KR101149089B1 - 노광 장치 - Google Patents
노광 장치 Download PDFInfo
- Publication number
- KR101149089B1 KR101149089B1 KR1020067027970A KR20067027970A KR101149089B1 KR 101149089 B1 KR101149089 B1 KR 101149089B1 KR 1020067027970 A KR1020067027970 A KR 1020067027970A KR 20067027970 A KR20067027970 A KR 20067027970A KR 101149089 B1 KR101149089 B1 KR 101149089B1
- Authority
- KR
- South Korea
- Prior art keywords
- exposure
- mask
- optical system
- image
- exposed
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Color Television Image Signal Generators (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004194023A JP2006017895A (ja) | 2004-06-30 | 2004-06-30 | 露光装置 |
JPJP-P-2004-00194023 | 2004-06-30 | ||
PCT/JP2005/011739 WO2006003863A1 (ja) | 2004-06-30 | 2005-06-27 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070024685A KR20070024685A (ko) | 2007-03-02 |
KR101149089B1 true KR101149089B1 (ko) | 2012-05-25 |
Family
ID=35782672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067027970A KR101149089B1 (ko) | 2004-06-30 | 2005-06-27 | 노광 장치 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2006017895A (ja) |
KR (1) | KR101149089B1 (ja) |
CN (1) | CN1981244B (ja) |
TW (1) | TWI397776B (ja) |
WO (1) | WO2006003863A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160108792A (ko) * | 2015-03-06 | 2016-09-20 | 아주하이텍(주) | Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3226073A3 (en) | 2003-04-09 | 2017-10-11 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device |
TW201834020A (zh) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
TWI437618B (zh) | 2004-02-06 | 2014-05-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
EP1881521B1 (en) | 2005-05-12 | 2014-07-23 | Nikon Corporation | Projection optical system, exposure apparatus and exposure method |
TW201738667A (zh) * | 2006-08-31 | 2017-11-01 | Nippon Kogaku Kk | 曝光方法及曝光裝置、以及元件製造方法 |
JP2008076709A (ja) * | 2006-09-21 | 2008-04-03 | V Technology Co Ltd | 露光装置 |
US8431328B2 (en) | 2007-02-22 | 2013-04-30 | Nikon Corporation | Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus |
JP4971835B2 (ja) * | 2007-03-02 | 2012-07-11 | 株式会社ブイ・テクノロジー | 露光方法及び露光装置 |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
JP2009251290A (ja) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | 露光装置 |
KR101325431B1 (ko) * | 2009-02-05 | 2013-11-04 | 도판 인사츠 가부시키가이샤 | 노광 방법, 컬러 필터의 제조 방법 및 노광 장치 |
JP5185158B2 (ja) * | 2009-02-26 | 2013-04-17 | Hoya株式会社 | 多階調フォトマスクの評価方法 |
KR101254442B1 (ko) | 2009-02-26 | 2013-04-12 | 도판 인사츠 가부시키가이샤 | 컬러 필터 및 컬러 필터의 제조 방법 |
JP5261847B2 (ja) * | 2009-06-16 | 2013-08-14 | 株式会社ブイ・テクノロジー | アライメント方法、アライメント装置及び露光装置 |
TWI428688B (zh) * | 2009-07-29 | 2014-03-01 | Hoya Corp | Method for manufacturing multi - modal mask and pattern transfer method |
US8988653B2 (en) | 2009-08-20 | 2015-03-24 | Asml Netherlands B.V. | Lithographic apparatus, distortion determining method, and patterning device |
WO2011058634A1 (ja) | 2009-11-12 | 2011-05-19 | 株式会社ブイ・テクノロジー | 露光装置及びそれに使用するフォトマスク |
TWI490657B (zh) * | 2009-11-26 | 2015-07-01 | V Technology Co Ltd | 曝光裝置及其所使用的光罩 |
JP5630864B2 (ja) * | 2010-12-06 | 2014-11-26 | 凸版印刷株式会社 | 露光装置 |
JP6940873B2 (ja) * | 2017-12-08 | 2021-09-29 | 株式会社ブイ・テクノロジー | 露光装置および露光方法 |
CN115278000A (zh) * | 2022-06-24 | 2022-11-01 | 维沃移动通信有限公司 | 图像传感器、图像生成方法、摄像头模组及电子设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60257521A (ja) * | 1984-06-04 | 1985-12-19 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成用露光装置 |
JPS6289328A (ja) * | 1985-10-16 | 1987-04-23 | Canon Inc | 露光装置 |
JPH09127702A (ja) * | 1995-10-30 | 1997-05-16 | Dainippon Printing Co Ltd | 大サイズ基板用露光装置および露光方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56105634A (en) * | 1980-01-25 | 1981-08-22 | Fujitsu Ltd | X rays transcription device |
US4780615A (en) * | 1985-02-01 | 1988-10-25 | Canon Kabushiki Kaisha | Alignment system for use in pattern transfer apparatus |
JPH0677112A (ja) * | 1992-08-28 | 1994-03-18 | Nec Kyushu Ltd | 露光装置における遮光領域制御機構 |
WO1999046807A1 (fr) * | 1998-03-09 | 1999-09-16 | Nikon Corporation | Procede et appareil d'exposition par balayage, procede de fabrication associe, dispositif et procede de fabrication associe |
AU1078700A (en) * | 1998-11-06 | 2000-05-29 | Nikon Corporation | Exposure method and exposure apparatus |
-
2004
- 2004-06-30 JP JP2004194023A patent/JP2006017895A/ja active Pending
-
2005
- 2005-06-27 CN CN2005800221906A patent/CN1981244B/zh active Active
- 2005-06-27 KR KR1020067027970A patent/KR101149089B1/ko active IP Right Grant
- 2005-06-27 WO PCT/JP2005/011739 patent/WO2006003863A1/ja active Application Filing
- 2005-06-29 TW TW094121819A patent/TWI397776B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60257521A (ja) * | 1984-06-04 | 1985-12-19 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成用露光装置 |
JPS6289328A (ja) * | 1985-10-16 | 1987-04-23 | Canon Inc | 露光装置 |
JPH09127702A (ja) * | 1995-10-30 | 1997-05-16 | Dainippon Printing Co Ltd | 大サイズ基板用露光装置および露光方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160108792A (ko) * | 2015-03-06 | 2016-09-20 | 아주하이텍(주) | Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법 |
KR101711726B1 (ko) | 2015-03-06 | 2017-03-03 | 아주하이텍(주) | Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법 |
Also Published As
Publication number | Publication date |
---|---|
TW200600981A (en) | 2006-01-01 |
WO2006003863A1 (ja) | 2006-01-12 |
JP2006017895A (ja) | 2006-01-19 |
CN1981244A (zh) | 2007-06-13 |
TWI397776B (zh) | 2013-06-01 |
KR20070024685A (ko) | 2007-03-02 |
CN1981244B (zh) | 2010-11-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101149089B1 (ko) | 노광 장치 | |
KR101143058B1 (ko) | 액정 표시 장치용 기판의 제조 방법 | |
KR101674131B1 (ko) | 얼라인먼트 방법, 얼라인먼트 장치 및 노광 장치 | |
TWI394007B (zh) | 曝光裝置 | |
TWI391796B (zh) | 曝光裝置及被曝光體 | |
JP2008076709A (ja) | 露光装置 | |
US9030646B2 (en) | Exposure apparatus and photomask used therein | |
JP4871145B2 (ja) | 露光方法及び露光装置 | |
JP5098041B2 (ja) | 露光方法 | |
JP4971835B2 (ja) | 露光方法及び露光装置 | |
TWI472885B (zh) | 校準方法、校準裝置及曝光裝置 | |
JP2006337873A (ja) | 露光装置及び露光方法 | |
KR20180037590A (ko) | 보조 노광 장치 및 노광량 분포 취득 방법 | |
JP4951036B2 (ja) | 露光装置 | |
WO2005106591A1 (ja) | 露光パターン形成方法 | |
JP2013108779A (ja) | 表面検査装置、表面検査方法、および露光システム | |
KR101103155B1 (ko) | 노광 장치 | |
JP4613098B2 (ja) | 露光装置 | |
JP4338628B2 (ja) | 露光装置 | |
JP6879484B2 (ja) | 画像取得装置、露光装置、及び画像取得方法 | |
JP2008083227A (ja) | アライメントマーク位置測定装置及び方法、及び描画装置 | |
JP7489913B2 (ja) | 描画装置および描画方法 | |
JP4773158B2 (ja) | 露光装置 | |
KR101242185B1 (ko) | 노광 장치 | |
JP4235584B2 (ja) | 露光装置及びパターン形成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
AMND | Amendment | ||
B701 | Decision to grant | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20150428 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20160427 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20170419 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20180426 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20190423 Year of fee payment: 8 |