KR940007570A - Color filter for liquid crystal display (LCD) and its manufacturing method - Google Patents

Color filter for liquid crystal display (LCD) and its manufacturing method Download PDF

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KR940007570A
KR940007570A KR1019920017263A KR920017263A KR940007570A KR 940007570 A KR940007570 A KR 940007570A KR 1019920017263 A KR1019920017263 A KR 1019920017263A KR 920017263 A KR920017263 A KR 920017263A KR 940007570 A KR940007570 A KR 940007570A
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color filter
color
pattern
lcd
manufacturing
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KR1019920017263A
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Korean (ko)
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KR100242435B1 (en
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진용석
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김광호
삼성전자 주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

본 발명은 LCD용 칼라필터 및 그 제조방법에 관한 것으로서 빛의 3원색인 R, G, B 화소의 정밀한 형태와 정확한 색도를 내기위해 영화 필름이나 슬라이드 필름 현상과 같은 포지티브 칼라필름(POSITIVE COLOR FILM) 현상을 이용한 것이다.The present invention relates to a color filter for LCD and a method of manufacturing the same, to produce a precise form and accurate chromaticity of R, G, and B pixels, which are three primary colors of light, and a positive color film such as film or slide film development. It is using the phenomenon.

즉, 내열 내광, 내화학성을 가진 포지티브 감광액을 도포한 기판상에 크롬이 패터닝된 1매의 포토마스크를 이용하여 스테퍼(STEPPER)로 여러부위 이동시키면서 각각 노광시켜 동일 높이의 R, G, B 삼원색을 형성함과 동시에 노광시 마스크 패턴에 의하여 상기 R, G, B 삼원색이 겹쳐지는 부분, 즉 적, 녹, 청색이 모두 노광된 부분인 흑색 블랙 매트릭스가 상기 R,G,B 삼원색과 동일 높이로 형성되므로 칼라필터를 제작함에 있어 3번 이상의 코팅 공정 및 에칭공정을 한번에 끝낼수 있어 공정이 단순화되고, 색도 조절이 동일할 뿐 아니라 칼라필터의 표면 평활화를 위한 노력을 감소시킬 수 있는 고신뢰성의 LCD용 칼라필터를 실현할 수 있다.That is, using a photomask patterned with chromium on a substrate coated with a positive photoresist having heat resistance and chemical resistance, each part is exposed to a stepper while being exposed to the same height, and the three primary colors of R, G, and B are the same primary colors. At the same time, the black black matrix, which is the portion where the R, G, and B primary colors overlap by the mask pattern during exposure, that is, the portions where all of the red, green, and blue colors are exposed, has the same height as the R, G, and B primary colors. Because it is formed, it is possible to finish three or more coating processes and etching processes at the same time in manufacturing color filters, which simplifies the process and the same color control as well as high reliability LCD which can reduce the effort for smoothing the surface of color filters. A color filter can be realized.

Description

액정표시장치(LCD)용 칼리필터 및 그 제조방법Cali filter for liquid crystal display (LCD) and its manufacturing method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 따른 포토마스크의 단면도, 제3(A)도 내지 제3(E)도는 본 발명에 따른 LCD용 칼라필터의 제초공정도이다.2 is a cross-sectional view of the photomask according to the present invention, and FIGS. 3 (A) to 3 (E) show a weeding process of the color filter for LCD according to the present invention.

Claims (11)

기판상에 박막 트랜지스터의 열화를 방지하기 위해 소정간격을 두고 동일 높이로 형성된 다수의 블랙 매트릭스와, 상기 블랙 매트릭스 사이에 상기 블랙 매트릭스와 동일 높이로 각각 분리되어 순차적으로 형성된 제1 내지 제3색 필터층과, 동일 높이로 형성된 상기 블랙 매트릭스와 색 필터층 위에 도포된 투명 전극막으로 구성됨을 특징으로 하는 LCD용 칼라필터.In order to prevent deterioration of the thin film transistor on the substrate, a plurality of black matrices formed at the same height at predetermined intervals, and the first to third color filter layers sequentially separated from the black matrices at the same height, respectively, are sequentially formed. And a transparent electrode layer coated on the black matrix and the color filter layer formed at the same height. 제1항에 있어서, 상기 기판은 유리, 석영 또는 고분자 필름으로 형성됨을 특징으로 하는 LCD용 칼라필터.The color filter of claim 1, wherein the substrate is formed of glass, quartz, or a polymer film. 제1항에 있어서, R, G, B 패턴과 블랙 매트릭스는 포지티브 칼라 감광액으로 형성됨을 특징으로 하는 LCD용 칼라필터.The color filter of claim 1, wherein the R, G, B patterns and the black matrix are formed of a positive color photosensitive liquid. 제1항 및 제3항에 있어서, 상기 블랙 매트릭스는 R, G, B 삼원색이 모두 노광되어 상기 삼원색이 겹쳐지는 부분으로 이루어짐을 특징으로 하는 LCD용 칼라필터.The color filter of claim 1, wherein the black matrix is formed of portions in which all three primary colors of R, G, and B are exposed to overlap the three primary colors. 포지티브 칼라 감광액이 도포된 기판상에 포토마스크를 이용하여 서로 동일 높이로 제1색 내지 제3색 필터층을 순차로 형성함과 동시에 상기 제1색 내지 제3색 필터층 사이에 상기 필터층과 동일 높이로 박막 트랜지스터의 열화를 방지하기 위해 소정간격으로 블랙 매트릭스를 형성하는 단계 및 상기 평탄화된 블랙 매트릭스와 제1색 내지 제3색 필터층 상에 투명 전극막을 형성하는 단계로 구성됨을 특징으로 하는 LCD용 칼리필터.On the substrate to which the positive color photosensitive liquid is applied, the first to third color filter layers are sequentially formed at the same height using a photomask, and at the same height as the filter layer between the first and third color filter layers. Forming a black matrix at predetermined intervals to prevent deterioration of the thin film transistor, and forming a transparent electrode film on the planarized black matrix and the first to third color filter layers. . 제5항에 있어서, 상기 LCD용 칼라필터는 포지티브 칼라 감광물질의 발색원리를 이용하여 제조됨을 특징으로 하는 LCD용 칼라필터의 제조방법.The method of claim 5, wherein the color filter for the LCD is manufactured using the color development principle of the positive color photosensitive material. 제5항에 있어서, 상기 칼라 필터의 발색은 노광후 상기 R,G,B 패턴을 현상액에 침적시키므로써 일어남을 특징으로 하는 LCD용 칼라필터의 제조방법.The method of claim 5, wherein the color filter is formed by depositing the R, G, and B patterns in a developer after exposure. 제5항에 있어서, 상기 포토마스크는 석영기판 상에 크롬패턴이 패터닝 된 것으로 상기 마스크 패턴은 소정간격을 두고 연이어 위치한 두개의 크롬패턴과 상기 크롬패턴의 폭 만큼을 다시 띄운 형태가 연속적으로 반복 배열됨을 특징으로 하는 LCD용 칼라필터의 제조방법.The method of claim 5, wherein the photomask is a pattern of chromium pattern on a quartz substrate, the mask pattern is arranged in succession repeating the two chrome patterns in succession at a predetermined interval and the shape of floating the width of the chrome pattern again Method of manufacturing a color filter for LCD, characterized in that the. 제5항에 있어서, 상기 제1색 내지 제3색 필터층 및 블랙 매트릭스는 포지티브 칼라 감광액이 도포된 기판상에 1매의 포토마스크를 이용하여 화면 사이즈에 따라 스테퍼로 여러부위를 이동하면서 노광시켜 적색패턴인 제1색 필터층을 형성 시킨뒤, 다시 사기 제조공정과 동일한 방법으로 스테터를 이동, 노광시켜 녹색패턴과 청색패턴인 제2색 및 제3색 필터층을 형성함과 흑색을 나타내는 부분인 블랙 매트릭스가 동시에 형성됨을 특징으로 하는 LCD용 칼라필터의 제조방법.The method according to claim 5, wherein the first to third color filter layers and the black matrix are exposed to red by moving various portions with a stepper according to the screen size using one photomask on a substrate coated with a positive color photosensitive liquid. After forming the first color filter layer as a pattern, the stator is moved and exposed again in the same manner as in the manufacturing process to form the second and third color filter layers, which are the green pattern and the blue pattern, and the black part. A method of manufacturing a color filter for LCD, characterized in that the matrix is formed at the same time. 제5항 및 제9항에 있어서, 상기 노광장치인 스테퍼는 가시광선으로 노광을 실시하여 상기 칼라필터를 패터닝 시키는 것을 특징으로 하는 LCD용 칼라필터의 제조방법.10. The method of manufacturing a color filter for an LCD according to claim 5 or 9, wherein the stepper serving as the exposure apparatus performs exposure with visible light to pattern the color filter. 제5항에 있어서, 상기 투명 전극막을 노광후 바로 현상액에 침적, 현상시킨 뒤, 정착과정과 건조과정을 거쳐 형성됨을 특징으로 하는 LCD용 칼라필터의 제조방법.6. The method of claim 5, wherein the transparent electrode film is formed through a fixing process and a drying process after being deposited and developed in a developer immediately after exposure. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920017263A 1992-09-22 1992-09-22 Color filter of liquid crystal display and method of production thereof KR100242435B1 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100432993B1 (en) * 1996-12-30 2004-08-25 삼성에스디아이 주식회사 Lcd with color filters and method for fabricating the color filters in short time by simple exposure
KR100723555B1 (en) * 2004-05-21 2007-05-31 산요덴키가부시키가이샤 Semi-transparent type liquid display device, and vertical orientation type liquid display device and manufacturing method thereof
KR100726133B1 (en) * 2001-02-02 2007-06-12 엘지.필립스 엘시디 주식회사 A color filter for LCD and method for fabricating thereof
KR100910555B1 (en) * 2002-09-11 2009-08-03 삼성전자주식회사 A mask for manufacturing a color filter and a method for manufacturing a color filter panel for a display device using the mask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100847811B1 (en) * 2001-10-22 2008-07-23 엘지디스플레이 주식회사 Liquid Crystal Display Device and Method for manufacturing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100432993B1 (en) * 1996-12-30 2004-08-25 삼성에스디아이 주식회사 Lcd with color filters and method for fabricating the color filters in short time by simple exposure
KR100726133B1 (en) * 2001-02-02 2007-06-12 엘지.필립스 엘시디 주식회사 A color filter for LCD and method for fabricating thereof
KR100910555B1 (en) * 2002-09-11 2009-08-03 삼성전자주식회사 A mask for manufacturing a color filter and a method for manufacturing a color filter panel for a display device using the mask
KR100723555B1 (en) * 2004-05-21 2007-05-31 산요덴키가부시키가이샤 Semi-transparent type liquid display device, and vertical orientation type liquid display device and manufacturing method thereof

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