd | 超狭帯域化レーザ装置及び狭帯域化レーザ装置 |
JP4763877B2 (ja) * | 2000-05-29 | 2011-08-31 | 信越石英株式会社 | F2エキシマレーザー用合成石英ガラス光学材料及び光学部材 |
JP4650712B2 (ja) * | 2000-08-02 | 2011-03-16 | 株式会社ニコン | 装置設計製作システム、このシステムにより製作される装置およびこの装置により製造される製品 |
JP2002158157A (ja) * | 2000-11-17 | 2002-05-31 | Nikon Corp | 照明光学装置および露光装置並びにマイクロデバイスの製造方法 |
WO2002052624A1 (fr) * | 2000-12-27 | 2002-07-04 | Nikon Corporation | Appareil d'exposition, support pour le montage d'elements optiques, gabarit de separation d'elements optiques, et procede de fabrication d'un appareil d'exposition |
DE10121346A1 (de) * | 2001-05-02 | 2002-11-07 | Zeiss Carl | Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie |
DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
US7362508B2 (en) * | 2002-08-23 | 2008-04-22 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
CN101424881B (zh) * | 2002-11-12 | 2011-11-30 | Asml荷兰有限公司 | 光刻投射装置 |
SG131766A1 (en) * | 2002-11-18 | 2007-05-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1420302A1 (en) * | 2002-11-18 | 2004-05-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4595320B2 (ja) * | 2002-12-10 | 2010-12-08 | 株式会社ニコン | 露光装置、及びデバイス製造方法 |
JP2004333761A (ja) * | 2003-05-06 | 2004-11-25 | Nikon Corp | 反射屈折型の投影光学系、露光装置、および露光方法 |
DE10324477A1 (de) * | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
JP2005191381A (ja) * | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
US7180572B2 (en) * | 2004-06-23 | 2007-02-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion optical projection system |
-
2004
- 2004-09-29 EP EP04788326A patent/EP1670042A4/en not_active Withdrawn
- 2004-09-29 SG SG200804997-5A patent/SG144907A1/en unknown
- 2004-09-29 TW TW093129326A patent/TW200513809A/zh unknown
- 2004-09-29 WO PCT/JP2004/014260 patent/WO2005031823A1/ja active Application Filing
- 2004-09-29 CN CN2004800280505A patent/CN1860585B/zh not_active Expired - Fee Related
- 2004-09-29 JP JP2005514258A patent/JP4492539B2/ja active Active
-
2006
- 2006-03-24 US US11/387,885 patent/US20060164616A1/en not_active Abandoned
- 2006-03-26 IL IL174566A patent/IL174566A0/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8724075B2 (en) | 2005-08-31 | 2014-05-13 | Nikon Corporation | Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice |
TWI450044B (zh) * | 2005-08-31 | 2014-08-21 | 尼康股份有限公司 | An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element |
Also Published As
Publication number | Publication date |
---|---|
EP1670042A1 (en) | 2006-06-14 |
CN1860585B (zh) | 2010-04-28 |
WO2005031823A1 (ja) | 2005-04-07 |
US20060164616A1 (en) | 2006-07-27 |
CN1860585A (zh) | 2006-11-08 |
SG144907A1 (en) | 2008-08-28 |
JPWO2005031823A1 (ja) | 2007-11-15 |
IL174566A0 (en) | 2006-08-20 |
JP4492539B2 (ja) | 2010-06-30 |
EP1670042A4 (en) | 2008-01-30 |
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