KR101768981B1 - 착색 조성물, 착색 경화성 조성물, 컬러필터, 컬러필터의 제조 방법, 고체 촬상 소자, 및 액정 표시 장치 - Google Patents

착색 조성물, 착색 경화성 조성물, 컬러필터, 컬러필터의 제조 방법, 고체 촬상 소자, 및 액정 표시 장치 Download PDF

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KR101768981B1
KR101768981B1 KR1020110086884A KR20110086884A KR101768981B1 KR 101768981 B1 KR101768981 B1 KR 101768981B1 KR 1020110086884 A KR1020110086884 A KR 1020110086884A KR 20110086884 A KR20110086884 A KR 20110086884A KR 101768981 B1 KR101768981 B1 KR 101768981B1
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South Korea
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group
carbon atoms
substituted
unsubstituted
color filter
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KR1020110086884A
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English (en)
Korean (ko)
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KR20120033970A (ko
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요시히코 후지에
다이스케 사사키
준이치 이토
카즈마사 모로즈미
소지 이시자카
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
KR1020110086884A 2010-09-30 2011-08-30 착색 조성물, 착색 경화성 조성물, 컬러필터, 컬러필터의 제조 방법, 고체 촬상 소자, 및 액정 표시 장치 KR101768981B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010221908A JP5642485B2 (ja) 2010-09-30 2010-09-30 着色組成物、着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、及び液晶表示装置
JPJP-P-2010-221908 2010-09-30

Publications (2)

Publication Number Publication Date
KR20120033970A KR20120033970A (ko) 2012-04-09
KR101768981B1 true KR101768981B1 (ko) 2017-08-17

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KR1020110086884A KR101768981B1 (ko) 2010-09-30 2011-08-30 착색 조성물, 착색 경화성 조성물, 컬러필터, 컬러필터의 제조 방법, 고체 촬상 소자, 및 액정 표시 장치

Country Status (3)

Country Link
JP (1) JP5642485B2 (zh)
KR (1) KR101768981B1 (zh)
TW (1) TWI453195B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6019597B2 (ja) * 2011-03-08 2016-11-02 住友化学株式会社 着色感光性樹脂組成物
JP5775482B2 (ja) * 2011-09-30 2015-09-09 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び表示装置
JP5710568B2 (ja) * 2012-09-27 2015-04-30 富士フイルム株式会社 着色硬化性組成物、着色硬化膜、カラーフィルタ、カラーフィルタの製造方法、表示装置、固体撮像素子、及び、化合物
JP6103880B2 (ja) * 2012-10-24 2017-03-29 富士フイルム株式会社 着色組成物、カラーフィルタ及びその製造方法、画像表示装置、固体撮像素子、並びに、新規化合物
TWI673325B (zh) * 2016-06-24 2019-10-01 南韓商三星Ｓｄｉ股份有限公司 化合物、包含其的感光性樹脂組成物以及彩色濾光片
KR101976015B1 (ko) * 2016-06-24 2019-09-10 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
JP6903988B2 (ja) * 2017-03-24 2021-07-14 富士フイルムビジネスイノベーション株式会社 水性顔料分散組成物、水性インク、インクカートリッジ、記録装置及び記録方法

Citations (4)

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JP2008083416A (ja) 2006-09-27 2008-04-10 Fujifilm Corp 感光性着色硬化性組成物、カラーフィルタ及びその製造方法
JP2008224982A (ja) * 2007-03-12 2008-09-25 Fujifilm Corp カラーフィルタ用着色硬化性組成物、カラーフィルタ及び液晶表示装置
JP2008292970A (ja) * 2006-09-27 2008-12-04 Fujifilm Corp 化合物及びその互変異性体、金属錯体化合物、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP2009031713A (ja) 2006-09-27 2009-02-12 Fujifilm Corp ジピロメテン系ホウ素錯体化合物及びその互換異性体、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法

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WO2006038823A1 (en) * 2004-10-08 2006-04-13 Massey University Beta-substituted porphyrins
JP5548394B2 (ja) * 2008-06-10 2014-07-16 富士フイルム株式会社 インクジェット用インク、カラーフィルタおよびその製造方法、ならびにそれを用いる液晶ディスプレイおよび画像表示デバイス
US8334085B2 (en) * 2008-09-02 2012-12-18 Fujifilm Corporation Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof
JP5388530B2 (ja) * 2008-09-30 2014-01-15 富士フイルム株式会社 着色硬化組成物、含フッ素ジピロメテン系化合物及びその互変異性体、含フッ素ジピロメテン系金属錯体化合物及びその互変異性体、並びにカラーフィルタ及びその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008083416A (ja) 2006-09-27 2008-04-10 Fujifilm Corp 感光性着色硬化性組成物、カラーフィルタ及びその製造方法
JP2008292970A (ja) * 2006-09-27 2008-12-04 Fujifilm Corp 化合物及びその互変異性体、金属錯体化合物、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP2009031713A (ja) 2006-09-27 2009-02-12 Fujifilm Corp ジピロメテン系ホウ素錯体化合物及びその互換異性体、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP2008224982A (ja) * 2007-03-12 2008-09-25 Fujifilm Corp カラーフィルタ用着色硬化性組成物、カラーフィルタ及び液晶表示装置

Also Published As

Publication number Publication date
TWI453195B (zh) 2014-09-21
JP5642485B2 (ja) 2014-12-17
KR20120033970A (ko) 2012-04-09
TW201219369A (en) 2012-05-16
JP2012077140A (ja) 2012-04-19

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