JPS6052930A - Production of vertical magnetic recording medium - Google Patents

Abstract

PURPOSE:To prevent deterioration in the magnetic characteristic of a soft magnetic layer owing to the evaporated matter from a flexible org. high polymer base plate, etc. and to obtain an excellent recording medium by maintaining the base plate temp. at a specific value or below and forming a soft magnetic alloy layer consisting principally of NiFe on said plate then forming a vertically magnetized film which is a Co alloy film thereon. CONSTITUTION:The temp. of an org. high polymer base plate F consisting of a polyethylene terephthalate, etc is maintained at <=120 deg.C and, for example, an NiFeMo alloy film S consisting principally of NiFe is formed. A thin alloy film R consisting of CoCr, etc. is then laminated on the film S. If the base plate temp. is maintained at <=120 deg.C, the deterioration in the magnetic characteristic of the soft magnetic layer S and the decrease in adhesiveness by the oligomer deposited on the surface from the base plate F in particular are prevented and the roughening of the surface of the vertically magnetized layer R is prevented. The double-side laminated magnetic recording layers having excellent durability are thus provided.

Description

【発明の詳細な説明】 ［技術分野］ 本発明は垂直磁気記録媒体の製造方法に関し、更に詳し
くは可撓性を有する有機高分子の基板上にＮｉ　Ｆｅ合
金膜からなる軟磁性層とＣＯ系合金膜からなる垂直磁気
記録層を形成した垂直磁気記録媒体の製造方法に関する
。Detailed Description of the Invention [Technical Field] The present invention relates to a method for manufacturing a perpendicular magnetic recording medium, and more specifically, the present invention relates to a method for manufacturing a perpendicular magnetic recording medium, and more specifically, a soft magnetic layer consisting of a NiFe alloy film and a CO-based soft magnetic layer on a flexible organic polymer substrate. The present invention relates to a method of manufacturing a perpendicular magnetic recording medium having a perpendicular magnetic recording layer formed of an alloy film.

［従来技術］ 近年、高密度記録特性の優れた磁気記録方式として、垂
直磁気記録方式が提案されている。この方式は、特公昭
５８−９１号公報、特公昭５８−　１０７６４号公報等
で公知の如く、磁化容易軸が膜面に対して垂直な方向を
有する記録媒体を用い、残留磁化が膜面に対して垂直に
向くように記録するもので、信号が高密度になるほど媒
体内反磁界は減少し、優れた記録及び再生を行なうこと
ができる。この方式に適する藺録媒体としてＣＯ系合金
薄膜（特にＣ０Ｃｒ合金薄膜）が公知である。特に、特
公昭５８−９１４公報に提案されているＣＯ系合金薄膜
の下地にパーマロイ合金のような軟磁性層を設けた垂直
磁気配録媒体は、記録効率が向上できるとともに、大ぎ
な再生出力が得られる点から注目されている。[Prior Art] In recent years, a perpendicular magnetic recording method has been proposed as a magnetic recording method with excellent high-density recording characteristics. This method uses a recording medium in which the axis of easy magnetization is perpendicular to the film surface, as is known from Japanese Patent Publication No. 58-91 and Japanese Patent Publication No. 58-10764. Recording is performed perpendicularly to the magnetic field, and as the signal density increases, the demagnetizing field within the medium decreases, making it possible to perform excellent recording and reproduction. A CO-based alloy thin film (particularly a COCr alloy thin film) is known as a recording medium suitable for this method. In particular, the perpendicular magnetic recording medium proposed in Japanese Patent Publication No. 58-914, in which a soft magnetic layer such as permalloy alloy is provided on the base of a CO-based alloy thin film, can improve recording efficiency and provide a large reproduction output. It is attracting attention because of the benefits it provides.

ところで、上述の垂直磁気記録媒体において、安価で且
つ機械的特性に優れたポリエチレンテレフタレート（Ｐ
ＥＴ）等の有機高分子のフィルムを基板として、その上
にスパッタリング法により軟磁性層及び記録層を形成し
た場合、その表面が粗面化されると共に軟磁性♂シ磁気
特性が劣化し、所望の記録特性及び再生特性が得られな
い問題がある。By the way, in the above-mentioned perpendicular magnetic recording medium, polyethylene terephthalate (P) is used, which is inexpensive and has excellent mechanical properties.
When a soft magnetic layer and a recording layer are formed by sputtering on an organic polymer film such as ET) as a substrate, the surface is roughened and the soft magnetic properties are deteriorated, making it difficult to achieve the desired results. There is a problem that recording and reproduction characteristics cannot be obtained.

Ｌ本発明の目的］ 本発明はかかる問題を解決すべくなされたもので、有機
高分子からなる基板を用いたかかる問題のない垂直磁気
記録媒体の製造方法を提供することを目的とする。LObject of the Present Invention The present invention was made to solve such problems, and an object of the present invention is to provide a method for manufacturing a perpendicular magnetic recording medium using a substrate made of an organic polymer and free from such problems.

［本発明の構成及び作用効果］ 前述の目的は以下の本発明により達成される。[Configuration and effects of the present invention] The above objects are achieved by the invention as follows.

りなわら、本発明は可撓性の有機高分子の基板上にＮｉ
、Ｆｅを主成分とする合金膜からなる軟磁性層とＣＯ系
合金膜よりなる記録層とを有する垂直Ｉｔ気記録媒体を
製造するに際し、前記軟磁性層を１２０℃以下の基板温
度で形成し、次いで前記記録層を形成することを特徴と
する垂直磁気記録媒体の製造方法である。However, in the present invention, Ni is deposited on a flexible organic polymer substrate.
When manufacturing a perpendicular IT recording medium having a soft magnetic layer made of an alloy film mainly composed of Fe and a recording layer made of a CO-based alloy film, the soft magnetic layer is formed at a substrate temperature of 120° C. or less. This is a method of manufacturing a perpendicular magnetic recording medium, characterized in that the recording layer is then formed.

上述の本発明は以下のようにしてなされたものである。The above-mentioned present invention was made as follows.

本発明の対象である基板上に軟磁性層と記録層とを有す
る垂直磁気記録媒体（以下二層膜媒体という）において
、高密度記録が可能で実用となる再生出力を得るために
は、記録層のｃｏ系合金膜の膜面に垂直方向の保磁力が
適当な値（大略５００±１５００ｅ　（エルステッド）
程度）を有することが必要である。これを満足するＣＯ
系合金膜を得るには、その膜形成時の基板温度を一定温
度以上に保持しなければならない。例えば、ＣＯ系合金
膜がＣ０Ｃｒ合金膜の場合には、その垂直方向の保磁力
口ＣＶとこれをスパッタリング法によって形成する際の
基板温度Ｔとは、第１図に示ずような関係にあり、３５
００　ｅ以上の保磁カドｌｃｖを得るには基板温度Ｔは
１４０℃以上の高温にする必要がある。なお、第３図の
基板温度Ｔは基板を移送するキャンの表面温度である。In a perpendicular magnetic recording medium (hereinafter referred to as a dual-layer film medium) having a soft magnetic layer and a recording layer on a substrate, which is the object of the present invention, in order to achieve high-density recording and to obtain a practical reproduction output, recording The coercive force in the direction perpendicular to the film surface of the co-based alloy film of the layer is an appropriate value (approximately 500±1500e (Oersted)
degree). CO that satisfies this
In order to obtain a alloy film, the substrate temperature must be maintained at a certain temperature or higher during film formation. For example, when the CO-based alloy film is a C0Cr alloy film, the vertical coercive force port CV and the substrate temperature T when it is formed by sputtering have a relationship as shown in Figure 1. , 35
In order to obtain a coercivity quadrature lcv of 00 e or more, the substrate temperature T needs to be as high as 140° C. or more. Note that the substrate temperature T in FIG. 3 is the surface temperature of the can for transferring the substrate.

そして、種々検問の結果、本発明者らは前述したように
有機高分子の基板を用いた二層膜媒体の表面が粗面化し
たり、軟磁性層の軟磁気特性が劣化するのは、前述の高
温下での記録層形成時等に基板表面に基板中に含まれる
揮発分が析出することに原因があることをつきとめ本発
明に到達した。As a result of various examinations, the present inventors found that the reason for the roughening of the surface of a two-layer film medium using an organic polymer substrate and the deterioration of the soft magnetic properties of the soft magnetic layer as described above. The present invention was achieved by discovering that the cause is that volatile components contained in the substrate are deposited on the substrate surface during the formation of the recording layer at high temperatures.

以下、その点をＰ　Ｅ　Ｔ　基板上に軟磁性層としてＮ
ｉ　Ｆｅｌｙｌｏ合金膜を、記録層としてＣｏ　Ｃｒ合
金膜をスパッタリング法により形成した二層膜媒体の例
に基いて詳述する。Below, we will discuss this point as a soft magnetic layer on the P E T substrate.
The i-Felylo alloy film will be described in detail based on an example of a two-layer film medium in which a Co Cr alloy film is formed as a recording layer by sputtering.

第２図にＮｉ　「ｅＭｏ合金よりなる厚さ０．４４μ汎
の軟磁性層の形成時の基板温度Ｔとその面内方向の保磁
力Ｈｃｈとの関係をミ第４図に前述の二層膜媒体の軟磁
性層の該保磁力Ｈｃｈと２ＫＦＲＰＩ矩形波の記録再生
用ツノＥＤとの関係を示した。Figure 2 shows the relationship between the substrate temperature T and the coercive force Hch in the in-plane direction during the formation of a 0.44μ thick soft magnetic layer made of Ni and Mo alloys. The relationship between the coercive force Hch of the soft magnetic layer of the medium and the horn ED for recording and reproducing 2KFRPI square waves is shown.

なお、記録再生時１ノ１の測定条件を表−１に示した。Note that Table 1 shows the measurement conditions for 1/1 during recording and reproduction.

使用したヘッドは特公昭５８−９１号開示の補助！ｉ極
励磁型の垂直ヘッドを用いた。さらに軟磁性層上に形成
した記録層のＣｏ　Ｃｒ合金薄膜（Ｃｒ：２０重皐％）
の特性を表−２に示した。The head used was assisted by the disclosure of Special Publication No. 58-91! An i-pole excitation type vertical head was used. Furthermore, a CoCr alloy thin film (Cr: 20%) of the recording layer formed on the soft magnetic layer
The characteristics are shown in Table 2.

表−１：電磁変換特性の測定条件 表−２：ＣＯＣｒ合金薄膜の特性 〈＊〉　Δθ艶：×線回折のｈｃｐ　（００２）面のロ
ツギング曲線の半値巾従来は軟磁性層の磁気特性（１１
Ｃ等）にあまり注意が払われていなかっ１＝が、第２図
、第３図より軟磁性層形成時の基板温度Ｔと軟磁性層の
保磁力１−ＩｃＩＩど二層膜媒体の再生出力Ｅｐには明
瞭な関係が存在することが判明した。すなわち良好な再
生出力Ｅｐを得るには、低い基板温度Ｔで基板よりの揮
発力の析出を防止しながら軟磁性膜を形成する必要があ
る。なお、かかる基板よりの揮発分とは、水分等基板表
面の吸着物があるが、特に両面に磁性層を有するフロッ
ピーディスクのごとき両面媒体においては基板のＰＥＴ
フィルムより析１１１１ノ、表面で結晶化する主として
３樋体よりなるオリゴマーが、表面を粗面化し、大きな
問題となる。Table 1: Measurement conditions for electromagnetic conversion characteristics Table 2: Characteristics of COCr alloy thin film <*> Δθ gloss: x-ray diffraction hcp
1=, which has not paid much attention to (C, etc.), but as shown in Figures 2 and 3, the reproduction output of the double-layer film media is determined by the substrate temperature T during the formation of the soft magnetic layer and the coercive force of the soft magnetic layer 1-IcII. It was found that there is a clear relationship between Ep. That is, in order to obtain a good reproduction output Ep, it is necessary to form a soft magnetic film at a low substrate temperature T while preventing volatile precipitation from the substrate. Incidentally, such volatile matter from the substrate includes substances adsorbed on the substrate surface such as moisture, but especially in double-sided media such as floppy disks that have magnetic layers on both sides, the volatile matter from the substrate is PET.
When the film is analyzed, oligomers mainly consisting of three trough bodies that crystallize on the surface roughen the surface and become a major problem.

本発明者らの真空中でのＰＵＴよりのオリゴマー析出状
況の研究において、オリゴマーの析出・結晶化は主とし
て加熱面、ずなわち高温のキャンに接触する面で発生し
、大気中とは挙動が異ることが判明した。すなわち、基
板の片面にのみ磁性層を有する媒体の作製時においては
、基板の磁性層側へのオリゴマー析出↓まなく（又は、
析出してもすぐに昇華し）、軟磁性層の磁気特性を若干
損うのみで表面を粗面化することはないが、両面に磁性
層を有する媒体においては、片面の磁性層。In our research on oligomer precipitation from PUT in vacuum, we found that oligomer precipitation and crystallization mainly occur on the heated surface, that is, on the surface that comes into contact with the high-temperature can, and the behavior differs from that in the atmosphere. It turned out to be different. In other words, when producing a medium that has a magnetic layer on only one side of the substrate, oligomer precipitation on the magnetic layer side of the substrate (or
Even if it precipitates, it sublimes immediately), which only slightly impairs the magnetic properties of the soft magnetic layer and does not roughen the surface.

記録層のスパッタ膜形成時に反対面に析出・結晶化する
オリゴマーの為に反対面が粗面化し大ぎな問題となる。During the sputtering film formation of the recording layer, oligomers precipitate and crystallize on the opposite surface, causing the opposite surface to become rough, causing a serious problem.

ところで、かかるオリゴマーの析出は、２軸延伸ＰＥＴ
フイルムでは延伸倍率や熱固定温度により１０〜２０℃
程度の差を有し、ポリエチレンナフタレートではやや少
ないものの、概略１２０　’Ｃ以上で現れ、特に１４０
℃以上では顕著となる。オリゴマーの析出した媒体にお
いては、スペーシングロスによる出力低下のみでなく、
基板とその−Ｌに形成される合金膜どの接着性や耐久性
が劣化するという問題がある。By the way, the precipitation of such oligomers occurs in biaxially stretched PET.
For films, the temperature is 10 to 20℃ depending on the stretching ratio and heat setting temperature.
There are differences in degree, and although it is slightly less in polyethylene naphthalate, it appears at approximately 120'C or higher, and especially at 140'C.
It becomes noticeable at temperatures above ℃. In media where oligomers are precipitated, not only the output decreases due to spacing loss, but also
There is a problem in that the adhesion and durability of the alloy film formed on the substrate and its -L deteriorate.

本発明は以上に述べた知見に基いてなされたものであり
、従って、前述した本発明により低保磁力の軟磁性層を
有し、表面性も損われていない良好な高分子基板の二層
膜媒体が得られることは明らかである。The present invention has been made based on the above-mentioned knowledge, and therefore, the present invention has been made to provide a two-layer polymer substrate having a soft magnetic layer with a low coercive force and having good surface properties with no loss in surface properties. It is clear that a membrane medium is obtained.

更に、フロッピーディスクに適した第４図に示すように
、基板Ｆの両面に軟磁性層Ｓと記録層Ｒを設けた両面二
層膜媒体においては、軟磁性層Ｓを両面に形成した後、
記録層Ｒを形成することにより、両面共良好な特性の高
分子基板の両面二層膜媒体が得られる。Furthermore, in a double-sided double-layer film medium in which a soft magnetic layer S and a recording layer R are provided on both sides of a substrate F, as shown in FIG. 4, which is suitable for a floppy disk, after forming the soft magnetic layer S on both sides,
By forming the recording layer R, it is possible to obtain a double-sided double-layer film medium of a polymer substrate with good characteristics on both sides.

なお、本発明において基板温度とは、基板の温度を規制
する冷却キャン、基板ホルダー等の基板との接触面の温
度をいう。Note that in the present invention, the substrate temperature refers to the temperature of the contact surface with the substrate of a cooling can, a substrate holder, etc. that regulates the temperature of the substrate.

又、本発明の基板は有機高分子−フィルムからなるもの
である。有機高分子としては、ポリエステル、ポリイミ
ド等公知のものが適用できるが、安価で表面性１寸法安
定性等の機械的特性に優れたエチレンテレフタレートま
たはエチレンナフタレートを主構成成分とするポリエス
テルが好まし０゜なお、本発明の軟磁性層はＮ＋Ｆｅ合
金やＮｉＦｅＭｏ合金よりなるいわゆるパーマロイを代
表とするものであるが、他にＣＯ，Ｆ　Ｑを主成分とし
、Ｚｒ、Ｎｂ、Ｔａ、Ｗ、Ｂ、Ｓｉ等を添加Ｌ　ｔｃ　
７−Ｅ　）Ｌｉ　７アス合金も使用され得る。記録層は
Ｃｒを１０〜２５重量％含有するＣｏ　Ｏｒ金合金代表
とするが、他にＣ０ＣｒにＲｅ、Ｗ、ＭＯ，Ｔａ等を添
加したものやバリウムフェライト等も使用され得る。作
製法はスパッタ法が好ましいが、蒸着、イオンブレーテ
ィングでもよい。又、軟磁性層と記録層の間に中間層が
あっても、記録層上に適当な保護層があってもよく、又
基板上に接着層があってもよい。Further, the substrate of the present invention is made of an organic polymer film. As the organic polymer, known materials such as polyester and polyimide can be used, but polyester whose main constituent is ethylene terephthalate or ethylene naphthalate is preferred because it is inexpensive and has excellent mechanical properties such as surface properties and 1-dimensional stability. 0° The soft magnetic layer of the present invention is typically made of so-called permalloy made of N+Fe alloy or NiFeMo alloy, but it also contains CO, FQ as main components, Zr, Nb, Ta, W, B, Addition of Si etc. L tc
7-E) Li7As alloys may also be used. The recording layer is typically made of a CoOr gold alloy containing 10 to 25% by weight of Cr, but other materials such as COCr with Re, W, MO, Ta, etc. added, barium ferrite, etc. may also be used. Although a sputtering method is preferable as a manufacturing method, vapor deposition or ion blating may also be used. Further, an intermediate layer may be provided between the soft magnetic layer and the recording layer, a suitable protective layer may be provided on the recording layer, and an adhesive layer may be provided on the substrate.

要は軟磁性層と記録層を主要構成とする媒体であれば本
発明が適用可能である。In short, the present invention is applicable to any medium whose main components are a soft magnetic layer and a recording layer.

以下に本発明の実施例を比較例と共に説明する。Examples of the present invention will be described below along with comparative examples.

まず、実施例に用いた巻取式の対向ターゲットスパッタ
装置を説明する。該対向ターゲットスパック装置は、特
開昭５８−１５８３８０号公報等で公知の対向ターゲッ
ト式スパッタ法と同一原理に基づくもので、長尺の基板
フィルムの両面に二層膜媒体を連続的に製造できるよう
に第５図に示す構成となっている。すなわち、図の１１
．１２は温度コントロール可能なキャン、１３は巻出し
ロール、１４は巻取ロール、１５はガイドロール、２０
は真空槽、２１はアルゴンガス導入系、２２は排気口で
ある。Ｆは基板フィルｌ＼であり、Ｐ１〜Ｐ４は３３０
＃１ＩＲＷＸ　１５０＃Ｌのターゲット２枚を対向させ
た対向ターゲット陰極で、遮蔽板Ｔにより不要部への粒
子飛散を防止しである。Ｐ＋　、Ｐａは軟磁性層用の合
金ターゲラ１〜．Ｐ２　、Ｐａは記録層用合金ターゲッ
トを設置する。なお、対向ターゲット式スパッタ法は前
述の通り公知であり、付帯設備の真空ポンプ。First, the winding-type facing target sputtering apparatus used in the examples will be described. The facing target sputtering device is based on the same principle as the facing target sputtering method known in Japanese Patent Application Laid-Open No. 58-158380, etc., and can continuously produce a two-layer film medium on both sides of a long substrate film. The configuration is shown in FIG. 5. In other words, 11 in the figure
．． 12 is a temperature controllable can, 13 is an unwinding roll, 14 is a take-up roll, 15 is a guide roll, 20
21 is a vacuum chamber, 21 is an argon gas introduction system, and 22 is an exhaust port. F is the substrate fill l\, and P1 to P4 are 330
It is a facing target cathode in which two #1IRWX 150 #L targets are placed facing each other, and a shielding plate T prevents particles from scattering to unnecessary parts. P+, Pa are alloys for soft magnetic layer Targetera 1~. At P2 and Pa, an alloy target for the recording layer is installed. As mentioned above, the facing target sputtering method is well known and requires a vacuum pump as ancillary equipment.

ターゲット冷却水系統、ターゲットへの電力供給電源及
び配線系統は図示省略した。又、そのスパッタ作用の説
明も省略する。The target cooling water system, power supply to the target, and wiring system are not shown. Further, explanation of the sputtering effect will also be omitted.

上述の構成ににり二層膜媒体は以下のように作成される
。すなわら、基板フィルムＦを巻出し〇−ル１３にセラ
１〜したフィルムロールより送り出し、巻取ロール１４
に巻取る。この間にターゲットＰ＋。A two-layer film medium having the above-mentioned configuration is prepared as follows. That is, the substrate film F is sent out from the film roll that has been set in the roller 13 to the unwinding roll 13, and
Wind it up. Target P+ during this time.

Ｐ２　、Ｐａ　、Ｐ４を全部動作させれば、−回で両面
二層膜媒体が得られる。又、Ｐ＋　、Ｐａのみを動作さ
せて軟磁性層を形成した後、巻き戻しながらＰ２　、Ｐ
ａのみを動作させて記録層を形成して両面二層膜媒体を
形成することもできる。このように種々の態様で両面二
層膜媒体を作成できるようになっている。If P2, Pa, and P4 are all operated, a double-sided double-layer film medium can be obtained in - times. Also, after forming a soft magnetic layer by operating only P+ and Pa, P2 and P
It is also possible to form a double-sided double-layer film medium by operating only a to form the recording layer. In this way, double-sided double-layer film media can be created in various ways.

［実施例］ 第５図に示した上述の対向ターゲット式スパッタ装置を
用い５０μｍ厚さ、中２４０＃ｌＩＩ＋の長尺の２軸延
伸ＰＥＴ’：１フイルムを基板どして用い、約ｏ、４４
ｕｍのＮｉ　Ｆｅ　Ｍｏ　（Ｎｉ　ニア９．　Ｆｅ　：
１６．　Ｍｏ　：５ｗｔ％）合金薄膜と、約０．４４１
１ｍのＣｏ　Ｃｒ（Ｃｒ：２０ｗｔ％）合金薄膜を両面
に有する両面二層膜媒体を作成した。対向ターゲットＰ
１とＰａはＮｉＦｅＭｏ合金ターゲット（３３０ｍｍ×
１５０ｍｍ＞２枚を有する対向ターゲラ１−とし、Ｐ２
どＰ４はＣ０Ｃｒ合金ターゲット（３３０＃１ＩＩＩＸ
　１５０ｍ）　２枚を有する対向ターゲットとして、以
下のように作成した。[Example] Using the above-mentioned facing target type sputtering apparatus shown in FIG.
um's Ni Fe Mo (Ni near 9. Fe:
16. Mo: 5wt%) alloy thin film, about 0.441
A double-sided double-layer film medium having 1 m of Co Cr (Cr: 20 wt%) alloy thin film on both sides was prepared. Opposing target P
1 and Pa are NiFeMo alloy targets (330 mm x
150mm>2 sheets, and P2
DoP4 is a C0Cr alloy target (330#1IIIX
150m) A facing target with two targets was created as follows.

すなわち、基板フィルムＦを巻出しロール１３より繰出
しながら９０℃に保ったキャン１１．１２上を送行さゼ
ながら対向ターゲットＰ１とＰａでアルゴンガス圧０．
５Ｐａ、平均堆積速度０．３μｍ／ｍｔｎでスパッタを
行いＮｉＦｅＭｏ合金薄膜を両面に形成し、巻取ロール
１４に巻取った。しがる後にキャン１１．１２を１５０
℃に保ち、全ロールを逆転させ対向ターゲラｈＰ２とＰ
４でアルゴンガス圧０．５Ｐａ、平均堆積速度０．３μ
′ｒｒＬ／１ｌｌｉｎでスパッタを行いＣ０Ｃｒ合金薄
膜を該ＮｉＦｅＭｏ合金薄膜上に形成し、巻出しロール
１３に巻取り両面二層膜媒体を作製した。That is, while the substrate film F is being fed out from the unwinding roll 13 and conveyed over the can 11.12 kept at 90°C, the argon gas pressure is 0.
Sputtering was performed at 5 Pa and an average deposition rate of 0.3 μm/mtn to form NiFeMo alloy thin films on both sides, and the film was wound onto a take-up roll 14. Can 11.12 after holding 150
℃, reverse all rolls and move the facing Targetera hP2 and P
4, argon gas pressure 0.5 Pa, average deposition rate 0.3μ
A C0Cr alloy thin film was formed on the NiFeMo alloy thin film by sputtering at a rate of 'rrL/1llin, and the film was wound around an unwinding roll 13 to produce a double-sided double-layer film medium.

以上の媒体を０．３インチ巾にスリ、ツトし表−１の条
件で再生出力を調べたが、表裏共２ＫＦＲＰ■出力が１
６５〜２１ＦｉμＶｏ−Ｄ　、　４５Ｋ　Ｆ　ＲＰ　Ｉ
出力が５５〜６０μＶ　ｏ−ｐであり良好であった。I sliced and cut the above media to a width of 0.3 inches and examined the playback output under the conditions shown in Table 1.
65-21FiμVo-D, 45K FRP I
The output was 55 to 60 μV op, which was good.

［比較例］ 実施例に用いたのと同じＰＥＴフィルムを基板フィルム
Ｆとして用い、基板フィルムＦを巻出しロール１３より
繰り出しながら　１４０℃に保ったキャン１１．１２を
通過させ巻取ロール１４に巻取る間に、対向ターゲラ１
〜Ｐ１〜Ｐ４のすべてを動作させてスパッタを行い一気
に基板フィルムＦの表裏にＣ０Ｃｒ合金薄膜とＮｉＦｅ
Ｍｏ合金薄膜よりなる両面二層膜媒体を作製した。[Comparative Example] The same PET film used in the example was used as the substrate film F, and while the substrate film F was fed out from the unwinding roll 13, it was passed through cans 11 and 12 kept at 140°C and wound onto the take-up roll 14. While taking it, the oncoming targetera 1
~ All of P1 to P4 are operated to perform sputtering, and a C0Cr alloy thin film and NiFe are deposited on the front and back sides of the substrate film F at once.
A double-sided double-layer film medium made of a Mo alloy thin film was produced.

キャン１１で作製した面にはオリゴマーの析出・結晶化
は認められなかったが、記録再生出力は実施例に比べ約
４　ｄＢ低下した。キャン１２で作製した面にはオリゴ
マーが多発し、記録再生出力は８ｄＢ以上低下し、さら
に合金薄膜と基板フィルムとの接着性がわるく媒体の記
録再生の繰返しに対する耐久性がきわめてわるがった。Although no oligomer precipitation or crystallization was observed on the surface prepared with Can 11, the recording/reproducing output was lowered by about 4 dB compared to the example. Oligomers were abundant on the surface prepared with Can 12, the recording/reproducing output was lowered by 8 dB or more, and the adhesion between the alloy thin film and the substrate film was poor, and the durability of the medium against repeated recording/reproducing was extremely poor.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は基板温度ＴとＣｏ　ｃｒ金合金りなる記録層の
垂直方向に測定した保磁力Ｈｃｖとの関係を示すグラフ
、第２図は基板温度ＴとＮｉＦｅＭ。 合金よりなる軟磁性層の保磁力Ｈｃｈとの関係を示すグ
ラフ、第３図は軟磁性層の保磁力１−Ｉｃｈと再生出力
Ｅｐとの関係を示すグラフ、第４図は垂直磁気記録媒体
の構成を示した断面図、第５図は巻取式の連続対向ター
ゲット式スパッタ装置の概略構成図である。 Ｆは基板、Ｓは軟磁性層、Ｒは記録層、　１１．１２は
キャン、（〕１〜Ｐ４は対向ターゲット陰極佛。 ２０は真空槽、２１はアルゴンガス導入部、２２は排気
口である。 特許出願人　帝　人　株　式　会　礼 式　理　人　弁理士　前　１）　純　博−；７′３図FIG. 1 is a graph showing the relationship between the substrate temperature T and the coercive force Hcv measured in the vertical direction of a recording layer made of a CoCr gold alloy, and FIG. 2 is a graph showing the relationship between the substrate temperature T and the coercive force Hcv of a recording layer made of a CoCr gold alloy. A graph showing the relationship between the coercive force Hch of a soft magnetic layer made of an alloy, FIG. 3 a graph showing the relationship between the coercive force 1-Ich of the soft magnetic layer and reproduction output Ep, and FIG. FIG. 5 is a cross-sectional view showing the configuration, and is a schematic configuration diagram of a winding type continuous facing target type sputtering apparatus. F is the substrate, S is the soft magnetic layer, R is the recording layer, 11.12 is the can, (1 to P4 are the opposing target cathodes. 20 is the vacuum chamber, 21 is the argon gas introduction part, and 22 is the exhaust port. Patent Applicant Teijin Co., Ltd. Courtesy Patent Attorney 1) Jun Hiroshi; Figure 7'3

Claims (1)

【特許請求の範囲】 １）可撓性の右機高分子基板上にＮｉ、Ｆｅを主成分と
する合金膜からなる軟磁性層とＧＯ系合金膜よりなる記
録層とを形成した垂直磁気記録媒体をＩＩＪ造づるに際
に、前記軟磁性層を１２０℃以下の基板温度で形成し、
次いで前記記録層を形成することを特徴とする垂直磁気
記録媒体の製造方法。 ２）前記軟磁性層を前記基板の両面に形成した後に、前
記記録層を形成する特許請求の範囲第１項記載の垂直磁
気記録媒体の製造方法。 ３）前記基板がエチレンテレフタレートまたはエチレン
ナフタレ−１〜を主構成成分とするポリエステルからな
る特許請求の範囲第１項若しくは第２項記載の垂直磁気
記録媒体の製造方法。[Claims] 1) Perpendicular magnetic recording in which a soft magnetic layer made of an alloy film mainly composed of Ni and Fe and a recording layer made of a GO alloy film are formed on a flexible polymer substrate. When manufacturing the IIJ medium, the soft magnetic layer is formed at a substrate temperature of 120° C. or less,
A method of manufacturing a perpendicular magnetic recording medium, comprising: then forming the recording layer. 2) The method of manufacturing a perpendicular magnetic recording medium according to claim 1, wherein the recording layer is formed after the soft magnetic layer is formed on both sides of the substrate. 3) The method of manufacturing a perpendicular magnetic recording medium according to claim 1 or 2, wherein the substrate is made of polyester whose main constituent is ethylene terephthalate or ethylene naphthalate.