KR19990072925A - 착색된광경화성조성물 - Google Patents

착색된광경화성조성물 Download PDF

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Publication number
KR19990072925A
KR19990072925A KR1019990006255A KR19990006255A KR19990072925A KR 19990072925 A KR19990072925 A KR 19990072925A KR 1019990006255 A KR1019990006255 A KR 1019990006255A KR 19990006255 A KR19990006255 A KR 19990006255A KR 19990072925 A KR19990072925 A KR 19990072925A
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KR
South Korea
Prior art keywords
alkyl
compound
phenyl
formula
alkoxy
Prior art date
Application number
KR1019990006255A
Other languages
English (en)
Korean (ko)
Inventor
쾰러만프레드
콘티히파트릭
레파르트다비드게오르게
Original Assignee
에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러, 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
Publication of KR19990072925A publication Critical patent/KR19990072925A/ko

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Medicinal Preparation (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1019990006255A 1998-02-27 1999-02-25 착색된광경화성조성물 KR19990072925A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19980483/98 1998-02-27
CH48398 1998-02-27

Publications (1)

Publication Number Publication Date
KR19990072925A true KR19990072925A (ko) 1999-09-27

Family

ID=4188042

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990006255A KR19990072925A (ko) 1998-02-27 1999-02-25 착색된광경화성조성물

Country Status (5)

Country Link
JP (1) JPH11292910A (it)
KR (1) KR19990072925A (it)
DE (1) DE19907957A1 (it)
ES (1) ES2153315B1 (it)
IT (1) IT1309578B1 (it)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778199B1 (ko) * 2000-07-07 2007-11-27 린텍 가부시키가이샤 자외선-경화형 점착제 조성물 및 자외선-경화성 점착시트

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WO2001018130A1 (en) * 1999-09-02 2001-03-15 Gmbh Clariant Method for brightening workpieces by powder coating
ATE253082T1 (de) 1999-12-08 2003-11-15 Ciba Sc Holding Ag Neues photoinitiatorsystem aus phosphinoxidverbindungen und wenig gefärbte härtbare zusammensetzungen
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
JP4993053B2 (ja) * 2001-02-27 2012-08-08 株式会社トクヤマ 歯科用硬化性組成物
ATE409708T1 (de) 2000-12-13 2008-10-15 Ciba Holding Inc Oberflächenaktive photoinitiatoren
JP4812963B2 (ja) * 2001-05-18 2011-11-09 リンテック株式会社 半導体ウエハ加工用粘着シートおよび半導体ウエハの加工方法
DE10154420A1 (de) * 2001-11-06 2003-05-28 Carl V Ossietzky Uni Oldenburg Lichthärtendes Kunststoffmaterial mit Indikator zur Anzeige des Aushärtungsgrades
CN1310707C (zh) 2002-01-29 2007-04-18 西巴特殊化学品控股有限公司 制备强附着涂层的方法
EP1349006B1 (en) * 2002-03-28 2013-09-25 Agfa Graphics N.V. Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm.
JP2003313208A (ja) * 2002-04-19 2003-11-06 Meiko:Kk 光硬化性樹脂組成物
DE10307451A1 (de) * 2003-02-21 2004-09-16 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US7527916B2 (en) * 2003-09-22 2009-05-05 Agfa Graphics, N.V. Photopolymerizable composition
JP4813900B2 (ja) * 2005-03-31 2011-11-09 株式会社イーテック 紫外線硬化型の紫外線遮蔽性を有する粘着剤・接着剤組成物
JP5255369B2 (ja) * 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
RU2528264C2 (ru) * 2009-02-09 2014-09-10 Хантсман Эдванст Матириалз (Свитзеленд) Гмбх Порошковая покрывающая композиция
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
WO2015104972A1 (ja) * 2014-01-08 2015-07-16 Dic株式会社 床材用活性エネルギー線硬化性組成物
CN107709371A (zh) * 2015-12-28 2018-02-16 积水化学工业株式会社 光固化性组合物以及电子部件的制造方法
JP6950257B2 (ja) * 2017-04-18 2021-10-13 コニカミノルタ株式会社 活性光線硬化型インクジェットインク
EP3681434A4 (en) * 2017-09-11 2021-04-07 3M Innovative Properties Company RADIATION CURABLE COMPOSITIONS AND COMPOSITE ARTICLES MADE BY AN ADDITIVE MANUFACTURING PROCESS
CN107987209B (zh) * 2018-01-08 2023-05-02 无锡佶达德光电子技术有限公司 一种香豆素类聚合物半导体激光材料及其应用
ES2913237T3 (es) * 2018-12-21 2022-06-01 Ivoclar Vivadent Ag Composiciones para la fabricación de piezas de trabajo dentales resistentes a la fractura mediante estereolitografía
EP3669856A1 (de) 2018-12-21 2020-06-24 Ivoclar Vivadent AG Zusammensetzungen für die herstellung von transparenten dentalwerkstücken mittels stereolithographie
CN110105166A (zh) * 2019-04-30 2019-08-09 同济大学 含有二苯乙烯的α-羟基酮类化合物及其制备方法和应用
EP4085893A1 (de) * 2021-05-07 2022-11-09 Ivoclar Vivadent AG Transparente, bruchzähe polymerisationsharze zur herstellung dentaler formkörper

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
US5660968A (en) * 1995-05-05 1997-08-26 Bayer Corporation Negative working, peel developeable, single sheet color proofing system with improved background color
US5707781A (en) * 1995-05-05 1998-01-13 Bayer Corporation Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner
GB9605712D0 (en) * 1996-03-19 1996-05-22 Minnesota Mining & Mfg Novel uv-curable compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778199B1 (ko) * 2000-07-07 2007-11-27 린텍 가부시키가이샤 자외선-경화형 점착제 조성물 및 자외선-경화성 점착시트

Also Published As

Publication number Publication date
ES2153315B1 (es) 2001-09-01
ITMI990376A1 (it) 2000-08-24
IT1309578B1 (it) 2002-01-24
JPH11292910A (ja) 1999-10-26
ES2153315A1 (es) 2001-02-16
DE19907957A1 (de) 1999-09-02

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