JPS6233580B2 - - Google Patents
Info
- Publication number
- JPS6233580B2 JPS6233580B2 JP18723580A JP18723580A JPS6233580B2 JP S6233580 B2 JPS6233580 B2 JP S6233580B2 JP 18723580 A JP18723580 A JP 18723580A JP 18723580 A JP18723580 A JP 18723580A JP S6233580 B2 JPS6233580 B2 JP S6233580B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- mask
- substrate
- pitch
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 16
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 25
- 239000004020 conductor Substances 0.000 description 24
- 238000010586 diagram Methods 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0286—Programmable, customizable or modifiable circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18723580A JPS57112753A (en) | 1980-12-29 | 1980-12-29 | Exposure method |
EP81306134A EP0055620B1 (en) | 1980-12-29 | 1981-12-24 | Method of projecting circuit patterns |
DE8181306134T DE3173277D1 (en) | 1980-12-29 | 1981-12-24 | Method of projecting circuit patterns |
US06/333,814 US4408875A (en) | 1980-12-29 | 1981-12-31 | Method of projecting circuit patterns |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18723580A JPS57112753A (en) | 1980-12-29 | 1980-12-29 | Exposure method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57112753A JPS57112753A (en) | 1982-07-13 |
JPS6233580B2 true JPS6233580B2 (ko) | 1987-07-21 |
Family
ID=16202415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18723580A Granted JPS57112753A (en) | 1980-12-29 | 1980-12-29 | Exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57112753A (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57168250A (en) * | 1981-04-10 | 1982-10-16 | Fujitsu Ltd | Exposing method |
JPS62147728A (ja) * | 1985-12-23 | 1987-07-01 | Fujitsu Ltd | 露光方法 |
JPS6355550A (ja) * | 1986-08-26 | 1988-03-10 | Mamiya Koki Kk | プリント基板の分割投影露光方法 |
JPH03116714A (ja) * | 1989-09-28 | 1991-05-17 | Nec Ic Microcomput Syst Ltd | 半導体集積回路素子の製造方法 |
-
1980
- 1980-12-29 JP JP18723580A patent/JPS57112753A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57112753A (en) | 1982-07-13 |
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