JPS5215267A - Fine processing method - Google Patents

Fine processing method

Info

Publication number
JPS5215267A
JPS5215267A JP50091127A JP9112775A JPS5215267A JP S5215267 A JPS5215267 A JP S5215267A JP 50091127 A JP50091127 A JP 50091127A JP 9112775 A JP9112775 A JP 9112775A JP S5215267 A JPS5215267 A JP S5215267A
Authority
JP
Japan
Prior art keywords
processing method
fine processing
film
irradiating
high resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50091127A
Other languages
Japanese (ja)
Other versions
JPS5521460B2 (en
Inventor
Keisuke Kobayashi
Yoshiki Kato
Seiji Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50091127A priority Critical patent/JPS5215267A/en
Priority to NL7608152A priority patent/NL7608152A/en
Priority to FR7622830A priority patent/FR2319926A1/en
Priority to DE19762633947 priority patent/DE2633947A1/en
Publication of JPS5215267A publication Critical patent/JPS5215267A/en
Publication of JPS5521460B2 publication Critical patent/JPS5521460B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To obtain a high resolution mask by a dry process by irradiating an energy beam on metallic halogen compound type film, by removing the portion irradiated and by processing a fine pattern on the film.
JP50091127A 1975-07-28 1975-07-28 Fine processing method Granted JPS5215267A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method
NL7608152A NL7608152A (en) 1975-07-28 1976-07-22 METHOD FOR THE FORMATION OF CARTRIDGES.
FR7622830A FR2319926A1 (en) 1975-07-28 1976-07-27 Fine pattern prodn. in metal halide layer on substrate - using laser beam to give precise patterns by dry process
DE19762633947 DE2633947A1 (en) 1975-07-28 1976-07-28 METHOD OF DEVELOPING A PATTERN

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Publications (2)

Publication Number Publication Date
JPS5215267A true JPS5215267A (en) 1977-02-04
JPS5521460B2 JPS5521460B2 (en) 1980-06-10

Family

ID=14017853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50091127A Granted JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Country Status (1)

Country Link
JP (1) JPS5215267A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154619A (en) * 1984-01-24 1985-08-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of etching metal layer
JPS60187026A (en) * 1984-01-24 1985-09-24 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of etching metal layer
WO2005045911A1 (en) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60150508A (en) * 1984-01-18 1985-08-08 日本写真印刷株式会社 Method of producing transparent electrode board

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833910A (en) * 1971-09-01 1973-05-15
JPS51123582A (en) * 1975-04-21 1976-10-28 Fujitsu Ltd Semiconductor device production system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833910A (en) * 1971-09-01 1973-05-15
JPS51123582A (en) * 1975-04-21 1976-10-28 Fujitsu Ltd Semiconductor device production system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154619A (en) * 1984-01-24 1985-08-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of etching metal layer
JPS60187026A (en) * 1984-01-24 1985-09-24 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of etching metal layer
WO2005045911A1 (en) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
US7790358B2 (en) 2003-11-11 2010-09-07 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same

Also Published As

Publication number Publication date
JPS5521460B2 (en) 1980-06-10

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