KR20150105248A - 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨 차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널 - Google Patents

차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨 차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널 Download PDF

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Publication number
KR20150105248A
KR20150105248A KR1020150031531A KR20150031531A KR20150105248A KR 20150105248 A KR20150105248 A KR 20150105248A KR 1020150031531 A KR1020150031531 A KR 1020150031531A KR 20150031531 A KR20150031531 A KR 20150031531A KR 20150105248 A KR20150105248 A KR 20150105248A
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KR
South Korea
Prior art keywords
light
black
shielding film
color
shielding
Prior art date
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KR1020150031531A
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English (en)
Korean (ko)
Inventor
요시토 나카지마
마사노리 코노
테츠야 야나기모토
마나부 히가시
토루 사이토우
코우이치 후지시로
Original Assignee
신닛테츠 수미킨 가가쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2015043998A external-priority patent/JP6815717B2/ja
Application filed by 신닛테츠 수미킨 가가쿠 가부시키가이샤 filed Critical 신닛테츠 수미킨 가가쿠 가부시키가이샤
Publication of KR20150105248A publication Critical patent/KR20150105248A/ko
Priority to KR1020230084142A priority Critical patent/KR20230104564A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
KR1020150031531A 2014-03-07 2015-03-06 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨 차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널 KR20150105248A (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020230084142A KR20230104564A (ko) 2014-03-07 2023-06-29 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014045103 2014-03-07
JPJP-P-2014-045103 2014-03-07
JP2015043998A JP6815717B2 (ja) 2015-03-05 2015-03-05 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル
JPJP-P-2015-043998 2015-03-05

Related Child Applications (1)

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KR1020230084142A Division KR20230104564A (ko) 2014-03-07 2023-06-29 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널

Publications (1)

Publication Number Publication Date
KR20150105248A true KR20150105248A (ko) 2015-09-16

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Application Number Title Priority Date Filing Date
KR1020150031531A KR20150105248A (ko) 2014-03-07 2015-03-06 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨 차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널
KR1020230084142A KR20230104564A (ko) 2014-03-07 2023-06-29 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널

Family Applications After (1)

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KR1020230084142A KR20230104564A (ko) 2014-03-07 2023-06-29 차광막용 흑색 수지 조성물, 상기 조성물을 경화시킨차광막을 갖는 차광막 부착 기판, 및 상기 차광막 부착 기판을 갖는 컬러필터 및 터치패널

Country Status (3)

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KR (2) KR20150105248A (zh)
CN (2) CN104898372B (zh)
TW (1) TWI659265B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
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US11041088B2 (en) 2017-09-04 2021-06-22 Samsung Display Co., Ltd. Ink blocking layer for display device and manufacturing method thereof
US12022687B2 (en) 2018-11-09 2024-06-25 Samsung Display Co., Ltd. Display panel

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JP6700710B2 (ja) * 2015-10-16 2020-05-27 日鉄ケミカル＆マテリアル株式会社 ブラックカラムスペーサー用の感光性樹脂組成物、ブラックカラムスペーサー、液晶表示装置、ブラックカラムスペーサー用の感光性樹脂組成物の製造方法、ブラックカラムスペーサーの製造方法、および液晶表示装置の製造方法
KR102540423B1 (ko) * 2015-12-24 2023-06-05 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JPWO2017208771A1 (ja) * 2016-05-31 2019-03-28 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像装置及び画像表示装置
KR102226800B1 (ko) * 2016-12-16 2021-03-10 주식회사 엘지화학 베젤 패턴 형성용 광중합성 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴
TWI744014B (zh) 2020-09-29 2021-10-21 新應材股份有限公司 黑色樹脂組成物、硬化膜以及黑色濾光片
CN113299781B (zh) * 2021-05-21 2023-02-03 中天科技精密材料有限公司 一种太阳能电池背板用多层功能膜、太阳能电池背板及太阳能电池组件
CN116970168B (zh) * 2023-09-22 2024-01-02 蓬莱新光颜料化工有限公司 一种基于颜料橙13的油墨用有机颜料及其制备方法

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11041088B2 (en) 2017-09-04 2021-06-22 Samsung Display Co., Ltd. Ink blocking layer for display device and manufacturing method thereof
US11618834B2 (en) 2017-09-04 2023-04-04 Samsung Display Co., Ltd. Ink blocking layer for display device and manufacturing method thereof
US12022687B2 (en) 2018-11-09 2024-06-25 Samsung Display Co., Ltd. Display panel

Also Published As

Publication number Publication date
CN111367143B (zh) 2023-10-31
TWI659265B (zh) 2019-05-11
CN104898372B (zh) 2020-04-14
CN111367143A (zh) 2020-07-03
KR20230104564A (ko) 2023-07-10
TW201535050A (zh) 2015-09-16
CN104898372A (zh) 2015-09-09

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