JPS58186746A - Manufacture of lithographic plate material requiring no dampening water - Google Patents
Manufacture of lithographic plate material requiring no dampening waterInfo
- Publication number
- JPS58186746A JPS58186746A JP6879682A JP6879682A JPS58186746A JP S58186746 A JPS58186746 A JP S58186746A JP 6879682 A JP6879682 A JP 6879682A JP 6879682 A JP6879682 A JP 6879682A JP S58186746 A JPS58186746 A JP S58186746A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- liq
- dispersion
- dampening water
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は湿し水不要平版材の製造方法に関するものであ
り、特に原画の再現性および原画（ポジないしネガフィ
ルム）との密着性に優れた湿し水不要平版材の製造方法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a lithographic material that does not require dampening water, and in particular, a lithographic material that does not require dampening water and has excellent reproducibility of original images and adhesion to original images (positive or negative film). Relating to a manufacturing method.
インキ反撥性の非画線部としてシリコーンゴム層を最上
層に有する湿し水不要平版材は７例えば特公昭４４−２
３０４２号、特公昭４６−１６０４４号。A lithographic plate material that does not require dampening water and has a silicone rubber layer as the top layer as an ink-repellent non-image area is 7, for example, Japanese Patent Publication No. 44-2
No. 3042, Special Publication No. 46-16044.
１−
特公昭５１−１７０８１号、特開昭４８−９４５０６号
などに数多く提案されている。1- Many proposals have been made in Japanese Patent Publication No. 51-17081, Japanese Patent Application Laid-open No. 48-94506, etc.
これらの湿し水不要平版材に画像を形成するために２通
常原画を通して活性光線による露光がおこなわれるが、
原画を忠実に再現するだめには。In order to form images on these planographic materials that do not require dampening water, exposure to actinic light is usually performed through the original image.
In order to faithfully reproduce the original painting.
該平版材上面に原画を完全に密着させることが必要であ
った。このため、一般的にはゴムシートと圧着ガラスの
間に、該平版材と原画とを重ねて配置シ、ゴムシートと
圧着ガラスの間を真空にして密着させる方法（以下真空
密着法と呼ぶ）が用いられてきだ。It was necessary to bring the original picture into complete contact with the upper surface of the planographic material. For this reason, generally, the planographic material and the original are placed between the rubber sheet and the pressure-bonded glass, and the space between the rubber sheet and the pressure-bonded glass is vacuumed and brought into close contact (hereinafter referred to as the vacuum adhesion method). is commonly used.
しかし々から、従来のインキ反撥性層としてのシリコー
ンゴム層を最上層に有する湿し水不要平版材の表面は、
非常に平滑で、かつシリコーンゴムが非常に密着性が良
好であるため、いったん原画フィルムとシリコーンゴム
層が密着すると密着部分は強固に固定されてしまい原画
フィルムの位置合せが難しく、捷だ気泡が入ったような
場合。However, the surface of a conventional planographic material that does not require dampening water and has a silicone rubber layer as an ink-repellent layer on the top layer,
It is very smooth and the silicone rubber has very good adhesion, so once the original film and the silicone rubber layer come into close contact, the adhering area is firmly fixed, making it difficult to align the original film and causing air bubbles to break up. If it seems to have entered.
真空密着法により該平版材の周辺部より空気を吸引して
も入った気泡を除去することが困難である。Even if air is sucked from the periphery of the planographic material using the vacuum contact method, it is difficult to remove the air bubbles.
従って、該平版材の全面にわたシ原画を完全に密着させ
るには、特に版サイズが大きい場合、非常に長い時間が
必要とされ、極端な場合にはいくら時間をかけても密着
しないことさえあった。Therefore, in order to make the original drawing completely adhere to the entire surface of the planographic material, a very long time is required, especially when the plate size is large, and in extreme cases, no matter how much time is spent, the original image may not adhere completely. there were.
このように真空密着に多大な時間を要することは、製版
作業の効率を低下させ、極めて不経済であったばかりで
なく・原画の密着が不十分なまま露光をおこなった場合
、原画を忠実に再現することができないという致命的な
問題があった。また。The large amount of time required for vacuum adhesion not only reduces the efficiency of the plate-making process and is extremely uneconomical, but also allows for faithful reproduction of the original image if exposure is carried out without sufficient adhesion to the original image. There was a fatal problem: I couldn't do it. Also.
露光の際にガスを発生するような感光層からなる版材の
場合２発生したガスが抜けないで版と原画との間にたま
り、密着をそこない忠実な画像の再現を困難にする。In the case of a plate material consisting of a photosensitive layer that generates gas during exposure, the generated gas does not escape and accumulates between the plate and the original, damaging the adhesion and making it difficult to reproduce faithful images.
この問題を解決するために２版面にポリエステル、ポリ
オレフィンなどのプラスチックフィルムをラミネートす
ることも提案されている。しかしながら１版面にプラス
チックフィルムをラミネートすると、原画との真空密着
性が若干向上するものの２版面にプラスチックフィルム
を設ける際に。In order to solve this problem, it has also been proposed to laminate a plastic film such as polyester or polyolefin on the second plate surface. However, when a plastic film is laminated on the first plate side, the vacuum adhesion to the original image is slightly improved, but when the plastic film is placed on the second plate side.
シリコーンゴム層との間に異物や空気をはさみ込み易い
などの技術的困難さがあったシ、経済的に不利であると
いつだ問題点があった。There were technical difficulties such as the tendency for foreign matter or air to get caught between the silicone rubber layer and the problem that it was economically disadvantageous.
さらに版面にプラスチックフィルムを設けると。Furthermore, if a plastic film is placed on the plate surface.
露光時に原画と感光性画像形成層（以下感光層という）
との距離が大きくなり、理想的な平行光線が得られてい
ない現行の露光機では、いわゆる焼きぼけを生じ易く原
画に忠実な画像が再現し難いという問題もあった。During exposure, the original image and the photosensitive image forming layer (hereinafter referred to as the photosensitive layer)
Current exposure machines, which cannot obtain ideal parallel rays of light due to the large distance between them, tend to cause so-called blurring, making it difficult to reproduce images that are faithful to the original.
また、露光により分解してガスを放出するタイプの感光
層を用いた場合、シリコーンゴム層上にプラスチックフ
ィルムを設けると露光により発生したガスがプラスチッ
クフィルムを押しあげ、原画との距離が大きくなり、焼
きぼけを生じるという重大な問題もある。Furthermore, when using a type of photosensitive layer that decomposes and releases gas when exposed to light, if a plastic film is placed on the silicone rubber layer, the gas generated during exposure will push up the plastic film, increasing the distance from the original image. There is also the serious problem of blurring.
本発明者らは、かかる問題点を解決すべく鋭意検討した
結果、以下に述べる本発明に到達した。The present inventors have made extensive studies to solve these problems, and as a result, have arrived at the present invention described below.
す々わち本発明は、最上層をインキ反撥性層とする湿し
水不要平版材において、インキ反撥性層上に不揮発性成
分を含有する溶液もしくは分散液を塗布し、溶液もしく
は分散液の凝集力によって最上層上に分散した小突起を
形成させたことを特徴とする湿し水不要平版材の製造方
法に関するものである。In other words, the present invention provides a lithographic plate that does not require dampening water and has an ink-repellent layer as the uppermost layer. The present invention relates to a method for producing a lithographic plate material that does not require dampening water, characterized in that small protrusions are formed on the uppermost layer by cohesive force.
本発明の湿し水不要平版材の製造方法は、不揮発成分を
含有する溶液もしくは分散液をインキ反撥性層としての
シリコーンゴム層の表面に塗布し。In the method for producing a lithographic plate material that does not require dampening water according to the present invention, a solution or dispersion containing a nonvolatile component is applied to the surface of a silicone rubber layer serving as an ink-repellent layer.
塗布液をシリコーンゴム層上で凝集させ、凝集によりシ
リコーンゴム層表面に形成される塗布液の液滴を乾燥す
ることによって２分散した小突起をつくることを特徴と
するものである。まだ、不揮発性成分を含有する溶液も
しくは分散液は版材を構成する成分に、物理的、化学的
に悪影響を与えることなく、シかも現像時に容易に除去
されうるものであって、かつ使用される現像液と反応し
ないものであれば使用可能である。The method is characterized in that the coating liquid is aggregated on the silicone rubber layer, and the droplets of the coating liquid formed on the surface of the silicone rubber layer due to the aggregation are dried to form two dispersed small protrusions. However, solutions or dispersions containing non-volatile components have no physical or chemical adverse effects on the components constituting the plate material, and stains can be easily removed during development. Any material that does not react with the developing solution can be used.
ここにいう不揮発性成分を含有する溶液もしくは分散液
は、不揮発性成分と溶媒とからなるものである。The solution or dispersion containing a non-volatile component referred to herein is a solution or dispersion containing a non-volatile component and a solvent.
不揮発性成分としては、たとえば樹脂、マット剤などが
ある。Examples of nonvolatile components include resins and matting agents.
５− 樹脂としては、アラビアゴム、膠、ゼラチン。5- Resins include gum arabic, glue, and gelatin.
カゼイン、セルロース類、でんぷん類、ポリビニルアル
コール、ポリスチレン＋ホ＋）オレフィン。casein, cellulose, starch, polyvinyl alcohol, polystyrene + olefin.
ポリエチレンオキシド、ポリアクリル酸、ポリアクリル
アミド、エポキシ樹脂、フェノール樹脂。Polyethylene oxide, polyacrylic acid, polyacrylamide, epoxy resin, phenolic resin.
ポリアミド、ポリエステル、ポリビニルブチラールなど
があり、これらの樹脂は二種以上併用することもできる
。Examples include polyamide, polyester, and polyvinyl butyral, and two or more of these resins can be used in combination.
マット剤としては、たとえば二酸化珪素、酸化亜鉛、酸
化チタン、酸化ジルコニウム、ガラス粒子、アルミナ、
澱粉２重合体粒子（たとえばポリメチルメタアクリレー
ト、ポリスチレン、）゛エノール樹脂などの粒子）など
があシ、これらは二種以上併用することもできる。また
、樹脂とマット剤との併用もできる。Examples of matting agents include silicon dioxide, zinc oxide, titanium oxide, zirconium oxide, glass particles, alumina,
Examples include starch dipolymer particles (for example, particles of polymethyl methacrylate, polystyrene, enol resin, etc.), and two or more of these may be used in combination. Further, a resin and a matting agent can be used together.
これらの樹脂、マット剤を単独または併用して適当な溶
媒に溶解まだは分散し、溶液もしくは分散液として使用
する。These resins and matting agents are dissolved or dispersed in a suitable solvent, either alone or in combination, and used as a solution or dispersion.
溶媒トシテハ、トルエン、キシレン、ベンゼン。Solvents: toluene, xylene, benzene.
酢酸メチル、酢酸エチル、オクタン、デカン、ドデカン
、メタノール、エタノール、インプロノくノール、メチ
ルセルンルブ、エチルセルソルブ、などが適当である。Methyl acetate, ethyl acetate, octane, decane, dodecane, methanol, ethanol, impronoknol, methylcernlube, ethylcelsolve, and the like are suitable.
」二記溶液、まだは分散液をシリコーン層上で適切に凝
集させるためには、該溶液もしくは分散液の表面張力が
２０〜６０ｄｙｎｅ／ａＴ＋の範囲にすることが良い。In order to appropriately aggregate the solution or dispersion on the silicone layer, the surface tension of the solution or dispersion is preferably in the range of 20 to 60 dyne/aT+.
溶液もしくは分散液の表面張力が２０ ａｙｎ ｅ、／
ｃｙｎ未満であれば溶液の凝集力が不十分で、溶液がシ
リコーン層表面で拡がり好ましい液滴ができにくい。The surface tension of the solution or dispersion is 20 ayn e, /
If it is less than cyn, the cohesive force of the solution is insufficient, and the solution spreads on the surface of the silicone layer, making it difficult to form desired droplets.
また表面張力が６０ （１７ｎ物を越えると大きい不均
一な液滴となり、適当に分散された小突起を形成するこ
とがやや困難である。Moreover, when the surface tension exceeds 60 (17n), large non-uniform droplets form, making it somewhat difficult to form properly dispersed small protrusions.
まだ塗布方法としては、スリットダイ、カーテンフロー
、リバースロール、グラビアロール、メーヤバーコータ
などの通常のコータあるいはホエラのような回転塗布装
置いずれを用いても各溶液もしくは分散液に従って適当
なウェット膜厚になるように塗布することにより２分散
した小突起を形成することにより凹凸を作ることができ
る。As for the coating method, whether you use a normal coater such as a slit die, curtain flow, reverse roll, gravure roll, or Meyer bar coater, or a rotary coating device such as Whaler, it is necessary to apply an appropriate wet film thickness according to each solution or dispersion. It is possible to create unevenness by forming two dispersed small protrusions by applying the coating in such a manner that the coating becomes uneven.
インキ反撥性層上に形成される小突起の平均高さは約５
０ｍμ〜５０μ、好ましくは０６〜１０μが適当である
。小突起の平均高さが約５０ｍμより小さくなるに従っ
て真空密着時間の短縮効果がなくなり、逆に約５０μよ
り大きく彦ると原画フィルムと該平版材との距離が犬き
くなり過ぎて焼きぼけ等を生じ、十分な画像再現性が得
られない。The average height of the small protrusions formed on the ink-repellent layer is approximately 5
A suitable value is 0 mμ to 50 μm, preferably 06 to 10 μm. As the average height of the small protrusions becomes smaller than about 50 mμ, the effect of shortening the vacuum adhesion time disappears, and conversely, when the height becomes larger than about 50 μm, the distance between the original film and the planographic material becomes too narrow, resulting in blurring, etc. occurs, and sufficient image reproducibility cannot be obtained.
また、隣接する小突起凸部間の平均距離は約０．０１−
２０ｍｍ、好ましくは０．０５−３ｍｍが適当である。In addition, the average distance between adjacent small protrusions is approximately 0.01-
20 mm, preferably 0.05-3 mm is suitable.
上記平均距離が約０．０１ａｎｎより短かくなるに従っ
て真空密着時間短縮化の効果が少なくなり。As the average distance becomes shorter than about 0.01 ann, the effect of shortening the vacuum contact time becomes less.
逆に約２０−より長くなるに従って原画フィルムと該平
版材との密着が不十分となり易く、十分な画像が再現で
きない。On the other hand, as the length becomes longer than about 20 mm, the adhesion between the original film and the planographic material tends to become insufficient, and a sufficient image cannot be reproduced.
まだ２本発明の小突起の形状は特に制限されるものでは
なく２例えば、シリコーン層の厚み、塗布液の組成ある
いは塗布方法などによってそれぞれ異なった形状を示す
。形状と大きさは、すべてが同一のものであってもよい
し１種々のものが混ざりあったものでもよい。However, the shapes of the small protrusions of the present invention are not particularly limited, and may have different shapes depending on, for example, the thickness of the silicone layer, the composition of the coating liquid, or the coating method. The shapes and sizes may all be the same or may be a mixture of different shapes and sizes.
また小突起の大きさは約０００５〜１０ Ｉｎｍ、好ま
しくは約０．０１〜０５圓である。Further, the size of the small protrusion is about 0.005 to 10 Inm, preferably about 0.01 to 0.5 Inm.
本発明の方法が適用される湿し水不要平版材の最上層で
あるインキ反撥性層としての組成物は。The composition for the ink repellent layer which is the uppermost layer of the dampening water-free planographic material to which the method of the present invention is applied is as follows.
公知のものとしては例えば次のようなものがあげられる
。Examples of known methods include the following.
（１）通常のシリコーン組成物として、特公昭４４−２
３０４２、特公昭４６−１’６０４４．特開昭４８−９
４５０３で提案されているもの、まだ特開昭５７−１０
１４５に開示されているようなポリオルガノシロキサン
よりなる一価又は二価以上の有機カルボン酸のろ価クロ
ム錯塩々ど。(1) As a normal silicone composition,
3042, Special Publication Showa 46-1'6044. Japanese Patent Publication No. 48-9
What is proposed in 4503 is still in Japanese Patent Application Publication No. 57-10
Chromium complex salts of monovalent, divalent or more than divalent organic carboxylic acids made of polyorganosiloxane as disclosed in No. 145.
（２）感光性を有するシリコーン組成物として。(2) As a photosensitive silicone composition.
（ａ） シリコーンに公知の感光性物質を混合した感
光性シリコーン組成物として、特公昭５５−２５４１８
などに提案されているもの。(a) As a photosensitive silicone composition in which silicone is mixed with a known photosensitive substance, Japanese Patent Publication No. 55-25418
etc. are proposed.
（ｂ） シリコーンに公知の感光性物質を反応させた
感光性シリコーン組成物として、特公昭５５−２７３３
７などに提案されているもの。(b) As a photosensitive silicone composition made by reacting silicone with a known photosensitive substance, Japanese Patent Publication No. 55-2733
7, etc., as proposed.
（３） フッ素系化合物としては、特公昭４４−２８
７２６などに提案されているもの。(3) As for fluorine compounds,
726, etc.
本発明の湿し水不要平版材を用いることにより。By using the lithographic plate material that does not require dampening water of the present invention.
原画との位置合せが容易になると共に、原画との密着性
が向上し密着に要する時間が大幅に短縮できる。さらに
画像を忠実に再現することが可能になった。Alignment with the original image becomes easier, the adhesion to the original image is improved, and the time required for adhesion can be significantly shortened. Furthermore, it has become possible to faithfully reproduce images.
またインキ反撥性層上の小突起は容易にしかも均一に設
けることが出来る。なお、設けられた小突起は画像露光
後の現像時などには極めて容易に除去することが可能で
、しかも印刷時の版性能に悪影響を及ぼすことはない。Further, small protrusions on the ink repellent layer can be easily and uniformly provided. Note that the provided small protrusions can be removed extremely easily during development after image exposure, and moreover, they do not adversely affect plate performance during printing.
さらにインキ反撥性層上に形成された小突起は。Furthermore, small protrusions formed on the ink repellent layer.
傷つきやすいインキ反撥性層を保護する効果をも有する
。It also has the effect of protecting the ink repellent layer, which is easily damaged.
以下、実施例により本発明をさらに詳しく説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例１ 比較例１
住友軽金属（株）製の化成処理アルミ板（厚さ３００μ
）に次の組成の感光層を乾燥厚さ約１．２μになるよう
に塗設した。Example 1 Comparative Example 1 Chemically treated aluminum plate manufactured by Sumitomo Light Metal Co., Ltd. (thickness: 300 μm)
) was coated with a photosensitive layer having the following composition to a dry thickness of about 1.2 μm.
（ａ） フェノールノボラック樹脂（住友ベークライ
ト製：スミレジンＰＲ５０２３５）のナフトキノン−１
，２−ジアジド−５−スルホン酸エステル（エステル化
度４４％）
続いて次の組成のシリコーンゴム層を乾燥厚さ約２．５
μになるように塗設し、１２０°６５分の熱処理を施し
た。(a) Naphthoquinone-1 of phenol novolac resin (Sumitomo Bakelite: Sumiresin PR50235)
, 2-diazide-5-sulfonic acid ester (degree of esterification: 44%).Subsequently, a silicone rubber layer having the following composition was dried to a thickness of approximately 2.5%.
It was coated so as to have a thickness of μ and heat treated at 120° for 65 minutes.
（ａ）トーレシリコーン製５Ｈ−７８１１００重量部
（ｂ） γ−アミノプロピルトリエトキシシラン４重
量部
そして、シリコーンゴム層上に次の組成物をメーヤバー
コータを用いてウェット膜厚１０μになるように塗布し
、乾燥（乾燥重量０．２ ｇ／ｍ２） してシリコーン
ゴム層上に小突起を形成することにより、湿し水不要平
版材を作製した。(a) 100 parts by weight of 5H-781 manufactured by Toray Silicone (b) 4 parts by weight of γ-aminopropyltriethoxysilane Then, the following composition was applied onto the silicone rubber layer using a Meyer bar coater to give a wet film thickness of 10 μm. A lithographic plate material that does not require dampening water was prepared by coating and drying (dry weight 0.2 g/m2) to form small protrusions on the silicone rubber layer.
（ａ）トルエン／エタノール（１／１−重量比）１００
重量部
（ｂ） ”デ／カブムラール”（電気化学工業（株）
製：弁３０００−２ ） ２重量部
（Ｃ） “サイロイド″（富士デピストン（株）製：
４２４４） （１１重量部な
お、」二記組成物の表面張力は２４ ｄ、ｙｎθにであ
った。また１版の小突起の大きさあるいは分布状態は次
のとおりである。(a) Toluene/ethanol (1/1-weight ratio) 100
Weight part (b) “De/Kabumural” (Denki Kagaku Kogyo Co., Ltd.)
Manufactured by: Valve 3000-2) 2 parts by weight (C) “Syroid” (manufactured by Fuji Depiston Co., Ltd.)
4244) (11 parts by weight) The surface tension of the composition No. 2 was 24 d, ynθ. The size or distribution of the small protrusions on the first plate was as follows.
（ａ） 凸部の大きさ 平均直径 １５０ ／４
平均高さ ４μ
（ｂ） 分布状態 平均個数 １５個／Ｉｎ
ｍ２平均凸部間距離 ０．８ ｗｎ
上記のように作製された版制を３０ａｎＸ４０（２）の
大きさに切り出し、５０％網点面積率を有する原画を重
ねて１通常の手法で真空密着させたところ。(a) Size of convex portion Average diameter 150/4
Average height 4μ (b) Distribution state Average number 15 pieces/In
m2 Average distance between convex parts 0.8 wn The plate produced as above was cut out to a size of 30an x 40 (2), and the original image having a halftone dot area ratio of 50% was overlaid and 1 was vacuum-adhered using the usual method. Where it was.
１５〜２０秒で完全に密着が完了した。Adhesion was completely completed in 15 to 20 seconds.
次いで、露光し、エタノールで現像したところ露光時に
発生したガスによる焼ぼけもなく良好な網点が再現され
た。まだ設けた小突起は現像時に完全に取り除かれてい
た。Then, when it was exposed to light and developed with ethanol, good halftone dots were reproduced without any blur due to gas generated during exposure. The remaining small projections were completely removed during development.
一方、比較としてシリコーンゴム層上に小突起を設けて
いない版材を用いて同様の操作を実施しだところ９版の
全面にわたって原画とシリコーンゴム層間に気泡が生じ
、２（１分にわたって吸引を続けてもこの気泡が消える
ことはなかった。続いてこの状態で露光し エタノール
で現像したところ、気泡が生じて原画との密着が十分で
なかった部分に再現された網点は焼きぼけにより良好な
形状ではなかった。On the other hand, for comparison, when the same operation was carried out using a plate material without small protrusions on the silicone rubber layer, air bubbles were generated between the original image and the silicone rubber layer over the entire surface of the 9th plate. Even if I continued to do so, these bubbles did not disappear.When I exposed the image in this state and developed it with ethanol, the halftone dots that were reproduced in the areas where bubbles had formed and the contact with the original image was not sufficient were better due to blurring. It wasn't a good shape.
実施例２ エポキシコートアルミ板（スカイアルミ（株） 製。Example 2 Epoxy coated aluminum plate (manufactured by Sky Aluminum Co., Ltd.).
厚さ２４０７＋）に下記の感光層組成物の２０重量係エ
チルセルソルブ溶液をスリットダイコータで塗布し１０
０’ｃ、２分加熱処理して厚さ２μの感光層を設けた。A 20% weight ethyl cellosolve solution of the following photosensitive layer composition was applied to the 2407+) thickness using a slit die coater.
A photosensitive layer having a thickness of 2 μm was formed by heat treatment at 0'c for 2 minutes.
（ａ） フェノールノボラック樹脂（住友ベークライ
ト（株）ｖ：“スミレシフ ＰＲ５０２３５’ ）のナ
フトキノン−１，２−ジアジド−５−スルホン酸エステ
ル（エステル（１４４％）
続いてこの」二にγ−アミノプロピルトリエトキシシラ
ン（ユニオンカーバイド製：Ａ１１００）の１ 重量％
“アイソパーＥ″（エッソスタンダード製二石油系溶媒
）溶液をスリットダイコータで塗−１６＝
布し１２０℃、１分間加熱処理して厚さ０．０５μの接
着層を設けた。(a) Naphthoquinone-1,2-diazide-5-sulfonic acid ester (ester (144%) of phenol novolak resin (Sumitomo Bakelite Co., Ltd. v: "SUMIRESIF PR50235'), followed by γ-aminopropyltritri 1% by weight of ethoxysilane (Union Carbide: A1100)
A solution of "Isopar E" (a two-petroleum solvent manufactured by Esso Standard) was applied using a slit die coater and heat treated at 120 DEG C. for 1 minute to form an adhesive layer with a thickness of 0.05 .mu.m.
続いてこの」二に下記のシリコーン組成物の２０重量係
アイソパーＥ溶液をスリットダイコータで塗布し１００
’ｃ、３分間加熱処理して厚さ５μのシリコーンゴム層
を設けた。Next, a 20% by weight Isopar E solution of the following silicone composition was applied to this 2 with a slit die coater.
'c, A silicone rubber layer with a thickness of 5 μm was provided by heat treatment for 3 minutes.
（ａ） ジメチルポリシロキサン １００重量部
（分子量約８０．［１００，末端ＯＨ基）（ｂ） エ
チルトリアセトキシシラン ５重量部（Ｃ）′）ブチ
ル錫ジアセテート ０２重量部上記のようにして得
られた印刷原版に次の組成物（表面張力３ Ｑ ｄｙｎ
０７４）を版面にスリットダイコータでウェット膜厚１
０μに塗布し、乾燥（乾燥重量０．３ ｇ／ｍ２） Ｌ
、 シリコーンゴム層上に小突起を形成させた。(a) Dimethylpolysiloxane 100 parts by weight (molecular weight approximately 80. [100, terminal OH group) (b) Ethyltriacetoxysilane 5 parts by weight (C') Butyltin diacetate 02 parts by weight Obtained as above The following composition (surface tension 3 Q dyn
074) on the printing plate with a wet film thickness of 1 using a slit die coater.
Apply to 0μ and dry (dry weight 0.3 g/m2) L
, small projections were formed on the silicone rubber layer.
（ａ）トルエン １００重量部（ｂ
） ポリスチレン樹脂（旭ダウ（株）製：′スタイロ
ン６８６”） ６重量部こうして得ら
れた版の小突起の大きさ２分布状態は次のようである。(a) 100 parts by weight of toluene (b
) Polystyrene resin (manufactured by Asahi Dow Co., Ltd.: 'STYRON 686'') 6 parts by weight The distribution of the two sizes of the small protrusions on the plate thus obtained is as follows.
（ａ）凸部の大きさ 平均直径 １００μ平均高さ
３μ
（ｂ） 分布状態 平均個数 １７個／皿２
平均凸部間距離 １皿
この版を３［１ａｎｘ４Ｄ（２）の大きさに切り出し。(a) Size of convex portion Average diameter 100μ Average height 3μ (b) Distribution condition Average number 17 pieces/dish 2
Average distance between convex parts: 1 plate Cut this plate into a size of 3 [1an x 4D (2)].
５０％網点面積率を有する原画を重ねると版と原画のす
べりも良く、常法に従って原画を真空密着させたところ
密着に要した時間は１５〜２０秒で気泡は全く残らなか
った。続いて露光、現像したところ発生したガスによる
焼きぼけもなく良好な網点が再現された。捷だ、設けた
小突起は現像時に完全に除かれていた。When the original images having a halftone dot area ratio of 50% were stacked, the slip between the plate and the original image was good, and when the original images were brought into close contact with each other under vacuum according to a conventional method, it took 15 to 20 seconds for the original images to come into close contact with each other, and no air bubbles remained at all. After subsequent exposure and development, good halftone dots were reproduced without any blurring caused by the generated gas. Unfortunately, the small projections were completely removed during development.
比較例２
不揮発性成分を含有する溶液として下記組成物（表面張
力１９ ｄｙｎθｋ）を版面にメーヤバーコータでウェ
ット膜厚７μに塗布、乾燥（乾燥重量０、０２ ｇ／ｍ
２ ）する以外は実施例１と同様にして版を作製した。Comparative Example 2 The following composition (surface tension: 19 dynθk) as a solution containing non-volatile components was coated on the printing plate with a wet film thickness of 7 μm using a Meyer bar coater, and dried (dry weight: 0,02 g/m
2) A plate was prepared in the same manner as in Example 1 except for the following.
（ａ） へブタン １００重量部
（ｂ） ニスコレラ５０００（オレフィン系樹脂エク
ンンケミカルズ製） ２重量部しかしながら
、この溶液ではシリコーン面で凝集せず全面に濡れだま
捷で均一な塗膜層を形成し。(a) Hebutane 100 parts by weight (b) Niscolera 5000 (olefin resin manufactured by Ekun Chemicals) 2 parts by weight However, with this solution, it did not aggregate on the silicone surface and was wet and kneaded to form a uniform coating layer on the entire surface. .
小突起はでき々かった。この版に５０係網点面積率を有
する原画を重ねると版は非粘着化されているので版と原
画のすべりは良いが、常法に従って原画を真空密着させ
たところ密着に要しだ時間は２分であり、実施例１の小
突起を設けた版に比較して約６倍長い時間を要しだ。続
いて露光、現像したところ一部に発生したガスのた捷り
ができて焼ぼけにより良好な網点が再現されなかった。The small protrusion was completely formed. When this plate is overlaid with an original image having a dot area ratio of 50, the plate and the original image slide well because the plate is non-adhesive, but when the original image is brought into close contact with the original image in a vacuum according to the usual method, the time required for the adhesion to be It took 2 minutes, which is about 6 times longer than the plate provided with small protrusions of Example 1. When the film was subsequently exposed and developed, the gas generated in some parts of the film was undone, and good halftone dots could not be reproduced due to blurring.
なお、塗膜層は現像時に完全に除かれていた。Note that the coating layer was completely removed during development.
比較例６
実施例１の場合と同様にして、但し不揮発生成分を含有
する分散液として下記組成物（表面張力６６ｄｙｎθ／
ｃｍ ）をメーヤバーコータでシリコーン面に塗布しよ
うとしたが、メーヤバーコータの前の液だまりが移動す
るのみで小突起を形成しなかった。Comparative Example 6 In the same manner as in Example 1, however, the following composition (surface tension: 66 dynθ/
cm) was tried to be applied to the silicone surface using a Meyer bar coater, but the liquid pool in front of the Meyer bar coater only moved and no small protrusions were formed.
（ａ） 水 １００重量部
（ｂ）トクシール（５ｉｎ２徳山曹達製）０２５重量部
この版は実施例１での小突起を設けていない版と同様で
５０係の網点面積率を有する原画を重ねて１通常の手法
で真空密着させたところ２版の全面にわたって原画とシ
リコーンゴム層間に気泡が生じ、２０分にわたって吸引
を続けてもこの気泡が消えることはなかった。続いて露
光、現像したところ、気泡が生じて原画との密着が十分
でなかった部分に再現された網点は焼きぼけにより良好
な形状では々かった。(a) 100 parts by weight of water (b) Tokusil (5in2 manufactured by Tokuyama Soda) 025 parts by weight This plate is similar to the plate without small protrusions in Example 1, and the original image having a halftone dot area ratio of 50 is overlaid. When the original image and the silicone rubber layer were brought into close contact with each other under vacuum using a conventional method, air bubbles were formed between the original image and the silicone rubber layer over the entire surface of the second plate, and these air bubbles did not disappear even after continued suction for 20 minutes. When the image was subsequently exposed and developed, the reproduced halftone dots in areas where air bubbles were generated and did not adhere well to the original image were not in good shape due to blurring.
Claims (2)
において、最上層上に不揮発性成分を含有する溶液また
は分散液を塗布し、溶液または分散液の凝集力により最
上層上に分散した小突起を形成させたことを特徴とする
湿し水不要平版材の製造方法。(1) In a lithographic material that does not require dampening water and has an ink-repellent top layer, a solution or dispersion containing a non-volatile component is applied onto the top layer, and the cohesive force of the solution or dispersion causes the layer to be coated onto the top layer. A method for producing a lithographic plate material that does not require dampening water and is characterized by forming dispersed small protrusions.
張力が２０〜６０ ｄｙｎ輸である特許請求の範囲第１
項記載の湿し水不要平版材の製造方法。(2) The surface tension of the solution or dispersion containing non-volatile components is 20 to 60 dyn.
A method for producing a lithographic plate material that does not require dampening water as described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6879682A JPS58186746A (en) | 1982-04-26 | 1982-04-26 | Manufacture of lithographic plate material requiring no dampening water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6879682A JPS58186746A (en) | 1982-04-26 | 1982-04-26 | Manufacture of lithographic plate material requiring no dampening water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58186746A true JPS58186746A (en) | 1983-10-31 |
Family
ID=13384034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6879682A Pending JPS58186746A (en) | 1982-04-26 | 1982-04-26 | Manufacture of lithographic plate material requiring no dampening water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58186746A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0154981A2 (en) * | 1984-03-12 | 1985-09-18 | Fuji Photo Film Co., Ltd. | Process for producing light-sensitive lithographic plate requiring no dampening solution |
| JPS62134289A (en) * | 1985-12-09 | 1987-06-17 | Fuji Photo Film Co Ltd | Plate material for lithography printing not requiring dampening water |
| JPH01257949A (en) * | 1988-04-08 | 1989-10-16 | Konica Corp | Damping-waterless planographic printing plate material |
| JPH03160453A (en) * | 1989-11-17 | 1991-07-10 | Konica Corp | Planographic printing plate material requiring no damping water and production thereof |
| JPH03179446A (en) * | 1989-12-08 | 1991-08-05 | Konica Corp | Production of damping waterless planographic printing plate material |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5124307A (en) * | 1974-07-24 | 1976-02-27 | Fuji Photo Film Co Ltd | KANKOSEI INSATSUBANNO SEIZOHO |
| JPS5555343A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Waterless lithographic printing original plate |
| JPS5627150A (en) * | 1979-08-13 | 1981-03-16 | Toray Ind Inc | Damping water nonrequiring lithographic original plate and its preparation |
-
1982
- 1982-04-26 JP JP6879682A patent/JPS58186746A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5124307A (en) * | 1974-07-24 | 1976-02-27 | Fuji Photo Film Co Ltd | KANKOSEI INSATSUBANNO SEIZOHO |
| JPS5555343A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Waterless lithographic printing original plate |
| JPS5627150A (en) * | 1979-08-13 | 1981-03-16 | Toray Ind Inc | Damping water nonrequiring lithographic original plate and its preparation |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0154981A2 (en) * | 1984-03-12 | 1985-09-18 | Fuji Photo Film Co., Ltd. | Process for producing light-sensitive lithographic plate requiring no dampening solution |
| JPS60191262A (en) * | 1984-03-12 | 1985-09-28 | Fuji Photo Film Co Ltd | Production of photosensitive lithographic printing plate without requiring damping water |
| JPH043863B2 (en) * | 1984-03-12 | 1992-01-24 | ||
| JPS62134289A (en) * | 1985-12-09 | 1987-06-17 | Fuji Photo Film Co Ltd | Plate material for lithography printing not requiring dampening water |
| JPH0517872B2 (en) * | 1985-12-09 | 1993-03-10 | Fuji Photo Film Co Ltd | |
| JPH01257949A (en) * | 1988-04-08 | 1989-10-16 | Konica Corp | Damping-waterless planographic printing plate material |
| JPH03160453A (en) * | 1989-11-17 | 1991-07-10 | Konica Corp | Planographic printing plate material requiring no damping water and production thereof |
| JPH03179446A (en) * | 1989-12-08 | 1991-08-05 | Konica Corp | Production of damping waterless planographic printing plate material |
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