JPS561532A - Method and device for correcting white spot defect of photomask - Google Patents

Method and device for correcting white spot defect of photomask

Info

Publication number
JPS561532A
JPS561532A JP7570679A JP7570679A JPS561532A JP S561532 A JPS561532 A JP S561532A JP 7570679 A JP7570679 A JP 7570679A JP 7570679 A JP7570679 A JP 7570679A JP S561532 A JPS561532 A JP S561532A
Authority
JP
Japan
Prior art keywords
metal film
white spot
spot defect
defect
dimensions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7570679A
Other languages
Japanese (ja)
Inventor
Takeoki Miyauchi
Mikio Hongo
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7570679A priority Critical patent/JPS561532A/en
Publication of JPS561532A publication Critical patent/JPS561532A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To correct a white spot defect, by bringing a metal film on a correction plate and the pattern surface of a mask into tight contact with each other and irradiating laser light upon a white spot defect portion to vaporize the metal film. CONSTITUTION:A metal film 9b provided on a correction plate 8, which is manufactured by coating the metal film on a glass plate 9a, is overlapped on the surface of the Cr pattern 2b of a glass plate 2a. Exhaust is effected by vacuum to bring a photomask 1 and the correction plate 8 into completely tight contact with each other. When the dimensions of a rectangular opening 24 projected onto the surface of the mask are adjusted to a white spot defect 4, another rectangular opening 26 is moved in connection with the adjustment to concentrate laser light 21 onto the metal film 9b in the same shape and dimensions as the image of the opening 24 to vaporize the metal film and correct the defect. According to this method, the projected shape and dimensions of the laser light can be adjusted to the defect from the side of an observer to perform working and the number of working steps is greatly reduced.
JP7570679A 1979-06-18 1979-06-18 Method and device for correcting white spot defect of photomask Pending JPS561532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7570679A JPS561532A (en) 1979-06-18 1979-06-18 Method and device for correcting white spot defect of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7570679A JPS561532A (en) 1979-06-18 1979-06-18 Method and device for correcting white spot defect of photomask

Publications (1)

Publication Number Publication Date
JPS561532A true JPS561532A (en) 1981-01-09

Family

ID=13583924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7570679A Pending JPS561532A (en) 1979-06-18 1979-06-18 Method and device for correcting white spot defect of photomask

Country Status (1)

Country Link
JP (1) JPS561532A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4444801A (en) * 1981-01-14 1984-04-24 Hitachi, Ltd. Method and apparatus for correcting transparent defects on a photomask
JPS62156958U (en) * 1986-03-28 1987-10-05
JP2002062637A (en) * 2000-08-22 2002-02-28 Nec Corp Laser modifying method and apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4444801A (en) * 1981-01-14 1984-04-24 Hitachi, Ltd. Method and apparatus for correcting transparent defects on a photomask
JPS62156958U (en) * 1986-03-28 1987-10-05
JPH0121307Y2 (en) * 1986-03-28 1989-06-26
JP2002062637A (en) * 2000-08-22 2002-02-28 Nec Corp Laser modifying method and apparatus

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