JP2000098126A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JP2000098126A
JP2000098126A JP27152798A JP27152798A JP2000098126A JP 2000098126 A JP2000098126 A JP 2000098126A JP 27152798 A JP27152798 A JP 27152798A JP 27152798 A JP27152798 A JP 27152798A JP 2000098126 A JP2000098126 A JP 2000098126A
Authority
JP
Japan
Prior art keywords
pattern
color filter
color
substrate
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27152798A
Other languages
Japanese (ja)
Inventor
Toshiaki Takagi
利晃 高木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP27152798A priority Critical patent/JP2000098126A/en
Publication of JP2000098126A publication Critical patent/JP2000098126A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To decrease production cost, number of processes and the fraction defective by forming the outer frame part and alignment marks of a pattern at one time when a first color of a color resist is applied. SOLUTION: A red color resist as a first color is applied all over a glass substrate 1 by a spin coating method or the like and dried, then the resist is exposed to UV rays through a photomask 6, developed and washed with water so as to form each pattern of the red pattern part of a color filter 2, the outer frame part 3 on the periphery of one screen of the pattern, and alignment markers 4 near the substrate edge. Then similarly, a photoresist is exposed to UV rays through a photomask to form only the pattern of the green pattern part of the color filter 2, developed and washed with water to form the pattern. Finally, the blue pattern part of the color filter 2 is also patterned to complete the color filter substrate.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、カラー液晶表示装
置等に内蔵されるカラーフィルターの製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter incorporated in a color liquid crystal display device or the like.

【0002】[0002]

【従来の技術】液晶表示装置に用いるカラーフィルタ基
板において、着色フィルタ部の間隙および外枠の遮光部
(ブラックマトリクス)のパターンとして従来から、ク
ロム等の金属膜および金属化合物の膜を使用している。
図2に示すように、ガラス基板1上の全面に形成した金
属膜をフォトリソグラフィーによりパターン形成し、ブ
ラックマトリクス5、その外枠部3、およびマーカー4
を形成した後、着色レジストによるカラーフィルタ2の
パターンを赤、緑、青の各色について順次繰り返し形成
することにより、カラーフィルタ基板を完成する。金属
膜および金属化合物の膜はパターン精度にすぐれ、0.
1〜0.2μm程度の薄い膜厚でも遮光性が大きいとい
う利点がある一方、高価で製造コストが高いという欠点
がある。
2. Description of the Related Art In a color filter substrate used in a liquid crystal display device, a metal film such as chromium or a metal compound film has conventionally been used as a pattern of a gap between colored filter portions and a light shielding portion (black matrix) of an outer frame. I have.
As shown in FIG. 2, a metal film formed on the entire surface of the glass substrate 1 is patterned by photolithography, and a black matrix 5, its outer frame portion 3, and a marker 4 are formed.
Is formed, the color filter pattern of the color resist 2 is sequentially and repeatedly formed for each of red, green, and blue, thereby completing the color filter substrate. The metal film and the film of the metal compound have excellent pattern accuracy.
Even with a thin film thickness of about 1 to 0.2 μm, there is an advantage that the light-shielding property is large, but there is a disadvantage that it is expensive and the manufacturing cost is high.

【0003】そこで、低コスト化の要求から、代替材料
として低反射の遮光性樹脂によるブラックマトリクスが
検討され、採用されている。しかしながら、遮光性樹脂
によるブラックマトリクスは、必要な遮光濃度(OD値
>3.5)を満たすためには膜厚が1μm以上は必要で
あり、白抜け防止のためオーバーラップさせて形成した
ブラックマトリクス5とカラーフィルタ2との重なり部
分では図3に示すように突起状となる。その突起が障害
となって液晶パネル化工程でのセルギャップ量のばらつ
きが大きくなるため、表示品位を大幅に劣化させてしま
うという問題があった。また、カラーフィルタの製造工
程としても金属膜に比べ品質が劣る上に歩留まりも悪
く、全体の品質に影響していた。これらの問題は、カラ
ーフィルタの低価格化の流れの中で、大きなコスト負荷
要因となっている。
In view of the demand for cost reduction, a black matrix made of a low-reflection light-shielding resin has been studied and used as an alternative material. However, a black matrix made of a light-shielding resin needs to have a film thickness of 1 μm or more in order to satisfy a required light-shielding density (OD value> 3.5). At the overlapping portion of the color filter 5 and the color filter 2, a projection is formed as shown in FIG. Since the protrusions become obstacles and the cell gap amount in the liquid crystal panel forming process varies greatly, there is a problem that the display quality is greatly deteriorated. In addition, the quality of the color filter manufacturing process is inferior to that of the metal film and the yield is low, which affects the overall quality. These problems have become a major cost burden factor in the trend of lowering the price of color filters.

【0004】[0004]

【発明が解決しようとする課題】本発明は上記のような
ブラックマトリクス形成を省略して、上記のような問題
点とコスト負荷を低減することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-described black matrix formation and reduce the above-mentioned problems and cost load.

【0005】[0005]

【課題を解決するための手段】本発明は、液晶表示装置
用カラーフィルタの製造方法において、ブラックマトリ
クスを形成していない透明基板上に、画面パターンの額
縁部および基板外周部のアライメントマーカーを、複数
色の着色レジストパターン形成工程のうち第1色目のパ
ターン形成工程にて同時に形成することを特徴とするカ
ラーフィルタの製造方法である。
According to the present invention, there is provided a method of manufacturing a color filter for a liquid crystal display device, comprising the steps of: forming a frame portion of a screen pattern and an alignment marker on an outer peripheral portion of a substrate on a transparent substrate on which a black matrix is not formed. A method of manufacturing a color filter, wherein the color filters are simultaneously formed in a first color pattern forming step of a plurality of colored resist pattern forming steps.

【0006】[0006]

【発明の実施の形態】本発明の実施の形態を以下に図面
を用いて説明する。図1(a)において示すように、ガ
ラス基板1上にまず第1色目の赤色の着色レジスト2’
をスピンコート法などにより全面にコーティングして、
乾燥した後、フォトマスク6を介して紫外線を露光し、
現像、水洗して、図1(b)に示すように、カラーフィ
ルタ2の赤色パターン部位、パターンの1画面の外周の
外枠部3、および基板端部近辺のアライメント用マーカ
ー4の各パターンを形成する。次いで、同様にカラーフ
ィルタ2の緑色パターン部位のパターンのみを形成する
ためのフォトマスクを介して紫外線を露光し現像、水洗
して、図1(c)に示すように、同パターンをパターニ
ングする。最後に、図1(d)に示すようにカラーフィ
ルタ2の青色パターン部位を同様にしてパターニングす
ることにより、カラーフィルタ基板を完成する。
Embodiments of the present invention will be described below with reference to the drawings. As shown in FIG. 1A, first, a first colored red resist 2 ′ is formed on a glass substrate 1.
Is coated on the entire surface by spin coating, etc.
After drying, it is exposed to ultraviolet light through a photomask 6,
After development and washing with water, as shown in FIG. 1B, each pattern of the red pattern portion of the color filter 2, the outer frame portion 3 on the outer periphery of one screen of the pattern, and the alignment marker 4 near the edge of the substrate is removed. Form. Next, similarly, ultraviolet rays are exposed through a photomask for forming only the pattern of the green pattern portion of the color filter 2, developed, washed, and then patterned as shown in FIG. Finally, as shown in FIG. 1D, the color filter substrate is completed by patterning the blue pattern portion of the color filter 2 in the same manner.

【0007】なお現在、カラーフィルタ2の各色のパタ
ーン間は、僅かにオーバーラップするように形成してい
るが、オーバーラップ量が小さいことから、この重なり
による突起は、従来の樹脂を用いたブラックマトリクス
上にオーバーラップして形成されていたカラーフィルタ
による突起に比較すれば極めて小さく、液晶表示装置と
した場合の画像の表示品位に影響するものではない。ま
た、本発明のカラーフィルタでは省略した、カラーフィ
ルタ間のブラックマトリクスは、かわりに対向基板(T
FT回路形成側基板)に設けるが、こうすることで、ブ
ラックマトリクスとカラーフィルタ間の樹脂の重なりは
起こらず、上記のような厚い樹脂の重なりによる大きな
突起が生じることがない。
[0007] At present, the color filters 2 are formed so as to slightly overlap each other. However, since the amount of overlap is small, the projection due to the overlap is formed by a conventional black resin. It is extremely small as compared with the projections formed by the color filters that overlap each other on the matrix, and does not affect the display quality of an image in the case of a liquid crystal display device. Further, the black matrix between the color filters, which is omitted in the color filter of the present invention, is replaced by a counter substrate (T
Although this is provided on the FT circuit forming side substrate), this does not cause the resin to overlap between the black matrix and the color filter, and thus does not cause a large protrusion due to the overlapping of the thick resin as described above.

【0008】[0008]

【発明の効果】本発明の方法により、従来クロム等や樹
脂にて別途形成していたブラックマトリクスおよびアラ
イメントマークのうち、画素パターン間のブラックマト
リクスは廃止して対向(TFT)電極側に移し、パター
ンの外周枠部およびアライメントマークを着色レジスト
の第1色目にて同時に形成することで、コストダウンと
なり、また工程数も減ることから不良率も低減する効果
がある。
According to the method of the present invention, of the black matrix and alignment mark conventionally formed of chrome or the like or a resin, the black matrix between pixel patterns is abolished and moved to the opposite (TFT) electrode side. By simultaneously forming the outer peripheral frame portion of the pattern and the alignment mark with the first color of the colored resist, the cost can be reduced, and the number of steps can be reduced, so that the defect rate can be reduced.

【0009】[0009]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のカラーフィルタの製造方法の一例を工
程順に示す説明図である。
FIG. 1 is an explanatory view showing an example of a method for manufacturing a color filter of the present invention in the order of steps.

【図2】従来の、ブラックマトリクスに金属および金属
化合物を用いたカラーフィルタの断面の一例を示す説明
図である。
FIG. 2 is an explanatory diagram showing an example of a cross section of a conventional color filter using a metal and a metal compound for a black matrix.

【図3】従来の、ブラックマトリクスに樹脂を用いたカ
ラーフィルタの断面の一例を示す説明図である。
FIG. 3 is an explanatory diagram showing an example of a cross section of a conventional color filter using a resin for a black matrix.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 カラーフィルタ 2’ 着色レジスト 3 外枠部 4 マーカー 5 ブラックマトリクス 6 フォトマスク DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Color filter 2 'Coloring resist 3 Outer frame part 4 Marker 5 Black matrix 6 Photomask

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】液晶表示装置用カラーフィルタの製造方法
において、ブラックマトリクスを形成していない透明基
板上に、画面パターンの額縁部および基板外周部のアラ
イメントマーカーを、複数色の着色レジストパターン形
成工程のうち第1色目のパターン形成工程にて同時に形
成することを特徴とするカラーフィルタの製造方法。
1. A method of manufacturing a color filter for a liquid crystal display device, comprising the steps of: forming, on a transparent substrate on which a black matrix is not formed, alignment markers at a frame portion of a screen pattern and an outer peripheral portion of a substrate, a plurality of colored resist pattern forming steps; Forming a first color pattern simultaneously in the first color pattern forming step.
JP27152798A 1998-09-25 1998-09-25 Production of color filter Pending JP2000098126A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27152798A JP2000098126A (en) 1998-09-25 1998-09-25 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27152798A JP2000098126A (en) 1998-09-25 1998-09-25 Production of color filter

Publications (1)

Publication Number Publication Date
JP2000098126A true JP2000098126A (en) 2000-04-07

Family

ID=17501316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27152798A Pending JP2000098126A (en) 1998-09-25 1998-09-25 Production of color filter

Country Status (1)

Country Link
JP (1) JP2000098126A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6652062B2 (en) 2000-03-31 2003-11-25 Canon Kabushiki Kaisha Liquid discharge recording head with orifice plate having extended portion fixed to recording head main body, liquid discharge recording apparatus having such head, and method for manufacturing such head
WO2004011987A1 (en) * 2002-07-29 2004-02-05 Sharp Kabushiki Kaisha Substrate with parallax barrier layer, method for producing substrate with parallax barrier layer, and three-dimensional display
JP2007065665A (en) * 2005-08-30 2007-03-15 Asml Netherlands Bv Device manufacturing method, mask and device
CN100410756C (en) * 2005-01-25 2008-08-13 统宝光电股份有限公司 Colour light filter base plate and producing method thereof
JP2013025297A (en) * 2011-07-26 2013-02-04 Toppan Printing Co Ltd Method of producing member for liquid crystal display panel, and member for liquid crystal display panel
US20140134770A1 (en) * 2012-11-09 2014-05-15 Tae-Jong EOM Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters
CN104777664A (en) * 2015-04-28 2015-07-15 深圳市华星光电技术有限公司 Method for manufacturing black matrix
JP2017151290A (en) * 2016-02-25 2017-08-31 凸版印刷株式会社 Color filter and method for manufacturing the same
WO2019223296A1 (en) * 2018-05-22 2019-11-28 惠科股份有限公司 Manufacturing method for display panel, and display panel
US11594707B2 (en) 2019-10-07 2023-02-28 Joled Inc. Self-luminous display panel having different distances between openings of light-shielding film and light-emitting elements depending on light emission color of the light-emitting elements
US11864443B2 (en) 2019-10-04 2024-01-02 Jdi Design And Development G. K. Self-luminous display panel having different optical distances between light-shielding film and light emission reference points depending on light emission color

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6652062B2 (en) 2000-03-31 2003-11-25 Canon Kabushiki Kaisha Liquid discharge recording head with orifice plate having extended portion fixed to recording head main body, liquid discharge recording apparatus having such head, and method for manufacturing such head
US6975466B2 (en) 2000-03-31 2005-12-13 Canon Kabushiki Kaisha Liquid discharge recording head, liquid discharge recording apparatus, and method for manufacturing liquid discharge head
WO2004011987A1 (en) * 2002-07-29 2004-02-05 Sharp Kabushiki Kaisha Substrate with parallax barrier layer, method for producing substrate with parallax barrier layer, and three-dimensional display
US7420637B2 (en) 2002-07-29 2008-09-02 Sharp Kabushiki Kaisha Substrate with parallax barrier layer, method for producing substrate with parallax barrier layer, and three-dimensional display
CN100410756C (en) * 2005-01-25 2008-08-13 统宝光电股份有限公司 Colour light filter base plate and producing method thereof
JP2007065665A (en) * 2005-08-30 2007-03-15 Asml Netherlands Bv Device manufacturing method, mask and device
JP4658004B2 (en) * 2005-08-30 2011-03-23 エーエスエムエル ネザーランズ ビー.ブイ. Device manufacturing method
JP2013025297A (en) * 2011-07-26 2013-02-04 Toppan Printing Co Ltd Method of producing member for liquid crystal display panel, and member for liquid crystal display panel
US20140134770A1 (en) * 2012-11-09 2014-05-15 Tae-Jong EOM Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters
US8951700B2 (en) * 2012-11-09 2015-02-10 Samsung Display Co., Ltd. Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters
CN104777664A (en) * 2015-04-28 2015-07-15 深圳市华星光电技术有限公司 Method for manufacturing black matrix
WO2016173210A1 (en) * 2015-04-28 2016-11-03 深圳市华星光电技术有限公司 Manufacturing method for black matrix
JP2017151290A (en) * 2016-02-25 2017-08-31 凸版印刷株式会社 Color filter and method for manufacturing the same
WO2019223296A1 (en) * 2018-05-22 2019-11-28 惠科股份有限公司 Manufacturing method for display panel, and display panel
US11864443B2 (en) 2019-10-04 2024-01-02 Jdi Design And Development G. K. Self-luminous display panel having different optical distances between light-shielding film and light emission reference points depending on light emission color
US11594707B2 (en) 2019-10-07 2023-02-28 Joled Inc. Self-luminous display panel having different distances between openings of light-shielding film and light-emitting elements depending on light emission color of the light-emitting elements

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