KR20080062919A - Method for measuring rubbing mark width of liquid crystal display device - Google Patents

Method for measuring rubbing mark width of liquid crystal display device Download PDF

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Publication number
KR20080062919A
KR20080062919A KR1020060139107A KR20060139107A KR20080062919A KR 20080062919 A KR20080062919 A KR 20080062919A KR 1020060139107 A KR1020060139107 A KR 1020060139107A KR 20060139107 A KR20060139107 A KR 20060139107A KR 20080062919 A KR20080062919 A KR 20080062919A
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South Korea
Prior art keywords
rubbing
substrate
liquid crystal
mark width
crystal display
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KR1020060139107A
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Korean (ko)
Inventor
조민수
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엘지디스플레이 주식회사
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Priority to KR1020060139107A priority Critical patent/KR20080062919A/en
Publication of KR20080062919A publication Critical patent/KR20080062919A/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/022—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by means of tv-camera scanning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
    • G01B11/046—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving for measuring width

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)

Abstract

A method for measuring rubbing mark width of a liquid crystal display device is provided to keep the workshop clean without scraps by removing a substrate cutting process. A method for measuring rubbing mark width of a liquid crystal display device includes the steps of: forming an alignment film on a substrate(S110); forming a rubbing mark on the alignment film by performing a rubbing process on the alignment film(S120); moving the substrate with the rubbing mark on the alignment film to a steam inspector(S130); steaming a surface of the alignment film on the substrate(S140); and measuring the width of the rubbing mark formed on the alignment film steamed(S150).

Description

Measuring method of rubbing mark width of liquid crystal display {METHOD FOR MEASURING RUBBING MARK WIDTH OF LIQUID CRYSTAL DISPLAY DEVICE}

1A to 1G are cross-sectional views illustrating a rubbing mark width measuring process of a liquid crystal display according to the related art.

2 is a flowchart illustrating a rubbing mark width measuring method of a liquid crystal display according to the related art.

3A to 3E are cross-sectional views illustrating a rubbing mark width measuring process of a liquid crystal display according to the present invention.

4 is a flowchart showing a rubbing mark width measuring method of a liquid crystal display according to the present invention;

-Code description of main parts of drawing-

101 substrate 103 alignment film

105: steam 121: rubbing roll

123: Loving gun 141: Camera

M: rubbing mark width

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a method of measuring a rubbing mark width of an alignment film surface by using a camera located above a steam tester.

In general, liquid crystal displays have low-voltage driving, full collor implementation, low power consumption, light weight and small size, and so on, such as clocks, calculators, PC monitors, notebook computers, TVs, aircraft monitors, portable phones, personal digital assistants, etc. The area is expanding, for example.

A general liquid crystal display device includes a lower substrate on which a thin film transistor array is formed, an upper substrate on which a color filter array is formed, and a liquid crystal layer formed between the lower substrate and the upper substrate.

In the lower substrate on which the thin film transistor array is formed, a plurality of gate lines are arranged in one direction at regular intervals, and a plurality of data lines are arranged in a direction perpendicular to the gate lines to form a pixel region in a matrix form. Each pixel area includes a thin film transistor configured to apply a data signal of the data line to each pixel electrode according to a signal of a pixel electrode and the gate line.

In addition, the upper substrate on which the color filter array is formed has a black matrix formed to shield light from portions other than the pixel region, and colors for implementing R (red), G (green), and B (blue) colors. A common electrode for forming an electrical phase difference between the filter layer and the pixel electrode is formed.

The upper substrate and the lower substrate are bonded to each other with a predetermined space, and a liquid crystal layer is formed therebetween.

The liquid crystal used in such a liquid crystal display device is a middle phase between a solid and a liquid, and has a solid property such as an order and a liquid property such as fluidity. The alignment of the liquid crystal is changed according to switching of a control signal by the thin film transistor. The image is realized by controlling the transmittance of light using a changing method.

In this case, the alignment of the liquid crystals is determined not only by the characteristics of the liquid crystal material itself but also by the characteristics of the alignment layers formed on the pixel electrodes and the common electrode on the two substrates facing each other.

The alignment layer is generally formed using a polyimide or the like, which is an organic polymer, by the following method.

First, in the alignment layer forming process, a thin film transistor array is formed or a polyamic acid solution or a soluble polyimide solution is coated on the substrate on which the color filter array is formed, and then a solvent is blown at about 60 ° C. to 80 ° C. And cured at 80 ° C to 200 ° C to form a polyimide film.

Then, the polyimide film formed on the substrate is mechanically rubbed using a cloth such as a cloth to give the polyimide film a liquid crystal orientation.

The liquid crystal formed between the two substrates having the alignment layer formed in this manner and bonded to face each other may have an effect of being aligned along the alignment layer.

Here, the rubbing step is to equip the polyimide film with liquid crystal orientation, and liquid crystal alignment is imparted by friction between the polyimide film and the cloth formed on the substrate.

The rubbing device performing this rubbing process rubs the upper surface of the substrate located on the table as the table moves in a straight line by a rubbing roll or shaft.

In the existing rubbing process, the distance between the substrate and the rubbing roll should always be constant and then the rubbing should be maintained to keep the rubbed mark width constant. When rubbing, the rubbing defect is not formed in the alignment layer. It happens a lot.

Therefore, in the past, efforts have been made to minimize rubbing defects by checking and compensating for rubbing defects occurring during the rubbing process.

In this regard, the rubbing width measuring method in the existing rubbing process will be described with reference to the accompanying drawings as follows.

1A to 1G are cross-sectional views illustrating a rubbing mark width measuring process of a liquid crystal display according to the related art.

2 is a flowchart illustrating a rubbing mark width measuring method of a liquid crystal display according to the related art.

Referring to FIG. 1A, a polyimide film, that is, an alignment film 13, is formed on the prepared first substrate 11 (see S10 of FIG. 2).

Next, referring to FIG. 1B, a table (not shown) that supports the first substrate 11 and is moved by a rubbing roller (not shown) and a driving shaft are formed in a parallel cylindrical shape to receive power from the driving unit. A rubbing device 20 composed of a rubbing roll 21 rotating at a high speed and a rubbing cloth 23 wound around the outer circumferential surface of the rubbing roll 21 is prepared.

At this time, the rubbing device 20 is fixed to a height corresponding to the thickness of the substrate, the rubbing roll 21 is rotated at a high speed by receiving the rotational power of the drive unit, the first substrate 11 is the table In the process of advancing in one direction by the movement of (not shown), the upper surface of the alignment layer 13 formed on the first substrate 11 is rubbed by rubbing the rubbing cloth 13 (see S20 of FIG. 2).

Subsequently, in order to measure the rubbing mark width of the rubbing process, the rubbing device 20 rotating at the high speed while the first substrate 11 is fixed moves vertically downward.

Next, referring to FIG. 1C, rubbing is performed by rubbing the upper surface of the alignment layer 13 by the rubbing cloth 23 wound around the outer circumferential surface of the rubbing roll 21 of the rubbing device 20 moved vertically. .

At this time, the rubbing roll 21 on which the rubbing cloth 23 having a predetermined thickness is wound is rolled in contact with the surface of the alignment layer 13, thereby being formed by the weft of the rubbing cloth 23 and the warp yarns alternately. By the surface shape, the surface of the alignment layer 13 is formed to be bent to have a fine groove.

The fine shape of the surface of the alignment film is deformed by the contact width of the alignment film and the rubbing cloth 23, and the contact width is generally referred to as mark width (M).

At this time, when the radius of the rubbing roll 21 is referred to as "r" and the thickness of the rubbing cloth 23 wound around the rubbing roll is referred to as "d", the mark width is M = 2 (d + r) It can be found by the formula of sinθ.

Here, the value of θ is the oblique line drawn in the middle of the portion (a) (b) where the rubbing cloth 23 and the alignment layer 13 abuts at the center point of the rubbing roll and the rubbing at the center point of the rubbing roll 21. It is an angle formed by the diagonal lines drawn to the left side (a) or the right side (b) where the fabric 23 and the alignment layer 13 abut.

In this case, in the case of a ferroelectric liquid crystal generally used in a liquid crystal display device, the mark width is affected, and the alignment layer 13 affects the initial alignment state of the liquid crystal molecules.

Subsequently, referring to FIG. 1D, the first substrate 11 subjected to the rubbing process by the rubbing device 20 is conveyed to a cutting table (not shown), and then the first substrate 11 is cut to an appropriate size. (See S30 of FIG. 2).

Next, although not shown in the figure, the worker moves the first substrate 11a cut to a suitable size to a projector (not shown).

Subsequently, referring to FIG. 1E, the liquid crystal 31 is evenly applied to the surface of the first substrate 11a in the projector (not shown) (see S40 of FIG. 2).

Next, referring to FIG. 1F, another second substrate 41 is placed on the first substrate 11a on which the liquid crystal 31 is coated (see S50 of FIG. 2).

Subsequently, referring to FIG. 1G, the mark width M formed on the first substrate 11a is measured using a vision camera 51 (see S60 of FIG. 2).

Next, although not shown in the figure, the first substrate 11a on which the mark width measurement is thus completed is discarded.

As described above, the rubbing mark width measuring method of the liquid crystal display according to the related art has the following problems.

The rubbing mark width measuring method of the liquid crystal display according to the related art cuts the ledger substrate on which the rubbing process is performed, at the cutting table.

In particular, since the mother substrate is moved to the cutting table and cut to fit the size of the projector, debris of the substrate may occur during cutting, which may cause foreign substances.

In addition, work loss occurs during conveyance to the cutting table for cutting the mother substrate.

In order to measure the rubbing mark width formed on the alignment film, a worker takes a lot of time such as a substrate cutting step, a liquid crystal coating step, and a rubbing mark width measurement step.

In addition, the rubbing mark width measuring method of the liquid crystal display according to the related art requires that the substrate used to measure the rubbing mark width must be discarded after one use, thus unnecessary waste of measurement costs.

Accordingly, the present invention has been made to solve the above problems of the prior art, the object of the present invention is to measure the rubbing mark width (rubbing mark width) in the steam (steam) tester to reduce the time loss of the operator liquid crystal display The present invention provides a method for measuring rubbing mark width of an apparatus.

In addition, another object of the present invention is to measure the rubbing mark width of the liquid crystal display device that can reduce the time required for measuring the rubbing width can be omitted, such as the substrate transfer process, the substrate cutting process, etc. In providing a method.

In addition, another object of the present invention is to provide a method for measuring a rubbing mark width of a liquid crystal display device which can recycle a substrate required for measuring a rubbing width, thereby reducing the cost of the measurement.

A method for measuring rubbing mark width of a liquid crystal display according to the present invention for achieving the above object comprises forming an alignment film on a substrate; Performing a rubbing process on the alignment layer to form a rubbing mark on the alignment layer; Moving the substrate on which the rubbing process is performed to a steam tester; Spraying steam on an alignment film surface of the substrate; And measuring a rubbing mark width formed on an alignment layer of the substrate on which the steam is sprayed.

It is characterized by being configured.

Hereinafter, a rubbing mark width measuring method of a liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.

3A to 3E are cross-sectional views illustrating a rubbing mark width measuring process of a liquid crystal display according to the present invention.

4 is a flowchart illustrating a rubbing mark width measuring method of a liquid crystal display according to the present invention.

Referring to FIG. 3A, a polyamic acid solution or a soluble polyimide solution is applied onto the prepared mother substrate 101, the solvent is blown at about 60 ° C. to 80 ° C., and then cured at 80 ° C. to 200 ° C. A polyimide film, that is, an alignment film 103, is formed (see S110 in FIG. 4).

In this case, the alignment layer 103 is a portion in direct contact with the upper substrate and the lower substrate in the liquid crystal display device. The reason for forming the alignment layer is that the liquid crystal material is simply sandwiched between the substrates to obtain a uniform molecular arrangement state. Because it is difficult.

In addition, the material of the alignment layer 103 may be classified into an inorganic alignment layer, an organic alignment layer, and the like.

For example, the inorganic alignment layer is formed by SiO evaporation. SiO deposition is a method of depositing an inorganic material such as a metal, an oxide, and a fluoride with respect to a substrate, and SiO is generally used as a deposition material.

When the deposition conditions such as deposition angle, deposition rate, vacuum degree, substrate temperature, film thickness, and the deposition material and the liquid crystal material are different, the liquid crystal molecules are changed in the alignment form.

In order to achieve an equilibrium orientation, the surface of the substrate may be mechanically rubbed by using a diamond paste or the like. The orientation mechanism of this film is considered to be due to a fine groove formed in the rubbing direction, and the pretilt angle becomes almost 0 degrees.

Next, referring to FIG. 3B, a table (not shown) supported by the substrate 101 and moved by a rubbing roller (not shown) and a drive shaft are formed in a cylindrical shape parallel to each other to receive power from the driving unit at high speed. A rubbing device 120 including a rotating rubbing roll 121 and a rubbing cloth 123 wound around the outer circumferential surface of the rubbing roll 121 is prepared.

At this time, the rubbing device 120 is fixed to a height corresponding to the thickness of the substrate, the rubbing roll 121 is rotated at high speed by receiving the rotational power of the drive unit.

In addition, the upper surface of the alignment layer 103 formed on the first substrate 101 is formed on the rubbing cloth 123 while the first substrate 101 moves forward in one direction by the movement of the table (not shown). Rubbing by rubbing (see S120 in Fig. 4).

Subsequently, in order to measure the rubbing mark width during the rubbing process, the rubbing device 120 rotating at the high speed while the substrate 101 is fixed moves vertically downward.

Next, referring to FIG. 3C, rubbing is performed by rubbing the upper surface of the alignment layer 103 by the rubbing cloth 123 wound around the outer circumferential surface of the rubbing roll 121 of the rubbing device 120 moved vertically. .

At this time, the rubbing roll 121 wound around the rubbing cloth 123 having a predetermined thickness is brought into contact with the surface of the alignment layer 103 to be formed by alternating weft and warp yarns of the rubbing cloth 123. By the surface shape, the surface of the alignment layer 103 is formed to be bent to have a fine groove.

The fine shape of the surface of the alignment layer 103 is deformed by the contact width of the alignment layer 103 and the rubbing cloth 123, and the contact width is generally referred to as a mark width (M).

In this case, in general, the ferroelectric liquid crystal used in the liquid crystal display device is affected by the mark width, and the alignment layer 103 affects the initial alignment state of the liquid crystal molecules.

In addition, when the radius of the rubbing roll 121 is referred to as "r", and the thickness of the rubbing cloth 123 wound around the rubbing roll 121 is "d", the mark width is M = 2 (d It can be obtained by the formula of + r) sinθ.

Here, the θ value is an oblique line drawn in the middle of a portion (a) (b) where the rubbing cloth 123 and the alignment layer 103 abut at the center point of the rubbing roll 121 and the center point of the rubbing roll 121. The angle formed by the diagonal lines drawn from the rubbing cloth 123 to the left side (a) or the right side (b) where the alignment layer 103 is in contact with each other.

Next, although not shown in the figure, the mother substrate 101 subjected to the rubbing process by the rubbing device 120 is conveyed to a steam tester (see S130 of FIG. 4).

Next, referring to FIG. 3D, after the substrate 101 is returned to the steam tester, steam 105 is applied onto the surface of the substrate 101 (see S140 of FIG. 4).

Next, referring to FIG. 3E, after applying steam 105 to the surface of the substrate 101, the rubbing mark width M formed on the surface of the substrate 101 by using a vision camera 141 is determined. Measure

Next, although not shown in the figure, the substrate 101 on which the rubbing mark width M measurement is completed is conveyed to a glass dummy port (S150 of FIG. 4).

In this case, the substrate 101 on which the rubbing mark width M measurement is completed may be reused later.

On the other hand, while described above with reference to a preferred embodiment of the present invention, those skilled in the art various modifications of the present invention without departing from the spirit and scope of the invention described in the claims below And can be changed.

As described above, the rubbing mark width measuring method of the liquid crystal display according to the present invention has the following effects.

In the rubbing mark width measuring method of the liquid crystal display according to the present invention, since the process of cutting the mother substrate on which the rubbing process is performed on the cutting table is omitted, there is no shaving or the like generated during the cutting process.

In addition, the rubbing mark width measuring method of the liquid crystal display according to the present invention can reduce the cost of rubbing mark width measurement because the substrate used to measure the rubbing mark width can be recycled.

In addition, the rubbing mark width measuring method of the liquid crystal display device according to the present invention is omitted because the substrate cutting process, the liquid crystal coating process, the substrate discarding process after measuring the rubbing mark width to measure the rubbing mark width formed on the alignment film as before. The time taken to measure the width can be reduced.

Claims (5)

Forming an alignment layer on the substrate; Performing a rubbing process on the alignment layer to form a rubbing mark on the alignment layer; Moving the substrate on which the rubbing process is performed to a steam tester; Spraying steam on an alignment film surface of the substrate; And And measuring a rubbing mark width formed on the alignment layer of the substrate on which the steam is jetted. The method of claim 1, wherein the alignment layer is formed by applying a polyamic acid solution or a soluble polyimide solution, blowing off the solvent at about 60 ° C to 80 ° C, and curing the resultant at 80 ° C to 200 ° C. A rubbing mark width measuring method of a liquid crystal display device. The rubbing mark width measuring method of claim 1, wherein the rubbing mark width is measured using a camera. The method according to claim 1, wherein the rubbing process is performed by a rubbing device comprising a rubbing roll and a rubbing cloth wound around the rubbing roll. The method according to claim 4, wherein the rubbing mark width is a contact width between the alignment layer and the rubbing cloth.
KR1020060139107A 2006-12-29 2006-12-29 Method for measuring rubbing mark width of liquid crystal display device KR20080062919A (en)

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