KR920018511A - 액정전기 광학장치 - Google Patents
액정전기 광학장치 Download PDFInfo
- Publication number
- KR920018511A KR920018511A KR1019920004132A KR920004132A KR920018511A KR 920018511 A KR920018511 A KR 920018511A KR 1019920004132 A KR1019920004132 A KR 1019920004132A KR 920004132 A KR920004132 A KR 920004132A KR 920018511 A KR920018511 A KR 920018511A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- channel
- film transistors
- liquid crystal
- optical device
- Prior art date
Links
- 239000011159 matrix material Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims 16
- 239000004973 liquid crystal related substance Substances 0.000 claims 11
- 230000000295 complement effect Effects 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 7
- 230000005611 electricity Effects 0.000 claims 1
- 230000005693 optoelectronics Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13624—Active matrix addressed cells having more than one switching element per pixel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13624—Active matrix addressed cells having more than one switching element per pixel
- G02F1/136245—Active matrix addressed cells having more than one switching element per pixel having complementary transistors
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Nonlinear Science (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Ceramic Engineering (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 구성을 2×2 매트릭스로 편성한 경우의 설명도,
제2도는 본 발명을 사용하지 않는 종래의 예시도,
제3도는 본 발명 실시예의 일례도.
Claims (9)
- 기판상에 매트릭스 구성을 갖는 복수의 화소가 설치된 액정전기 광학장치로, 각각의 화소전극에 P채널형 박막트랜지스터와 N채널형 박막트랜지스터와를 상보형으로 구성한 상보형 박막트랜지스터를 복수로 설치하고, 그 복수의 상보형 박막트랜지스터의 입출력단을 직렬로 접속하고, 이 입출력단의 한쪽을 상기 화소전극으로, 다른 한쪽을 제1신호선에 접속하고, 동시에 상기 복수의 상보형 박막 트랜지스터의 모든 게이트전극을 제2신호선에 접속한 것을 특징으로 하는 액정전기 광학전기.
- 기판상에 매트릭스 구성을 갖는 복수의 화소가 설치된 액정전기 광학장치로, 각각의 화소전극에 복수의 P채널형 박막트랜지스터와 복수의 N채널형 박막트랜지스터를 갖고, 상기 복수의 P채널형 박막트랜지스터의 입출력단을 직렬로 접속하고, 이 입출력단의 한쪽을 상기 화소전극에, 다른 한쪽을 제1신호선에 접속하고, 상기 복수의 N채널형 박막트랜지스터의 입출력단을 직렬로 접속하고, 이 입출력단의 한쪽을 상기 화소전극에, 다른 한쪽을 같은 제1신호선에 접속하고, 상기 박막트랜지스터의 모든 게이트 전극을 동일한 제2신호선에 접속한 것을 특징으로 하는 액정전기 광학장치.
- 제1항에 있어서 복수의 상보형 박막트랜지스터 가운데 적어도 1조는 나머지 상보형 박막트랜지스터가 동작불량시 보상하는 기능을 갖는 점을 특징으로 하는 액정정기 광학장치.
- 제2항에 있어서, 복수의 P채널형 박막트랜지스터 가운데 적어도 일부는 나머지 박막트랜지스터가 동작불량시 보상하는 기능을 갖는 점을 특징으로 하는 액정전기 광학장치.
- 제2항에 있어서, 복수의 N채널형 박막트랜지스터 가운데 적어도 일부는 나머지 박막트랜지스터가 동작불량시 보상하는 기능을 갖는 점을 특징으로 하는 액정전기 광학장치.
- 한쌍의 기판과, 상기 한쌍의 기판들 사이에 구비된 전기광학적 영향이 미치는 수단과, 상기 기판들 중 한 내부표면상에 다수의 화소전극들이 형성되어 상기 화소전극에 전압을 인가하기 위한 스윗칭수단으로 구비되는 각각의 상기 화소전극과, 다른 기판상에 형성된 역전극과, 상기 화소전극들이 형성된 기판상에 제공된 다수의 신호선 및 다수의 데이터선으로 이루어져 상기 스윗칭수단이 직렬로 상응화소전극 및 데이터선과 접속된 두 개의 상보형 P채널 및 N채널 트랜지스터로 이루어짐을 특징으로 하는 액정전기 광학장치.
- 제6항에 있어서, 상기 전기광학적 영향이 미치는 수단이 액정층임을 특징으로 하는 액정전기 광학장치.
- 제6항에 있어서, 상기 두 개의 상보형 P채널 및 N채널 트랜지스터 쌍들의 모든 게이트 전극들이 상기 신호선중 상응하는 하나와 접속됨을 특징으로 하는 액정전기 광학장치.
- 제6항에 있어서, 상기 스윗칭수단이 직렬로 상기 두 개의 P채널 및 N채널 트랜지스터 쌍과 접속된 다른 상보형 P채널 및 N채널 트랜지스터 쌍으로 이루어짐을 특징으로 하는 액정전기 광학장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7678591A JP2873632B2 (ja) | 1991-03-15 | 1991-03-15 | 半導体装置 |
JP91-76785 | 1991-03-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920018511A true KR920018511A (ko) | 1992-10-22 |
KR0133845B1 KR0133845B1 (ko) | 1998-04-22 |
Family
ID=13615264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920004132A KR0133845B1 (ko) | 1991-03-15 | 1992-03-13 | 반도체장치와 그를 사용한 전기광학장치 |
Country Status (3)
Country | Link |
---|---|
US (2) | US5642213A (ko) |
JP (1) | JP2873632B2 (ko) |
KR (1) | KR0133845B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100522960B1 (ko) * | 1990-11-26 | 2005-10-24 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치 제작방법 |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3556679B2 (ja) * | 1992-05-29 | 2004-08-18 | 株式会社半導体エネルギー研究所 | 電気光学装置 |
JP2873632B2 (ja) | 1991-03-15 | 1999-03-24 | 株式会社半導体エネルギー研究所 | 半導体装置 |
US6713783B1 (en) | 1991-03-15 | 2004-03-30 | Semiconductor Energy Laboratory Co., Ltd. | Compensating electro-optical device including thin film transistors |
CN1161646C (zh) | 1994-06-02 | 2004-08-11 | 株式会社半导体能源研究所 | 有源矩阵显示器和电光元件 |
EP1054381A3 (en) * | 1994-06-24 | 2001-08-22 | Hitachi, Ltd. | Active matrix liquid crystal display system of the horizontal field type with voltage for minimum brightness greater than zero, and driving method therefor |
US6198464B1 (en) | 1995-01-13 | 2001-03-06 | Hitachi, Ltd. | Active matrix type liquid crystal display system and driving method therefor |
TW345654B (en) * | 1995-02-15 | 1998-11-21 | Handotai Energy Kenkyusho Kk | Active matrix display device |
TW344901B (en) * | 1995-02-15 | 1998-11-11 | Handotai Energy Kenkyusho Kk | Active matrix display device |
US6072454A (en) * | 1996-03-01 | 2000-06-06 | Kabushiki Kaisha Toshiba | Liquid crystal display device |
JP4014676B2 (ja) * | 1996-08-13 | 2007-11-28 | 株式会社半導体エネルギー研究所 | 絶縁ゲイト型半導体装置およびその作製方法 |
JP3788649B2 (ja) * | 1996-11-22 | 2006-06-21 | 株式会社半導体エネルギー研究所 | 液晶表示装置 |
JP3795606B2 (ja) * | 1996-12-30 | 2006-07-12 | 株式会社半導体エネルギー研究所 | 回路およびそれを用いた液晶表示装置 |
US6088070A (en) * | 1997-01-17 | 2000-07-11 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix liquid crystal with capacitor between light blocking film and pixel connecting electrode |
JP3528182B2 (ja) * | 1997-02-17 | 2004-05-17 | セイコーエプソン株式会社 | 表示装置 |
US6462722B1 (en) | 1997-02-17 | 2002-10-08 | Seiko Epson Corporation | Current-driven light-emitting display apparatus and method of producing the same |
JP3308880B2 (ja) * | 1997-11-07 | 2002-07-29 | キヤノン株式会社 | 液晶表示装置と投写型液晶表示装置 |
JPH11195487A (ja) * | 1997-12-27 | 1999-07-21 | Tdk Corp | 有機el素子 |
US6506635B1 (en) * | 1999-02-12 | 2003-01-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and method of forming the same |
US6346730B1 (en) * | 1999-04-06 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device having a pixel TFT formed in a display region and a drive circuit formed in the periphery of the display region on the same substrate |
US8853696B1 (en) * | 1999-06-04 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and electronic device |
JP2001077108A (ja) * | 1999-08-31 | 2001-03-23 | Nec Corp | 半導体装置及び複合酸化物薄膜の製造方法 |
TW591584B (en) | 1999-10-21 | 2004-06-11 | Semiconductor Energy Lab | Active matrix type display device |
US6580094B1 (en) * | 1999-10-29 | 2003-06-17 | Semiconductor Energy Laboratory Co., Ltd. | Electro luminescence display device |
TW587239B (en) | 1999-11-30 | 2004-05-11 | Semiconductor Energy Lab | Electric device |
US6825488B2 (en) | 2000-01-26 | 2004-11-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
TW521226B (en) * | 2000-03-27 | 2003-02-21 | Semiconductor Energy Lab | Electro-optical device |
JP4014831B2 (ja) * | 2000-09-04 | 2007-11-28 | 株式会社半導体エネルギー研究所 | El表示装置及びその駆動方法 |
JP2002358031A (ja) | 2001-06-01 | 2002-12-13 | Semiconductor Energy Lab Co Ltd | 発光装置及びその駆動方法 |
JP4149168B2 (ja) * | 2001-11-09 | 2008-09-10 | 株式会社半導体エネルギー研究所 | 発光装置 |
KR100444030B1 (ko) * | 2002-07-16 | 2004-08-12 | 엘지.필립스 엘시디 주식회사 | 유기전계 발광소자 |
US6803275B1 (en) | 2002-12-03 | 2004-10-12 | Fasl, Llc | ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices |
US7033957B1 (en) | 2003-02-05 | 2006-04-25 | Fasl, Llc | ONO fabrication process for increasing oxygen content at bottom oxide-substrate interface in flash memory devices |
JP4574127B2 (ja) * | 2003-03-26 | 2010-11-04 | 株式会社半導体エネルギー研究所 | 素子基板及び発光装置 |
US7199397B2 (en) * | 2004-05-05 | 2007-04-03 | Au Optronics Corporation | AMOLED circuit layout |
TWI293713B (en) * | 2004-07-02 | 2008-02-21 | Au Optronics Corp | Display panel and fabrication method thereof |
US7382421B2 (en) * | 2004-10-12 | 2008-06-03 | Hewlett-Packard Development Company, L.P. | Thin film transistor with a passivation layer |
KR101219038B1 (ko) | 2004-10-26 | 2013-01-07 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
WO2006054568A1 (ja) * | 2004-11-19 | 2006-05-26 | Matsushita Electric Industrial Co., Ltd. | 有機半導体回路及びその駆動方法 |
KR101404582B1 (ko) * | 2006-01-20 | 2014-06-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치의 구동방법 |
TWI459103B (zh) * | 2009-02-02 | 2014-11-01 | Au Optronics Corp | 畫素結構及其製造方法 |
CN106990574B (zh) * | 2017-06-02 | 2021-02-02 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示装置及其驱动方法 |
Family Cites Families (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5124341B2 (ko) * | 1971-12-24 | 1976-07-23 | ||
US4065781A (en) * | 1974-06-21 | 1977-12-27 | Westinghouse Electric Corporation | Insulated-gate thin film transistor with low leakage current |
US4042854A (en) | 1975-11-21 | 1977-08-16 | Westinghouse Electric Corporation | Flat panel display device with integral thin film transistor control system |
US4006383A (en) | 1975-11-28 | 1977-02-01 | Westinghouse Electric Corporation | Electroluminescent display panel with enlarged active display areas |
US4045302A (en) * | 1976-07-08 | 1977-08-30 | Burroughs Corporation | Multilevel metallization process |
JPS5327483A (en) | 1976-08-27 | 1978-03-14 | Hitachi Ltd | Evalution of material structure |
JPS53144297A (en) * | 1977-05-20 | 1978-12-15 | Matsushita Electric Ind Co Ltd | Display device |
JPS5529154A (en) * | 1978-08-23 | 1980-03-01 | Shunpei Yamazaki | Semiconductor device |
US4466172A (en) * | 1979-01-08 | 1984-08-21 | American Microsystems, Inc. | Method for fabricating MOS device with self-aligned contacts |
GB2081018B (en) * | 1980-07-31 | 1985-06-26 | Suwa Seikosha Kk | Active matrix assembly for display device |
US4409724A (en) | 1980-11-03 | 1983-10-18 | Texas Instruments Incorporated | Method of fabricating display with semiconductor circuits on monolithic structure and flat panel display produced thereby |
DE3272410D1 (en) | 1981-02-16 | 1986-09-11 | Fujitsu Ltd | Method of producing mosfet type semiconductor device |
JPS584180A (ja) | 1981-06-30 | 1983-01-11 | セイコーエプソン株式会社 | アクテイブマトリクス基板 |
JPS587163A (ja) | 1981-07-03 | 1983-01-14 | Matsushita Graphic Commun Syst Inc | 静電現像装置 |
JPS5823479A (ja) * | 1981-08-05 | 1983-02-12 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS58100461A (ja) * | 1981-12-10 | 1983-06-15 | Japan Electronic Ind Dev Assoc<Jeida> | 薄膜トランジスタの製造方法 |
JPS58115864A (ja) * | 1981-12-28 | 1983-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置 |
FR2524714B1 (fr) * | 1982-04-01 | 1986-05-02 | Suwa Seikosha Kk | Transistor a couche mince |
US4770498A (en) * | 1982-07-12 | 1988-09-13 | Hosiden Electronics Co., Ltd. | Dot-matrix liquid crystal display |
DE3480243D1 (en) | 1983-03-31 | 1989-11-23 | Matsushita Electric Ind Co Ltd | Method of manufacturing thin-film integrated devices |
JPS6066288A (ja) | 1983-09-21 | 1985-04-16 | セイコーエプソン株式会社 | 液晶表示装置 |
JPS60213062A (ja) * | 1984-04-09 | 1985-10-25 | Hosiden Electronics Co Ltd | 薄膜トランジスタの製造方法 |
US4727044A (en) | 1984-05-18 | 1988-02-23 | Semiconductor Energy Laboratory Co., Ltd. | Method of making a thin film transistor with laser recrystallized source and drain |
JPS6137284A (ja) * | 1984-07-31 | 1986-02-22 | ジューキ株式会社 | ミシンの縫製パタ−ン作成装置 |
JPH0693166B2 (ja) * | 1984-09-05 | 1994-11-16 | 株式会社日立製作所 | 液晶素子 |
JPS6211829A (ja) * | 1985-03-28 | 1987-01-20 | Toshiba Corp | アクテイブマトリツクス形液晶表示装置 |
JPS6245182A (ja) * | 1985-08-23 | 1987-02-27 | Hitachi Vlsi Eng Corp | 半導体記憶装置 |
DE3682021D1 (de) | 1985-10-23 | 1991-11-21 | Hitachi Ltd | Polysilizium-mos-transistor und verfahren zu seiner herstellung. |
JPH0799774B2 (ja) | 1986-11-06 | 1995-10-25 | 松下電器産業株式会社 | 半導体装置の製造方法 |
JPS63151083A (ja) * | 1986-12-16 | 1988-06-23 | Hitachi Ltd | 薄膜半導体装置 |
JPS63261875A (ja) * | 1987-04-20 | 1988-10-28 | Seiko Epson Corp | 固体撮像装置 |
JPS63289534A (ja) * | 1987-05-22 | 1988-11-28 | Seiko Epson Corp | アクテイブマトリクスパネル |
GB2206721A (en) * | 1987-07-03 | 1989-01-11 | Philips Electronic Associated | Active matrix display device |
JPS6430133A (en) * | 1987-07-24 | 1989-02-01 | New Japan Radio Co Ltd | Manufacture of embeded heater for miniature cathode |
JPH07114184B2 (ja) | 1987-07-27 | 1995-12-06 | 日本電信電話株式会社 | 薄膜形シリコン半導体装置およびその製造方法 |
JPS6450028A (en) * | 1987-08-21 | 1989-02-27 | Nec Corp | Thin film transistor substrate |
JP2786628B2 (ja) * | 1987-10-15 | 1998-08-13 | シャープ株式会社 | 液晶パネルの電極構造 |
US5075674A (en) * | 1987-11-19 | 1991-12-24 | Sharp Kabushiki Kaisha | Active matrix substrate for liquid crystal display |
JPH01165172A (ja) * | 1987-12-22 | 1989-06-29 | Ricoh Co Ltd | 薄膜トランジスターの製造方法 |
JP2653099B2 (ja) * | 1988-05-17 | 1997-09-10 | セイコーエプソン株式会社 | アクティブマトリクスパネル,投写型表示装置及びビューファインダー |
JP2657071B2 (ja) | 1988-07-18 | 1997-09-24 | 三洋電機株式会社 | 多結晶シリコン薄膜及びその形成方法 |
JPH0816756B2 (ja) * | 1988-08-10 | 1996-02-21 | シャープ株式会社 | 透過型アクティブマトリクス液晶表示装置 |
JPH0285826A (ja) * | 1988-09-22 | 1990-03-27 | Hitachi Ltd | 表示パネル |
JPH0290683A (ja) * | 1988-09-28 | 1990-03-30 | Seiko Epson Corp | 薄膜トランジスタ及びその製造方法 |
DE68915524T2 (de) * | 1988-12-26 | 1994-12-08 | Sharp Kk | Flüssigkristallanzeigevorrichtung. |
US5159476A (en) * | 1988-12-28 | 1992-10-27 | Sony Corporation | Liquid crystal display unit having large image area and high resolution |
JPH02273934A (ja) * | 1989-04-17 | 1990-11-08 | Oki Electric Ind Co Ltd | 半導体素子およびその製造方法 |
JP2941908B2 (ja) * | 1989-07-31 | 1999-08-30 | キヤノン株式会社 | 薄膜トランジスタ及びその製造方法並びにそれを有する装置 |
GB2235326A (en) * | 1989-08-16 | 1991-02-27 | Philips Electronic Associated | Active matrix liquid crystal colour display devices |
US5153690A (en) * | 1989-10-18 | 1992-10-06 | Hitachi, Ltd. | Thin-film device |
JPH03163529A (ja) * | 1989-11-22 | 1991-07-15 | Sharp Corp | アクティブマトリクス表示装置 |
JPH02230130A (ja) * | 1989-12-15 | 1990-09-12 | Semiconductor Energy Lab Co Ltd | 液晶電気光学装置 |
US5056895A (en) * | 1990-05-21 | 1991-10-15 | Greyhawk Systems, Inc. | Active matrix liquid crystal liquid crystal light valve including a dielectric mirror upon a leveling layer and having fringing fields |
US5126283A (en) * | 1990-05-21 | 1992-06-30 | Motorola, Inc. | Process for the selective encapsulation of an electrically conductive structure in a semiconductor device |
JP3226223B2 (ja) * | 1990-07-12 | 2001-11-05 | 株式会社東芝 | 薄膜トランジスタアレイ装置および液晶表示装置 |
JPH0817235B2 (ja) * | 1990-08-29 | 1996-02-21 | 株式会社東芝 | オフセットゲート構造トランジスタおよびその製造方法 |
JP3060656B2 (ja) | 1990-11-26 | 2000-07-10 | セイコーエプソン株式会社 | 液晶表示素子 |
DE69128876T2 (de) * | 1990-11-30 | 1998-08-06 | Sharp Kk | Dünnfilm-Halbleitervorrichtung |
KR960010723B1 (ko) * | 1990-12-20 | 1996-08-07 | 가부시끼가이샤 한도오따이 에네루기 겐큐쇼 | 전기광학장치 |
US5289030A (en) * | 1991-03-06 | 1994-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device with oxide layer |
JP2717233B2 (ja) | 1991-03-06 | 1998-02-18 | 株式会社 半導体エネルギー研究所 | 絶縁ゲイト型電界効果半導体装置およびその作製方法 |
JP2873632B2 (ja) | 1991-03-15 | 1999-03-24 | 株式会社半導体エネルギー研究所 | 半導体装置 |
GB2255443B (en) * | 1991-04-30 | 1995-09-13 | Samsung Electronics Co Ltd | Fabricating a metal electrode of a semiconductor device |
-
1991
- 1991-03-15 JP JP7678591A patent/JP2873632B2/ja not_active Expired - Fee Related
-
1992
- 1992-03-13 KR KR1019920004132A patent/KR0133845B1/ko not_active IP Right Cessation
-
1994
- 1994-05-20 US US08/247,924 patent/US5642213A/en not_active Expired - Lifetime
-
1995
- 1995-06-06 US US08/470,598 patent/US6236064B1/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100522960B1 (ko) * | 1990-11-26 | 2005-10-24 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치 제작방법 |
Also Published As
Publication number | Publication date |
---|---|
JP2873632B2 (ja) | 1999-03-24 |
US6236064B1 (en) | 2001-05-22 |
KR0133845B1 (ko) | 1998-04-22 |
JPH0627484A (ja) | 1994-02-04 |
US5642213A (en) | 1997-06-24 |
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