JPS6479090A - Method for stabilizing growth of semiconductor single crystal - Google Patents
Method for stabilizing growth of semiconductor single crystalInfo
- Publication number
- JPS6479090A JPS6479090A JP23484587A JP23484587A JPS6479090A JP S6479090 A JPS6479090 A JP S6479090A JP 23484587 A JP23484587 A JP 23484587A JP 23484587 A JP23484587 A JP 23484587A JP S6479090 A JPS6479090 A JP S6479090A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- melt
- single crystal
- raw material
- wall surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To prevent the sticking of raw material polycrystals to the wall surface of a crucible and to stabilize the growth of a single crystal by melting the raw material polycrystals while applying oscillation to the wall surface of the crucible or the melt. CONSTITUTION:The raw material polycrystals 1 are packed into a quartz crucible 3 installed in a graphite susceptor 4 and are heated by a heater 5. While the crucible 3 is gradually rotated, the crucible is lowered and the raw material polycrystals 1 packed in the crucible 3 are gradually melted from below to form the melt 2. An ultrasonic oscillator 6 installed via a heat insulating material 9 is simultaneously oscillated to apply the oscillation to the wall surface of the crucible 3 or the melt 2 via a waveguide 7 and the susceptor 4. The seed crystal is pulled up from the melt 2 and the single crystal is thus grown.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23484587A JPS6479090A (en) | 1987-09-21 | 1987-09-21 | Method for stabilizing growth of semiconductor single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23484587A JPS6479090A (en) | 1987-09-21 | 1987-09-21 | Method for stabilizing growth of semiconductor single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6479090A true JPS6479090A (en) | 1989-03-24 |
Family
ID=16977263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23484587A Pending JPS6479090A (en) | 1987-09-21 | 1987-09-21 | Method for stabilizing growth of semiconductor single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6479090A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991007520A1 (en) * | 1989-11-19 | 1991-05-30 | Kabushiki-Kaisha Hitachi Seisakusho | Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal |
US5837332A (en) * | 1989-11-19 | 1998-11-17 | Nihon Victor Kabushiki-Kaisha | Method and apparatus for preparing crystal thin films by using a surface acoustic wave |
JP2007210803A (en) * | 2006-02-07 | 2007-08-23 | Shin Etsu Handotai Co Ltd | Method and apparatus for manufacturing silicon single crystal ingot, and silicon single crystal ingot |
-
1987
- 1987-09-21 JP JP23484587A patent/JPS6479090A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991007520A1 (en) * | 1989-11-19 | 1991-05-30 | Kabushiki-Kaisha Hitachi Seisakusho | Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal |
US5837332A (en) * | 1989-11-19 | 1998-11-17 | Nihon Victor Kabushiki-Kaisha | Method and apparatus for preparing crystal thin films by using a surface acoustic wave |
JP2007210803A (en) * | 2006-02-07 | 2007-08-23 | Shin Etsu Handotai Co Ltd | Method and apparatus for manufacturing silicon single crystal ingot, and silicon single crystal ingot |
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