TW200600981A - Exposing apparatus - Google Patents
Exposing apparatusInfo
- Publication number
- TW200600981A TW200600981A TW094121819A TW94121819A TW200600981A TW 200600981 A TW200600981 A TW 200600981A TW 094121819 A TW094121819 A TW 094121819A TW 94121819 A TW94121819 A TW 94121819A TW 200600981 A TW200600981 A TW 200600981A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- optical system
- image
- equipment
- color filter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Color Television Image Signal Generators (AREA)
Abstract
Exposure equipment (1) is provided with an exposure optical system for irradiating a color filter board with exposure light from a light source, and a transfer means, on which the color filter board arranged to face the exposure optical system is placed to be transferred at a fixed speed. The exposure equipment exposes an image on an opening part of a mask arranged on an optical path of the exposure optical system. The exposure equipment is provided with an image pickup means, which performs image pickup of a black matrix previously formed on the color filter board, having the front side of an exposure position of the exposure optical system in a shifting direction of the transfer means as an image pickup apposition. The equipment is also provided with a control means, which detects a previously set reference position in the black matrix of which image has been picked up by the image picked up means, controls irradiation timing of the exposure light of the exposure optical system with the reference position as the standard, and exposes the image of the opening part of the mask at a prescribed position on the color filter board. Thus, the exposure equipment which performs efficient exposure to a large exposure area by using the small mask is provided.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004194023A JP2006017895A (en) | 2004-06-30 | 2004-06-30 | Aligner |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200600981A true TW200600981A (en) | 2006-01-01 |
TWI397776B TWI397776B (en) | 2013-06-01 |
Family
ID=35782672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094121819A TWI397776B (en) | 2004-06-30 | 2005-06-29 | Exposing apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2006017895A (en) |
KR (1) | KR101149089B1 (en) |
CN (1) | CN1981244B (en) |
TW (1) | TWI397776B (en) |
WO (1) | WO2006003863A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI422981B (en) * | 2006-08-31 | 2014-01-11 | 尼康股份有限公司 | Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method |
TWI470379B (en) * | 2009-02-05 | 2015-01-21 | Toppan Printing Co Ltd | Exposure method, method for manufacturing color filter, and exposure device |
US9030646B2 (en) | 2009-11-12 | 2015-05-12 | V Technology Co., Ltd. | Exposure apparatus and photomask used therein |
TWI490657B (en) * | 2009-11-26 | 2015-07-01 | V Technology Co Ltd | Exposure apparatus and photomask to be used for same |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3226073A3 (en) | 2003-04-09 | 2017-10-11 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device |
TW201834020A (en) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | Optical illumination device, exposure device, exposure method and device manufacturing method |
TW201809801A (en) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method |
TWI437618B (en) | 2004-02-06 | 2014-05-11 | 尼康股份有限公司 | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
EP1881521B1 (en) | 2005-05-12 | 2014-07-23 | Nikon Corporation | Projection optical system, exposure apparatus and exposure method |
JP2008076709A (en) * | 2006-09-21 | 2008-04-03 | V Technology Co Ltd | Exposure device |
US8431328B2 (en) | 2007-02-22 | 2013-04-30 | Nikon Corporation | Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus |
JP4971835B2 (en) * | 2007-03-02 | 2012-07-11 | 株式会社ブイ・テクノロジー | Exposure method and exposure apparatus |
JP5267029B2 (en) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
JP2009251290A (en) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | Exposure apparatus |
JP5185158B2 (en) * | 2009-02-26 | 2013-04-17 | Hoya株式会社 | Multi-tone photomask evaluation method |
KR101254442B1 (en) | 2009-02-26 | 2013-04-12 | 도판 인사츠 가부시키가이샤 | Color filter and manufacturing method for a color filter |
JP5261847B2 (en) * | 2009-06-16 | 2013-08-14 | 株式会社ブイ・テクノロジー | Alignment method, alignment apparatus, and exposure apparatus |
TWI428688B (en) * | 2009-07-29 | 2014-03-01 | Hoya Corp | Method for manufacturing multi - modal mask and pattern transfer method |
US8988653B2 (en) | 2009-08-20 | 2015-03-24 | Asml Netherlands B.V. | Lithographic apparatus, distortion determining method, and patterning device |
JP5630864B2 (en) * | 2010-12-06 | 2014-11-26 | 凸版印刷株式会社 | Exposure equipment |
KR101711726B1 (en) * | 2015-03-06 | 2017-03-03 | 아주하이텍(주) | Exposure apparatus and exposure method using the same |
JP6940873B2 (en) * | 2017-12-08 | 2021-09-29 | 株式会社ブイ・テクノロジー | Exposure equipment and exposure method |
CN115278000A (en) * | 2022-06-24 | 2022-11-01 | 维沃移动通信有限公司 | Image sensor, image generation method, camera module and electronic equipment |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56105634A (en) * | 1980-01-25 | 1981-08-22 | Fujitsu Ltd | X rays transcription device |
JPS60257521A (en) * | 1984-06-04 | 1985-12-19 | Nippon Telegr & Teleph Corp <Ntt> | Exposure apparatus for forming pattern |
JPS6289328A (en) * | 1985-10-16 | 1987-04-23 | Canon Inc | Exposure device |
US4780615A (en) * | 1985-02-01 | 1988-10-25 | Canon Kabushiki Kaisha | Alignment system for use in pattern transfer apparatus |
JPH0677112A (en) * | 1992-08-28 | 1994-03-18 | Nec Kyushu Ltd | Glare protection region control mechanism in aligner |
JPH09127702A (en) * | 1995-10-30 | 1997-05-16 | Dainippon Printing Co Ltd | Exposing and exposing method device for large-size substrate |
WO1999046807A1 (en) * | 1998-03-09 | 1999-09-16 | Nikon Corporation | Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method |
AU1078700A (en) * | 1998-11-06 | 2000-05-29 | Nikon Corporation | Exposure method and exposure apparatus |
-
2004
- 2004-06-30 JP JP2004194023A patent/JP2006017895A/en active Pending
-
2005
- 2005-06-27 CN CN2005800221906A patent/CN1981244B/en active Active
- 2005-06-27 KR KR1020067027970A patent/KR101149089B1/en active IP Right Grant
- 2005-06-27 WO PCT/JP2005/011739 patent/WO2006003863A1/en active Application Filing
- 2005-06-29 TW TW094121819A patent/TWI397776B/en active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI422981B (en) * | 2006-08-31 | 2014-01-11 | 尼康股份有限公司 | Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method |
TWI470379B (en) * | 2009-02-05 | 2015-01-21 | Toppan Printing Co Ltd | Exposure method, method for manufacturing color filter, and exposure device |
US9030646B2 (en) | 2009-11-12 | 2015-05-12 | V Technology Co., Ltd. | Exposure apparatus and photomask used therein |
TWI490657B (en) * | 2009-11-26 | 2015-07-01 | V Technology Co Ltd | Exposure apparatus and photomask to be used for same |
Also Published As
Publication number | Publication date |
---|---|
WO2006003863A1 (en) | 2006-01-12 |
KR101149089B1 (en) | 2012-05-25 |
JP2006017895A (en) | 2006-01-19 |
CN1981244A (en) | 2007-06-13 |
TWI397776B (en) | 2013-06-01 |
KR20070024685A (en) | 2007-03-02 |
CN1981244B (en) | 2010-11-10 |
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