JPS6479090A - Method for stabilizing growth of semiconductor single crystal - Google Patents

Method for stabilizing growth of semiconductor single crystal

Info

Publication number
JPS6479090A
JPS6479090A JP23484587A JP23484587A JPS6479090A JP S6479090 A JPS6479090 A JP S6479090A JP 23484587 A JP23484587 A JP 23484587A JP 23484587 A JP23484587 A JP 23484587A JP S6479090 A JPS6479090 A JP S6479090A
Authority
JP
Japan
Prior art keywords
crucible
melt
single crystal
raw material
wall surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23484587A
Other languages
Japanese (ja)
Inventor
Hiroshi Kaneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP23484587A priority Critical patent/JPS6479090A/en
Publication of JPS6479090A publication Critical patent/JPS6479090A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the sticking of raw material polycrystals to the wall surface of a crucible and to stabilize the growth of a single crystal by melting the raw material polycrystals while applying oscillation to the wall surface of the crucible or the melt. CONSTITUTION:The raw material polycrystals 1 are packed into a quartz crucible 3 installed in a graphite susceptor 4 and are heated by a heater 5. While the crucible 3 is gradually rotated, the crucible is lowered and the raw material polycrystals 1 packed in the crucible 3 are gradually melted from below to form the melt 2. An ultrasonic oscillator 6 installed via a heat insulating material 9 is simultaneously oscillated to apply the oscillation to the wall surface of the crucible 3 or the melt 2 via a waveguide 7 and the susceptor 4. The seed crystal is pulled up from the melt 2 and the single crystal is thus grown.
JP23484587A 1987-09-21 1987-09-21 Method for stabilizing growth of semiconductor single crystal Pending JPS6479090A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23484587A JPS6479090A (en) 1987-09-21 1987-09-21 Method for stabilizing growth of semiconductor single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23484587A JPS6479090A (en) 1987-09-21 1987-09-21 Method for stabilizing growth of semiconductor single crystal

Publications (1)

Publication Number Publication Date
JPS6479090A true JPS6479090A (en) 1989-03-24

Family

ID=16977263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23484587A Pending JPS6479090A (en) 1987-09-21 1987-09-21 Method for stabilizing growth of semiconductor single crystal

Country Status (1)

Country Link
JP (1) JPS6479090A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991007520A1 (en) * 1989-11-19 1991-05-30 Kabushiki-Kaisha Hitachi Seisakusho Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal
US5837332A (en) * 1989-11-19 1998-11-17 Nihon Victor Kabushiki-Kaisha Method and apparatus for preparing crystal thin films by using a surface acoustic wave
JP2007210803A (en) * 2006-02-07 2007-08-23 Shin Etsu Handotai Co Ltd Method and apparatus for manufacturing silicon single crystal ingot, and silicon single crystal ingot

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991007520A1 (en) * 1989-11-19 1991-05-30 Kabushiki-Kaisha Hitachi Seisakusho Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal
US5837332A (en) * 1989-11-19 1998-11-17 Nihon Victor Kabushiki-Kaisha Method and apparatus for preparing crystal thin films by using a surface acoustic wave
JP2007210803A (en) * 2006-02-07 2007-08-23 Shin Etsu Handotai Co Ltd Method and apparatus for manufacturing silicon single crystal ingot, and silicon single crystal ingot

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