JPS5846820B2 - Rotating anode target for X-ray tube and manufacturing method thereof - Google Patents
Rotating anode target for X-ray tube and manufacturing method thereofInfo
- Publication number
- JPS5846820B2 JPS5846820B2 JP10883879A JP10883879A JPS5846820B2 JP S5846820 B2 JPS5846820 B2 JP S5846820B2 JP 10883879 A JP10883879 A JP 10883879A JP 10883879 A JP10883879 A JP 10883879A JP S5846820 B2 JPS5846820 B2 JP S5846820B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- anode target
- rotating anode
- ray tube
- molybdenum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/108—Substrates for and bonding of emissive target, e.g. composite structures
Description
【発明の詳細な説明】
この発明はＸ線管用回転陽極ターゲット及びその製造方
法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a rotating anode target for an X-ray tube and a method for manufacturing the same.
一般にＸ線管は例えばＸ線診断として医療用に利用され
ているが、胃の検診などの場合には回転陽極型といわれ
るＸ線管が用いられている。Generally, X-ray tubes are used for medical purposes, for example, for X-ray diagnosis, and in cases such as gastric examinations, X-ray tubes called rotating anode types are used.
この種のＸ線管は外囲器の一方に陰極が配設され、この
陰極下端には偏心して陰極フィラメント及び集束電極を
内蔵したカップが設けられている。This type of X-ray tube has a cathode disposed on one side of the envelope, and an eccentric cup containing a cathode filament and a focusing electrode is provided at the lower end of the cathode.
又、外囲器の中央付近には陰極に対向して略傘状の回転
陽極ターゲットが配設され、ローターにより回転軸が通
常３０００〜９０００ｒｐｍで回転するようになってい
る。Further, a substantially umbrella-shaped rotating anode target is disposed near the center of the envelope to face the cathode, and the rotating shaft is rotated by a rotor at usually 3,000 to 9,000 rpm.
そして動作時には陰陽極間に高電圧（３０〜２００に■
）が印加され、陰極フィラメントから発射された電子が
集束電極により集束されて回転陽極ターゲット上に大小
二重の焦点を形成し、この小焦点で透視が大焦点で撮影
がそれぞれ行なわれる。During operation, there is a high voltage between the anode and cathode (30 to 200
) is applied, and the electrons emitted from the cathode filament are focused by the focusing electrode to form a large and small focal point on the rotating anode target, and fluoroscopy is performed at this small focal point and photographing is performed at the large focal point, respectively.
ところで上記のようなＸ線管において、従来の回転陽極
ターゲットは第１図に示すように構成されている。By the way, in the above-mentioned X-ray tube, a conventional rotating anode target is constructed as shown in FIG.
即ち、グラファイトからなる基板１の表面の電子衝撃部
分にはレニウム層２を介してタングステン層３が形成さ
れている。That is, a tungsten layer 3 is formed with a rhenium layer 2 in between at an electron impact portion on the surface of a substrate 1 made of graphite.
ところが、このような従来の回転陽極ターゲットにおい
ては、電子衝撃部分は傾斜しているため、レニウム層２
の上にタングステン層３を形成するのは加工が難しく、
且つはがれ易い。However, in such a conventional rotating anode target, since the electron impact portion is inclined, the rhenium layer 2
It is difficult to process to form the tungsten layer 3 on top of the
Moreover, it peels off easily.
又、タングステン層３が薄いので熱衝撃がタングステン
層３と基板１との間にかかるが、タングステンと基板１
のグラファイトとは特性が異なるので、モリブテンから
なる基板にタングステン層を設けているターゲットに比
べると接合部が強度的に弱い。Also, since the tungsten layer 3 is thin, thermal shock is applied between the tungsten layer 3 and the substrate 1;
Since the characteristics are different from those of graphite, the strength of the joint is weaker than that of a target with a tungsten layer on a molybdenum substrate.
この発明は上記従来の欠点を除去したＸ線管用回転陽極
ターゲット及びその製造方法を提供することを目的とす
る。An object of the present invention is to provide a rotating anode target for an X-ray tube and a method for manufacturing the same, which eliminates the above-mentioned conventional drawbacks.
以下、図面を参照してこの発明の一実施例を詳細に説明
する。Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.
この発明の回転陽極ターゲットは第２図に示すように構
成され、基板４の表面の周縁がテーパー状に形成され、
このテーパ一部つまり傾斜した部分が電子衝撃部分にな
っていて、ここにタングステン層５が設けられている。The rotating anode target of the present invention is constructed as shown in FIG. 2, and the peripheral edge of the surface of the substrate 4 is formed into a tapered shape.
A part of this taper, that is, an inclined part is an electron impact part, and the tungsten layer 5 is provided here.
そして基板４は、図示のように表面から見て、順に第１
のモリブデン層６、第２のモリブデン層７、中間層８、
グラファイト層９を積層形成してなっている。Then, as shown in the figure, the substrate 4 is sequentially placed in the first
a molybdenum layer 6, a second molybdenum layer 7, an intermediate layer 8,
It is formed by laminating graphite layers 9.
この場合、第１のモリブデン層６の厚さは厚くて２ｍ７
ＩＬ以上であり、５關程度が好適である。In this case, the thickness of the first molybdenum layer 6 is at most 2 m7.
IL or more, preferably about 5 degrees.
又、第２のモリブデン層７は厚さが薄くて０．２〜２間
であり、Ｑ、 ５ ｍｍ程度が好適である。The second molybdenum layer 7 has a thin thickness of between 0.2 and 2, preferably about 5 mm.
更に中間層８はレニウム、ルテニウム等からなり、後述
の如く、この中間層８と第２のモリブデン層７とは溶射
によって形成されており、第２のモリブデン層７と第１
のモリブデン層６とはバインダー１０により接合されて
いる。Further, the intermediate layer 8 is made of rhenium, ruthenium, etc., and as described later, this intermediate layer 8 and the second molybdenum layer 7 are formed by thermal spraying, and the second molybdenum layer 7 and the first molybdenum layer 7 are formed by thermal spraying.
It is bonded to the molybdenum layer 6 by a binder 10.
尚、バインダー１０はモリブデン粉と有機溶剤の混合物
である。Note that the binder 10 is a mixture of molybdenum powder and an organic solvent.
次に上記回転陽極ターゲットの製造方法について述べる
。Next, a method for manufacturing the above rotating anode target will be described.
第３図ａ［示すように先ず公知の方法で、円盤状にして
表面の周縁をテーパー状にした第１のモリブデン層６を
形成し、この第１のモリブデン層６のテーパ一部つまり
電子衝撃部分にタングステン層５を形成する。FIG. 3a [As shown in FIG. A tungsten layer 5 is formed on the portion.
又、第１のモリブデン層６の裏面は、平らに研削してお
く。Further, the back surface of the first molybdenum layer 6 is ground flat.
一方、第３図すに示すように円盤状のグラファイト層９
を製作し、平らに研削した一面に中間層７と第２のモリ
ブデン層７を順次溶射により形成して第２のモリブデン
層７の表面を平らに研削する。On the other hand, as shown in Fig. 3, a disk-shaped graphite layer 9
The intermediate layer 7 and the second molybdenum layer 7 are sequentially formed by thermal spraying on one surface that has been ground flat, and the surface of the second molybdenum layer 7 is ground flat.
その後、この第２のモリブデン層７と前記第１のモリブ
テン層６とをホットプレス法によりバインダー１０を介
して接合する。Thereafter, this second molybdenum layer 7 and the first molybdenum layer 6 are bonded via a binder 10 by hot pressing.
この場合のホットプレス法を具体的に述べると、第１の
モリブデン層６の裏面と第２のモリブデン層７の表面に
それぞれバインダー１０を付け、仮圧し、昇温して有機
成分をとばしてから高温加圧して接合する。Specifically describing the hot pressing method in this case, binder 10 is applied to the back surface of the first molybdenum layer 6 and the surface of the second molybdenum layer 7, temporary pressure is applied, and the temperature is raised to blow off the organic components. Join by applying high temperature pressure.
その後、回転軸が挿入される透孔１１を穿設したり、グ
ラファイト層９０周縁なテーパー状に形成すれば、第２
図の如き所望の回転陽極ターゲットが完成する。After that, if a through hole 11 into which the rotating shaft is inserted is formed or a tapered shape is formed around the graphite layer 90, the second
The desired rotating anode target as shown in the figure is completed.
この発明のＸ線管用回転陽極ターゲット及びその製造方
法は上記説明及び図示のように構成され、第１のモリブ
デン層６が厚いので、その裏面を平らに研削できる。The rotary anode target for an X-ray tube and the method for manufacturing the same according to the present invention are constructed as described above and shown in the drawings, and since the first molybdenum layer 6 is thick, its back surface can be ground flat.
従って、第２のモリブデン層１及び中間層８を介してグ
ラファイト層９との接合が極めて容易になる。Therefore, bonding with the graphite layer 9 via the second molybdenum layer 1 and the intermediate layer 8 becomes extremely easy.
又、この発明ではタングステン層５に加わった熱が第１
のモリブデン層６により緩衝され、グラファイト層９と
第２のモリブデン層７との間にかかる熱衝撃が小さくな
り、タングステン層５がはがれ難いという利点がある。Further, in this invention, the heat applied to the tungsten layer 5 is
This has the advantage that the thermal shock applied between the graphite layer 9 and the second molybdenum layer 7 is reduced, and the tungsten layer 5 is difficult to peel off.
尚、第４図は製造方法の変形例を示したもので、ａに示
す予め回転軸が挿入される透孔１２を設けた第１のモリ
ブデン層６と、ｂに示す予め回転軸が挿入される透孔１
３を設けると共に所定形状に加工した第２のモリブデン
層Ｔ及び中間層８を有するグラファイト層９とを接合し
たものであり、上記実施例と同様効果が得られることは
言う迄もない。In addition, FIG. 4 shows a modification of the manufacturing method, in which the first molybdenum layer 6 shown in a is provided with a through hole 12 into which a rotating shaft is inserted in advance, and the first molybdenum layer 6 shown in b is provided with a through hole 12 into which a rotating shaft is inserted in advance. Through hole 1
3 and a second molybdenum layer T processed into a predetermined shape and a graphite layer 9 having an intermediate layer 8 are bonded to each other, and it goes without saying that the same effects as in the above embodiment can be obtained.
以上説明したようにこの発明によれば、実用的価値大な
るＸ線管用回転陽極ターゲット及びその製造方法を提供
することができる。As explained above, according to the present invention, it is possible to provide a rotating anode target for an X-ray tube of great practical value and a method for manufacturing the same.
第１図は、従来のＸ線管用回転陽極ターゲットを示す断
面図、第２図はこの発明の一実施例に係るＸ線管用回転
陽極ターゲットを示す断面図、第３図はこの発明の一実
施例に係るＸ線管用回転陽極ターゲットの製造方法を示
す断面図、第４図は同じく変形例を示す断面図である。
４・・・・・・基板、５・・・・・・タングステン層、
６・・・・・・第１のモリブテン層、Ｔ・・・・・・第
２のモリブデン層、８・・・・・・中間層、９・・・・
・・グラファイト層、１０・・・・・・バインダーFIG. 1 is a sectional view showing a conventional rotating anode target for an X-ray tube, FIG. 2 is a sectional view showing a rotating anode target for an X-ray tube according to an embodiment of the present invention, and FIG. 3 is an embodiment of the present invention. FIG. 4 is a cross-sectional view showing a method for manufacturing a rotating anode target for an X-ray tube according to an example, and FIG. 4 is a cross-sectional view showing a modified example. 4...Substrate, 5...Tungsten layer,
6...First molybdenum layer, T...Second molybdenum layer, 8...Intermediate layer, 9...
...graphite layer, 10...binder
Claims (1)
てなるＸ線管用回転陽極ターゲットにおいて、前記基板
は、前記表面から順に厚さの厚い第１のモリブデン層、
厚さの薄い第２のモリブテン層、中間層、グラファイト
層が積層され一体的に接合されてなることを特徴とする
Ｘ線管用回転陽極ターゲット。 ２ 表面の電子衝撃部分にタングステン層を設けた第１
のモリブデン層の裏面を平らに研削し、更にグラファイ
ト層の一面に中間層、第２のモリブデン層を溶射により
積層形成して該第２のモリブテン層表面を平らに研削し
、その後、該第２のモリブデン層と前記第１のモリブデ
ン層裏面とをホットプレス法によりバインダーを介して
接合することを特徴とするＸ線管用回転陽極ターゲット
の製造方法。[Scope of Claims] 1. A rotating anode target for an X-ray tube comprising a tungsten layer provided on the electron impact portion of the surface of the substrate, wherein the substrate includes a first molybdenum layer having a thickness increasing in order from the surface;
A rotating anode target for an X-ray tube, characterized in that a thin second molybdenum layer, an intermediate layer, and a graphite layer are laminated and integrally joined. 2 The first layer has a tungsten layer on the electron impact part of the surface.
The back surface of the molybdenum layer is ground flat, and an intermediate layer and a second molybdenum layer are laminated on one side of the graphite layer by thermal spraying, and the surface of the second molybdenum layer is ground flat. A method for producing a rotating anode target for an X-ray tube, characterized in that the molybdenum layer and the back surface of the first molybdenum layer are bonded via a binder by a hot press method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10883879A JPS5846820B2 (en) | 1979-08-27 | 1979-08-27 | Rotating anode target for X-ray tube and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10883879A JPS5846820B2 (en) | 1979-08-27 | 1979-08-27 | Rotating anode target for X-ray tube and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5632654A JPS5632654A (en) | 1981-04-02 |
| JPS5846820B2 true JPS5846820B2 (en) | 1983-10-19 |
Family
ID=14494840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10883879A Expired JPS5846820B2 (en) | 1979-08-27 | 1979-08-27 | Rotating anode target for X-ray tube and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5846820B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01173412U (en) * | 1988-05-23 | 1989-12-08 | ||
| JPH0313528Y2 (en) * | 1984-08-31 | 1991-03-27 |
-
1979
- 1979-08-27 JP JP10883879A patent/JPS5846820B2/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0313528Y2 (en) * | 1984-08-31 | 1991-03-27 | ||
| JPH01173412U (en) * | 1988-05-23 | 1989-12-08 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5632654A (en) | 1981-04-02 |
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