KR20130031799A - 노볼락형 페놀 수지, 포토레지스트용 수지 조성물 및 액정 디바이스의 제조 방법 - Google Patents

노볼락형 페놀 수지, 포토레지스트용 수지 조성물 및 액정 디바이스의 제조 방법 Download PDF

Info

Publication number: KR20130031799A
Authority: KR; South Korea
Prior art keywords: novolak; type phenol; resin; phenol resin; photoresists
Prior art date: 2011-09-21

Application number

KR1020120104401A

Other languages

English (en)

Korean (ko)

Inventor

준 마토리

Original Assignee

스미또모 베이크라이트 가부시키가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-09-21

Filing date

2012-09-20

Publication date

2013-03-29

2012-09-20 Application filed by 스미또모 베이크라이트 가부시키가이샤 filed Critical 스미또모 베이크라이트 가부시키가이샤

2013-03-29 Publication of KR20130031799A publication Critical patent/KR20130031799A/ko

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with monohydric phenols having only one hydrocarbon substituent ortho on para to the OH group, e.g. p-tert.-butyl phenol
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials For Photolithography (AREA)
Phenolic Resins Or Amino Resins (AREA)

KR1020120104401A 2011-09-21 2012-09-20 노볼락형 페놀 수지, 포토레지스트용 수지 조성물 및 액정 디바이스의 제조 방법 KR20130031799A (ko)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JPJP-P-2011-205833		2011-09-21
JP2011205833		2011-09-21

Publications (1)

Publication Number	Publication Date
KR20130031799A true KR20130031799A (ko)	2013-03-29

Family

ID=48180857

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1020120104401A KR20130031799A (ko)	2011-09-21	2012-09-20	노볼락형 페놀 수지, 포토레지스트용 수지 조성물 및 액정 디바이스의 제조 방법

Country Status (3)

Country	Link
JP (1)	JP6031905B2 (ja)
KR (1)	KR20130031799A (ja)
TW (1)	TWI546323B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
RU2677493C1 (ru) *	2018-02-07	2019-01-17	Федеральное государственное унитарное предприятие "Государственный научный центр "Научно-исследовательский институт органических полупродуктов и красителей"	Алкилфенолоформальдегидные смолы - пленкообразующие для фоторезистов

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US9963536B2 (en)	2014-07-09	2018-05-08	Dic Corporation	Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60189739A (ja) *	1984-03-09	1985-09-27	Japan Synthetic Rubber Co Ltd	ポジ型感光性樹脂組成物
CA2023791A1 (en) *	1989-08-24	1991-02-25	Ayako Ida	Radiation-sensitive positive resist composition
JP3472994B2 (ja) *	1995-02-17	2003-12-02	Ｊｓｒ株式会社	感放射線性樹脂組成物
JP3478378B2 (ja) *	1998-12-18	2003-12-15	Ｊｓｒ株式会社	アルカリ可溶性ノボラック樹脂
JP2000338660A (ja) *	1999-05-27	2000-12-08	Toray Ind Inc	ポジ型電子線レジスト組成物およびこれを用いたレジストパターンの製造法
JP2002268214A (ja) *	2001-03-08	2002-09-18	Sumitomo Bakelite Co Ltd	フォトレジスト用フェノ−ル樹脂
JP4156400B2 (ja) *	2003-02-24	2008-09-24	東京応化工業株式会社	ポジ型ホトレジスト組成物及びレジストパターンの形成方法
JP2005221515A (ja) *	2004-01-08	2005-08-18	Tokyo Ohka Kogyo Co Ltd	システムｌｃｄ製造用ポジ型ホトレジスト組成物およびレジストパターンの形成方法
JP4929733B2 (ja) *	2005-01-28	2012-05-09	住友ベークライト株式会社	ノボラック型フェノール樹脂の製造方法
JP2007254547A (ja) *	2006-03-22	2007-10-04	Sumitomo Bakelite Co Ltd	フォトレジスト用フェノール樹脂とその製造方法、及びフォトレジスト用樹脂組成物

2012
- 2012-09-10 TW TW101132974A patent/TWI546323B/zh active
- 2012-09-10 JP JP2012198809A patent/JP6031905B2/ja active Active
- 2012-09-20 KR KR1020120104401A patent/KR20130031799A/ko not_active Application Discontinuation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
RU2677493C1 (ru) *	2018-02-07	2019-01-17	Федеральное государственное унитарное предприятие "Государственный научный центр "Научно-исследовательский институт органических полупродуктов и красителей"	Алкилфенолоформальдегидные смолы - пленкообразующие для фоторезистов

Also Published As

Publication number	Publication date
TWI546323B (zh)	2016-08-21
TW201323488A (zh)	2013-06-16
JP2013079369A (ja)	2013-05-02
JP6031905B2 (ja)	2016-11-24

Similar Documents

Publication	Publication Date	Title
EP2639636B1 (en)	2021-05-19	Positive-type photoresist composition
EP2639637B1 (en)	2017-03-22	Positive-type photoresist composition
KR20140007808A (ko)	2014-01-20	포지티브형 포토레지스트 조성물, 그 도막 및 노볼락형 페놀 수지
JP2008088197A (ja)	2008-04-17	フォトレジスト用フェノール樹脂とその製造方法、及びフォトレジスト用樹脂組成物
JP6221316B2 (ja)	2017-11-01	フォトレジスト用樹脂組成物の製造方法、フォトレジストの製造方法および液晶デバイスの製造方法
KR20140043322A (ko)	2014-04-09	포토레지스트용 수지 조성물
JP2011063667A (ja)	2011-03-31	ノボラック型フェノール樹脂及びフォトレジスト用樹脂組成物
KR20120029326A (ko)	2012-03-26	노볼락형 페놀 수지 및 포토 레지스트용 수지 조성물
KR20130031799A (ko)	2013-03-29	노볼락형 페놀 수지, 포토레지스트용 수지 조성물 및 액정 디바이스의 제조 방법
JPH02222409A (ja)	1990-09-05	ノボラック樹脂の製造方法
KR102012053B1 (ko)	2019-08-19	포토 레지스트용 수지 조성물
JP4929733B2 (ja)	2012-05-09	ノボラック型フェノール樹脂の製造方法
JP2009075436A (ja)	2009-04-09	フォトレジスト用樹脂組成物
KR20060043671A (ko)	2006-05-15	포토레지스트용 페놀 수지의 제조방법 및 포토레지스트조성물
KR20050029690A (ko)	2005-03-28	포토레지스트용 페놀 수지의 제조방법 및 포토레지스트조성물
KR101102111B1 (ko)	2012-01-02	포토레지스트용 수지의 제조방법, 포토레지스트 조성물
KR101253351B1 (ko)	2013-04-11	노볼락형 페놀 수지의 제조방법, 노볼락형 페놀 수지 및포토레지스트용 페놀 수지 조성물
JP2020055955A (ja)	2020-04-09	ノボラック型フェノール樹脂、感光性樹脂組成物およびノボラック型フェノール樹脂の製造方法
JP6386764B2 (ja)	2018-09-05	ノボラック型フェノール樹脂の製造方法、ノボラック型フェノール樹脂、及びフォトレジスト組成物
JP2021091798A (ja)	2021-06-17	フォトレジスト用のノボラック型フェノール樹脂およびその製造方法、ならびにフォトレジスト用の感光性樹脂組成物
JP2005290026A (ja)	2005-10-20	フォトレジスト用フェノール樹脂の製造方法、及び、フォトレジスト用樹脂組成物
JP2006096824A (ja)	2006-04-13	フォトレジスト用フェノール樹脂の製造方法及びフォトレジスト用樹脂組成物
JPH0694453B2 (ja)	1994-11-24	ポジ型レジスト用感放射線剤の製造方法

Legal Events

Date	Code	Title
2017-06-28	A201	Request for examination
2018-07-11	E902	Notification of reason for refusal
2019-01-22	E601	Decision to refuse application