KR101677505B1 - 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막 - Google Patents

신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막 Download PDF

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KR101677505B1
KR101677505B1 KR1020127000819A KR20127000819A KR101677505B1 KR 101677505 B1 KR101677505 B1 KR 101677505B1 KR 1020127000819 A KR1020127000819 A KR 1020127000819A KR 20127000819 A KR20127000819 A KR 20127000819A KR 101677505 B1 KR101677505 B1 KR 101677505B1
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South Korea
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compound
radiation
formula
sensitive composition
mass
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KR1020127000819A
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English (en)
Korean (ko)
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KR20120046161A (ko
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하루오 이와사와
다이고 이치노헤
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제이에스알 가부시끼가이샤
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Publication of KR20120046161A publication Critical patent/KR20120046161A/ko
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Publication of KR101677505B1 publication Critical patent/KR101677505B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polymerisation Methods In General (AREA)
KR1020127000819A 2009-08-26 2010-07-02 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막 KR101677505B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2009-195992 2009-08-26
JP2009195992 2009-08-26
PCT/JP2010/061335 WO2011024557A1 (ja) 2009-08-26 2010-07-02 新規化合物、その製造方法、この新規化合物を含有する感放射線性組成物及び硬化膜

Publications (2)

Publication Number Publication Date
KR20120046161A KR20120046161A (ko) 2012-05-09
KR101677505B1 true KR101677505B1 (ko) 2016-11-18

Family

ID=43627668

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127000819A KR101677505B1 (ko) 2009-08-26 2010-07-02 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막

Country Status (5)

Country Link
JP (1) JP5640978B2 (ja)
KR (1) KR101677505B1 (ja)
CN (1) CN102482240B (ja)
TW (1) TWI464152B (ja)
WO (1) WO2011024557A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5423352B2 (ja) * 2009-11-26 2014-02-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示素子の層間絶縁膜、保護膜及びスペーサーならびにそれらの形成方法
JP6292388B2 (ja) * 2014-03-24 2018-03-14 Jsr株式会社 感放射線性樹脂組成物
JP6530902B2 (ja) * 2014-10-22 2019-06-12 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
JP2016079157A (ja) * 2014-10-22 2016-05-16 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
JP6431747B2 (ja) * 2014-11-06 2018-11-28 株式会社Adeka 感光性ソルダーレジスト用光重合開始剤及びこれを用いた感光性ソルダーレジスト組成物
CN108780274B (zh) * 2016-03-16 2021-07-13 东洋纺株式会社 可水显影的柔性印刷用感光性树脂组合物、及由该组合物得到的柔性印刷用感光性树脂原版
JP6630754B2 (ja) * 2017-02-16 2020-01-15 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN115448894B (zh) * 2022-09-05 2024-03-29 天津久日新材料股份有限公司 一种光引发剂及其制备方法和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002544205A (ja) 1999-05-10 2002-12-24 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規な光開始剤及びその応用
JP2007086565A (ja) 2005-09-26 2007-04-05 Jsr Corp 感光性樹脂組成物、液晶表示パネル用保護膜およびスペーサー、それらを具備してなる液晶表示パネル
JP2009122533A (ja) 2007-11-16 2009-06-04 Fujifilm Corp 感光性樹脂組成物、スペーサ及びその形成方法、並びに液晶表示素子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088050B1 (de) 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
CA2208967A1 (en) * 1994-12-30 1996-07-11 Novartis Ag Polymers based on block copolymers
NL1016815C2 (nl) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
US20030225179A1 (en) 2002-04-26 2003-12-04 Chiu Chingfan Chris Novel morpholinoketone derivatives, and preparation process and uses of the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002544205A (ja) 1999-05-10 2002-12-24 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規な光開始剤及びその応用
JP2007086565A (ja) 2005-09-26 2007-04-05 Jsr Corp 感光性樹脂組成物、液晶表示パネル用保護膜およびスペーサー、それらを具備してなる液晶表示パネル
JP2009122533A (ja) 2007-11-16 2009-06-04 Fujifilm Corp 感光性樹脂組成物、スペーサ及びその形成方法、並びに液晶表示素子

Also Published As

Publication number Publication date
TWI464152B (zh) 2014-12-11
WO2011024557A1 (ja) 2011-03-03
JPWO2011024557A1 (ja) 2013-01-24
CN102482240B (zh) 2014-07-30
KR20120046161A (ko) 2012-05-09
CN102482240A (zh) 2012-05-30
JP5640978B2 (ja) 2014-12-17
TW201109310A (en) 2011-03-16

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