JPS6361418A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS6361418A JPS6361418A JP20617986A JP20617986A JPS6361418A JP S6361418 A JPS6361418 A JP S6361418A JP 20617986 A JP20617986 A JP 20617986A JP 20617986 A JP20617986 A JP 20617986A JP S6361418 A JPS6361418 A JP S6361418A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- plasma
- protective film
- magnetic
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 230000001681 protective effect Effects 0.000 claims abstract description 47
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000000178 monomer Substances 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000000314 lubricant Substances 0.000 claims description 21
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 150000002894 organic compounds Chemical class 0.000 claims description 10
- 229910001111 Fine metal Inorganic materials 0.000 claims description 8
- 239000002923 metal particle Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 85
- 229920006267 polyester film Polymers 0.000 abstract description 9
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 8
- 229910052725 zinc Inorganic materials 0.000 abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 3
- 239000011241 protective layer Substances 0.000 abstract description 3
- 229910052804 chromium Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 239000013528 metallic particle Substances 0.000 abstract 3
- VDRSDNINOSAWIV-UHFFFAOYSA-N [F].[Si] Chemical compound [F].[Si] VDRSDNINOSAWIV-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 239000010408 film Substances 0.000 description 49
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000007789 gas Substances 0.000 description 15
- 235000021355 Stearic acid Nutrition 0.000 description 9
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 9
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 9
- 239000008117 stearic acid Substances 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- 239000010419 fine particle Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- -1 hexamethylsiloxane Chemical compound 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- RNYJXPUAFDFIQJ-UHFFFAOYSA-N hydron;octadecan-1-amine;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[NH3+] RNYJXPUAFDFIQJ-UHFFFAOYSA-N 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 238000001883 metal evaporation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- PRAKJMSDJKAYCZ-UHFFFAOYSA-N squalane Chemical compound CC(C)CCCC(C)CCCC(C)CCCCC(C)CCCC(C)CCCC(C)C PRAKJMSDJKAYCZ-UHFFFAOYSA-N 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 239000004909 Moisturizer Substances 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- ULBTUVJTXULMLP-UHFFFAOYSA-N butyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCC ULBTUVJTXULMLP-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- AMFIJXSMYBKJQV-UHFFFAOYSA-L cobalt(2+);octadecanoate Chemical compound [Co+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AMFIJXSMYBKJQV-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000001333 moisturizer Effects 0.000 description 1
- 229940043348 myristyl alcohol Drugs 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- JXTPJDDICSTXJX-UHFFFAOYSA-N n-Triacontane Natural products CCCCCCCCCCCCCCCCCCCCCCCCCCCCCC JXTPJDDICSTXJX-UHFFFAOYSA-N 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- WTBAHSZERDXKKZ-UHFFFAOYSA-N octadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCCCC(Cl)=O WTBAHSZERDXKKZ-UHFFFAOYSA-N 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- QWPNJOHZHSJFIY-UHFFFAOYSA-N octyl tetradecanoate Chemical compound CCCCCCCCCCCCCC(=O)OCCCCCCCC QWPNJOHZHSJFIY-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940032094 squalane Drugs 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HSXKFDGTKKAEHL-UHFFFAOYSA-N tantalum(v) ethoxide Chemical compound [Ta+5].CC[O-].CC[O-].CC[O-].CC[O-].CC[O-] HSXKFDGTKKAEHL-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- ZRLCXMPFXYVHGS-UHFFFAOYSA-N tetramethylgermane Chemical compound C[Ge](C)(C)C ZRLCXMPFXYVHGS-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は磁気記録媒体およびその製造方法に関し、さ
らに詳しくは摩擦係数が小さくて耐久性に優れた磁気記
録媒体およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium and a method of manufacturing the same, and more particularly to a magnetic recording medium with a small coefficient of friction and excellent durability and a method of manufacturing the same.
一般に、金属もしくはそれらの合金などをＭ空蒸着、ス
パッタリング等によって基体フィルム上に被着するか、
あるいは磁性粉末を結合剤成分とともに基体フィルム上
に結着してつくられる磁気記録媒体は、記録再生時に磁
気ヘッド等と激しく摺接するため磁性層が摩耗されやす
く、特に真空蒸着等によって形成される強磁性金属薄膜
層は、高密度記録に適した特性を有する反面、磁気ヘッ
ドとの摩擦係数が大きくて、摩耗や損傷を受は易い。In general, metals or their alloys are deposited on a base film by M-vacuum deposition, sputtering, etc.
Alternatively, magnetic recording media made by bonding magnetic powder together with a binder component onto a base film are susceptible to abrasion of the magnetic layer due to violent sliding contact with a magnetic head etc. during recording and reproduction. Although the magnetic metal thin film layer has characteristics suitable for high-density recording, it has a large coefficient of friction with the magnetic head and is easily subject to wear and damage.
このため、従来から磁性層上に種々の保護膜層を設ける
などして耐久性を改善することが行われており、たとえ
ば、高級脂肪酸やフッ素系化合物等の潤滑剤を被着させ
たり（特開昭５３−８８７０４号、特開昭５８−９４１
３０号）、あるいは、有機化合物のモノマーガスのプラ
ズマ重合により高分子化合物のＨＨ＊を設けたり（特開
昭５８−８８８２８号、特開昭５８−６０４２７号）、
またイオン化プラズマ分解重合により炭素水素買被膜を
形成する（特開昭６０−１５７７２６号）ことが提案さ
れている。For this reason, durability has been conventionally improved by providing various protective film layers on the magnetic layer. Publication No. 53-88704, Japanese Patent Publication No. 58-941
30), or provide HH* of a polymer compound by plasma polymerization of a monomer gas of an organic compound (JP-A-58-88828, JP-A-58-60427),
It has also been proposed to form a carbon-hydrogen film by ionization plasma decomposition polymerization (Japanese Patent Laid-Open No. 157726/1983).
ところが、これらの保護膜層を磁性層上に設け′たもの
は耐久性が未だ充分ではなく、磁気ヘッドとの摺接によ
り比較的短時間で摩耗しやすくて、未だ充分に満足でき
る耐久性は得られていない。However, the durability of these protective film layers provided on the magnetic layer is not yet sufficient, and they tend to wear out in a relatively short period of time due to sliding contact with the magnetic head, so the durability is still not satisfactory. Not obtained.
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、基体上に磁性層を形成した後、この磁性層
上に金属微粒子を含有させて表面に凹凸を形成したプラ
ズマ重合保護膜層を形成することによって、磁気ヘッド
等との摺動の際の真実接触面積を低減し、摩擦係数を充
分に小さくして耐久性を充分に向上させたものである。This invention was made as a result of various studies in view of the current situation. After forming a magnetic layer on a substrate, a plasma-polymerized protective film layer is formed on the magnetic layer by containing fine metal particles to form irregularities on the surface. By forming this, the actual contact area during sliding with a magnetic head etc. is reduced, the coefficient of friction is sufficiently reduced, and durability is sufficiently improved.
またプラズマ重合保護膜層上にさらに潤滑剤層を形成す
ることによって、耐久性をさらに一段と向上させたもの
である。Further, by further forming a lubricant layer on the plasma polymerized protective film layer, durability is further improved.
この発明において、磁性層上に形成するプラズマ重合保
護膜層は、磁性層を真空雰囲気内で有機化合物のモノマ
ーガスのプラズマ中にさらしてプラズマ重合を行うと同
時に、金属を加熱蒸発させて得た蒸気流を磁性層に差し
向けることによって形成され、このように有機化合物の
プラズマ重合と同時に金属の加熱蒸発が行われると、加
熱蒸発された金属が微粒子となって磁性層上に被着し、
金属の微粒子を含有して表面に凹凸を形成した有機化合
物のプラズマ重合保護層が形成される。しかして、この
プラズマ重合保護層の凹凸によって磁気ヘッド等との摺
動の際の真実接触面積が低減され、摩擦係数が充分に小
さくなって走行性が改善され、耐久性が充分に向上され
る。In this invention, the plasma-polymerized protective film layer formed on the magnetic layer is obtained by exposing the magnetic layer to plasma of monomer gas of an organic compound in a vacuum atmosphere to perform plasma polymerization and at the same time heating and evaporating the metal. It is formed by directing a vapor flow toward the magnetic layer, and when the metal is heated and evaporated simultaneously with the plasma polymerization of the organic compound, the heated and evaporated metal becomes fine particles and adheres to the magnetic layer.
A plasma-polymerized protective layer of an organic compound containing fine metal particles and having an uneven surface is formed. The unevenness of this plasma-polymerized protective layer reduces the actual contact area when sliding with a magnetic head, etc., and the coefficient of friction becomes sufficiently small, improving running performance and sufficiently increasing durability. .
このように、プラズマ重合と同時に金属蒸発源で加熱蒸
発されて使用される金属としては、亜鉛、アルミニウム
、ニッケル、コバルト、クロム、チタン、鉄等の金属ま
たはこれらの合金が好適なものとして使用され、これら
の金属は抵抗加熱や電子銃加熱により加熱蒸発され、磁
性層に差し向けられて微粒子となって磁性層上に被着す
る。As described above, metals such as zinc, aluminum, nickel, cobalt, chromium, titanium, and iron, or alloys thereof, are preferably used as metals that are heated and evaporated in a metal evaporation source at the same time as plasma polymerization. These metals are heated and evaporated by resistance heating or electron gun heating, directed toward the magnetic layer, and become fine particles that are deposited on the magnetic layer.
また、プラズマ重合に使用される有機化合物のモノマー
ガスとしては、たとえば、メタン、プロパン、エチレン
、プロピレンなどの炭化水素系化合物のモノマーガス、
Ｃ２Ｆ４ 、Ｃ３Ｆｓ 、Ｃ３Ｆ、等のフッ素系有機化
合物のモノマーガス、テトラメチルシラン、ヘキサメチ
ルジシラン、ヘキサメチルジシラザン、ヘキサメチルシ
ロキサン、オクタメチルシクロテトラシロキサンなどの
ケイ素系有機化合物のモノマーガス、テトラメチルスズ
、テトラメチルゲルマニウム、フェロセン、ペンタエト
キシタンタル、チタニウムテトライソプロポキサイドな
どの有機金属化合物のモノマーガス等が好ましく使用さ
れる。これらの有機化合物のモノマーガスは、単独ある
いは希ガス、水素ガス、酸素ガス等と混合し、１３．５
６ ＭＨｚの高周波や、２．５６ＧＨ２のマイクロ波に
よりプラズマ化して磁性層上でプラズマ重合され、この
とき同時に金属の蒸気流が差し向けられるため、金属の
微粒子を含有して表面に凹凸を形成したプラズマ重合保
護膜層が磁性層上に形成される。In addition, monomer gases for organic compounds used in plasma polymerization include, for example, monomer gases for hydrocarbon compounds such as methane, propane, ethylene, and propylene;
Monomer gas of fluorine-based organic compounds such as C2F4, C3Fs, C3F, monomer gas of silicon-based organic compounds such as tetramethylsilane, hexamethyldisilane, hexamethyldisilazane, hexamethylsiloxane, octamethylcyclotetrasiloxane, tetramethyl Monomer gases of organometallic compounds such as tin, tetramethylgermanium, ferrocene, pentaethoxytantalum, and titanium tetraisopropoxide are preferably used. The monomer gas of these organic compounds can be used alone or mixed with rare gas, hydrogen gas, oxygen gas, etc.
It is turned into plasma by 6 MHz high frequency and 2.56 GH2 microwave and plasma polymerized on the magnetic layer, and at the same time, a metal vapor flow is directed, so it contains fine metal particles and forms unevenness on the surface. A plasma polymerized overcoat layer is formed over the magnetic layer.
このようにして形成されるプラズマ重合保護膜層におけ
る金属微粒子の配合割合は、プラズマ重合保護膜層の全
成分に対して１０〜７０重量％の範囲内であることが好
ましく、少なすぎても多すぎても表面に凹凸を良好に形
成することができない。また、プラズマ重合保護膜層の
表面の凹凸は、［０，０１〜０．２０ＩＩｍの範囲内の
ものがｌＸｌＯ１２〜ｌＸ１０１４Ｘｌ−形成されてい
るのが好ましく、幅が狭すぎたり、少なすぎると所期の
効果が得られず、幅が広すぎたり、多すぎたりすると電
磁変換特性に悪影響を及ぼす。この凹凸の幅の大きさお
よび個数等は、金属の加熱蒸発とプラズマ重合を同時に
行う際のガス圧および高周波電力、マイクロ波電力等を
制御することによってコントロールされ、従って、金属
の加熱蒸発とプラズマ重合を同時に行う場合のガス圧お
よび高周波の電力やマイクロ波電力は、プラズマ重合保
護膜層の表面に良好な凹凸を形成するため、ガス圧を０
．０１〜５トールの範囲内とし、高周波電力を０．０１
〜２Ｗ／ ｃｎｌ、マイクロ波電力を０．０１〜２Ｗ／
−の範囲内とするのが好ましく、ガス圧を０．０３〜１
．５トールとし、高周波電力を、０．０５〜ｌ Ｗ／ｃ
ｄ、マイクロ波電力を０．０５〜Ｉ Ｗ／ｃｎ！の範囲
内とするのがより好ましい。また、このようにして形成
される表面に凹凸を存するプラズマ重合保護膜層の膜厚
は、５０〜１０００人の範囲内であることが好ましく、
膜厚が薄すぎると充分な凹凸を有する保護膜層が得られ
ず、走行性および耐久性が充分に向上されない。また厚
すぎると内部応力によりクラックが生じ、さらにスペー
シングロスが大きくなりすぎて電磁変換特性に悪影響を
及ぼすため好ましくない。The proportion of metal fine particles in the plasma-polymerized protective film layer formed in this manner is preferably within the range of 10 to 70% by weight based on the total components of the plasma-polymerized protective film layer; If it is too thick, it will not be possible to form unevenness on the surface well. In addition, the unevenness on the surface of the plasma-polymerized protective film layer is preferably formed within the range of [0.01 to 0.20IIm], and if the width is too narrow or too small, If the width is too wide or there are too many, the electromagnetic conversion characteristics will be adversely affected. The width and number of these irregularities are controlled by controlling the gas pressure, high frequency power, microwave power, etc. when simultaneously performing metal heating evaporation and plasma polymerization. In order to form good unevenness on the surface of the plasma-polymerized protective film layer, the gas pressure and high-frequency power or microwave power when performing polymerization at the same time are reduced to 0.
．． Within the range of 0.01 to 5 torr, and the high frequency power is 0.01
~2W/cnl, microwave power 0.01~2W/
- It is preferable to set the gas pressure within the range of 0.03 to 1
．． 5 torr and high frequency power of 0.05 to 1 W/c.
d. Microwave power 0.05~I W/cn! It is more preferable to set it within the range of . Further, the thickness of the plasma polymerized protective film layer formed in this way, which has irregularities on the surface, is preferably within the range of 50 to 1000.
If the film thickness is too thin, a protective film layer with sufficient irregularities cannot be obtained, and runnability and durability cannot be sufficiently improved. Moreover, if it is too thick, cracks will occur due to internal stress, and the spacing loss will become too large, which will adversely affect electromagnetic conversion characteristics, which is not preferable.
このようにして形成された表面に凹凸を有するプラズマ
重合保護膜層は、さらに潤滑剤層が積層されると摩擦係
数がさらに低減されて耐久性が一段と向上される。この
ようなプラズマ重合保護膜層上に積層形成される潤滑剤
層は、潤滑剤を、たとえば、メチルイソブチルケトン、
メチルエチルケトン、イソプロピルアルコール、ベンゼ
ン、トルエン、フレオン、シクロヘキサノン、酢酸エチ
ル、テトラヒドロフラン、ジメチルホルムアミド、ジオ
キサン等の適当な溶剤に熔解し、溶解によって得られた
溶液中にプラズマ重合保護膜層を浸漬するか、或いは上
記溶液を予め形成されたプラズマ重合保護膜層上に塗布
または噴霧するなどの方法で被着され、さらに潤滑剤を
、プラズマ重合、ＣｖＤ、スパッタリング、真空蒸着等
の方法でプラズマ重合保護膜層上に被着する方法でも被
着される。When a lubricant layer is further laminated on the thus formed plasma polymerized protective film layer having an uneven surface, the coefficient of friction is further reduced and the durability is further improved. The lubricant layer laminated on such a plasma polymerized protective film layer contains a lubricant such as methyl isobutyl ketone,
Dissolve in a suitable solvent such as methyl ethyl ketone, isopropyl alcohol, benzene, toluene, freon, cyclohexanone, ethyl acetate, tetrahydrofuran, dimethylformamide, dioxane, etc., and immerse the plasma polymerized protective film layer in the solution obtained by dissolution, or The solution is coated on the plasma polymerized protective film layer formed in advance by a method such as coating or spraying, and a lubricant is further applied on the plasma polymerized protective film layer by a method such as plasma polymerization, CvD, sputtering, vacuum deposition, etc. It can also be deposited by a method of depositing on.
使用される潤滑剤としては、脂肪族系潤滑剤、フッ素系
潤滑剤、シリコーン系潤滑剤および炭化水素系潤滑剤等
がいずれも好適なものとして使用され、脂肪族系潤滑剤
としては、ラウリン酸、ミリスチン酸、パルミチン酸、
ステアリン酸、ベヘン酸等の脂肪酸、ステアリン酸亜鉛
、ステアリン酸コバルト等の脂肪酸の金属塩、ステアリ
ン酸−ｎ−ブチル、ミリスチン酸オクチル等の脂肪酸エ
ステル、ステアリルアルコール、ミリスチルアルコール
等の脂肪族アルコール、トリメチルステアリルアンモニ
ウムクロライド、塩化ステアロイル等の塩化物、ステア
リルアミン、ステアリルアミンアセテート、ステアリル
アミンハイドロクロライド等のアミン等が挙げられる。Suitable lubricants used include aliphatic lubricants, fluorine-based lubricants, silicone-based lubricants, and hydrocarbon-based lubricants. Among the aliphatic lubricants, lauric acid , myristic acid, palmitic acid,
Fatty acids such as stearic acid and behenic acid, metal salts of fatty acids such as zinc stearate and cobalt stearate, fatty acid esters such as n-butyl stearate and octyl myristate, fatty alcohols such as stearyl alcohol and myristyl alcohol, trimethyl Examples include chlorides such as stearyl ammonium chloride and stearoyl chloride, and amines such as stearylamine, stearylamine acetate, and stearylamine hydrochloride.
またフッ素系潤？ｆｔ剤としては、パーフルオロポリエ
ーテルフルオロアルキルポリエーテルなどが好適なもの
として使用され、市販品の具体例としては、ダイキン社
製ダイフロイル＃２０、デュポン社製クライトツクスＭ
１クライトツクスＨ，パイダックスＡＲ，モンテジソン
社製フォンブリンＺ等が挙げられる。さらにシリコーン
系潤滑剤としては、シリコーンオイル、変性シリコーン
オイル等が挙げられ、炭化水素系潤滑剤としては、パラ
フィン、スクアラン、ワックス等が挙げられる。なお、
これらの潤滑剤のうち、極性基を有するものはプラズマ
重合保護膜層との密着性がよく、特に摩擦係数を下げる
効果があるためより好ましく使用される。Another fluorine-based moisturizer? As the ft agent, perfluoropolyether fluoroalkyl polyether and the like are preferably used, and specific examples of commercially available products include Daifloil #20 manufactured by Daikin and Krytx M manufactured by DuPont.
Examples include 1 Kritex H, Pydax AR, and Fomblin Z manufactured by Montegisson. Furthermore, silicone-based lubricants include silicone oil, modified silicone oil, and the like, and hydrocarbon-based lubricants include paraffin, squalane, wax, and the like. In addition,
Among these lubricants, those having polar groups are more preferably used because they have good adhesion to the plasma polymerized protective film layer and are particularly effective in lowering the coefficient of friction.
使用に際しては、その１種または２種以上が混合して使
用され、また被着量は、プラズマ重合保護膜層上に２０
〜２００人の被膜が形成される範囲内で被着させるのが
好ましく、２０人より膜厚が薄いと所期の効果が得られ
ず、２００人より膜厚が厚いとスペーシングロスが大き
くなりすぎて電気的特性に悪影響を及ぼす。When used, one type or a mixture of two or more of them is used, and the amount of coating is 20% on the plasma polymerized protective film layer.
It is preferable to apply within the range where a film of ~200 people is formed; if the film thickness is thinner than 20 people, the desired effect will not be obtained, and if the film thickness is thicker than 200 people, the spacing loss will be large. Too much will adversely affect electrical characteristics.
基体上に形成される磁性層は、γ−ｉ’；’ｅ２ｏ。The magnetic layer formed on the substrate is γ-i';'e2o.
粉末、Ｆｅ３０４粉末、Ｃｏ含有ｒ−Ｆｅ２０３粉末、
Ｃｏ含有Ｆｅ３Ｏ４粉末、Ｆｅ粉末、Ｃ。powder, Fe304 powder, Co-containing r-Fe203 powder,
Co-containing Fe3O4 powder, Fe powder, C.
粉末、Ｆｅ−Ｎｉ粉末などの磁性粉末を結合剤成分およ
び有機溶剤等とともに基体上に塗布、乾燥するか、ある
いは、Ｃｏ、Ｆｅ、Ｎｉ、Ｃｏ−Ｎｉ合金、Ｃｏ−Ｃｒ
合金、Ｃｏ−Ｐ合金、Ｇｏ−Ｎｉ−Ｐ合金などの強磁性
材を、真空蒸着、イオンブレーティング、スパッタリン
グ、メッキ等の手段によって基体上に被着するなどの方
法で形成される。Co, Fe, Ni, Co-Ni alloy, Co-Cr
It is formed by depositing a ferromagnetic material such as alloy, Co--P alloy, Go--Ni--P alloy, etc. on the substrate by means such as vacuum evaporation, ion blasting, sputtering, and plating.
また、磁気記録媒体としては、ポリエステルフィルム、
ポリイミドフィルムなどの合成樹脂フィルムを基体とす
る磁気テープ、合成樹脂フィルム、アルミニウム板およ
びガラス扱等からなる円盤やドラムを基体とする磁気デ
ィスクや磁気ドラムなど、磁気ヘッドと摺接する構造の
種々の形態を包含する。In addition, as magnetic recording media, polyester film,
Various types of structures that come into sliding contact with magnetic heads, such as magnetic tapes based on synthetic resin films such as polyimide films, magnetic disks and magnetic drums based on disks and drums made of synthetic resin films, aluminum plates, glass, etc. includes.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例１
厚さ１０μｍのポリエステルフィルムを真空蒸着装置に
袋層し、ｌＸｌ０−５トールの真空下でコバルトを加熱
蒸発させて、ポリエステルフィルム上に厚さ１００人の
コバルトからなる強磁性金属薄膜層を形成した。次いで
、第１図に示すプラズマ処理装置を使用し、強磁性金属
薄膜層を形成したポリエステルフィルム１を処理槽２内
の原反ロール３からガイドロール４を介し、円筒状キャ
ン５に沿って２ｍ／分の速度で移動させ、さらにガイド
ロール６を介して巻き取りロール７に巻き取るようにセ
ットした。続いて、円筒状キャン５の下方に配設した金
属蒸発源８で亜鉛９を電子銃で加熱蒸発させると同時に
、処理槽２に取りつけたガス導入管ＩＯから処理槽２内
にメタンのモノマーガスを１００ｓｅｃｍの流量で導入
して、ガス圧を０．０９トールとし、電極１１に１３．
５６Ｍ）ＩｚＯ高周波を１００Ｗで印加してプラズマ重
合を行い、プラズマ重合保護膜層を形成した。このとき
のプラズマ重合保護膜層の層厚は３００人で、亜鉛およ
び亜鉛酸化物の微粒子を含み、表面に！０．０３μｍの
凹凸が１．６Ｘ １０１３個／ｃｆＩｌ形成されていた
。しかる後、所定の幅に裁断して、第２図に示すような
ポリエステルフィルム１上に強磁性金属薄膜層１４およ
び凹凸を有する全屈微粒子含有プラズマ重合保護膜層１
５を順次に積層形成した磁気テープＡをつくった。なお
、第１図中１２は処理槽２内を減圧するための排気系で
あり、１３は電極１１に高周波を印加するための高周波
電源である。Example 1 A polyester film with a thickness of 10 μm was layered in a vacuum evaporation apparatus, and cobalt was heated and evaporated under a vacuum of lXl0-5 torr to form a ferromagnetic metal thin film layer of cobalt with a thickness of 100 μm on the polyester film. was formed. Next, using the plasma processing apparatus shown in FIG. 1, the polyester film 1 on which the ferromagnetic metal thin film layer was formed was passed from the raw roll 3 in the processing tank 2 through the guide roll 4 and along the cylindrical can 5 for 2 m. The film was moved at a speed of 1/2 min, and further set to be wound onto a winding roll 7 via a guide roll 6. Next, zinc 9 is heated and evaporated with an electron gun in the metal evaporation source 8 disposed below the cylindrical can 5, and at the same time, methane monomer gas is introduced into the processing tank 2 from the gas introduction pipe IO attached to the processing tank 2. was introduced at a flow rate of 100 sec, the gas pressure was set to 0.09 torr, and 13.
56M) IzO high frequency was applied at 100 W to perform plasma polymerization to form a plasma polymerized protective film layer. At this time, the plasma polymerized protective film layer had a thickness of 300 mm and contained fine particles of zinc and zinc oxide on the surface! 1.6×1013 unevenness/cfIl of 0.03 μm were formed. Thereafter, it is cut to a predetermined width, and a ferromagnetic metal thin film layer 14 and a plasma polymerized protective film layer 1 containing full-fledged fine particles having unevenness are formed on the polyester film 1 as shown in FIG.
Magnetic tape A was prepared by sequentially laminating the magnetic tapes 5 and 5. Note that 12 in FIG. 1 is an exhaust system for reducing the pressure inside the processing tank 2, and 13 is a high frequency power source for applying high frequency to the electrode 11.
実施例２
実施例１におけるプラズマ重合保護膜層の形成において
、亜鉛に代えてアルミニウムを加熱蒸発させた以外は、
実施例１と同様にして強磁性金属薄膜層上に、厚さ３５
０人で、アルミニウム及びアルミニウム酸化物の微粒子
を含み、幅０．０５μｍの凹凸が３ Ｘ １０”（ＩＩ
Ｉ／ｃａｔ形成されたプラズマ重合保護膜層を形成し、
磁気テープＡをつくった。Example 2 In the formation of the plasma polymerized protective film layer in Example 1, except that aluminum was heated and evaporated instead of zinc.
In the same manner as in Example 1, a layer with a thickness of 35 mm was deposited on the ferromagnetic metal thin film layer.
0 person, containing fine particles of aluminum and aluminum oxide, 0.05 μm wide unevenness is 3 × 10” (II
forming a plasma polymerized protective film layer formed with I/cat;
I made magnetic tape A.
実施例３
実施例１におけるプラズマ重合保護膜層の形成において
、メタンのモノマーガスに代えて、テトラメチルシラン
のモノマーガスを１５０ｓｅｃｍの流量で導入した以外
は、実施例１と同様にして強磁性金属薄膜層上に、厚さ
２５０人で、亜鉛および亜鉛酸化物の微粒子を含み、＠
０．０２μｍの凹凸が５Ｘ１０１３（固／ｅｌ＋！形成
されたプラズマ重合保護膜層を形成し、磁気テープＡを
つくった。Example 3 Ferromagnetic metal On the thin film layer, with a thickness of 250 mm, containing fine particles of zinc and zinc oxide, @
A plasma-polymerized protective film layer having 5×1013 (solid/el+!) irregularities of 0.02 μm was formed to prepare magnetic tape A.
実施例４
実施例１において、プラズマ重合保護膜層を形成した後
、さらにこのプラズマ重合保護膜層上に、ステアリン酸
のｏ、ｉｉｉ％トルエン溶液を塗布、乾燥して、ステア
リン酸からなる厚さ５０人の潤滑剤層を形成した以外は
、実施例１と同様にして第３図に示すような、ポリエス
テルフィルムｌ上に、強磁性金属薄膜層１４、凹凸を有
する金属微粒子含有プラズマ重合保護膜層１５および潤
滑剤層１６を順次に積層形成した磁気テープＢをつく
った。Example 4 After forming the plasma-polymerized protective film layer in Example 1, a toluene solution of stearic acid at 0, iii% was applied on the plasma-polymerized protective film layer and dried to form a thick layer of stearic acid. A ferromagnetic metal thin film layer 14 and a plasma polymerized protective film containing fine metal particles having irregularities were formed on a polyester film l as shown in FIG. A magnetic tape B is prepared in which layer 15 and lubricant layer 16 are sequentially laminated.
It was.
実施例５
実施例２において、プラズマ重合保護膜層を形成した後
、さらにこのプラズマ重合保護膜層上に、ステアリン酸
の０．１重量％トルエン溶液を塗布、乾燥して、ステア
リン酸からなる厚さ５０人の潤滑剤層を形成した以外は
、実施例２と同様にして第３図に示すような磁気テープ
Ｂをつくった。Example 5 After forming the plasma-polymerized protective film layer in Example 2, a 0.1% by weight toluene solution of stearic acid was applied on the plasma-polymerized protective film layer and dried to form a thick layer of stearic acid. A magnetic tape B as shown in FIG. 3 was produced in the same manner as in Example 2 except that a 50-layer lubricant layer was formed.
実施例６
実施例３において、プラズマ重合保護膜層を形成した後
、さらにこのプラズマ重合保護膜層上に、ステアリン酸
の０．１重量％トルエン溶液を塗布、乾燥して、ステア
リン酸からなる厚さ５０人の潤滑剤層を形成した以外は
、実施例３と同様にして第３図に示すような磁気テープ
Ｂをつくった。Example 6 After forming the plasma-polymerized protective film layer in Example 3, a 0.1% by weight toluene solution of stearic acid was applied on the plasma-polymerized protective film layer and dried to form a thick layer of stearic acid. A magnetic tape B as shown in FIG. 3 was produced in the same manner as in Example 3 except that a 50-layer lubricant layer was formed.
実施例７
α−Ｆｅ磁性粉末 ６００重量部エスレッ
クＣＮ（ｍ水化学工業 ８０〃社製、塩化ヒニルー酢
酸ヒニ
ル共重合体）
バンデソクスＴ−５２５０（大 ３０〃日本インキ化
学工業社製、ウ
レタンエラストマー）
コロネートしく日本ポリウレタ １０〃ン工業社製、
三官能性低分子
量イソシアネート化合物）
メチルイソブチルケトン ４００〃トルエン
４００〃この組成物をボールミル中
で７２時間混合分散して磁性塗料を調製し、この磁性塗
料を厚さ１０μｍのポリエステルフィルム上に乾燥厚が
４μｍとなるように塗布、乾燥して磁性層を形成した。Example 7 α-Fe magnetic powder 600 parts by weight Eslec CN (manufactured by Mizu Kagaku Kogyo 80, hinyl chloride-hinyl acetate copolymer) Bandesox T-5250 (large 30, manufactured by Nippon Ink Chemical Industries, Ltd., urethane elastomer) Coronate Shiku Nippon Polyurethane 10 Manufactured by Kogyo Co., Ltd.
Trifunctional low molecular weight isocyanate compound) Methyl isobutyl ketone 400〃Toluene
400 This composition was mixed and dispersed in a ball mill for 72 hours to prepare a magnetic paint, and this magnetic paint was applied onto a polyester film with a thickness of 10 μm to a dry thickness of 4 μm, and dried to form a magnetic layer. did.
次いで、これに実施例１と同様にしてプラズマ重合保護
膜層を形成し、磁気テープをつくった。Next, a plasma polymerized protective film layer was formed thereon in the same manner as in Example 1 to produce a magnetic tape.
実施例８
実施例７において、プラズマ重合保護膜層を形成した後
、さらにこのプラズマ重合保護膜層上に、ステアリン酸
の０．１重量％トルエン溶液を塗布、乾燥して、ステア
リン酸からなる厚さ５０人の潤滑剤層を形成した以外は
、実施例７と同様にして磁気テープをつくった。Example 8 After forming the plasma-polymerized protective film layer in Example 7, a 0.1% by weight toluene solution of stearic acid was further applied on the plasma-polymerized protective film layer and dried to form a thick layer of stearic acid. A magnetic tape was produced in the same manner as in Example 7, except that a 50-layer lubricant layer was formed.
比較例１
実施例１において、プラズマ重合保護膜層の形成を省い
た以外は実施例Ｉと同様にして磁気テープをつくった。Comparative Example 1 A magnetic tape was produced in the same manner as in Example I except that the formation of the plasma polymerized protective film layer was omitted.
比較例２
実施例４において、プラズマ重合保護膜層の形成を省い
た以外は実施例４と同様にして磁気テープをつくった。Comparative Example 2 A magnetic tape was produced in the same manner as in Example 4, except that the formation of the plasma polymerized protective film layer was omitted.
比較例３
実施例７において、プラズマ重合保護膜層の形成を省い
た以外は実施例７と同様にして磁気テープをつくった。Comparative Example 3 A magnetic tape was produced in the same manner as in Example 7 except that the formation of the plasma polymerized protective film layer was omitted.
比較例４
実施例８において、プラズマ重合保護膜層の形成を省い
た以外は実施例８と同様にして磁気テープをつくった。Comparative Example 4 A magnetic tape was produced in the same manner as in Example 8 except that the formation of the plasma polymerized protective film layer was omitted.
各実施例および各比較例で得られた磁気テープについて
、摩擦係数を測定し、耐久性を試験した。耐久性試験は
、スチル試験機でスチル寿命を測定して行った。The coefficient of friction was measured for the magnetic tapes obtained in each Example and each Comparative Example, and the durability was tested. The durability test was conducted by measuring the still life using a still testing machine.
下記第１表はその結果である。Table 1 below shows the results.
第１表
〔発明の効果〕
上表から明らかなように、この発明で得られた磁気テー
プ（実施例１ないし８）は、いずれも比較例１ないし４
で得られた磁気テープに比し、摩擦係数が小さくて、ス
チル寿命が長く、このことからこの発明によって得られ
る磁気記録媒体は、−段と耐久性に優れていることがわ
かる。Table 1 [Effects of the Invention] As is clear from the above table, the magnetic tapes obtained according to the present invention (Examples 1 to 8) are the same as Comparative Examples 1 to 4.
Compared to the magnetic tape obtained by the present invention, the coefficient of friction is smaller and the still life is longer, which indicates that the magnetic recording medium obtained by the present invention is significantly more durable.
第１図はプラズマ処理装置の１例を示す概略断面図、第
２図および第３図はこの発明によって得られた磁気テー
プの部分拡大断面図である。
１・・・ポリエステルフィルム（基体）、１４・・・強
磁性金属薄膜層（磁性層）、１５・・・プラズマ重合保
護膜層、１６・・・潤滑剤層、Ａ、Ｂ・・・磁気テープ
（磁気記録媒体）
第１図FIG. 1 is a schematic sectional view showing one example of a plasma processing apparatus, and FIGS. 2 and 3 are partially enlarged sectional views of a magnetic tape obtained according to the present invention. DESCRIPTION OF SYMBOLS 1... Polyester film (substrate), 14... Ferromagnetic metal thin film layer (magnetic layer), 15... Plasma polymerized protective film layer, 16... Lubricant layer, A, B... Magnetic tape (Magnetic recording medium) Figure 1
Claims (1)
子を含有させて表面に凹凸を形成したプラズマ重合保護
膜層を設けたことを特徴とする磁気記録媒体 ２、基体上に磁性層を形成し、この磁性層上に金属微粒
子を含有させて表面に凹凸を形成したプラズマ重合保護
膜層を設け、さらにこのプラズマ重合保護膜層上に潤滑
剤層を設けたことを特徴とする磁気記録媒体 ３、基体上に磁性層を形成し、次いで、この磁性層を真
空雰囲気内で有機化合物のモノマーガスのプラズマ中に
さらしてプラズマ重合を行うと同時に、金属を加熱蒸発
させて得た蒸気流を磁性層に差し向け、金属微粒子を含
有させて表面に凹凸を形成したプラズマ重合保護膜層を
磁性層上に形成することを特徴とする磁気記録媒体の製
造方法 ４、基体上に磁性層を形成し、次いで、この磁性層を真
空雰囲気内で有機化合物のモノマーガスのプラズマ中に
さらしてプラズマ重合を行うと同時に、金属を加熱蒸発
させて得た蒸気流を磁性層に差し向けて、金属微粒子を
含有させて表面に凹凸を形成したプラズマ重合保護膜層
を磁性層上に形成し、さらにこのプラズマ重合保護膜層
上に潤滑剤層を形成することを特徴とする磁気記録媒体
の製造方法[Claims] 1. A magnetic recording medium characterized in that a magnetic layer is formed on a substrate, and a plasma polymerized protective film layer containing fine metal particles and having an uneven surface is provided on the magnetic layer. 2. A magnetic layer is formed on the substrate, a plasma polymerized protective film layer containing fine metal particles to form an uneven surface is provided on the magnetic layer, and a lubricant layer is further provided on the plasma polymerized protective film layer. A magnetic recording medium 3 characterized in that a magnetic layer is formed on a substrate, and then this magnetic layer is exposed to a plasma of monomer gas of an organic compound in a vacuum atmosphere to perform plasma polymerization, and at the same time, a metal is A method for producing a magnetic recording medium, which comprises directing a vapor flow obtained by heating and evaporation to a magnetic layer to form a plasma polymerized protective film layer containing fine metal particles and having an uneven surface on the magnetic layer. 4. A magnetic layer is formed on the substrate, and then this magnetic layer is exposed to plasma of monomer gas of an organic compound in a vacuum atmosphere to perform plasma polymerization, and at the same time, a vapor flow obtained by heating and evaporating the metal is A plasma polymerized protective film layer containing fine metal particles to form an uneven surface is formed on the magnetic layer toward the magnetic layer, and a lubricant layer is further formed on this plasma polymerized protective film layer. Method of manufacturing a magnetic recording medium
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20617986A JPS6361418A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20617986A JPS6361418A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6361418A true JPS6361418A (en) | 1988-03-17 |
Family
ID=16519120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20617986A Pending JPS6361418A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6361418A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5715669A (en) * | 1994-11-30 | 1998-02-10 | Kabushiki Kaisha Toyoda Jidoshokki Seisakusho | Bobbin transporting system for roving and spinning machines with apparatus to exchange bobbins of differing pitches |
-
1986
- 1986-09-01 JP JP20617986A patent/JPS6361418A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5715669A (en) * | 1994-11-30 | 1998-02-10 | Kabushiki Kaisha Toyoda Jidoshokki Seisakusho | Bobbin transporting system for roving and spinning machines with apparatus to exchange bobbins of differing pitches |
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