JPS643661A - Pattern defect correcting device - Google Patents
Pattern defect correcting deviceInfo
- Publication number
- JPS643661A JPS643661A JP15938687A JP15938687A JPS643661A JP S643661 A JPS643661 A JP S643661A JP 15938687 A JP15938687 A JP 15938687A JP 15938687 A JP15938687 A JP 15938687A JP S643661 A JPS643661 A JP S643661A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- beams
- projection
- ion
- correcting device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To reduce the damage of a substrate by charged beams by heating the substrate in the middle of projecting charged beams or after projection. CONSTITUTION:The substrate 10 is heated in the middle of projecting charged beams or after projection. A heating device 5 is installed beneath a moving stage 4. While the glass substrate 10 is heated, ion beams 8 are projected and scanned. Therefore, color centers, etc., disappear due to heat energy, and an organization is restored. Thus damages of the glass substrate 10, which are caused by ion injection, can be removed. Moreover the edge of an ion projection part is sharpened to obtain high image quality patterns at high accuracy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15938687A JP2504995B2 (en) | 1987-06-25 | 1987-06-25 | Pattern defect repair device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15938687A JP2504995B2 (en) | 1987-06-25 | 1987-06-25 | Pattern defect repair device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS643661A true JPS643661A (en) | 1989-01-09 |
JP2504995B2 JP2504995B2 (en) | 1996-06-05 |
Family
ID=15692658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15938687A Expired - Fee Related JP2504995B2 (en) | 1987-06-25 | 1987-06-25 | Pattern defect repair device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2504995B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0553293A (en) * | 1991-08-26 | 1993-03-05 | Mitsubishi Electric Corp | Manufacture of photomask substrate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53135629A (en) * | 1977-04-30 | 1978-11-27 | Fujitsu Ltd | Correcting device for emulsion photo-mask |
JPS5787128A (en) * | 1980-11-19 | 1982-05-31 | Toshiba Corp | Correcting method of mask |
JPS586127A (en) * | 1981-07-03 | 1983-01-13 | Hitachi Ltd | Method and apparatus for correcting defect of photo-mask |
JPS60245227A (en) * | 1984-05-21 | 1985-12-05 | Seiko Instr & Electronics Ltd | Pattern film forming method |
JPS61123841A (en) * | 1984-11-20 | 1986-06-11 | Seiko Instr & Electronics Ltd | Ion beam mask reparing device |
-
1987
- 1987-06-25 JP JP15938687A patent/JP2504995B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53135629A (en) * | 1977-04-30 | 1978-11-27 | Fujitsu Ltd | Correcting device for emulsion photo-mask |
JPS5787128A (en) * | 1980-11-19 | 1982-05-31 | Toshiba Corp | Correcting method of mask |
JPS586127A (en) * | 1981-07-03 | 1983-01-13 | Hitachi Ltd | Method and apparatus for correcting defect of photo-mask |
JPS60245227A (en) * | 1984-05-21 | 1985-12-05 | Seiko Instr & Electronics Ltd | Pattern film forming method |
JPS61123841A (en) * | 1984-11-20 | 1986-06-11 | Seiko Instr & Electronics Ltd | Ion beam mask reparing device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0553293A (en) * | 1991-08-26 | 1993-03-05 | Mitsubishi Electric Corp | Manufacture of photomask substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2504995B2 (en) | 1996-06-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |