NL1035770A1 - Lithographic apparatus and thermal optical manipulator control method. - Google Patents

Lithographic apparatus and thermal optical manipulator control method.

Info

Publication number
NL1035770A1
NL1035770A1 NL1035770A NL1035770A NL1035770A1 NL 1035770 A1 NL1035770 A1 NL 1035770A1 NL 1035770 A NL1035770 A NL 1035770A NL 1035770 A NL1035770 A NL 1035770A NL 1035770 A1 NL1035770 A1 NL 1035770A1
Authority
NL
Netherlands
Prior art keywords
control method
lithographic apparatus
manipulator control
thermal optical
optical manipulator
Prior art date
Application number
NL1035770A
Other languages
English (en)
Inventor
Bastiaan Stephanus Hendricus Jansen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1035770A1 publication Critical patent/NL1035770A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1035770A 2007-08-14 2008-07-30 Lithographic apparatus and thermal optical manipulator control method. NL1035770A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/889,583 US8064151B2 (en) 2007-08-14 2007-08-14 Lithographic apparatus and thermal optical manipulator control method

Publications (1)

Publication Number Publication Date
NL1035770A1 true NL1035770A1 (nl) 2009-02-17

Family

ID=40362696

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1035770A NL1035770A1 (nl) 2007-08-14 2008-07-30 Lithographic apparatus and thermal optical manipulator control method.

Country Status (3)

Country Link
US (2) US8064151B2 (nl)
JP (2) JP4790771B2 (nl)
NL (1) NL1035770A1 (nl)

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US8064151B2 (en) 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
CN102428408B (zh) * 2009-05-16 2014-11-05 卡尔蔡司Smt有限责任公司 包括光学校正布置的用于半导体光刻的投射曝光设备
NL2004980A (en) * 2009-07-13 2011-01-17 Asml Netherlands Bv Heat transfers assembly, lithographic apparatus and manufacturing method.
US8242917B1 (en) * 2009-10-06 2012-08-14 Sprint Communications Company L.P. Somatosensory receptors for mobile device
JP2011192991A (ja) 2010-03-12 2011-09-29 Asml Netherlands Bv リソグラフィ装置および方法
GB2483304B (en) * 2010-09-06 2013-07-03 Sony Corp An apparatus and method for controlling power
GB2483303A (en) * 2010-09-06 2012-03-07 Sony Corp Managing electrical energy consumption of grouped devices
DE102010041528A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
KR101529807B1 (ko) 2011-01-20 2015-06-17 칼 짜이스 에스엠티 게엠베하 투영 노광 도구를 조작하는 방법
DE102011077784A1 (de) * 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
US9366887B2 (en) * 2014-02-26 2016-06-14 TeraDiode, Inc. Systems and methods for laser systems with variable beam parameter product utilizing thermo-optic effects
JP6760975B2 (ja) * 2015-06-19 2020-09-23 エーエスエムエル ネザーランズ ビー．ブイ． 制御システム、位置決めシステム、リソグラフィ装置及びデバイス製造方法
JP6445501B2 (ja) * 2016-09-20 2018-12-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
JP2019070812A (ja) * 2018-11-29 2019-05-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
EP3702839B1 (en) * 2019-02-27 2021-11-10 ASML Netherlands B.V. Method of reducing effects of lens heating and/or cooling in a lithographic process

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JP2004228456A (ja) 2003-01-27 2004-08-12 Canon Inc 露光装置
US7098994B2 (en) 2004-01-16 2006-08-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7375794B2 (en) 2004-08-04 2008-05-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007193527A (ja) 2006-01-18 2007-08-02 Omron Corp ヒータ駆動制御方法
US7525640B2 (en) 2006-11-07 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US8064151B2 (en) 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method

Also Published As

Publication number Publication date
US20110273682A1 (en) 2011-11-10
US8861102B2 (en) 2014-10-14
JP2011211237A (ja) 2011-10-20
JP5181047B2 (ja) 2013-04-10
JP4790771B2 (ja) 2011-10-12
JP2009081419A (ja) 2009-04-16
US20090046260A1 (en) 2009-02-19
US8064151B2 (en) 2011-11-22

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