JPS643661A - Pattern defect correcting device - Google Patents

Pattern defect correcting device

Info

Publication number
JPS643661A
JPS643661A JP15938687A JP15938687A JPS643661A JP S643661 A JPS643661 A JP S643661A JP 15938687 A JP15938687 A JP 15938687A JP 15938687 A JP15938687 A JP 15938687A JP S643661 A JPS643661 A JP S643661A
Authority
JP
Japan
Prior art keywords
substrate
beams
projection
ion
correcting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15938687A
Other languages
Japanese (ja)
Other versions
JP2504995B2 (en
Inventor
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP15938687A priority Critical patent/JP2504995B2/en
Publication of JPS643661A publication Critical patent/JPS643661A/en
Application granted granted Critical
Publication of JP2504995B2 publication Critical patent/JP2504995B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To reduce the damage of a substrate by charged beams by heating the substrate in the middle of projecting charged beams or after projection. CONSTITUTION:The substrate 10 is heated in the middle of projecting charged beams or after projection. A heating device 5 is installed beneath a moving stage 4. While the glass substrate 10 is heated, ion beams 8 are projected and scanned. Therefore, color centers, etc., disappear due to heat energy, and an organization is restored. Thus damages of the glass substrate 10, which are caused by ion injection, can be removed. Moreover the edge of an ion projection part is sharpened to obtain high image quality patterns at high accuracy.
JP15938687A 1987-06-25 1987-06-25 Pattern defect repair device Expired - Fee Related JP2504995B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15938687A JP2504995B2 (en) 1987-06-25 1987-06-25 Pattern defect repair device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15938687A JP2504995B2 (en) 1987-06-25 1987-06-25 Pattern defect repair device

Publications (2)

Publication Number Publication Date
JPS643661A true JPS643661A (en) 1989-01-09
JP2504995B2 JP2504995B2 (en) 1996-06-05

Family

ID=15692658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15938687A Expired - Fee Related JP2504995B2 (en) 1987-06-25 1987-06-25 Pattern defect repair device

Country Status (1)

Country Link
JP (1) JP2504995B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0553293A (en) * 1991-08-26 1993-03-05 Mitsubishi Electric Corp Manufacture of photomask substrate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135629A (en) * 1977-04-30 1978-11-27 Fujitsu Ltd Correcting device for emulsion photo-mask
JPS5787128A (en) * 1980-11-19 1982-05-31 Toshiba Corp Correcting method of mask
JPS586127A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Method and apparatus for correcting defect of photo-mask
JPS60245227A (en) * 1984-05-21 1985-12-05 Seiko Instr & Electronics Ltd Pattern film forming method
JPS61123841A (en) * 1984-11-20 1986-06-11 Seiko Instr & Electronics Ltd Ion beam mask reparing device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135629A (en) * 1977-04-30 1978-11-27 Fujitsu Ltd Correcting device for emulsion photo-mask
JPS5787128A (en) * 1980-11-19 1982-05-31 Toshiba Corp Correcting method of mask
JPS586127A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Method and apparatus for correcting defect of photo-mask
JPS60245227A (en) * 1984-05-21 1985-12-05 Seiko Instr & Electronics Ltd Pattern film forming method
JPS61123841A (en) * 1984-11-20 1986-06-11 Seiko Instr & Electronics Ltd Ion beam mask reparing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0553293A (en) * 1991-08-26 1993-03-05 Mitsubishi Electric Corp Manufacture of photomask substrate

Also Published As

Publication number Publication date
JP2504995B2 (en) 1996-06-05

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