KR930019812A - 저표면장력 암모니아수 조성물 - Google Patents

저표면장력 암모니아수 조성물 Download PDF

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Publication number
KR930019812A
KR930019812A KR1019930002587A KR930002587A KR930019812A KR 930019812 A KR930019812 A KR 930019812A KR 1019930002587 A KR1019930002587 A KR 1019930002587A KR 930002587 A KR930002587 A KR 930002587A KR 930019812 A KR930019812 A KR 930019812A
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South Korea
Prior art keywords
ammonia water
surface tension
low surface
water composition
water
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KR1019930002587A
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English (en)
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KR100250002B1 (ko
Inventor
후미히로 모리가와
아키히사 요시가와
노리오 이시가와
다카오 시호야
Original Assignee
나카이 타케오
닛산 카가쿠 고오교오 가부시끼가이샤
노자와 슌타로오
칸토오 카가쿠 가부시끼가이샤
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Publication of KR930019812A publication Critical patent/KR930019812A/ko
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Publication of KR100250002B1 publication Critical patent/KR100250002B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D10/00—Compositions of detergents, not provided for by one single preceding group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

암모니아수에 불소계 계면활성제(플루오로알킬술폰아미드화합물)를 함유하여 이루어지는 것을 특징으로 하는 저표면장력 암모니아수조성물 및 이 암모니아수 조성물과 과산화수소수와 물로 이루어지는 웨이퍼세정액.
이 암모니아수 조성물은, 과산화수소수, 물과의 혼합액으로서 사용할 경우, 실리콘 웨이퍼의 세정시에, 표면장력이 작고, 웨이퍼에 대한 젖는 성질이 양호함과 동시에, 미립자의 제거능력이 높고, 피트발생등의 실리콘웨이퍼로의 대미지도 억제할 수가 있다.

Description

저표면장력 암모니아수 조성물.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (6)

  1. 일반식
  2. R1SO2NR2-X-H ‥‥‥(1)
  3. (식 중, R1은 플루오르알킬기를 나타내고, R2은 수소원자 또는 저급알킬기를 나타내며, X는, CH2COO 또는 (CH2CH2O)n를 나타낸다. 여기서 n는 1에서부터 20이다.)로 나타내는 플루오로알킬술폰아미드화합물로 이루어지는 불소계 계면활성제를 암모니아수에 함유시킨 것을 특징으로 하는 저표면장력 암모니아수 조성물.
  4. 제1항에 있어서, 상기 플루오로알킬술폰아미드 화합물의 함유량이 0.001~0.3중량%인 저표면장력 암모니아수 조성물.
  5. 제1항 또는 제2항에 있어서, 상기 암모니아수가 과산화수소수와 물과의 혼합액으로서 조제된 것인 저표면장력 암모니아수 조성물.
  6. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930002587A 1992-03-06 1993-02-24 반도체 기판용 저표면장력 세정조성물 KR100250002B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP92-97516 1992-03-06
JP09751692A JP3217116B2 (ja) 1992-03-06 1992-03-06 低表面張力洗浄用組成物

Publications (2)

Publication Number Publication Date
KR930019812A true KR930019812A (ko) 1993-10-19
KR100250002B1 KR100250002B1 (ko) 2000-03-15

Family

ID=14194426

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930002587A KR100250002B1 (ko) 1992-03-06 1993-02-24 반도체 기판용 저표면장력 세정조성물

Country Status (5)

Country Link
US (1) US5580847A (ko)
EP (1) EP0561236B1 (ko)
JP (1) JP3217116B2 (ko)
KR (1) KR100250002B1 (ko)
DE (1) DE69329883T2 (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3217116B2 (ja) * 1992-03-06 2001-10-09 日産化学工業株式会社 低表面張力洗浄用組成物
JPH08195369A (ja) * 1995-01-13 1996-07-30 Daikin Ind Ltd 基板の洗浄方法
RU2052868C1 (ru) * 1995-02-03 1996-01-20 Акционерное общество "Научно-производственное предприятие "Сапфир" Состав раствора для очистки поверхности (типа "полифункционал")
JP3923097B2 (ja) * 1995-03-06 2007-05-30 忠弘 大見 洗浄装置
AU7040698A (en) 1997-07-10 1999-02-08 Merck Patent Gmbh Solutions for cleaning silicon semiconductors or silicon oxides
KR100415261B1 (ko) * 1998-03-26 2004-03-26 이기원 전자표시장치및기판용세정및식각조성물
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
TWI276682B (en) 2001-11-16 2007-03-21 Mitsubishi Chem Corp Substrate surface cleaning liquid mediums and cleaning method
US6949411B1 (en) * 2001-12-27 2005-09-27 Lam Research Corporation Method for post-etch and strip residue removal on coral films
US7294610B2 (en) 2004-03-03 2007-11-13 3M Innovative Properties Company Fluorinated sulfonamide surfactants for aqueous cleaning solutions
US20100160458A1 (en) * 2008-12-23 2010-06-24 3M Innovative Properties Company Method of making a composition and aqueous composition preparable thereby
WO2010074878A1 (en) * 2008-12-23 2010-07-01 3M Innovative Properties Company Aqueous composition containing fluorinated sulfonamide and sulfonamidate compounds
US8258341B2 (en) 2009-07-10 2012-09-04 E.I. Du Pont De Nemours And Company Polyfluorosulfonamido amine and intermediate
US8779196B2 (en) * 2010-03-25 2014-07-15 E I Du Pont De Nemours And Company Polyfluoroalkylsulfonamido alkyl halide intermediate
US9168408B2 (en) * 2010-03-25 2015-10-27 The Chemours Company Fc, Llc Surfactant composition from polyfluoroalkylsulfonamido alkyl amines
US8729138B2 (en) * 2010-03-25 2014-05-20 E I Du Pont De Nemours And Company Mixture of polyfluoroalkylsulfonamido alkyl amines
CN103717706B (zh) 2011-08-10 2015-09-23 3M创新有限公司 用于光致抗蚀剂冲洗剂溶液的全氟烷基磺酰胺表面活性剂
EP2951217B1 (en) * 2013-01-29 2017-08-16 3M Innovative Properties Company Surfactants and methods of making and using same
US11193059B2 (en) 2016-12-13 2021-12-07 Current Lighting Solutions, Llc Processes for preparing color stable red-emitting phosphor particles having small particle size

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2877267A (en) * 1956-06-18 1959-03-10 Minnesota Mining & Mfg Polyfluorinated sulfonic acids and derivatives
US2937098A (en) * 1958-09-18 1960-05-17 Simoniz Co Liquid polishing composition driable to a bright coating
US3741914A (en) * 1969-06-26 1973-06-26 Procter & Gamble Cleaning polishing composition
US3900508A (en) * 1969-10-17 1975-08-19 Bayer Ag Perfluoroalkylsulfonic acid aminophenyl esters
DE1952387C3 (de) * 1969-10-17 1975-01-23 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung von PerfhioralkylsulfonsSurearylestern
US3901727A (en) * 1971-03-08 1975-08-26 Minnesota Mining & Mfg Process and composition for cleaning and imparting water and oil repellency and stain resistance to a substrate
NL171267C (nl) * 1975-12-19 Ciba Geigy Werkwijze voor het bereiden van gefluoreerde sulfonzuren en zouten daarvan, alsmede werkwijze voor het bereiden van samenstellingen, die deze verbindingen bevatten.
US4299749A (en) * 1980-06-30 1981-11-10 Sterling Drug Inc. Floor coating composition
KR900001065B1 (ko) * 1987-09-30 1990-02-26 삼성전자 주식회사 실리콘 반도체 장치의 표면 메탈증착전 처리방법
JP2894717B2 (ja) * 1989-03-15 1999-05-24 日産化学工業株式会社 低表面張力硫酸組成物
JP2801635B2 (ja) * 1989-04-26 1998-09-21 川崎製鉄株式会社 高振動減衰能を有する高じん性溶接構造用鋼材
JP3217116B2 (ja) * 1992-03-06 2001-10-09 日産化学工業株式会社 低表面張力洗浄用組成物

Also Published As

Publication number Publication date
DE69329883T2 (de) 2001-08-02
EP0561236B1 (en) 2001-01-24
KR100250002B1 (ko) 2000-03-15
DE69329883D1 (de) 2001-03-01
EP0561236A1 (en) 1993-09-22
US5580847A (en) 1996-12-03
JPH05251416A (ja) 1993-09-28
JP3217116B2 (ja) 2001-10-09

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