JPS6142964A - Dual gate field effect transistor - Google Patents

Dual gate field effect transistor

Info

Publication number
JPS6142964A
JPS6142964A JP16520984A JP16520984A JPS6142964A JP S6142964 A JPS6142964 A JP S6142964A JP 16520984 A JP16520984 A JP 16520984A JP 16520984 A JP16520984 A JP 16520984A JP S6142964 A JPS6142964 A JP S6142964A
Authority
JP
Japan
Prior art keywords
gate
width
dual gate
mixer
effect transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16520984A
Other languages
Japanese (ja)
Inventor
Kunihiko Kanazawa
邦彦 金澤
Shutaro Nanbu
修太郎 南部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16520984A priority Critical patent/JPS6142964A/en
Publication of JPS6142964A publication Critical patent/JPS6142964A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/812Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
    • H01L29/8124Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate with multiple gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE:To enable an excellent modulator or mixer by increasing the first gate width larger than the second gate width, thereby reducing the tertiary distortion. CONSTITUTION:The first gate width is increased than the second gate width. For example, a bonding pad is provided on a source 20, the first gate 21 is formed with the width of 600mum, the second gate 22 is formed with the width of 300mum, and 24 is ohmic metal between the first gate 21 and the second gate 22. Thus, the harmonic distortion of the tertiary strain can be reduced while the power consumption when used as a mixer or a modulator remain small.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は歪特性を改善したデュアル・ゲート電界効果ト
ランジスタに関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a dual gate field effect transistor with improved strain characteristics.

従来例のIi8戒とその問題点 変調器やミキサーに電界効果トランジスタ(FET)は
よく使われている。特に、最近、高周波特性を向上させ
るために優れた高周波特性を持つGa As  MES
  FETを用いた変調器やミキサーが開発されている
。とりわけ、デュアル・ゲートGa As  MES 
 FETは局発信号と信号の分離が容易などの特徴があ
る。これはたとえば、第1図に示ずような横)Δのもの
である。
Conventional Ii8 Commandments and their Problems Field-effect transistors (FETs) are often used in modulators and mixers. In particular, GaAs MES with excellent high frequency characteristics has recently been developed to improve high frequency characteristics.
Modulators and mixers using FETs have been developed. Among others, dual gate GaAs MES
FETs have the advantage of being easy to separate local oscillation signals from signals. This is, for example, the transverse) Δ as shown in FIG.

QaAsデュアル・ゲートMES  FEI−1のソー
ス2を接地する。第1ゲート3に整合回路4を設け、信
号入力端5から信号を入力する。第2ゲート6にも整合
回路7を設け、局発信号入力端8から局発信号を入力す
る。ドレイン9には中間信号の整合回路10を設け、1
1が中間信号出力端となる。
Source 2 of QaAs dual gate MES FEI-1 is grounded. A matching circuit 4 is provided at the first gate 3, and a signal is input from a signal input terminal 5. A matching circuit 7 is also provided in the second gate 6, and a local oscillation signal is inputted from a local oscillation signal input terminal 8. An intermediate signal matching circuit 10 is provided at the drain 9, and 1
1 is the intermediate signal output terminal.

agJ波歪を下げるために、平衡さVた構造のミキサー
(バランスド・ミキサー)や平衡変調器も開発されてい
る。たとえば、第2図に示すようなダブル・バランスド
・ミキサーが開発されている。
In order to reduce agJ wave distortion, mixers with a balanced V structure (balanced mixers) and balanced modulators have also been developed. For example, a double balanced mixer as shown in FIG. 2 has been developed.

4つのQa Asデュアル・ゲートMES  FETの
ソース12を共通接地する。第1ゲートは第2因のよう
に配線され2つの第1ゲートは位相返転回路13を経て
、残りの2つの第1ゲートは直接に信号入力端14に接
続される。第2ゲートは第2図のように配線され、2つ
の第2ゲートは位相反転回路15を経て、残りの2つの
第2ゲートは直接に局発信号入力端16に接続される。
The sources 12 of the four Qa As dual gate MES FETs are commonly grounded. The first gates are wired like the second factor, two first gates are connected through the phase reversing circuit 13, and the remaining two first gates are directly connected to the signal input terminal 14. The second gates are wired as shown in FIG. 2, two of the second gates are connected to the phase inversion circuit 15, and the remaining two second gates are directly connected to the local oscillator signal input terminal 16.

ドレインは2つのドレインは位相反転回路13.17を
経て、他の2つのドレインは直接に中間信号出力IMi
aに接続される。このようにバランスド構成にJ“るこ
とで、n調波の歪を低減することができる。
Two drains pass through a phase inversion circuit 13.17, and the other two drains directly output an intermediate signal IMi.
connected to a. By adopting a balanced configuration in this way, distortion of n harmonics can be reduced.

しかしながら、上記のダブル・バランスド・ミキサーあ
るいは2重平衡変調器にJ3いては、8発信号や2次歪
等偶数次高調波歪は打ち消せるが、3次歪は打ち消すこ
とができず、特に、′B調波で一番、中間上9近くに現
われる3次歪を低減できないという問題点を有していた
However, with J3 in the above-mentioned double balanced mixer or double balanced modulator, even-order harmonic distortion such as 8-shot signals and 2nd-order distortion can be canceled, but 3rd-order distortion cannot be canceled, especially , 'B harmonics, and the third-order distortion that appears near the middle upper 9th wave cannot be reduced.

発明の目的 本発明はこのような従来の問題に鑑み、ミキ→ノ。purpose of invention In view of such conventional problems, the present invention has been developed based on the present invention.

−や変調器の3次歪等を低減し、ミキサーや変調器とし
てもつとも望ましい特性をもつデュアル・ゲートFET
を提供することを目的とするものである。
Dual gate FET with desirable characteristics as a mixer or modulator, reducing third-order distortion of the modulator and other factors.
The purpose is to provide the following.

発明の構成 本発明は第1ゲート幅を第2ゲート幅より大きくする描
造にしたもので、これにより、3次歪を低減し、優れた
変調器又はミキ°す“−を可能とするものである。
Structure of the Invention The present invention is designed to make the first gate width larger than the second gate width, thereby reducing third-order distortion and making it possible to create an excellent modulator or mixer. It is.

実施例の説明 以下本発明の一実施例を図面に暴づいて説明する。第3
図は本発明の一実施例におけるチップパターン図を示ず
。ソース20にボンディング・パッドを設け、第1ゲー
ト21を600μIのゲート幅とし、第2ゲート22を
300μmのゲート幅とし、23をドレインとする。2
4は第1ゲート21と第2ゲート22間のオーミック金
属である。これを第4図の従来例のものと比較すると、
ゲート幅は第1ゲート21′、第2ゲート22′ とも
300μ−であったのに対し、本発明の第3図では第1
ゲート21のゲート幅が2倍の600μlになっている
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. Third
The figure does not show a chip pattern diagram in one embodiment of the present invention. A bonding pad is provided on the source 20, the first gate 21 has a gate width of 600 μI, the second gate 22 has a gate width of 300 μm, and 23 is the drain. 2
4 is an ohmic metal between the first gate 21 and the second gate 22. Comparing this with the conventional example shown in Figure 4,
The gate width was 300 μ- for both the first gate 21' and the second gate 22', whereas in the case of FIG.
The gate width of the gate 21 is doubled to 600 μl.

信号入力として、周波数700MHz、信号強度−20
dBmを入力し、800MHz 、 +lOd Bmの
局発信号を入力した時、100M HZの中間信号強度
を計った時の変換利得は、第5図に示づように、第1ゲ
ート幅を2倍にしてもほとんど変わらない。
As signal input, frequency 700MHz, signal strength -20
dBm, input a local oscillation signal of 800 MHz, +lOd Bm, and measure the intermediate signal strength of 100 MHz, the conversion gain is calculated by doubling the first gate width, as shown in Figure 5. However, there is almost no difference.

しかし、さらに妨害信号701M Hz −20d B
 mを入力した時の3次歪を測定すると、第6図のよう
に第1ゲート幅を2倍にすることによって、3次歪抑圧
比は対中間信号強度比で60d Bから66CI Bま
でに改善される。また第1ゲートを900μmとして3
倍にすると、3次歪は抑圧比はざらに70dBまでに改
善される。
However, in addition, the interference signal 701MHz -20dB
When measuring the third-order distortion when inputting m, by doubling the first gate width as shown in Figure 6, the third-order distortion suppression ratio increases from 60 dB to 66 CI B in terms of the intermediate signal strength ratio. Improved. In addition, the first gate is 900 μm and 3
When doubled, the third-order distortion suppression ratio is roughly improved to 70 dB.

ここで、本発明では第1グー1−幅のみ増大したが、第
2ゲート幅も増大してしまうと消費電流が大ぎくなり、
消′p!電力が増大する欠点がある。ちなみに、第2ゲ
ーを1重3倍にすると、消費電流は1/10ぼとにまで
小さくなる。つまり、第1ゲートのグー1〜幅だけを第
2ゲートのゲート幅に対して広げることは、消費電力を
小さく保ったままで、歪み特性を著しく改善することに
なる。
Here, in the present invention, only the first gate width is increased, but if the second gate width is also increased, the current consumption becomes large.
Extinguish p! It has the disadvantage of increased power consumption. By the way, if the second game is multiplied by 1x3, the current consumption will be reduced to about 1/10. In other words, widening only the width of the first gate with respect to the gate width of the second gate significantly improves the distortion characteristics while keeping the power consumption small.

ところで、この実施例では単一のデュアル・ゲートFE
Tミキサーあるいは変調器について説明したが、2次歪
などの偶数次高調彼等を低Mづる際は、本発明のデュア
ル・ゲートFETを用いて第2図のダブル・バランスド
・ミキサーあるいは2重平衡変調回路を(構成すること
が可能である。
By the way, in this embodiment, a single dual gate FE
Although the T mixer or modulator has been explained, when even-order harmonics such as second-order distortion are to be reduced to a low M, the dual gate FET of the present invention is used to create a double balanced mixer or a double balanced mixer as shown in Figure 2. It is possible to construct a balanced modulation circuit.

発明の効果 以上のように、本発明はデュアル・ゲーh F ETの
第1ゲート幅を第2ゲート幅より良くすることによって
、ミキサーや変調器として使用し1重時の消費電力を小
さく保ったまま、3次歪等の高調波歪を著しく低減でき
る優れたデュアル・ゲートFETを実現できるものであ
る。
Effects of the Invention As described above, the present invention makes the first gate width of the dual-game hFET better than the second gate width, thereby keeping power consumption small when used as a mixer or modulator. However, it is possible to realize an excellent dual gate FET that can significantly reduce harmonic distortion such as third-order distortion.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はデュアル・ゲートFETミキサーの回路図、第
2図はダブル・バランスド・デュアル・ゲートFETミ
キサーの回路図、第3図は本発明の一実施例におけるデ
ュアル・ゲートFETのチップパターン図、第4図は従
来例のデュアル・ゲートFETのチップパターン図、第
5図は変換利得特性図、第6図は3次歪特性図である。 20・・・ソース、21・・・第1ゲート、22・・・
第2ゲート、23・・・トレイン、24・・・オーミッ
ク金属。 代理人   森  本  義  弘 第1図 第2図 第3図 第4図
Figure 1 is a circuit diagram of a dual gate FET mixer, Figure 2 is a circuit diagram of a double balanced dual gate FET mixer, and Figure 3 is a chip pattern diagram of a dual gate FET in an embodiment of the present invention. , FIG. 4 is a chip pattern diagram of a conventional dual gate FET, FIG. 5 is a conversion gain characteristic diagram, and FIG. 6 is a third-order distortion characteristic diagram. 20... Source, 21... First gate, 22...
2nd gate, 23...train, 24...ohmic metal. Agent Yoshihiro Morimoto Figure 1 Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 1、第1ゲート幅を第2ゲート幅より大きくしたデュア
ル・ゲート電界効果トランジスタ。
1. A dual gate field effect transistor in which the first gate width is larger than the second gate width.
JP16520984A 1984-08-07 1984-08-07 Dual gate field effect transistor Pending JPS6142964A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16520984A JPS6142964A (en) 1984-08-07 1984-08-07 Dual gate field effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16520984A JPS6142964A (en) 1984-08-07 1984-08-07 Dual gate field effect transistor

Publications (1)

Publication Number Publication Date
JPS6142964A true JPS6142964A (en) 1986-03-01

Family

ID=15807912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16520984A Pending JPS6142964A (en) 1984-08-07 1984-08-07 Dual gate field effect transistor

Country Status (1)

Country Link
JP (1) JPS6142964A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61263249A (en) * 1985-05-17 1986-11-21 Nec Corp Semiconductor device
EP0610564A2 (en) * 1993-01-26 1994-08-17 Sumitomo Electric Industries, Ltd. Dual gate fet and circuits using dual gate fet
DE4444808B4 (en) * 1993-12-17 2005-12-15 Denso Corp., Kariya Semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61263249A (en) * 1985-05-17 1986-11-21 Nec Corp Semiconductor device
EP0610564A2 (en) * 1993-01-26 1994-08-17 Sumitomo Electric Industries, Ltd. Dual gate fet and circuits using dual gate fet
EP0610564A3 (en) * 1993-01-26 1995-01-25 Sumitomo Electric Industries Dual gate fet and circuits using dual gate fet.
DE4444808B4 (en) * 1993-12-17 2005-12-15 Denso Corp., Kariya Semiconductor device

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