KR100809125B1 - 처리 장치, 위치설정 방법 및 컴퓨터 기억 매체 - Google Patents

처리 장치, 위치설정 방법 및 컴퓨터 기억 매체 Download PDF

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Publication number
KR100809125B1
KR100809125B1 KR1020060044442A KR20060044442A KR100809125B1 KR 100809125 B1 KR100809125 B1 KR 100809125B1 KR 1020060044442 A KR1020060044442 A KR 1020060044442A KR 20060044442 A KR20060044442 A KR 20060044442A KR 100809125 B1 KR100809125 B1 KR 100809125B1
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KR
South Korea
Prior art keywords
processing
chamber
positioning
substrate
processing chamber
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KR1020060044442A
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English (en)
Korean (ko)
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KR20060119815A (ko
Inventor
아키히코 시무라
Original Assignee
동경 엘렉트론 주식회사
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Publication of KR20060119815A publication Critical patent/KR20060119815A/ko
Application granted granted Critical
Publication of KR100809125B1 publication Critical patent/KR100809125B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67236—Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
KR1020060044442A 2005-05-18 2006-05-17 처리 장치, 위치설정 방법 및 컴퓨터 기억 매체 KR100809125B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005144886A JP4849825B2 (ja) 2005-05-18 2005-05-18 処理装置、位置合わせ方法、制御プログラムおよびコンピュータ記憶媒体
JPJP-P-2005-00144886 2005-05-18

Publications (2)

Publication Number Publication Date
KR20060119815A KR20060119815A (ko) 2006-11-24
KR100809125B1 true KR100809125B1 (ko) 2008-03-03

Family

ID=37425464

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060044442A KR100809125B1 (ko) 2005-05-18 2006-05-17 처리 장치, 위치설정 방법 및 컴퓨터 기억 매체

Country Status (4)

Country Link
JP (1) JP4849825B2 (ja)
KR (1) KR100809125B1 (ja)
CN (2) CN101447444B (ja)
TW (1) TWI390657B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101007710B1 (ko) * 2008-03-26 2011-01-13 주식회사 에스에프에이 화학 기상 증착 장치의 로드락 챔버
TWI458587B (zh) * 2012-01-17 2014-11-01 Chin Yen Wang 位置校正裝置
CN103569672B (zh) * 2012-07-20 2016-03-09 上海微电子装备有限公司 一种兼容硅片和玻璃基板的传输装置
JP2014075432A (ja) * 2012-10-03 2014-04-24 Hioki Ee Corp 基板支持装置および基板検査装置
CN105529278B (zh) * 2014-09-29 2019-08-16 盛美半导体设备（上海）有限公司 加工半导体结构的装置
JP6298109B2 (ja) * 2016-07-08 2018-03-20 キヤノントッキ株式会社 基板処理装置及びアライメント方法
JP7105629B2 (ja) * 2018-06-20 2022-07-25 東京エレクトロン株式会社 自動教示方法及び制御装置
CN109904101B (zh) * 2019-01-28 2021-09-03 拓荆科技股份有限公司 一种晶圆转移及测量***
JP7259476B2 (ja) 2019-03-27 2023-04-18 東京エレクトロン株式会社 アライメント装置、基板処理装置、アライメント方法及び基板処理方法
CN110504185B (zh) * 2019-08-27 2022-02-11 北京芯可鉴科技有限公司 Esd保护单元的测试及加固方法
JP2022135185A (ja) 2021-03-04 2022-09-15 東京エレクトロン株式会社 基板位置制御方法、及び基板処理システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030043220A (ko) * 2001-11-27 2003-06-02 엘지.필립스 엘시디 주식회사 액정표시장치의 유리 기판 파손 감지장치
KR20040106042A (ko) * 2003-06-10 2004-12-17 브룩스오토메이션아시아(주) 로드락 장치의 얼라이너

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2622525B2 (ja) * 1989-03-31 1997-06-18 東京エレクトロン株式会社 液晶基板の製造装置
JP3139155B2 (ja) * 1992-07-29 2001-02-26 東京エレクトロン株式会社 真空処理装置
US5558482A (en) * 1992-07-29 1996-09-24 Tokyo Electron Limited Multi-chamber system
JP3335983B2 (ja) * 1993-02-26 2002-10-21 東京エレクトロン株式会社 Ｌｃｄ用ガラス基板の位置合わせ機構及び真空処理装置
JP3299338B2 (ja) * 1993-04-28 2002-07-08 東京エレクトロン株式会社 真空処理装置
JP3350234B2 (ja) * 1994-06-06 2002-11-25 東京エレクトロン株式会社 被処理体のバッファ装置、これを用いた処理装置及びその搬送方法
JP3650495B2 (ja) * 1995-12-12 2005-05-18 東京エレクトロン株式会社 半導体処理装置、その基板交換機構及び基板交換方法
JP4674705B2 (ja) * 1998-10-27 2011-04-20 東京エレクトロン株式会社 搬送システムの搬送位置合わせ方法及び搬送システム
US7280883B2 (en) * 2001-09-06 2007-10-09 Dainippon Screen Mfg. Co., Ltd. Substrate processing system managing apparatus information of substrate processing apparatus
EP1450392A1 (en) * 2003-02-20 2004-08-25 Applied Materials, Inc. Methods and apparatus for positioning a substrate relative to a support stage

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030043220A (ko) * 2001-11-27 2003-06-02 엘지.필립스 엘시디 주식회사 액정표시장치의 유리 기판 파손 감지장치
KR20040106042A (ko) * 2003-06-10 2004-12-17 브룩스오토메이션아시아(주) 로드락 장치의 얼라이너

Also Published As

Publication number Publication date
JP4849825B2 (ja) 2012-01-11
JP2006324366A (ja) 2006-11-30
CN101447444B (zh) 2011-04-13
TW200709327A (en) 2007-03-01
CN100511633C (zh) 2009-07-08
TWI390657B (zh) 2013-03-21
CN1866493A (zh) 2006-11-22
CN101447444A (zh) 2009-06-03
KR20060119815A (ko) 2006-11-24

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