JPS58108035A - Manufacture of flexible magnetic recording medium - Google Patents

Abstract

PURPOSE:To form magnetic recording medium films on both surfaces of a base sheet successively at a high speed by sputtering a magnetic recording medium while allowing the flexible base sheet to run facing flanks of opposed targets through rotating shafts. CONSTITUTION:At an upper electrode 2a and a lower electrode 2b where bar magnets 1 are embedded facing each other, cooling water circulating mechanisms 3 are provided and on the opposite surfaces, targets 4a and 4b each consisting of a magnetic recording medium are fitted. In parallel with target electrode surfaces, rotating shafts 8a and 8b, and 8c and 8d each equipped with the temperature regulating mechanism consisting of a cooling flow tube 6 and a heating coil 7 are arranged, and flexible base sheets 10 fed from feed rollers 9a and 9b are run in crossing relation as shown by arrows and wound around take-up rolls 11b. When plasma 12 is generated between the electrode 2a and 2b in an atmosphere of Ar, sputtered particles pass between anodes 5a and 5b to stick to the base sheets 10, thus forming the magnetic recording medium films on both surfaces at a high speed.

Description

【発明の詳細な説明】 （１）　　発明の技留分野 本斃Ｉｊ１社７し命シプル鵬気記録謙体の製造方法に係
１１．４１１に一直方向に一軸磁気異方性を有する７し
中シプル磁気記＃謀体の製造方法に関する。[Detailed Description of the Invention] (1) The technical field of the invention relates to a method for manufacturing a 7-year-old ship that has uniaxial magnetic anisotropy in a straight direction in 11.411 The present invention relates to a method for manufacturing a Sipul magnetic recording body.

（２）技術の背景 最近、鼻気テープ成るいは磁気ディスク等の義気ｔ―織
体に於て、媒体藺に対して一直方向に砿気記録する１直
磁化記録方式が高密度記録方式としで優れた方法である
として＃＆案されている。(2) Background of the technology Recently, a high-density recording method has been developed in which magnetic tape, magnetic disks, etc. #& has been proposed as being an excellent method.

これは−電磁化方式に於て反磁場による減磁作用か非常
に小さいことによる。そして誼垂直磁化方式の記録謀体
としては、膜面に対して―直方向の一軸磁気異方性を持
つスパッタ法により形成されたコパル）（Ｃｏ）りｐム
（Ｏｒ）合金等の磁性合金膜が多く用いられ、諌磁性合
金展に於ける磁気層Ｂ特性の―直方向の角形成を向上さ
せる手段が種種の角度から検討されている現状である。This is because - in the electromagnetic system, the demagnetizing effect due to the demagnetizing field is very small. The recording material for the perpendicular magnetization method is a magnetic alloy such as Copal (Co) and PM (Or) alloy, which is formed by sputtering and has uniaxial magnetic anisotropy perpendicular to the film surface. At present, many films are used, and various angles are being investigated to improve the corner formation in the direction perpendicular to the magnetic layer B characteristic in the development of a magnetic alloy.

（３）従来技術と閲亀点 上記喬直磁−化記録方式の７し中シプル磁気記録謀体を
形成するに際して、従来は通常の高周数二極スパッタ形
成るいはＶグネトロ／スパッタ装置を用い、走行するマ
イラ成るいはポリエステル尋からなるフレキシブル基体
シートを前記スパッタ装置の０ｏＯｒ合金ターゲットに
対向して配置し該基体上ＫＯＯＯｒ合金からなる磁気記
―謀体のスパッタ膜を被着させる方法が用いられてい友
、然し上記従来方法に於ては、印フレキシブル１体シ−
ト画がターゲツト面に対向している丸めに基体シートが
電子衝撃及びターゲツト面からの熱輻射によりてそや質
形温直以上に加熱嘔れ、基体シートの平ｉ１直が損われ
る、（０）前記電子衝撃及び輻射熱による昇温によシ磁
気記録媒体膜の磁気層ｍ％性に於ける喬直方向の角形性
が横われる、等の問題点がＴｏつ九。(3) Prior art and review points When forming a medium sipple magnetic recording system using the above-mentioned direct magnetization recording method, conventionally, conventional high-frequency bipolar sputtering or V-Gnetro/sputtering equipment was used. A flexible substrate sheet made of mylar or polyester thin film is placed opposite the OoOr alloy target of the sputtering device, and a sputtered film of a magnetic recording material made of KOOOr alloy is deposited on the substrate. However, in the above conventional method, a single flexible sheet is used.
When the target image is facing the target surface, the base sheet is heated more than the normal temperature due to electron impact and heat radiation from the target surface, and the flatness of the base sheet is damaged. ) There are nine problems such as the fact that the squareness in the perpendicular direction in the m% of the magnetic layer of the magnetic recording medium film is changed due to temperature increase due to the electron impact and radiant heat.

（４）　　＠明の目的 本偽＄１０目的は、磁気記録媒体膜をフレキシブル基体
シートの両ＩＮＫ低温で連続的に＾連形成させることが
可ｆ１亀スパッタ形成方法を提供し、上記問題点を除去
すｈことＫある。(4) Purpose of @Ming False $10 The purpose is to provide an f1 sputter formation method that allows magnetic recording media films to be continuously formed on both INKs of a flexible base sheet at low temperatures, and to solve the above problems. There is a method called removal.

（５）　　斃明の構成 本発明はフレキシブル磁気記録媒体の製造方法に於て、
対向ターゲット方式のスパッタリング手段を用い、対向
ターゲットの側面近傍に設は九装置調節手段を具備する
単数着しくは複数の回転軸を介して対向ターゲットの側
面に面してフレキシブル１体シートを走行させ、該７レ
キシプル基体シートの両画に連続して磁気記録媒体膜を
スパッタ形成することを％像とする。(5) Structure of the present invention In a method for manufacturing a flexible magnetic recording medium,
Using a facing target type sputtering means, a single flexible sheet is run facing the side surface of the facing target via one or more rotating shafts equipped with a device adjustment means installed near the side surface of the facing target. , continuous sputtering of a magnetic recording medium film on both images of the 7 lexiple base sheet is defined as a % image.

泰　嬌Ｗの詳ｉＩａ表説明 （６）発明の実施町 以下本発明を一実施例について、第１図に示す誼実施例
に用いたスパッタリング装置の嶽部斜視模式図、及び第
２図に示する該スパッタリング装置に於ける矢視ム方向
側面図を用いて詳細に説明する。なおここで嬉１図及び
ｇ２図に於ける各部は同記号で示しである。Detailed explanation of Yasushi W (6) Implementation of the invention The following is an example of the present invention, which is shown in FIG. The sputtering apparatus will be explained in detail using a side view in the direction of arrows. Note that each part in Figure 1 and Figure G2 is indicated by the same symbol.

本発明の一実施例に於て用いたスパッタリング装置は、
第１図及び第２図に示す鼾、うな構造を有してなりてい
る。即ち図示しない真空容器内に１例えばＮ極を主面１
１に向けて一様な密度で棒磁石１が塩め込まれ九上部タ
ーゲット電極２ａと、同様な密度で８極を主面側に向け
て棒磁石１が纏め込まれた下部ターゲット電極２ｂが、
所望の間隔で対向せしめられた通常の対向ターゲット電
極が配設される。なお該対向ターゲット電極には通常通
シ電極の昇温を抑える良めの冷却水循槙機構３が付加さ
れる。１１気記錐媒体材料からなるスパッタ・ターゲッ
ト例え１ｊｏｏｏｒ合金ターゲット０及びａｂｄそれぞ
れ上部ターゲット電極２１Ｌ及び下部ターゲット電＠２
ｂの主面上に取付けられる。The sputtering equipment used in one embodiment of the present invention was as follows:
It has a snoring structure shown in FIGS. 1 and 2. That is, in a vacuum container (not shown), for example, a N pole is placed on the main surface 1.
There are nine upper target electrodes 2a in which bar magnets 1 are filled with salt with a uniform density toward 1, and a lower target electrode 2b in which bar magnets 1 are packed together in a similar density with 8 poles facing the main surface side. ,
Ordinary opposing target electrodes are provided facing each other at a desired spacing. Note that a good cooling water circulation mechanism 3 is usually added to the opposing target electrode to suppress the temperature rise of the through electrode. 11 Sputter target made of conical medium material Example 1 Jooor alloy target 0 and abd Upper target electrode 21L and lower target electrode @2 respectively
It is attached on the main surface of b.

又シールドを兼ね九陽１に５１及び５ｂは通常通ジター
ゲット電＠　２　＆及び２ｂの両側面から僅かに離れ九
場所にそれぞれターゲット電極側面に平行して配設され
る。そして陽ｌｋ５　ａ　＊　５　ｂをへたてて史に３
０〜５０（ＩＩＩ）１ｍ度離れたターゲット電極２１及
び２ｂの両側方位置に、ターゲット電極側面に平行して
、例えば回転ドラム等からな９冷却水流通管６等からな
る冷却機構及び加熱線輪７勢からなる加熱機構を具備し
温度調節が可能な各２〔本〕の回転軸ｇａ、ｇｂ及びｇ
ｃ　、　８（１がそれぞれ配設されてなル、別に設けら
れた２（＄３のシート送シローラ９ａ、自すから送シ出
されたポリエステル尋からなる帯状の７レキシプル基体
シート１Ｇは前記１転軸７ｇ、７ｂ及び７０．７＋１間
に図示のようＫたすき状にかけ渡され、諌回転軸〕４゜
ｌ及び７ａ、７１を介して対向する０００ｒ会金ターゲ
ツト４　ａ　ｔ　４　’ｂ　Ｃ）１１１１部の側方を該
ターゲットの一面に面して移動しシート巻取シローシ１
１＆。In addition, 51 and 5b, which also serve as shields, are usually arranged in parallel to the side surfaces of the target electrodes, slightly away from both sides of the target electrodes 2 & and 2b. And let the positive lk5 a * 5 b go down to history 3
0 to 50 (III) At both sides of the target electrodes 21 and 2b, 1 m degrees apart, and parallel to the side surfaces of the target electrodes, a cooling mechanism consisting of 9 cooling water flow pipes 6, etc., such as a rotating drum, etc., and a heating coil are installed. Two rotating shafts ga, gb, and g each equipped with a heating mechanism consisting of 7 units and capable of temperature adjustment.
c, 8 (1) are respectively disposed, 2 ($3) sheet feeding rollers 9a are provided separately, and a belt-shaped 7 lexiple base sheet 1G made of self-feeding polyester sheet is provided as described above. The 000r metal target 4a t 4'b C) 1111 is stretched across the rotating shafts 7g, 7b and 70.7+1 in a cross-shaped manner as shown in the figure, and faces across the vertical rotation shafts]4゜l and 7a, 71. The sheet winding sheet 1 is moved so that the side of the part faces one side of the target.
1&.

１１１）にそれ′ぞれ巻！取られるようになっている。111) and each volume! It is about to be taken.

なお上記構造に於て基体シート１０を九すき状にかけ渡
したのはターゲット側面に直かに面するシート両面の面
積を均等にするためで、史に両面の被着膜厚を勢しくす
る九めにはたすき掛けの中点をターゲット間ｌｌｌ０中
心面と一致せしめる。In the above structure, the base sheet 10 is spread across nine spaces in order to equalize the area of both sides of the sheet facing directly to the target side. In order to do so, the midpoint of the cross-over is made to coincide with the inter-target lll0 center plane.

本発明の方法に於ては、例えば上記のようなスパッタリ
ング装置を用い、図示しない真空容器内を１　＝　２　
ｘ　１０−”　（Ｔｏｒｒ　）９度のアルボｙ　（Ａ　
ｒ）雰囲気に保ち、対向するターゲット電極２ａ及び２
ｂに例えばそれぞれ−５００（Ｖ）＠寂の直流負電圧−
１を印加し、陽極５１及び５ｂをアースＧ即ち直流０〔
ｖ〕電位とし、対向ターゲット間にプラスｉを発生させ
て、諌７ラズマによりて励起された荷電アルゴン粒子（
ムｒ＋）の衝撃により０ｏＯｒ合金をスパッタさせる。In the method of the present invention, for example, a sputtering apparatus as described above is used, and the inside of a vacuum container (not shown) is 1 = 2.
x 10-” (Torr) 9 degrees Alboy (A
r) Keep the target electrodes 2a and 2 facing each other in the atmosphere.
For example, -500 (V) @ Jaku DC negative voltage for each b.
1 is applied, and the anodes 51 and 5b are connected to ground G, that is, DC 0 [
v] electric potential, generate plus i between the opposing targets, and charge argon particles (
The 0oOr alloy is sputtered by the impact of the 0oOr alloy.

このような対向ターゲット方式のスパッタに於ては、対
向するＣ００ｒ倉金ターゲット４ｍ、４ｂ１４Ｉ６に形
成されているターゲツト面に−直な磁界と電界が千行く
なる九めターゲット面間に１縮プラズマ１２が発生し、
その結果ターゲットは高速でスパッタされ、０ｏＯｙ合
金のスパッタ粒子は１Ｉｉｋ５ａと５ｂの間隙部から側
方に放射状に飛び出し、＃領域を送られているフレキシ
ブル基体シート１０のターゲット側面に向う面に５００
０（Ａ／分）　　１ｉｌの速さで被着する。なお基体シ
ー）１Ｇは前述のように回転軸８．ａ　、　８ｂ及びｆ
３ｏ、８ａ間にそれぞれ九す龜がけ場れているので、両
面に同じ厚さの０ｏＯｒスパツメ展が被着される。この
ように内向に−じ厚さのスパッタ膜を形成することは、
膜付着による応力を両面間で相殺し、基体シートの変形
を防止するうえで重畳である。一方、０ｏＯｙ等の磁気
記録媒体鵬をスパッタ形成する際に１良好な垂直方向の
磁気異方性を得るのに最適な基体温度が存在する。In such facing target type sputtering, a 1-condensed plasma 12 is generated between the nine target surfaces where the magnetic field and electric field are 1,000 lines perpendicular to the target surfaces formed on the opposing C00r metal targets 4m, 4b14I6. occurs,
As a result, the target is sputtered at a high speed, and the sputtered particles of the 0oOy alloy fly out radially to the side from the gap between 1Iik5a and 5b, and are deposited on the surface of the flexible base sheet 10 facing the target side surface that is being fed through the # area.
Deposits at a rate of 0 (A/min) 1 il. Note that the base seat) 1G is the rotating shaft 8. a, 8b and f
Since there are nine spouts between 3o and 8a, the same thickness of 0oOr spats is applied to both sides. Forming a sputtered film of the same thickness inward in this way
This is superimposed in order to offset stress caused by film adhesion between both surfaces and prevent deformation of the base sheet. On the other hand, there is an optimum substrate temperature for obtaining good perpendicular magnetic anisotropy when sputtering a magnetic recording medium such as 0oOy.

これはその温度がスパッタ時の特に膜成長に重畳な役１
１Ｉｌりを果しておシ、それが前述し九−軸異方性の磁
気履歴特性を左右するからである。そしてこの最適亀覆
は１００〔℃１程度以下の低温と考えられている。又一
方平滑な記録媒体面を形成することは、テープにしろ７
０ツビデイスクにしろ磁気ヘッドの安定浮上を保つうえ
で１めて重畳なことである。そこでフレキシブル基体シ
ートの熱変形を防止し平滑な媒体面を得るためＫも基体
シートの温度上昇は制限され、例えはポリエステルから
なる基体シートに於ては基体シートの温度を１５０【′
Ｏ）以下徊度に抑える必資がある。This is because the temperature plays a superimposed role on film growth, especially during sputtering.
This is because it influences the magnetic hysteresis characteristics of the nine-axis anisotropy mentioned above. This optimum coating is thought to be at a low temperature of about 100°C or less. On the other hand, forming a smooth recording medium surface is important for tapes as well.
Even if it is a 0-tube disk, this is a superimposed factor in maintaining stable flying of the magnetic head. Therefore, in order to prevent thermal deformation of the flexible base sheet and obtain a smooth medium surface, the temperature rise of the base sheet is limited.For example, in the case of a base sheet made of polyester, the temperature of the base sheet is increased to 150
O) There is a need to keep things to a minimum.

本発明の方法に於ては、これらの点を考慮して基体シー
トの温度を低温に保′）１＋−択がこうじられる。即ち
第１図及び第２１１Ｉに示すように、対向ターゲット構
造を有しフレキシブル基体シート１０がターゲツト面に
対向しないので電子の衝撃、ターゲツト面からの熱輻射
勢による昇温が防止される。且り又フレキシブル基体シ
ー）１０の温度が冷却、加熱機構を具備した回転軸８ａ
、ｇｂ、ｌｉｅ。In the method of the present invention, the temperature of the base sheet is maintained at a low temperature in consideration of these points. That is, as shown in FIGS. 1 and 211I, since the flexible base sheet 10 has a facing target structure and does not face the target surface, temperature rise due to electron impact and thermal radiation from the target surface is prevented. In addition, the rotating shaft 8a is equipped with a cooling and heating mechanism to adjust the temperature of the flexible base sheet 10.
,gb,lie.

８ｄとの間の熱伝導によって調節がなされる。そしてス
パッタ膜の被着速度は前記のように５０００【１／分〕
１ｍ度の高速であるので、所定の膜厚１【μｌＮ］程度
の０ｏＯｒスパツタ膜を形成する―のシート送り速度は
高速になり、基体シート９の瓢皺は回転軸ｓ　ａ　ｅ　
ｓ　ｂ　＊　８０＋　８　”の温度と殆んど勢しい温度
に胸部できる。従って回転軸ｇａ、８ｂ、ｇａ８ｄのＩ
ＩＬ度を１００（’０３以下の所定の低温に保つことに
よシ、７レキシプル基体シート１００両面に０ｏＯｙ合
金の低温スパッタ族を高速で形成させることがで龜る。Adjustment is made by heat conduction between 8d and 8d. And the deposition rate of the sputtered film is 5000 [1/min] as mentioned above.
Since it is a high speed of 1 m degree, the sheet feeding speed for forming a 0oOr sputter film with a predetermined film thickness of about 1 [μlN] is high, and the wrinkles of the base sheet 9 are aligned with the rotation axis s a e
The temperature of s b * 80 + 8'' is almost intense.Therefore, the I of the rotation axes ga, 8b, ga8d
By keeping the IL degree at a predetermined low temperature of 100 ('03 or less), it is possible to form a low-temperature sputter group of 0oOy alloy on both sides of the 7-lexiple base sheet 100 at a high speed.

なお上記実施例の方法に於て、対向ターゲットの側面長
を大きくシ、回転軸の長さを淡くし工、シートのたすｔ
Ｉ掛は回数を増すことによＬ　ＩＫスパッタ効率が増す
と同時に温度制御精度も向上する。In addition, in the method of the above embodiment, the side length of the opposing target is increased, the length of the rotating shaft is decreased, and the total length of the sheet is increased.
By increasing the number of I-threads, LIK sputtering efficiency increases and temperature control accuracy also improves.

上記実施例に於ては、対向ターゲットの両側方に基体シ
ートを走らせて二条の基体シートに同時にスパッタ膜の
形成を行−）九が、勿論事情によつては基体シートの退
行機構を対向ターゲットの片側に設けて一条の基体シー
トにスパッタ膜を形成しても嵐い。、又上記実施例に於
て社基体シートを一転軸に九すき掛けすることにより、
一つの対向ターゲットで基体シートの両面にスパッタ膜
を被着せしめたが、前記九すき掛けを行わず基体シート
の画情に対向ターゲットを設けて、基体シート１面に同
時にスパッタ族を被着せしめても良い。In the above embodiment, the base sheet is run on both sides of the opposing target to simultaneously form sputtered films on two strips of the base sheet. Even if it is provided on one side of the base sheet and a sputtered film is formed on a single strip of the base sheet, it will not be easy. , Also, in the above embodiment, by hanging the base sheet on the rotation shaft nine times,
The sputtered film was applied to both sides of the base sheet using one opposing target, but instead of performing the above-mentioned 9-ply coating, an opposing target was provided at the image level of the base sheet, and the sputtered film was applied to one side of the base sheet at the same time. It's okay.

（７）発明の詳細 な説明しえように本発明によれは、フレキシブル基体の
両面に低温高速で磁気記録媒体展をスパッタ形成するこ
とができる。従２て垂直方向の一軸異方性を有し、且つ
磁気履歴特性に於ける角形性が優れ高密度記録に適した
磁気記録媒体が形成できると同時に、被着膜の応力及び
加熱によるフレキシブル基体の変形が防止されるので、
ヘッドの安定浮上が充分に確保できる平滑性の優れたフ
レキシブル磁気記録媒体を製造することができる。(7) Detailed Description of the Invention According to the present invention, a magnetic recording medium can be formed by sputtering on both sides of a flexible substrate at low temperature and high speed. Therefore, it is possible to form a magnetic recording medium that has uniaxial anisotropy in the perpendicular direction and has excellent squareness in magnetic hysteresis characteristics and is suitable for high-density recording, and at the same time, it is possible to form a flexible substrate by stress and heating of the deposited film. This prevents deformation of the
A flexible magnetic recording medium with excellent smoothness that can sufficiently ensure stable flying of the head can be manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明の一実施例に用いたスパッタリング装置
の賛部斜視模式図で、第２図は同じく矢視Ａ方向側面図
である。図に於て、４　ａ　＋　４　ｂ　Ｂコバルト・
クロム合金ターゲット、６は冷却水流通管、７は加熱線
輪、８ａｔ８ｂ、８ｏ、８４は回転軸、。 ９ａ、９ｂは送シローラ、Ｘ０Ｆｉフレキシブル基体シ
ート、１１１．１１ｂ　Ｆｉ巻巻取−−ラ、１２は濃縮
プラズマを示す。 １ｇ　２　図FIG. 1 is a schematic perspective view of a sputtering apparatus used in an embodiment of the present invention, and FIG. 2 is a side view in the direction of arrow A. In the figure, 4 a + 4 b B cobalt.
Chromium alloy target, 6 is a cooling water flow pipe, 7 is a heating coil, 8at8b, 8o, 84 is a rotating shaft. 9a and 9b are feeding rollers, X0Fi flexible base sheet, 111.11b Fi winding roller, and 12 are concentrated plasma. 1g 2 figure

Claims (1)

【特許請求の範囲】[Claims] 対向ターゲット方式のスパッタリング手段を用い、対向
ターゲットの何面近傍にｉけ九温度調節手＊ｔＡ備する
単数着しく社複数の回転軸を介して対内ターゲットの何
面に面してフレキシブル基体シートを走行畜せ、誼フレ
キシブル基体シートｔ）ｌｌｊａ＠に連続して一気記録
媒体！ａをスパッタ形成することを特徴とするフレキシ
ブル磁気記録謀体の製造方法。Using a facing target type sputtering means, a flexible base sheet is applied to any surface of the inner target through multiple rotating shafts equipped with nine temperature control means near each surface of the facing target. Run fast, flexible base sheet t)llja@ and recording media all at once! 1. A method for manufacturing a flexible magnetic recording material, comprising sputtering a.