JPS62277625A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS62277625A JPS62277625A JP12088186A JP12088186A JPS62277625A JP S62277625 A JPS62277625 A JP S62277625A JP 12088186 A JP12088186 A JP 12088186A JP 12088186 A JP12088186 A JP 12088186A JP S62277625 A JPS62277625 A JP S62277625A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- protective layer
- layer
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 65
- 239000011241 protective layer Substances 0.000 claims abstract description 33
- 239000010410 layer Substances 0.000 claims abstract description 27
- 229920001721 polyimide Polymers 0.000 claims abstract description 21
- 230000001186 cumulative effect Effects 0.000 claims abstract description 17
- 239000004642 Polyimide Substances 0.000 claims abstract description 16
- 239000003302 ferromagnetic material Substances 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 3
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 claims description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 57
- 239000010409 thin film Substances 0.000 abstract description 31
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 13
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 239000004033 plastic Substances 0.000 abstract description 2
- 229920003023 plastic Polymers 0.000 abstract description 2
- 239000004417 polycarbonate Substances 0.000 abstract description 2
- 229920000515 polycarbonate Polymers 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 abstract 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 24
- 229920005575 poly(amic acid) Polymers 0.000 description 19
- -1 polyethylene terephthalate Polymers 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000012360 testing method Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical class 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000008346 aqueous phase Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 125000001165 hydrophobic group Chemical group 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 238000000427 thin-film deposition Methods 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical class CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- NAPSCFZYZVSQHF-UHFFFAOYSA-N dimantine Chemical compound CCCCCCCCCCCCCCCCCCN(C)C NAPSCFZYZVSQHF-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000013101 initial test Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- SDKPSXWGRWWLKR-UHFFFAOYSA-M sodium;9,10-dioxoanthracene-1-sulfonate Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] SDKPSXWGRWWLKR-UHFFFAOYSA-M 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
3、発明の詳細な説明
〔産業上の利用分野〕
本発明は、耐久性、走行性の優れた保護層を有する強磁
性薄膜型磁気記録媒体に関する。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a ferromagnetic thin film magnetic recording medium having a protective layer with excellent durability and runnability.
近年、増大する一方である映像信号(高画質化によって
も増大する)、デジタル信号等を含む多量の情報信号を
、コンパクトに高密度記録する媒体として、非磁性支持
体上に、コバルト、ニッケル、クロム、鉄、あるいはこ
れらを主成分とする合金ないしは酸化物の薄ngを真空
蒸着、スパッタリング、イオンブレーティング、メッキ
等の方法で形成せしめた強磁性薄膜型磁気記録媒体が注
目されている。In recent years, cobalt, nickel, Ferromagnetic thin-film magnetic recording media in which thin ng of chromium, iron, or alloys or oxides containing these as main components are formed by vacuum evaporation, sputtering, ion blasting, plating, or other methods are attracting attention.
しかし、このような薄膜型磁気記録媒体は。However, such thin film magnetic recording media.
従来の塗布型媒体に比べて、抗磁力や角型比等の磁気特
性において優れている一方において。While it has superior magnetic properties such as coercive force and squareness ratio compared to conventional coated media.
磁気ヘッドとの摺動摩擦、テープの場合のガイドビンお
よび固定ポスト等との接触による摺動摩擦等によって1
強磁性薄膜表面が摩耗し易く、動的耐久性に難点がある
。1 due to sliding friction with the magnetic head, sliding friction due to contact with guide bins and fixed posts in the case of tape, etc.
The surface of the ferromagnetic thin film is easily worn, and dynamic durability is problematic.
この為、磁性薄膜表面に各種の保護層を設けることが数
多く提案されている。係る保護層に於いては膜厚は厚い
方が、#摩耗性に優れるが、磁性層と磁気ヘッド間のス
ペーシングが大きくなり、電磁変換特性に悪影響を及ぼ
す、電磁変換特性から見れば、係る保護層の膜厚はせい
ぜい500Å以下であることが要求され、中でも、特に
短波長での記録再生に於いては、スペーシングによる影
響が出易い為、保護層の膜厚は100Å以下、出来れば
、更に薄い事が望ましい、更に係る保護層に於いて、そ
の膜厚及び面内密度は出来る限り一定かつ、均一である
ことが走行面からも、又電磁変換特性面からも要求され
る。この様な各面からの要求に対し、飽和脂肪酸金層塩
の単分子膜、又は単分子累積膜を利用した保護層が提案
されている(特開昭61−48119号公報)が、係る
薄膜保護層を以ってしても、保護層形成に伴なう電磁変
換特性の損失は、可成り大きく、又、十分な耐久性を有
しているとはいい難い、一方この点を改良すべく、係る
単分子膜乃至単分子累積膜を重合性物質で構成すること
が、提案されている(特開昭61−48124号公報)
、然し乍ら、この場合、確かに、耐久性の点では飽和脂
肪酸金層塩を用いたものと比較して、ある程度の向上が
認められるものの、電磁変換特性面の改良は何ら図られ
ておらず、保護層に要求される性能を十分に満足してい
るとはいい難い。For this reason, many proposals have been made to provide various protective layers on the surface of the magnetic thin film. The thicker the protective layer, the better the abrasion resistance, but the larger the spacing between the magnetic layer and the magnetic head, which has a negative effect on the electromagnetic conversion characteristics. The thickness of the protective layer is required to be at most 500 Å or less, and especially in recording and reproducing at short wavelengths, spacing tends to affect the thickness of the protective layer, so the thickness of the protective layer should be 100 Å or less, preferably less than 100 Å. It is desirable that the protective layer be thinner, and it is required that the thickness and in-plane density of the protective layer be as constant and uniform as possible from the viewpoint of running and electromagnetic conversion characteristics. In response to these various demands, a protective layer using a monomolecular film or a monomolecular cumulative film of saturated fatty acid gold salt has been proposed (Japanese Patent Application Laid-Open No. 61-48119). Even with a protective layer, the loss of electromagnetic conversion characteristics due to the formation of the protective layer is quite large, and it cannot be said that it has sufficient durability. Therefore, it has been proposed that such a monomolecular film or a monomolecular cumulative film be composed of a polymerizable substance (Japanese Unexamined Patent Publication No. 61-48124).
However, in this case, although there is certainly some improvement in durability compared to the one using saturated fatty acid gold layer salt, no improvement has been made in terms of electromagnetic conversion characteristics. It cannot be said that the performance required for the protective layer is fully satisfied.
そこで本発明の目的は、係る従来技術の欠点を解消し、
!磁変換特性を損なわず、#磁性、走行性に優れた高性
能の磁気記録媒体を提供することにある。Therefore, the purpose of the present invention is to eliminate the drawbacks of the prior art,
! The object of the present invention is to provide a high-performance magnetic recording medium that does not impair magnetic conversion characteristics and has excellent magnetic properties and running properties.
上記の目的は、以下の本発明によって達成される。すな
わち本発明は、支持体上に磁性層と有機保護層とを有す
る磁気記録媒体に於いて。The above object is achieved by the present invention as follows. That is, the present invention relates to a magnetic recording medium having a magnetic layer and an organic protective layer on a support.
該有機保護層が、ポリイミドの単分子膜又はその累積膜
を含むことを特徴とする磁気記録媒体である。The magnetic recording medium is characterized in that the organic protective layer includes a monomolecular film of polyimide or a cumulative film thereof.
本発明で用いるポリイミドとしては、特に下式(A)で
表わされるものが好適である。As the polyimide used in the present invention, one represented by the following formula (A) is particularly suitable.
(但し1mは1以上の正数である) 〔作用〕 本発明は。(However, 1m is a positive number greater than or equal to 1) [Effect] The present invention is.
1)磁性薄膜との密着性に優れた超薄膜の保護層を比較
的簡単に作成する方法、
2)その際、保護層を構成する分子が高度の秩序構造を
持って配向される方法
を種々検討した結果1本発明を成すに至った。1) A relatively easy method to create an ultra-thin protective layer with excellent adhesion to a magnetic thin film, and 2) Various methods for orienting the molecules that make up the protective layer with a highly ordered structure. As a result of the study, the present invention was completed.
又、係る製造方法を用いて電磁変換特性を損なわずに、
耐久性、走行性に優れる高性能の磁性薄膜保護層を有す
る薄膜型磁気記録媒体を提供できるに至った。In addition, using such a manufacturing method, without impairing the electromagnetic conversion characteristics,
It has now been possible to provide a thin-film magnetic recording medium having a high-performance magnetic thin-film protective layer with excellent durability and runnability.
゛本発明の磁気記録媒体を構成する支持体、とりわけ非
磁性支持体としては1通常、ポリエチレンテレフタレ:
ト、ポリカーボネート、ポリアセテート、ポリアミド、
ポリイミドなどの比較的耐熱性の良好なプラスチックの
厚さ3〜40g、m程度のフィルムが好ましく用いられ
るが、その他罪磁性金属箔なども必要に応じて用いるこ
とができ、基本的には、所望の不滑な磁性層形成面を看
する任意の固体材料が用いられる。゛Supports constituting the magnetic recording medium of the present invention, particularly non-magnetic supports, include 1 usually polyethylene terephthalate:
polycarbonate, polyacetate, polyamide,
A film made of relatively heat-resistant plastic such as polyimide and having a thickness of about 3 to 40 g or m is preferably used, but other materials such as magnetic metal foil can also be used as needed; basically, it can be used as desired. Any solid material that provides a smooth magnetic layer formation surface can be used.
これら非磁性支持体には、その上に強磁性体薄膜を形成
するに先立ち、接着性向上、磁気特性向上、その他の目
的で、必要に応じて、コロナ処理、プライマー処理、あ
るいはパーマロイで代表される透磁層等の下地層を形成
してもよい、また、これら非磁性支持体の磁性層形成面
とは反対側の面に非磁性のバックコート層を設けても良
い。Before forming a ferromagnetic thin film on these non-magnetic supports, corona treatment, primer treatment, or permalloy treatment is applied as necessary to improve adhesion, improve magnetic properties, or for other purposes. An underlayer such as a magnetically permeable layer may be formed, or a nonmagnetic back coat layer may be provided on the surface of the nonmagnetic support opposite to the surface on which the magnetic layer is formed.
強磁性体薄膜は、上記したように必要に応じて下地処理
を行なった非磁性支持体上に、一般にスパッタリング等
の蒸着により、Fe、Co。A ferromagnetic thin film is generally formed by depositing Fe, Co, etc. on a nonmagnetic support that has been subjected to a base treatment if necessary as described above.
Ni等を主成分とする強磁性体金属あるl、Nは合金の
厚さが0.01〜2.0pmの薄膜を形成することによ
り得られる。特にCOを主成分とする磁性薄膜が好まし
く用いられ、これには、磁化容易軸が膜面に垂直方向に
あるCOとCrを主成分とする磁性薄膜と、磁化容易軸
が膜面に水平方向にあるCOを主成分とする磁性薄膜と
が含まれる。A ferromagnetic metal mainly composed of Ni or the like, N, can be obtained by forming a thin film of an alloy with a thickness of 0.01 to 2.0 pm. In particular, a magnetic thin film whose main component is CO is preferably used, and this includes a magnetic thin film whose main components are CO and Cr whose easy axis of magnetization is perpendicular to the film surface, and a magnetic thin film whose easy axis of magnetization is horizontal to the film surface. This includes a magnetic thin film whose main component is CO.
これら強磁性体薄膜は、必要に応じて非磁性支持体の両
面に形成することもできる。These ferromagnetic thin films can also be formed on both sides of the nonmagnetic support, if necessary.
本発明の磁気記録媒体に於ては、上記した強磁性体薄膜
表面の酸化処理によって、表面活性化乃至は金属表面層
を酸化してもよい。In the magnetic recording medium of the present invention, the surface of the ferromagnetic thin film may be surface activated or the metal surface layer may be oxidized by the above-described oxidation treatment of the surface of the ferromagnetic thin film.
磁気記録層表面の酸化処理方法としては1通常、金属そ
の他の材料を比較的緩慢に表層から部分酸化せしめる事
が出来る方法であれば何ら制限されないが、中でも特に
好ましい方法として、酸素プラズマ処理法、陽極酸化処
理法、オゾン雰囲気中での紫外線照射による酸化処理法
1等が使用される。酸化処理表面は金属表面の活性化状
態、表層部の安定な酸化物状態共に有効であった。The method for oxidizing the surface of the magnetic recording layer is generally not limited as long as it can partially oxidize metals and other materials from the surface layer relatively slowly, but particularly preferred methods include oxygen plasma treatment, Anodizing treatment method, oxidation treatment method 1 using ultraviolet irradiation in an ozone atmosphere, etc. are used. The oxidized surface was effective for both the activated state of the metal surface and the stable oxide state of the surface layer.
係る強磁性体薄膜の表面酸化層上にポリイミドの単分子
膜〆はその累積膜から成る保護層を形成し、薄膜堆積型
磁気記録媒体を得た。A protective layer consisting of a cumulative film of a polyimide monomolecular film was formed on the surface oxidation layer of the ferromagnetic thin film to obtain a thin film deposition type magnetic recording medium.
係るポリイミドの単分子膜又はその累積膜を作成する方
法としては、例えば、1.Langmu i rらの開
発したラングミュア−プロジェット法(以下LB法)を
用いることができ、鉛末らによる説明がある(1986
年日本化学会第52春季年会講演番号IG−01,02
)。Examples of methods for creating such a polyimide monomolecular film or a cumulative film thereof include 1. The Langmuir-Prodgett method (hereinafter referred to as the LB method) developed by Langmuir et al. can be used, and is explained by Benzu et al. (1986).
52nd Spring Annual Meeting of the Chemical Society of Japan Lecture No. IG-01,02
).
即ち、目的とするポリイミドの前駆体であるIポリアミ
ド酸アミン塩を、N、N−ジメチルアセトアミド−ベン
ゼン混合溶媒等の溶剤に溶解し、シリンダー等を用いて
これを第1図に示した単分子膜形成装置の水槽l内の水
相2上に展開させる。That is, a polyamic acid amine salt I, which is a precursor of the desired polyimide, is dissolved in a solvent such as a mixed solvent of N,N-dimethylacetamide and benzene, and a cylinder or the like is used to form the single molecule shown in FIG. It is spread on the aqueous phase 2 in the water tank 1 of the film forming apparatus.
この際、ポリアミド酸アミン塩内に適当な疎水性部位と
親木性部位とが併存することが必要であり、係る両親媒
性ポリアミド酸アミン塩の・・例を(1)式に示す。At this time, it is necessary that a suitable hydrophobic site and a wood-philic site coexist in the polyamic acid amine salt, and an example of such an amphipathic polyamic acid amine salt is shown in formula (1).
と配化合物に於いてnは8〜26の整数であり、好まし
くは16.18又は20である。In the combination compound, n is an integer of 8 to 26, preferably 16.18 or 20.
又、炭化水素鎖を構成する水素原子の一部、又は全てを
フッ素原子に置換してもよい。Further, some or all of the hydrogen atoms constituting the hydrocarbon chain may be replaced with fluorine atoms.
次に移動障壁(又は浮子)旦を動かし、水相Z上に展開
させた。ポリアミド酸アミン塩の展開面積を縮少させる
ことにより、累積膜の製造に適する表面圧を設定するこ
とができる。この表面圧を表面圧力制御装置6で維持し
ながら、清浄な基板ヱを静かに垂直に上下させることに
より、ポリアミド酸アミン塩の単分子膜が、基板Z上に
移しとられる。ここでいう基板とは既述の磁性体薄膜を
指す、この様にして、ポリアミド酸アミン塩の単分子膜
を強磁性体薄膜の表面酸化層上に形成することができる
。ポリアミド酸アミン塩の単分子膜は以上で製造される
が、前記の操作を繰り返すことにより、所望の累積数の
ポリアミド酸アミン塩の単分子累積膜を作成することが
できる。Next, the moving barrier (or float) was moved and spread on the aqueous phase Z. By reducing the spread area of the polyamic acid amine salt, a surface pressure suitable for producing a cumulative film can be set. A monomolecular film of polyamic acid amine salt is transferred onto the substrate Z by gently moving the clean substrate Z up and down vertically while maintaining this surface pressure using the surface pressure control device 6. The substrate here refers to the magnetic thin film described above. In this way, a monomolecular film of polyamic acid amine salt can be formed on the surface oxidation layer of the ferromagnetic thin film. A monomolecular film of polyamic acid amine salt is produced in the above manner, and by repeating the above operations, a desired cumulative number of monomolecular films of polyamic acid amine salt can be created.
ポリアミド酸アミン塩の単分子膜を基板上番こ移し取る
には、上述した垂直浸漬法の他、水平付着法1回転円筒
法などの方法による。水平付着法は基板を水面に水平に
接触させて移しとる方法で1回転円筒法は円筒形の基板
を水面上を回転させて基板表面に移しとる方法である。In order to transfer the monomolecular film of the polyamic acid amine salt onto the substrate, in addition to the above-mentioned vertical dipping method, methods such as the horizontal deposition method and the one-turn cylinder method are used. The horizontal attachment method is a method in which the substrate is brought into horizontal contact with the water surface and transferred, and the one-turn cylinder method is a method in which a cylindrical substrate is rotated on the water surface and transferred onto the substrate surface.
前述した垂直浸漬法では、表面が親水性である、基板を
水面を横切る方向−に水中から引き上げるとポリアミド
酸アミン塩の親木基が基板側に向いた単分子膜が基板上
に形成される。前述のように基板を上下させると、各工
程ごとに一枚ずつポリアミド酸アミン塩の単分子膜が積
み重なっていく、製膜分子の向きが引上工程と浸漬工程
で逆になるので、この方法によると各層間はポリアミド
酸アミン塩の親木基と疎水基が向かいあうY型膜が形成
される。In the vertical immersion method described above, when a substrate with a hydrophilic surface is lifted out of water in a direction transverse to the water surface, a monomolecular film is formed on the substrate with the parent group of the polyamic acid amine salt facing the substrate. . As mentioned above, when the substrate is moved up and down, a monomolecular film of polyamic acid amine salt is stacked one by one in each step.The direction of the film-forming molecules is reversed in the pulling step and dipping step, so this method According to the above, a Y-shaped film is formed between each layer in which the parent group and the hydrophobic group of the polyamic acid amine salt face each other.
それに対し、水平付着法は、ポリアミド酸アミン塩の疎
水基が基板に向いた単分子膜が基板上に形成される。こ
の方法では、累積しても。In contrast, in the horizontal deposition method, a monomolecular film is formed on the substrate with the hydrophobic groups of the polyamic acid amine salt facing the substrate. In this way, even if cumulative.
製膜分子の向きの交代はなく全ての、居において、疎水
基が基板側に向いたX型膜が形成される0反対に全ての
層において親木基が基板側に向いた累積膜はX型膜と呼
ばれる。There is no change in the orientation of the film-forming molecules, and an X-type film is formed in which the hydrophobic groups face the substrate in all layers.On the contrary, a cumulative film in which the parent groups face the substrate in all layers is X-shaped. It is called a mold membrane.
単分子層を基板上に移す方法は、これらに限定されるわ
けではなく、大面積基板を用いる時には基板ロールから
水相中に基板を押し出していく方法などもとり得る。ま
た、前述した親木基、疎水基の基板への向きは原則であ
り、基板の表面処理等によって変えることもできる。The method of transferring the monomolecular layer onto the substrate is not limited to these methods, and when a large-area substrate is used, a method of extruding the substrate from a substrate roll into an aqueous phase may also be used. Furthermore, the orientation of the aforementioned parent wood group and hydrophobic group toward the substrate is a general rule, and can be changed by surface treatment of the substrate, etc.
上述の手法により得られた、ポリアミド酸アミン塩の単
分子膜、又は単分子累積膜を、無水酢酸・ピリジン及び
ベンゼンの混合溶液(1:l:3)に浸漬し、イミド化
を行なう、この様にして得られるポリイミド(式A)の
単分子膜又は単分子累積膜は、ポリアミド酸アミン塩の
良、好な累積状態がそのまま
保持されており、高度の秩序性を有する超薄膜(単分子
層当りの厚さ24人)であり、これらの膜で保護層を形
成した場合には電磁変換特性に与える影響を著しく小さ
なものにすることが可能である。A monomolecular film or a monomolecular cumulative film of polyamic acid amine salt obtained by the above method is immersed in a mixed solution of acetic anhydride, pyridine, and benzene (1:1:3) to imidize it. The monomolecular film or monomolecular cumulative film of polyimide (formula A) obtained in the above manner retains the good and favorable cumulative state of the polyamic acid amine salt as it is, and is an ultra-thin film (single-molecular film) with a high degree of order. The thickness per layer is 24 mm), and when a protective layer is formed using these films, it is possible to significantly reduce the influence on electromagnetic conversion characteristics.
更に係る保護層形成を行なった磁性薄膜を必要に応じて
熱処理、或いは真空処理することにより、磁性層との′
!F、tI性の更なる向上轡、保護層の更なる安定化を
図ることもできる。何れに性を本質的に低下させること
なく、特に耐久性、並びに走行性の優れた薄膜堆積型磁
気記録媒体が得られる。本発明に係る保護層の厚さとし
ては、4人〜100人が好適である。Furthermore, by subjecting the magnetic thin film on which the protective layer has been formed to heat treatment or vacuum treatment as necessary, the relationship between the magnetic layer and the magnetic thin film can be improved.
! It is also possible to further improve the F and tI properties and to further stabilize the protective layer. A thin film deposition type magnetic recording medium particularly excellent in durability and runnability can be obtained without essentially deteriorating properties. The thickness of the protective layer according to the present invention is preferably 4 to 100 people.
本発明におけるGo−Cr合金強磁性体薄膜堆積型磁気
記録媒体において、当該磁気記録媒体の支持体の少なく
とも片側表面には磁性層を形成し、・これと反対側の一
方の面には、必要に応じて表面と対称型の薄膜を積層形
成しても良く、あるいは当該基体の保護、滑性、補強、
その他の有効な効果を補足する目的で各種のバックコー
ト層を形成しても良い。In the Go-Cr alloy ferromagnetic thin film deposited magnetic recording medium of the present invention, a magnetic layer is formed on at least one surface of the support of the magnetic recording medium, and a magnetic layer is formed on the opposite surface as necessary. According to
Various back coat layers may be formed for the purpose of supplementing other effective effects.
バックコート層としては、A文、Ti、V、Zr、Co
、Nb、Ta、W、Cr、Si、Ge等の金属、半金属
あるいはその酸化物、窒化物、炭化物の薄膜、あるいは
酸化物微粒子炭酸カルシウム等の易滑性微粒子と、カー
ボン、金属粉末等の導電性粒子と、脂肪酸、脂肪酸エス
テル等の潤滑剤を少なくとも−・種類含む熱可塑性また
は熱硬化性樹脂等の高分子バインダーに混練して塗布し
たものが挙げられる。As the back coat layer, A pattern, Ti, V, Zr, Co
, thin films of metals such as Nb, Ta, W, Cr, Si, and Ge, metalloids or their oxides, nitrides, and carbides, or oxide fine particles, slippery fine particles such as calcium carbonate, and carbon, metal powder, etc. Examples include those obtained by kneading conductive particles and a polymer binder such as a thermoplastic or thermosetting resin containing at least one type of lubricant such as a fatty acid or a fatty acid ester and applying the mixture.
以下に、本発明の効果を、磁気ディスク、磁気テープに
ついての実施例をもって説明するが、本発明による薄膜
堆積型磁気記録媒体はこれらの形態に限定されるもので
はない。The effects of the present invention will be explained below using examples regarding magnetic disks and magnetic tapes, but the thin film deposition type magnetic recording medium according to the present invention is not limited to these forms.
実施例1、比較例1
内容積300fLの重合釜に3 、3’ 、 4 、4
’ −ビフェニルテトラカルボン酸二無水物;20モル
、ピロメリット酸二無水物;80モル、パラフェニレン
ジアミン、70モル及び4.4′−ジアミノジフェニル
エーテル;30モルヲ原料トして厚さlOJLmの芳香
族ポリイミド膜のベースフィルムを製造した。Example 1, Comparative Example 1 3, 3', 4, 4 in a polymerization pot with an internal volume of 300 fL
'-Biphenyltetracarboxylic dianhydride; 20 mol, pyromellitic dianhydride; 80 mol, para-phenylene diamine, 70 mol and 4,4'-diaminodiphenyl ether; A base film of polyimide membrane was manufactured.
この芳香族ポリイミドフィルムについて種々の物性を測
定したが、その結果、引張弾性定数が490Kg/mm
’、熱膨張計数α100〜300″Cが1.6X 10
−5cm/Cm/’C,Rzは80人であった・
この芳香族ポリイミドフィルムをベースフィルムとして
使用し、電子ビーム加熱装置を有した磁気テープの連続
成膜装置により、当該べ一スフ、イルムノ表面にCo7
8wt%−Cr22wt%の垂直磁化蒸着膜をベースフ
ィルムの温度を200℃として、1.1 JLm/ s
e cの成膜速度で約0.4 p−m厚形酸した後、
その上部に酸素10%を含むアルゴンガス中でCOをス
パッタし、酸化コバルト薄膜を80久厚形成した。Various physical properties of this aromatic polyimide film were measured, and as a result, the tensile elastic constant was 490 Kg/mm.
', thermal expansion coefficient α100~300''C is 1.6X 10
-5cm/Cm/'C, Rz was 80 people.Using this aromatic polyimide film as a base film, the base film, Illuminated Co7 on the surface
8wt%-Cr22wt% perpendicular magnetization vapor deposited film with base film temperature of 200°C, 1.1 JLm/s
After about 0.4 pm thick acid deposition at a film formation rate of e c,
On top of this, CO was sputtered in an argon gas containing 10% oxygen to form a cobalt oxide thin film 80 cm thick.
次に、(3)式に示すメボリアミド酸をN。Next, mebolyamic acid shown in formula (3) was mixed with N.
N−ジメチルアセトアミド−ベンゼン混合溶媒(1:l
)に溶解(濃度IXIO−3m)せしめた後、別途調製
した。N、N−ジメチルオクタデシル
アミンの同じ溶媒によるlXl0−3M溶液とを混合し
て(4)式に示すポリアミド酸オクタデシルアミン塩溶
液を調製し、水温20℃の°水相(CH2)170H3
(CH2)17 CH3Z(図1)上に展開した。N-dimethylacetamide-benzene mixed solvent (1:l
) (concentration IXIO-3m), and then separately prepared. A polyamic acid octadecylamine salt solution shown in formula (4) was prepared by mixing a 1X10-3M solution of N,N-dimethyloctadecylamine in the same solvent, and the water phase (CH2) 170H3 at a water temperature of 20°C was prepared.
(CH2)17 Developed on CH3Z (Figure 1).
溶媒蒸発除去後、表面圧を25 m N / mに迄高
めた0表面圧を一定に保ち乍ら、上述磁性体薄膜を基板
として10mm/minの速度で係る基板を水面を横切
る方向に水中より引き上げ、ポリアミド酸オクタデシル
アミン塩の単分子膜を係る基板上に形成した。更に係る
基板を10mm/minの速度で静かに上下させ、3層
に累積したものも作成した。After the solvent was removed by evaporation, the surface pressure was increased to 25 mN/m. While keeping the zero surface pressure constant, the above-mentioned magnetic thin film was used as a substrate and the substrate was lowered from the water in a direction across the water surface at a speed of 10 mm/min. A monomolecular film of polyamic acid octadecylamine salt was formed on the substrate. Further, the substrate was gently moved up and down at a speed of 10 mm/min to create a three-layered substrate.
次に係る磁気シートを無水酢酸、ピリジン及びベンゼン
の混合溶液(1: 1 : 3)に24時間浸漬し、ポ
リアミド酸長釦アルキルアミン酸をイミド化し、ポリイ
ミド単分子膜又は累積膜を得た。係る工程を経た、磁気
シートを8.0mm[にスリットした。このテープのカ
ールは。Next, the magnetic sheet was immersed in a mixed solution of acetic anhydride, pyridine, and benzene (1:1:3) for 24 hours to imidize the polyamic acid and alkylamine acid, thereby obtaining a polyimide monomolecular film or a cumulative film. The magnetic sheet that had undergone the above process was slit into 8.0 mm. This tape curls.
”< 0.1 m m−1と小さく、実用上問題のない
量であった。"<0.1 m m-1, which was a small amount that caused no practical problems.
かくして得られたテープを一方ではそのまま、他方では
70℃、90%RH中に200時間保存して得られた二
種のテープ試料について評価したところ、いずれの試料
についても、早送り走行性に於てはシンチング、テープ
折れ共に全く無く、大変良好であった。また60分間の
スチル画再生中も出力変動がldB以内であり、大変良
好であった。尚、70°C190%RH保存による画質
の劣化、出力低下は認められなかった。When evaluating two types of tape samples, one of which was stored as is and the other was stored at 70°C and 90% RH for 200 hours, both samples showed no improvement in fast-forward running properties. was in very good condition with no cinching or tape bending. Further, even during still image playback for 60 minutes, the output fluctuation was within 1 dB, which was very good. Note that no deterioration in image quality or decrease in output was observed due to storage at 70° C. and 190% RH.
一方、係る保護層の形成を省略した試料では、70℃、
90%RH,200時間の環境試験後のスチル画再生1
5分で大幅に画質が乱れ、出力が低下してしまった。On the other hand, in the sample in which the formation of such a protective layer was omitted, the temperature was 70°C.
Still image playback 1 after 90% RH, 200 hours environmental test
After 5 minutes, the image quality deteriorated significantly and the output decreased.
実施例2、比較例2
3 、3’ 、 4 、4’−ビフェニルテトラカルボ
ン酸二無水物:40モル、ピロメリット酷二無水物、6
0モル、パラフェニレンジアミン;50モル、及び4.
4′−ジアミノジフェニルエーテル=50モルより成る
モノマー成分及び成分比で実施例1と同一方法にて芳香
族ポリアミック酸の溶液組成物を製造した。このように
して得られた溶液組成物を使用し実施例1と同一方法に
て厚さ40gmの芳香族ポリイミドフィルムを製造した
。この芳香族ポリイミドフィルムは引張弾性定数が40
0Kg/mm熱膨張係数αlOO〜300℃が2.6
X 10−5 c m / c m 7℃、Rzは30
久であた。Example 2, Comparative Example 2 3,3',4,4'-biphenyltetracarboxylic dianhydride: 40 mol, pyromellitic dianhydride, 6
0 moles, paraphenylene diamine; 50 moles, and 4.
A solution composition of an aromatic polyamic acid was prepared in the same manner as in Example 1 using a monomer component consisting of 50 moles of 4'-diaminodiphenyl ether and a component ratio. Using the solution composition thus obtained, an aromatic polyimide film having a thickness of 40 gm was produced in the same manner as in Example 1. This aromatic polyimide film has a tensile elastic constant of 40
0Kg/mm thermal expansion coefficient αlOO~300℃ is 2.6
X 10-5 cm/cm 7℃, Rz is 30
It was a long time ago.
この芳香族ポリイミドフィルムをベースフィルムとして
使用し、スパッタリング装置にて当該ベースフィルム上
にCo80wt・%−Cr20Wt・%の垂直磁化膜を
ベースフィルムの温度を150°Cとして、約0.5
g m形成した後、その上部に酸素12%を含むアルゴ
ンガス中でCoをスパッタし1m化コバルトB膜を10
000久厚形成、更にこの上に実施例1と同様の方法に
てポリイミドの単分子膜を形成した後、70℃の恒温炉
にて15分間熱処理を行なった。係る磁気シートをビデ
オフロッピーディスク用に直径47mmに打抜いた。Using this aromatic polyimide film as a base film, a perpendicularly magnetized film of 80 wt.% Co - 20 wt.
After forming a 1m cobalt B film on top of the 1m cobalt B film by sputtering in argon gas containing 12% oxygen.
After forming a polyimide monomolecular film thereon in the same manner as in Example 1, heat treatment was performed for 15 minutes in a constant temperature oven at 70°C. This magnetic sheet was punched out to a diameter of 47 mm for a video floppy disk.
かくして得た磁気フロッピーディスクを用いて、録画再
生200万回及びメチル画50時間の連続再生テストを
それぞれ行ったところ、いずれのテストにおいても、出
力変化が当初に比し、1dB以内であり大変良好であっ
た。また、70℃、90%RH1200時間の環境試験
後に同様な再生テストを行なったが、当初に比し、出力
変化がldB以内であり大変良好であった。Using the magnetic floppy disk obtained in this way, we conducted a continuous playback test of 2 million recordings and 50 hours of methyl images, and in both tests, the output change was within 1 dB compared to the original, which was very good. Met. Further, a similar playback test was conducted after an environmental test at 70° C. and 90% RH for 1200 hours, and the output change was within 1 dB compared to the initial test, which was very good.
一方、上記において係る保護層形成処理を省略して得ら
れたフロッピーディスク試料では。On the other hand, in the floppy disk sample obtained by omitting the protective layer forming process in the above.
録画、再生1万回ならびにスチル画連続再生5分の条件
で、大幅にドロップアウトが増加し、画像の劣化が顕著
に認められた。Under conditions of recording and playback 10,000 times and continuous still image playback for 5 minutes, dropouts increased significantly and image deterioration was noticeable.
実施例3、比較例3
7pm厚のポリアミドフィルム上に80%Co−20%
Ni合金を微量酸素雰囲気中で斜め蒸着して得た磁性薄
膜上に実施例1と同様の方法にてポリイミド単分子膜を
形成させた後、50’0の真空恒温炉で5分間真空熱処
理を行なった。こうして得た磁気シートを、12.65
mm幅にスリットして磁気テープを得た。Example 3, Comparative Example 3 80%Co-20% on 7pm thick polyamide film
A polyimide monomolecular film was formed in the same manner as in Example 1 on a magnetic thin film obtained by diagonally depositing a Ni alloy in a trace oxygen atmosphere, and then subjected to vacuum heat treatment for 5 minutes in a 50'0 vacuum constant temperature oven. I did it. The thus obtained magnetic sheet was 12.65
A magnetic tape was obtained by slitting the tape into mm width.
・かくして得、られた磁気テープを用い、VH3方式ビ
デオデツキによる早送り走行性およびスチル特性を試験
したところ、早送りに際しては、シンチング、テープ折
れ共全く無く、大変良好であった。また60分間のスチ
ル画再生中も、出力変動が1dB以内であり、大変良好
であった。更に70℃、90%RH1200時間、の環
境試験後の記録再生テストに於ても、画像の劣化、出力
低下、走行不良共に無く、大変良好な特性が得られた。- Using the thus obtained magnetic tape, we tested the fast-forward runnability and still characteristics on a VH3 video deck, and found that it was very good, with no shinching or tape bending at all during fast-forwarding. Also, even during still image playback for 60 minutes, the output fluctuation was within 1 dB, which was very good. Furthermore, in a recording/reproduction test after an environmental test at 70° C. and 90% RH for 1200 hours, very good characteristics were obtained with no image deterioration, no output drop, and no running defects.
一方、係る保護層形成を省略した試料では。On the other hand, in the sample where such protective layer formation was omitted.
70℃、90%RH1200時間の環境試験後のスチル
画再生15分で大幅に画質が乱れ、出力が低下してしま
った。After 1200 hours of environmental testing at 70°C and 90% RH, the image quality was significantly disturbed and the output was reduced within 15 minutes of still image playback.
第1図(a)(b)は1本発明に係る保護層を構成する
単分子膜または単分子累積膜を形成する際に用いる成膜
装置を例示する斜視図および縦断面図である。
1:水槽 2二水相FIGS. 1(a) and 1(b) are a perspective view and a vertical cross-sectional view illustrating a film forming apparatus used for forming a monomolecular film or a monomolecular cumulative film constituting a protective layer according to the present invention. 1: Water tank 2 Two aqueous phases
Claims (6)
録媒体に於いて、該有機保護層がポリイミドの単分子膜
又はその累積膜を含むことを特徴とする磁気記録媒体。(1) A magnetic recording medium having a magnetic layer and an organic protective layer on a support, wherein the organic protective layer includes a monomolecular film of polyimide or a cumulative film thereof.
の範囲第1項記載の磁気記録媒体。 ▲数式、化学式、表等があります▼(A) (但し、mは1以上の整数である)(2) The magnetic recording medium according to claim 1, wherein the polyimide is represented by the following formula (A). ▲There are mathematical formulas, chemical formulas, tables, etc.▼(A) (However, m is an integer greater than or equal to 1)
る特許請求の範囲第1項記載の磁気記録媒体。(3) The magnetic recording medium according to claim 1, wherein the organic protective layer has a thickness in the range of 4 to 100 Å.
請求の範囲第1項記載の磁気記録媒体。(4) The magnetic recording medium according to claim 1, wherein the magnetic layer contains a Co-Cr alloy ferromagnetic material.
請求の範囲第1項記載の磁気記録媒体。(5) The magnetic recording medium according to claim 1, which has an intermediate layer between the magnetic layer and the organic protective layer.
5項記載の磁気記録媒体。(6) The magnetic recording medium according to claim 5, wherein the intermediate layer contains cobalt oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12088186A JPS62277625A (en) | 1986-05-26 | 1986-05-26 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12088186A JPS62277625A (en) | 1986-05-26 | 1986-05-26 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62277625A true JPS62277625A (en) | 1987-12-02 |
Family
ID=14797279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12088186A Pending JPS62277625A (en) | 1986-05-26 | 1986-05-26 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62277625A (en) |
-
1986
- 1986-05-26 JP JP12088186A patent/JPS62277625A/en active Pending
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