JPH0517872B2 - - Google Patents
Info
- Publication number
- JPH0517872B2 JPH0517872B2 JP60275028A JP27502885A JPH0517872B2 JP H0517872 B2 JPH0517872 B2 JP H0517872B2 JP 60275028 A JP60275028 A JP 60275028A JP 27502885 A JP27502885 A JP 27502885A JP H0517872 B2 JPH0517872 B2 JP H0517872B2
- Authority
- JP
- Japan
- Prior art keywords
- ink
- resin
- parts
- plate material
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 14
- 229920000642 polymer Polymers 0.000 claims description 12
- 239000005871 repellent Substances 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 229920002050 silicone resin Polymers 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 239000005011 phenolic resin Substances 0.000 claims description 3
- 229920001225 polyester resin Polymers 0.000 claims description 3
- 239000004645 polyester resin Substances 0.000 claims description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 14
- 229920001577 copolymer Polymers 0.000 description 5
- 229920002379 silicone rubber Polymers 0.000 description 4
- 239000004945 silicone rubber Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 150000004812 organic fluorine compounds Chemical class 0.000 description 2
- 125000005375 organosiloxane group Chemical group 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920005573 silicon-containing polymer Polymers 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
- B41N1/14—Lithographic printing foils
Landscapes
- Printing Plates And Materials Therefor (AREA)
Description
〔産業上の利用分野〕
本発明は印刷時に湿し水を必要としない印刷を
可能にする湿し水不要平版印刷用版材に関する。
〔従来の技術〕
従来、水と油がまじりあわないという物理化学
的な性質の差を利用した湿し水を使う平版印刷法
が著しい発展をとげている。しかし、この湿し水
を使う平版印刷法は、インキと湿し水のバランス
がむずかしく印刷濃度のコントロールが難しいこ
と、インキの乳化が起こりやすいこと、印刷機が
複雑な機構になること、エツチング処理により印
刷作業が煩雑になること等の欠点が指摘されてい
た。
そこで上述したような平版印刷法の欠点を改良
する方法として、湿し水およびエツチング処理を
必要としない湿し水不要平版印刷法が提案されて
いる。
このような湿し水不要平版法では非画線部にイ
ンキが付着しないようにその版表面が一般にイン
キ反撥性の物質たとえば、有機シリコーンポリマ
ーあるいは有機フツ素化合物で被覆されているこ
とにその本質がある。ここで、非画線部にインキ
反撥性の領域を選択的に形成させる方法として
は、例えば支持体／感光層／インキ反撥性物質層
なる構成の版材を像形状に露光し、露光部分また
は未露光部分を現象液で除去するという方法が知
られている。さらにまた、支持体／インキ反撥性
物質なる構成の版材に、例えば、電子写真法によ
つて、インキ受容性トナーを像状に付着させると
いう画像形成法も知られている。後者のような直
接製版法によつた場合には画像形成が簡単にでき
軽印刷に適するが、インキ反撥性の有機シリコー
ンポリマーあるいは有機フツ素化合物表面に対し
トナーが強固に接着せず、これを刷版として印刷
を行なうと耐刷力が劣るという大きな問題があ
る。
この問題を解決するための試みとしては、例え
ば特開昭52−29305号公報では、オルガノポリシ
ロキサンの改質の反応性有機基をもつオルガノシ
ロキサンを含有させるという方法が提案されてい
る。特開昭50−1803号公報ではインキ反撥性層の
オルガノシロキサンをポリスチレン等で改質して
異相重合体を用いることが提案されている。ま
た、特開昭51−66008号公報ではインキ反撥性エ
ラストマー層としてシロキサンブロツクと熱可塑
性ブロツクとから成るブロツクポリマーを用いる
ことが提案されている。特開昭52−76104号公報
にはインキ反撥性物質として固体のフツ素化化合
物共重合体を使用する方法が提案されている。
〔発明が解決しようとする問題点〕
しかし、いずれの方法でも印刷の汚れと耐刷力
とのバランスの点から実用には十分でない。特
に、耐刷力を上げようとすると印刷汚れを生じ易
い欠点がある。
本発明の目的は、印刷の汚れが生ぜず耐刷力も
優れた簡易に製版できる湿し水不要平版印刷用版
材を提供することにある。
〔問題点を解決するための手段並びに作用〕
本発明者らはそれ自身はインキ受容性である、
ある種の高分子化合物をシリコーンゴム層へ不均
一な形で添加した時に、インキ剥離性が低下せず
向上するという意外な事実を見い出し本発明を成
すに至つた。
本発明は、支持体上にシリコーン樹脂および臨
界表面張力が38.5dyne／cm以上で、該シリコーン
樹脂と実質上相溶しない高分子化合物から構成さ
れるインキ反撥性層を設けてなることを特徴とす
る湿し水不要平版印刷用版材である。
本発明で用いられるシリコーン樹脂とは有機ポ
リシロキサンを指し、一般にメチル基、エチル
基、ビニル基、フエニル基などの炭化水素基を結
合した有機ケイ素基がシロキサン結合により縮合
している樹脂を指す。
有機ポリシロキサンは一般にその側鎖に反応性
の官能基を含み、架橋剤と反応して硬化する。具
体例を挙げると信越化学製の一液型RTV（室温加
硫型）ではKE41、KE42、KE45（商品名）、二液
型ではKE103とCatalyst103、KS709と
CatalystPS、KS770とCatalyst PL−１（商品名）
の組合せ、またシリコン生ゴムKE76（商品名）と
過酸化ベンゾイルの組合せ等がある。
又本発明において、これらシリコーン樹脂と混
合する高分子化合物としてはZismanによつて定
義された（H.W.Fox and W.A.Zisman，J.
Collaid Sci，７巻、109及び428（1952））臨界表
面張力（rc）が38.5dyne／cm以上で、かつ該シリ
コーン樹脂と相溶しないものが用いられる。具体
例としては、塩化ビニルと酢酸ビニルの共重合
体、その共重合体に更にビニルアルコール・マレ
イン酸等の極性モノマーを含むもの、フエノール
樹脂、エポキシ樹脂、ポリエステル樹脂、ポリア
ミド樹脂、塩化ビニリデン共重合体等を列挙でき
るがその間特に塩化ビニル−酢酸ビニル共重合体
系樹脂、フエノール樹脂、ポリエステル樹脂が好
ましい、尚これらポリマーの添加量はシリコーン
樹脂100重量部に対して１重量部から200重量部の
範囲であるが、好ましくは３重量部から100重量
部の範囲、さらに好ましくは５重量部から50重量
部の範囲である。
〔実施例〕
以下に本発明の実施例を述べるが、本発明は実
施例の範囲に限定されるものではない。
なお、実施例中に用いられる部はいずれも重量
部を示す。
実施例 １
ジメチルポリシロキサン生ゴム
（信越化学製、KE76）（商品名） 60部
過酸化ベンゾイル 1.2部
トルエン 940部
この溶液に
塩化ビニル・酢酸ビニル共重合体
（積水化学製、エスレツクＣ）（商品名） ６部
メチルエチルケトン 94部
から成る溶液を添加撹拌した後、70％リン酸浴中
で電解研磨したアルミニウム板（200μｍ厚）上
に乾燥時の膜厚が５〜6μｍになるように塗布し、
150℃30分放置し硬化させた。
比較の為に、エスレツクＣを含まないジメチル
ポリシロキサン生ゴムだけの膜を同様にして作製
した。
また、同様な膜をポリエステルフイルム上へ塗
布したものを作つた。三田工業製の電子写真複写
機DC−161を使用し、シリコーンゴム上へトナー
像を転写・定着した。このようにして出来た製版
マスターを東洋インキ製TKにアクワレスＧスミ
という商品名の乾式平版用インキを使用して印刷
し、良好な印刷物を得た。印刷物の地汚れを調べ
たところ、エスレツクＣを含む場合の方が濃度と
して0.01地汚れが少ない結果であつた。
実施例２〜６、比較例１〜４
実施例１のエスレツクＣの代りに、各種ポリマ
ーに変え、添加量もシリコーンゴム100部に対し
て５部から100部の範囲で変化させて実験した結
果を表１にまとめて示した。表１には表面張力
（γsの異なる各種溶媒でポリマー表面の接触角
（θ）を測定しcosθ VS.γsのプロツトから求めた
各ポリマーの臨界表面張力γcの値も同時に示し
た。
[Industrial Field of Application] The present invention relates to a lithographic printing plate material that does not require dampening water and enables printing that does not require dampening water during printing. [Prior Art] Remarkable progress has been made in the lithographic printing method that uses dampening water, which takes advantage of the difference in physicochemical properties that water and oil do not mix. However, with this lithographic printing method that uses dampening water, it is difficult to balance the ink and dampening water, making it difficult to control print density, the ink tends to emulsify, the printing machine has a complicated mechanism, and the etching process is difficult. It has been pointed out that there are drawbacks such as complicating printing work. Therefore, as a method for improving the above-mentioned drawbacks of the lithographic printing method, a dampening water-free lithographic printing method that does not require dampening water and etching treatment has been proposed. The essence of such a lithography method that does not require dampening water is that the plate surface is generally coated with an ink-repellent material, such as an organic silicone polymer or an organic fluorine compound, to prevent ink from adhering to non-image areas. There is. Here, as a method for selectively forming ink-repellent regions in non-image areas, for example, a plate material having a structure of support/photosensitive layer/ink-repellent material layer is exposed to light in an image shape, and the exposed areas or A method is known in which the unexposed areas are removed using a phenomenon liquid. Furthermore, an image forming method is also known in which an ink-receptive toner is imagewise deposited on a plate material having a support/ink-repellent material structure, for example, by electrophotography. When using the latter direct plate-making method, image formation is easy and suitable for light printing, but the toner does not adhere firmly to the ink-repellent organic silicone polymer or organic fluorine compound surface. When printing as a printing plate, there is a big problem of poor printing durability. As an attempt to solve this problem, for example, JP-A-52-29305 proposes a method of modifying organopolysiloxane by incorporating an organosiloxane having a reactive organic group. JP-A-50-1803 proposes using a different phase polymer by modifying the organosiloxane of the ink repellent layer with polystyrene or the like. Furthermore, Japanese Patent Application Laid-Open No. 51-66008 proposes the use of a block polymer consisting of a siloxane block and a thermoplastic block as an ink-repellent elastomer layer. JP-A-52-76104 proposes a method of using a solid fluorinated compound copolymer as an ink repellent material. [Problems to be Solved by the Invention] However, none of these methods is sufficient for practical use due to the balance between printing stains and printing durability. In particular, when trying to increase printing durability, printing smudges tend to occur. An object of the present invention is to provide a lithographic printing plate material that does not require dampening water and can be easily made into a plate that does not cause printing stains and has excellent printing durability. [Means and effects for solving the problem] The present inventors have discovered that the present invention is itself ink-receptive;
The inventors have discovered the surprising fact that when a certain type of polymer compound is added to a silicone rubber layer in a non-uniform form, the ink releasability is improved rather than reduced, and the present invention has been completed. The present invention is characterized in that an ink-repellent layer comprising a silicone resin and a polymer compound having a critical surface tension of 38.5 dyne/cm or more and substantially incompatible with the silicone resin is provided on a support. This is a lithographic printing plate material that does not require dampening water. The silicone resin used in the present invention refers to an organic polysiloxane, and generally refers to a resin in which an organic silicon group bonded with a hydrocarbon group such as a methyl group, an ethyl group, a vinyl group, or a phenyl group is condensed through a siloxane bond. Organopolysiloxanes generally contain reactive functional groups in their side chains and are cured by reacting with crosslinking agents. To give specific examples, Shin-Etsu Chemical's one-component RTVs (room temperature vulcanization type) include KE41, KE42, and KE45 (product names), and the two-component RTVs include KE103, Catalyst103, and KS709.
CatalystPS, KS770 and Catalyst PL-1 (product name)
There are also combinations of raw silicone rubber KE76 (trade name) and benzoyl peroxide. In addition, in the present invention, the polymer compound to be mixed with these silicone resins was defined by Zisman (HWFox and WAZisman, J.
Collaid Sci, Vol. 7, 109 and 428 (1952)) A material having a critical surface tension (rc) of 38.5 dyne/cm or more and incompatible with the silicone resin is used. Specific examples include copolymers of vinyl chloride and vinyl acetate, copolymers containing polar monomers such as vinyl alcohol and maleic acid, phenolic resins, epoxy resins, polyester resins, polyamide resins, and vinylidene chloride copolymers. Among them, vinyl chloride-vinyl acetate copolymer resins, phenol resins, and polyester resins are particularly preferred.The amount of these polymers added is in the range of 1 part by weight to 200 parts by weight per 100 parts by weight of silicone resin. However, it is preferably in the range of 3 parts by weight to 100 parts by weight, and more preferably in the range of 5 parts by weight to 50 parts by weight. [Example] Examples of the present invention will be described below, but the present invention is not limited to the scope of the examples. Note that all parts used in the examples indicate parts by weight. Example 1 Dimethylpolysiloxane raw rubber (manufactured by Shin-Etsu Chemical, KE76) (trade name) 60 parts Benzoyl peroxide 1.2 parts Toluene 940 parts Add vinyl chloride/vinyl acetate copolymer (manufactured by Sekisui Chemical, Eslec C) (trade name) ) After adding and stirring a solution consisting of 6 parts and 94 parts of methyl ethyl ketone, it was applied onto an aluminum plate (200 μm thick) electrolytically polished in a 70% phosphoric acid bath so that the dry film thickness was 5 to 6 μm.
It was left to harden at 150°C for 30 minutes. For comparison, a film made of only dimethylpolysiloxane raw rubber without ESLEC C was prepared in the same manner. A similar film was also coated on a polyester film. The toner image was transferred and fixed onto the silicone rubber using an electrophotographic copying machine DC-161 manufactured by Sanda Kogyo. The plate-making master thus prepared was printed on TK manufactured by Toyo Ink using a dry lithography ink with the trade name of Aquares G Sumi to obtain good printed matter. When the background smudge of the printed matter was investigated, it was found that the density of the background smudge was less by 0.01 in the case containing Esslec C. Examples 2 to 6, Comparative Examples 1 to 4 Results of experiments in which various polymers were used instead of Eslec C in Example 1, and the amount added was varied from 5 parts to 100 parts per 100 parts of silicone rubber. are summarized in Table 1. Table 1 also shows the critical surface tension γ c of each polymer, which was obtained by measuring the contact angle (θ) of the polymer surface with various solvents having different surface tensions (γ s ) and plotting cos θ VS.γ s .
上記の如く本発明の混合インキ反撥性層によ
り、印刷の汚れが生ぜず、耐刷力も優れた、簡易
に製版できる湿し水不要平版印刷用版材を得るこ
とが出来た。
As described above, by using the mixed ink repellent layer of the present invention, it was possible to obtain a lithographic printing plate material that does not cause printing stains, has excellent printing durability, and which can be easily plate-made and does not require dampening water.
Claims (1)
要平版印刷用版材において、該インキ反撥性層が
シリコーン樹脂および臨界表面張力が38.5dyne／
cm以上で、該シリコーン樹脂と実質上相溶しない
高分子化合物から構成されることを特徴とする湿
し水不要平版印刷用版材。 ２ 該高分子化合物がフエノール樹脂、ポリエス
テル樹脂、塩化ビニル−酢酸ビニル共重合体系樹
脂から選ばれる樹脂である特許請求の範囲第１項
記載の版材。 ３ 該高分子化合物の含有量が、シリコーン樹脂
固形分の重量部１〜200％である特許請求の範囲
第１項又は第２項記載の版材。[Scope of Claims] 1. A plate material for lithographic printing that does not require dampening water and has an ink-repellent layer on a support, wherein the ink-repellent layer is made of a silicone resin and has a critical surface tension of 38.5 dyne/
1 cm or more, and is comprised of a polymer compound that is substantially incompatible with the silicone resin. 2. The plate material according to claim 1, wherein the polymer compound is a resin selected from phenolic resin, polyester resin, and vinyl chloride-vinyl acetate copolymer resin. 3. The plate material according to claim 1 or 2, wherein the content of the polymer compound is 1 to 200% by weight of the silicone resin solid content.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27502885A JPS62134289A (en) | 1985-12-09 | 1985-12-09 | Plate material for lithography printing not requiring dampening water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27502885A JPS62134289A (en) | 1985-12-09 | 1985-12-09 | Plate material for lithography printing not requiring dampening water |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62134289A JPS62134289A (en) | 1987-06-17 |
| JPH0517872B2 true JPH0517872B2 (en) | 1993-03-10 |
Family
ID=17549866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27502885A Granted JPS62134289A (en) | 1985-12-09 | 1985-12-09 | Plate material for lithography printing not requiring dampening water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62134289A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE534515T1 (en) * | 2002-07-30 | 2011-12-15 | Kodak Il Ltd | SIMPLY COATED, SELF-ORGANIZED, MULTI-LAYER PRINTING PLATE |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106504A (en) * | 1975-03-17 | 1976-09-21 | Fuji Xerox Co Ltd | Shimeshimizufuyono heibaninsatsugenban |
| JPS5478202A (en) * | 1977-12-05 | 1979-06-22 | Ricoh Kk | Method of making dry flat printing plate |
| JPS58186746A (en) * | 1982-04-26 | 1983-10-31 | Toray Ind Inc | Manufacture of lithographic plate material requiring no dampening water |
-
1985
- 1985-12-09 JP JP27502885A patent/JPS62134289A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51106504A (en) * | 1975-03-17 | 1976-09-21 | Fuji Xerox Co Ltd | Shimeshimizufuyono heibaninsatsugenban |
| JPS5478202A (en) * | 1977-12-05 | 1979-06-22 | Ricoh Kk | Method of making dry flat printing plate |
| JPS58186746A (en) * | 1982-04-26 | 1983-10-31 | Toray Ind Inc | Manufacture of lithographic plate material requiring no dampening water |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62134289A (en) | 1987-06-17 |
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