NL2003152A1 - Radiation source, lithographic apparatus and device manufacturing method. - Google Patents
Radiation source, lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2003152A1 NL2003152A1 NL2003152A NL2003152A NL2003152A1 NL 2003152 A1 NL2003152 A1 NL 2003152A1 NL 2003152 A NL2003152 A NL 2003152A NL 2003152 A NL2003152 A NL 2003152A NL 2003152 A1 NL2003152 A1 NL 2003152A1
- Authority
- NL
- Netherlands
- Prior art keywords
- radiation source
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13613008P | 2008-08-14 | 2008-08-14 | |
US13612908P | 2008-08-14 | 2008-08-14 | |
US19337308P | 2008-11-21 | 2008-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2003152A1 true NL2003152A1 (nl) | 2010-02-16 |
Family
ID=41110410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2003152A NL2003152A1 (nl) | 2008-08-14 | 2009-07-08 | Radiation source, lithographic apparatus and device manufacturing method. |
Country Status (6)
Country | Link |
---|---|
US (1) | US8685632B2 (nl) |
JP (1) | JP5732393B2 (nl) |
KR (1) | KR101626012B1 (nl) |
CN (1) | CN102119366B (nl) |
NL (1) | NL2003152A1 (nl) |
WO (1) | WO2010018039A1 (nl) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8587768B2 (en) * | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
DE102010038697B4 (de) * | 2010-07-30 | 2012-07-19 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie |
US9594306B2 (en) | 2011-03-04 | 2017-03-14 | Asml Netherlands B.V. | Lithographic apparatus, spectral purity filter and device manufacturing method |
JP2014514736A (ja) * | 2011-03-16 | 2014-06-19 | ケーエルエー−テンカー コーポレイション | 薄膜スペクトル純度フィルタコーティングとともに画像センサを使用するeuv化学線レチクル検査システム |
NL2009117A (en) * | 2011-08-05 | 2013-02-06 | Asml Netherlands Bv | Radiation source and method for lithographic apparatus and device manufacturing method. |
WO2014020003A1 (en) * | 2012-08-03 | 2014-02-06 | Asml Netherlands B.V. | Lithographic apparatus and method of manufacturing a device |
EP3257054B1 (en) * | 2015-02-10 | 2019-10-16 | Carl Zeiss SMT GmbH | Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror |
JP6919699B2 (ja) | 2019-11-28 | 2021-08-18 | 凸版印刷株式会社 | 反射型フォトマスクブランク及び反射型フォトマスク |
EP4145222A1 (en) | 2020-04-30 | 2023-03-08 | Toppan Photomask Co., Ltd. | Reflective photomask blank and reflective photomask |
JP7421411B2 (ja) | 2020-04-30 | 2024-01-24 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
JP2022054941A (ja) | 2020-09-28 | 2022-04-07 | 凸版印刷株式会社 | 反射型フォトマスクブランク及び反射型フォトマスク |
JP2022107355A (ja) | 2021-01-08 | 2022-07-21 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
JP2022185356A (ja) | 2021-06-02 | 2022-12-14 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
DE102022212168A1 (de) | 2022-11-16 | 2024-05-16 | Carl Zeiss Smt Gmbh | EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG135934A1 (en) * | 2002-12-20 | 2007-10-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
TWI264620B (en) | 2003-03-07 | 2006-10-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US8094288B2 (en) | 2004-05-11 | 2012-01-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
ATE555422T1 (de) | 2004-07-22 | 2012-05-15 | Koninkl Philips Electronics Nv | Optisches system mit einer reinigungsanordnung |
US7453645B2 (en) * | 2004-12-30 | 2008-11-18 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
US7518128B2 (en) | 2006-06-30 | 2009-04-14 | Asml Netherlands B.V. | Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned |
US7473908B2 (en) * | 2006-07-14 | 2009-01-06 | Asml Netherlands B.V. | Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface |
DE102006054726B4 (de) | 2006-11-21 | 2014-09-11 | Asml Netherlands B.V. | Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung |
NL2004787A (en) * | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter. |
-
2009
- 2009-07-08 NL NL2003152A patent/NL2003152A1/nl not_active Application Discontinuation
- 2009-07-13 CN CN200980131416.4A patent/CN102119366B/zh active Active
- 2009-07-13 WO PCT/EP2009/058898 patent/WO2010018039A1/en active Application Filing
- 2009-07-13 US US13/058,788 patent/US8685632B2/en active Active
- 2009-07-13 KR KR1020117005827A patent/KR101626012B1/ko active IP Right Grant
- 2009-07-13 JP JP2011522453A patent/JP5732393B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20110143288A1 (en) | 2011-06-16 |
WO2010018039A1 (en) | 2010-02-18 |
JP5732393B2 (ja) | 2015-06-10 |
CN102119366A (zh) | 2011-07-06 |
KR101626012B1 (ko) | 2016-05-31 |
KR20110058810A (ko) | 2011-06-01 |
US8685632B2 (en) | 2014-04-01 |
JP2011530823A (ja) | 2011-12-22 |
CN102119366B (zh) | 2015-04-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
WDAP | Patent application withdrawn |
Effective date: 20100708 |