KR100854642B1 - 배향막을 제조하는 제조 장치 - Google Patents
배향막을 제조하는 제조 장치 Download PDFInfo
- Publication number
- KR100854642B1 KR100854642B1 KR1020060064240A KR20060064240A KR100854642B1 KR 100854642 B1 KR100854642 B1 KR 100854642B1 KR 1020060064240 A KR1020060064240 A KR 1020060064240A KR 20060064240 A KR20060064240 A KR 20060064240A KR 100854642 B1 KR100854642 B1 KR 100854642B1
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- Prior art keywords
- chamber
- shielding plate
- film
- liquid crystal
- alignment film
- Prior art date
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133734—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by obliquely evaporated films, e.g. Si or SiO2 films
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Liquid Crystal (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- 대향하는 한 쌍의 기판 사이에 액정을 삽입하여 이루어지는 액정 장치의 배향막을 제조하는 제조 장치로서,진공 챔버로 이루어지는 성막실(成膜室)과,증착원(蒸着源)을 갖고, 상기 성막실 내에서 상기 기판에 배향막 재료를 물리적 증착법에 의해 증착시켜 배향막을 형성하는 증착부와,상기 증착부와 상기 기판 사이에 형성되고, 배향막 재료를 선택적으로 증착시키기 위한 슬릿 형상의 개구부를 가지며, 상기 기판에서의 배향막이 형성되지 않는 영역을 덮는 차폐판(遮蔽板)과,상기 성막실에 게이트 밸브를 통하여 연통(連通)하는 진공 챔버로 이루어지는 급제재실(給除材室)과,상기 급제재실에 연통하고, 상기 차폐판의 예비(豫備) 차폐판을 수용하는 차폐판 수용실과,상기 급제재실에 설치되어, 상기 성막실 내에 배치된 차폐판과 상기 차폐판 수용실 내에 배치된 예비 차폐판을 교환하는 교환 장치를 구비하는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 차폐판 수용실은 상기 급제재실에 게이트 밸브를 통하여 연통하고 있는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 교환 장치는 상기 성막실 내의 차폐판을 상기 차폐판 수용실 내로 배출하는 배출 암(arm) 기구와, 상기 차폐판 수용실 내의 예비 차폐판을 상기 성막실 내로 공급하는 공급 암 기구를 구비하는 배향막의 제조 장치.
- 제 1 항에 있어서,복수의 상기 급제재실과 복수의 상기 차폐판 수용실을 구비하는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 급제재실에 적어도 1개의 상기 교환 장치가 설치되어 있는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 성막실에 상기 차폐판이 복수 설치되어 있는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 성막실에는 상기 차폐판을 유지하는 유지부와,상기 유지부와 상기 차폐판 사이에 설치되고, 상기 차폐판의 개구부가 소정의 위치로 되도록 차폐판의 위치를 결정하는 위치 결정부를 구비하는 배향막의 제조 장치.
- 제 1 항에 있어서,상기 증착부에는 상기 증착원을 개폐 가능하게 덮는 셔터가 구비되어 있는 배향막의 제조 장치.
- 삭제
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00205469 | 2005-07-14 | ||
JP2005205469A JP2007025118A (ja) | 2005-07-14 | 2005-07-14 | 配向膜の製造装置、液晶装置、及び電子機器 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070009403A KR20070009403A (ko) | 2007-01-18 |
KR100854642B1 true KR100854642B1 (ko) | 2008-08-27 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060064240A KR100854642B1 (ko) | 2005-07-14 | 2006-07-10 | 배향막을 제조하는 제조 장치 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070015070A1 (ko) |
JP (1) | JP2007025118A (ko) |
KR (1) | KR100854642B1 (ko) |
CN (1) | CN100504548C (ko) |
TW (1) | TW200707034A (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4944002B2 (ja) * | 2007-12-13 | 2012-05-30 | 日本電子株式会社 | 試料作製装置の遮蔽材保持機構 |
EP2397899A1 (en) * | 2010-06-15 | 2011-12-21 | Applied Materials, Inc. | Mask holding device |
CN102409296A (zh) * | 2010-09-20 | 2012-04-11 | 巨擘科技股份有限公司 | 真空蒸镀用镀材舟及真空蒸镀*** |
TWI496329B (zh) * | 2010-12-08 | 2015-08-11 | Au Optronics Corp | 回收裝置及應用其之成膜設備 |
KR20150078549A (ko) * | 2013-12-31 | 2015-07-08 | 한국과학기술원 | 집적형 박막 태양전지의 제조 장치 |
KR102089128B1 (ko) * | 2017-11-30 | 2020-03-16 | 주식회사 야스 | 각도제한부의 공정 중 교체시스템 |
Citations (2)
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KR100284660B1 (ko) * | 1995-11-17 | 2001-03-15 | 김덕중 | 전기전도성 고분자 액정배향막의 제조방법 및 그 제조장치 |
KR20040019585A (ko) * | 2002-08-28 | 2004-03-06 | 삼성에스디아이 주식회사 | 기판반송장치가 개선된 멀티챔버타입의 기판처리장치 |
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US4340305A (en) * | 1977-05-03 | 1982-07-20 | Massachusetts Institute Of Technology | Plate aligning |
JP3261948B2 (ja) * | 1995-03-28 | 2002-03-04 | キヤノン株式会社 | X線露光用マスク及びそれを用いた半導体素子の製造方法 |
JPH098103A (ja) * | 1995-06-19 | 1997-01-10 | Nikon Corp | 投影露光装置及び投影露光方法 |
US20040005211A1 (en) * | 1996-02-28 | 2004-01-08 | Lowrance Robert B. | Multiple independent robot assembly and apparatus and control system for processing and transferring semiconductor wafers |
US6844004B2 (en) * | 1997-08-15 | 2005-01-18 | Board Of Regents, The University Of Texas System | Topical formulations of natamycin/pimaricin |
US6830663B2 (en) * | 1999-01-26 | 2004-12-14 | Symyx Technologies, Inc. | Method for creating radial profiles on a substrate |
US6469439B2 (en) * | 1999-06-15 | 2002-10-22 | Toray Industries, Inc. | Process for producing an organic electroluminescent device |
AUPQ880600A0 (en) * | 2000-07-14 | 2000-08-10 | Ggg Pty Ltd | Printing process |
US6500264B2 (en) * | 2001-04-06 | 2002-12-31 | Wafermasters, Inc. | Continuous thermal evaporation system |
JP4013523B2 (ja) * | 2001-10-26 | 2007-11-28 | セイコーエプソン株式会社 | 蒸着装置、蒸着方法、液晶装置の製造方法 |
JP4099328B2 (ja) * | 2001-11-26 | 2008-06-11 | キヤノンアネルバ株式会社 | スパッタリング装置におけるパーティクル発生防止方法、スパッタリング方法、スパッタリング装置及び被覆用部材 |
JP2004043880A (ja) * | 2002-07-11 | 2004-02-12 | Nikon Corp | 成膜方法、成膜装置、光学素子及び投影露光装置 |
US7101329B2 (en) * | 2002-08-28 | 2006-09-05 | Gary Lawrence Johnston | Variable exercise apparatus |
US6926840B2 (en) * | 2002-12-31 | 2005-08-09 | Eastman Kodak Company | Flexible frame for mounting a deposition mask |
NL1024215C2 (nl) * | 2003-09-03 | 2005-03-07 | Otb Group Bv | Systeem en werkwijze voor het behandelen van substraten, alsmede een gebruik van een dergelijke systeem en een transportinrichting. |
US7153180B2 (en) * | 2003-11-13 | 2006-12-26 | Eastman Kodak Company | Continuous manufacture of flat panel light emitting devices |
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2005
- 2005-07-14 JP JP2005205469A patent/JP2007025118A/ja active Pending
-
2006
- 2006-07-07 CN CNB2006101055172A patent/CN100504548C/zh not_active Expired - Fee Related
- 2006-07-10 KR KR1020060064240A patent/KR100854642B1/ko active IP Right Grant
- 2006-07-11 US US11/484,530 patent/US20070015070A1/en not_active Abandoned
- 2006-07-12 TW TW095125523A patent/TW200707034A/zh unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100284660B1 (ko) * | 1995-11-17 | 2001-03-15 | 김덕중 | 전기전도성 고분자 액정배향막의 제조방법 및 그 제조장치 |
KR20040019585A (ko) * | 2002-08-28 | 2004-03-06 | 삼성에스디아이 주식회사 | 기판반송장치가 개선된 멀티챔버타입의 기판처리장치 |
Also Published As
Publication number | Publication date |
---|---|
TW200707034A (en) | 2007-02-16 |
KR20070009403A (ko) | 2007-01-18 |
CN100504548C (zh) | 2009-06-24 |
CN1896848A (zh) | 2007-01-17 |
US20070015070A1 (en) | 2007-01-18 |
JP2007025118A (ja) | 2007-02-01 |
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