NL1036277A1 - Lithographic apparatus, stage system and stage control method. - Google Patents

Lithographic apparatus, stage system and stage control method. Download PDF

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Publication number
NL1036277A1
NL1036277A1 NL1036277A NL1036277A NL1036277A1 NL 1036277 A1 NL1036277 A1 NL 1036277A1 NL 1036277 A NL1036277 A NL 1036277A NL 1036277 A NL1036277 A NL 1036277A NL 1036277 A1 NL1036277 A1 NL 1036277A1
Authority
NL
Netherlands
Prior art keywords
stage
control method
lithographic apparatus
stage control
stage system
Prior art date
Application number
NL1036277A
Other languages
English (en)
Inventor
Mauritius Gerardus Schneiders
Wilhelmus Franciscus Johannes Simons
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036277A1 publication Critical patent/NL1036277A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1036277A 2007-12-19 2008-12-04 Lithographic apparatus, stage system and stage control method. NL1036277A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US814507P 2007-12-19 2007-12-19

Publications (1)

Publication Number Publication Date
NL1036277A1 true NL1036277A1 (nl) 2009-06-22

Family

ID=40805281

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036277A NL1036277A1 (nl) 2007-12-19 2008-12-04 Lithographic apparatus, stage system and stage control method.

Country Status (6)

Country Link
US (1) US7948609B2 (nl)
JP (1) JP4880665B2 (nl)
KR (1) KR101085986B1 (nl)
CN (1) CN101464634B (nl)
NL (1) NL1036277A1 (nl)
TW (1) TWI396057B (nl)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5805868B2 (ja) * 2011-07-11 2015-11-10 マッパー・リソグラフィー・アイピー・ビー．ブイ． ターゲットの位置データを格納するためのリソグラフィシステムおよび方法
CN103085314B (zh) * 2013-02-01 2016-02-03 合肥合锻机床股份有限公司 安装有双移动工作台的压力机及移动控制装置与控制方法
JP6234170B2 (ja) 2013-10-31 2017-11-22 キヤノン株式会社 プログラム、生成方法、生成装置、駆動装置、加工装置、リソグラフィ装置及び物品の製造方法
KR101882892B1 (ko) 2013-12-05 2018-07-27 에이에스엠엘 네델란즈 비.브이. 기판 상의 구조체를 측정하는 방법 및 장치, 오차 보정을 위한 모델, 이러한 방법 및 장치를 구현하기 위한 컴퓨터 프로그램 제품
CN106462079B (zh) * 2014-06-03 2019-08-09 Asml荷兰有限公司 对象定位***、控制***、光刻设备、对象定位方法和器件制造方法
CN105068386B (zh) * 2015-09-07 2017-04-12 哈尔滨工业大学 一种双工件台***安全保护方法
CN105700302A (zh) * 2016-03-18 2016-06-22 天津中精微仪器设备有限公司 一种快速光刻***
CN107797387A (zh) * 2016-08-30 2018-03-13 上海微电子装备（集团）股份有限公司 工件台运动控制方法
CN107885036A (zh) * 2016-09-29 2018-04-06 上海微电子装备（集团）股份有限公司 运动台驱动装置
CN107976870B (zh) * 2016-10-24 2020-12-04 上海微电子装备（集团）股份有限公司 一种运动台定位误差补偿装置及补偿方法
EP3376289A1 (en) 2017-03-17 2018-09-19 ASML Netherlands B.V. Stage system and metrology tool
CN110320756B (zh) * 2018-03-30 2020-09-22 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台***和光刻机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7209219B2 (en) * 2003-03-06 2007-04-24 Asml Netherlands B.V. System for controlling a position of a mass
US20040204777A1 (en) * 2003-04-14 2004-10-14 Alon Harpaz Precision motion control using feed forward of acceleration
TWI243291B (en) * 2003-05-13 2005-11-11 Asml Netherlands Bv Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7113256B2 (en) * 2004-02-18 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with feed-forward focus control
US7084958B2 (en) 2004-04-14 2006-08-01 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US7327437B2 (en) * 2004-12-07 2008-02-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007035780A (ja) * 2005-07-25 2007-02-08 Hitachi High-Technologies Corp 回路パターン製造装置
US7505114B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7576832B2 (en) * 2006-05-04 2009-08-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
CN101464634B (zh) 2011-07-20
CN101464634A (zh) 2009-06-24
TW200935186A (en) 2009-08-16
US20090231566A1 (en) 2009-09-17
KR101085986B1 (ko) 2011-11-22
JP2009152591A (ja) 2009-07-09
TWI396057B (zh) 2013-05-11
US7948609B2 (en) 2011-05-24
KR20090067055A (ko) 2009-06-24
JP4880665B2 (ja) 2012-02-22

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