KR102180168B9 - 반도체 웨이퍼 표면 보호용 점착 테이프 및 반도체 웨이퍼의 가공 방법 - Google Patents

반도체 웨이퍼 표면 보호용 점착 테이프 및 반도체 웨이퍼의 가공 방법

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Publication number
KR102180168B9
KR102180168B9 KR1020187031997A KR20187031997A KR102180168B9 KR 102180168 B9 KR102180168 B9 KR 102180168B9 KR 1020187031997 A KR1020187031997 A KR 1020187031997A KR 20187031997 A KR20187031997 A KR 20187031997A KR 102180168 B9 KR102180168 B9 KR 102180168B9
Authority
KR
South Korea
Prior art keywords
semiconductor wafer
processing method
adhesive tape
surface protection
wafer surface
Prior art date
Application number
KR1020187031997A
Other languages
English (en)
Other versions
KR20180132813A (ko
KR102180168B1 (ko
Inventor
유스케 고토
Original Assignee
후루카와 덴키 고교 가부시키가이샤
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Application filed by 후루카와 덴키 고교 가부시키가이샤 filed Critical 후루카와 덴키 고교 가부시키가이샤
Publication of KR20180132813A publication Critical patent/KR20180132813A/ko
Application granted granted Critical
Publication of KR102180168B1 publication Critical patent/KR102180168B1/ko
Publication of KR102180168B9 publication Critical patent/KR102180168B9/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22—Plastics; Metallised plastics
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35—Heat-activated
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
KR1020187031997A 2017-03-31 2018-03-27 반도체 웨이퍼 표면 보호용 점착 테이프 및 반도체 웨이퍼의 가공 방법 KR102180168B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017071346 2017-03-31
JPJP-P-2017-071346 2017-03-31
PCT/JP2018/012284 WO2018181240A1 (ja) 2017-03-31 2018-03-27 半導体ウェハ表面保護用粘着テープ及び半導体ウェハの加工方法

Publications (3)

Publication Number Publication Date
KR20180132813A KR20180132813A (ko) 2018-12-12
KR102180168B1 KR102180168B1 (ko) 2020-11-18
KR102180168B9 true KR102180168B9 (ko) 2023-03-14

Family

ID=63677267

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187031997A KR102180168B1 (ko) 2017-03-31 2018-03-27 반도체 웨이퍼 표면 보호용 점착 테이프 및 반도체 웨이퍼의 가공 방법

Country Status (5)

Country Link
JP (1) JP7079200B2 (ko)
KR (1) KR102180168B1 (ko)
CN (1) CN109075055B (ko)
TW (1) TWI690018B (ko)
WO (1) WO2018181240A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020175363A1 (ja) * 2019-02-26 2020-09-03 株式会社ディスコ 裏面研削用粘着シート及び半導体ウエハの製造方法
KR20210128382A (ko) * 2019-02-26 2021-10-26 가부시기가이샤 디스코 이면 연삭용 점착 시트 및 반도체 웨이퍼의 제조 방법
JP7289688B2 (ja) * 2019-03-26 2023-06-12 日東電工株式会社 接着フィルム付きダイシングテープ
JP6678796B1 (ja) * 2019-04-08 2020-04-08 古河電気工業株式会社 電子部品用テープおよび電子部品の加工方法
JP6678795B1 (ja) * 2019-04-08 2020-04-08 古河電気工業株式会社 電子部品用テープおよび電子部品の加工方法
KR102411362B1 (ko) * 2021-07-09 2022-06-22 구동필 웨이퍼 배면 연마용 점착 필름 및 그 제조 방법
CN118077037A (zh) * 2021-10-20 2024-05-24 电化株式会社 用于具有凸部的半导体晶圆的加工用粘合片的基材
WO2023083248A1 (en) * 2021-11-11 2023-05-19 Ddp Specialty Electronic Materials Us, Llc Adhesive system
JP7173392B1 (ja) 2022-05-12 2022-11-16 大日本印刷株式会社 半導体加工用粘着テープ

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR94276E (fr) 1967-05-11 1969-07-25 Saint Gobain Plaques ou pieces de forme a base de fibres minérales, telles que notamment fibres de verre, et procédé pour leur obtention.
JPS5117630B1 (ko) 1971-06-22 1976-06-03
JP4369584B2 (ja) 2000-01-21 2009-11-25 日東電工株式会社 半導体ウエハ保持保護用粘着シート
JP4413551B2 (ja) * 2003-07-28 2010-02-10 古河電気工業株式会社 半導体ウエハ面保護用粘着テープ
JP2008060151A (ja) * 2006-08-29 2008-03-13 Nitto Denko Corp 半導体ウエハ裏面加工方法、基板裏面加工方法、及び放射線硬化型粘着シート
JP2010100686A (ja) 2008-10-21 2010-05-06 Nitto Denko Corp 自発巻回性粘着シート
JP5501060B2 (ja) * 2009-04-02 2014-05-21 日東電工株式会社 半導体ウエハ保護用粘着シートの貼り合わせ方法、及びこの貼り合わせ方法に用いる半導体ウエハ保護用粘着シート
WO2012042869A1 (ja) 2010-09-30 2012-04-05 三井化学株式会社 拡張性フィルム、ダイシングフィルム、および半導体装置の製造方法
JP5951216B2 (ja) 2011-10-13 2016-07-13 リンテック株式会社 粘着シートおよびその使用方法
KR101985049B1 (ko) * 2012-02-17 2019-05-31 후루카와 덴키 고교 가부시키가이샤 반도체 웨이퍼 표면 보호용 점착 테이프
JP5117630B1 (ja) * 2012-07-06 2013-01-16 古河電気工業株式会社 半導体ウェハ表面保護用粘着テープおよびそれを用いた半導体ウェハの製造方法
JP6159163B2 (ja) * 2013-06-21 2017-07-05 日東電工株式会社 粘着シート
JP6109220B2 (ja) * 2015-03-06 2017-04-05 古河電気工業株式会社 半導体ウエハ表面保護用粘着テープ
JP6053909B2 (ja) * 2015-12-28 2016-12-27 古河電気工業株式会社 半導体ウエハ表面保護用粘着テープおよびその製造方法
JP6034522B1 (ja) * 2016-03-17 2016-11-30 古河電気工業株式会社 半導体ウェハ加工用粘着テープおよび半導体ウェハの加工方法

Also Published As

Publication number Publication date
JPWO2018181240A1 (ja) 2020-02-06
KR20180132813A (ko) 2018-12-12
CN109075055A (zh) 2018-12-21
KR102180168B1 (ko) 2020-11-18
JP7079200B2 (ja) 2022-06-01
TW201838082A (zh) 2018-10-16
WO2018181240A1 (ja) 2018-10-04
TWI690018B (zh) 2020-04-01
CN109075055B (zh) 2023-08-15

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