JPS57162431A - Method for exposure to electron beam - Google Patents

Method for exposure to electron beam

Info

Publication number
JPS57162431A
JPS57162431A JP4952481A JP4952481A JPS57162431A JP S57162431 A JPS57162431 A JP S57162431A JP 4952481 A JP4952481 A JP 4952481A JP 4952481 A JP4952481 A JP 4952481A JP S57162431 A JPS57162431 A JP S57162431A
Authority
JP
Japan
Prior art keywords
exposure
distance
marks
determined
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4952481A
Other languages
Japanese (ja)
Inventor
Teruaki Okino
Hitoshi Takemura
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP4952481A priority Critical patent/JPS57162431A/en
Publication of JPS57162431A publication Critical patent/JPS57162431A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Abstract

PURPOSE:To realize a high precision exposure by a method wherein the temperature of the mask substrate to be exposed is determined and the distance between some marks on or near the mask substrate is determined by an electron beam, and the distance thus determined is used to compensate for exposure generated heat caused expansion or shrinkage. CONSTITUTION:The temperature To is determined of a holder 2 and is stored in a CPU7 and, at the same time, a bed 3 changes its place under a laser distance measuring system 11. The marks M1 and M2 are positioned in succession directly under an electronic optical system and each of the marks is scanned by a deflector 9 and the electrons reflected by a mark are detected by a detector 12. The detected signals are supplied to the CPU7 wherein the traveling of the bed 3 is used to determine the distance Lo between the two marks and the distance Lo is stored therein. The thermal expansion coefficients alpha and beta respectively of the holder 2 and the mask substrate 1 are stored in the CPU7 for the determination of the holder 2 temperature T under exposure. Temperature T and the expansion coefficient beta are used to determine the exposure caused changes in size of the mask substrate 1, the outcome whereof corrects for a proper exposure the coordinates indicating the location to be electron beam illuminated. This results in a high precision exposure.
JP4952481A 1981-03-31 1981-03-31 Method for exposure to electron beam Pending JPS57162431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4952481A JPS57162431A (en) 1981-03-31 1981-03-31 Method for exposure to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4952481A JPS57162431A (en) 1981-03-31 1981-03-31 Method for exposure to electron beam

Publications (1)

Publication Number Publication Date
JPS57162431A true JPS57162431A (en) 1982-10-06

Family

ID=12833522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4952481A Pending JPS57162431A (en) 1981-03-31 1981-03-31 Method for exposure to electron beam

Country Status (1)

Country Link
JP (1) JPS57162431A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61138248U (en) * 1985-02-19 1986-08-27
EP0878822A1 (en) * 1997-04-10 1998-11-18 Fujitsu Limited Charged Particle beam exposure apparatus having a stage position measurement device
US7751528B2 (en) 2007-07-19 2010-07-06 The University Of North Carolina Stationary x-ray digital breast tomosynthesis systems and related methods
US9782136B2 (en) 2014-06-17 2017-10-10 The University Of North Carolina At Chapel Hill Intraoral tomosynthesis systems, methods, and computer readable media for dental imaging
US10980494B2 (en) 2014-10-20 2021-04-20 The University Of North Carolina At Chapel Hill Systems and related methods for stationary digital chest tomosynthesis (s-DCT) imaging

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518032A (en) * 1978-07-25 1980-02-07 Jeol Ltd Stage shifting device in electron beam exposing device
JPS5591826A (en) * 1978-12-29 1980-07-11 Fujitsu Ltd Method of exposing electronic beam

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518032A (en) * 1978-07-25 1980-02-07 Jeol Ltd Stage shifting device in electron beam exposing device
JPS5591826A (en) * 1978-12-29 1980-07-11 Fujitsu Ltd Method of exposing electronic beam

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61138248U (en) * 1985-02-19 1986-08-27
EP0878822A1 (en) * 1997-04-10 1998-11-18 Fujitsu Limited Charged Particle beam exposure apparatus having a stage position measurement device
US7751528B2 (en) 2007-07-19 2010-07-06 The University Of North Carolina Stationary x-ray digital breast tomosynthesis systems and related methods
US9782136B2 (en) 2014-06-17 2017-10-10 The University Of North Carolina At Chapel Hill Intraoral tomosynthesis systems, methods, and computer readable media for dental imaging
US9907520B2 (en) 2014-06-17 2018-03-06 The University Of North Carolina At Chapel Hill Digital tomosynthesis systems, methods, and computer readable media for intraoral dental tomosynthesis imaging
US10980494B2 (en) 2014-10-20 2021-04-20 The University Of North Carolina At Chapel Hill Systems and related methods for stationary digital chest tomosynthesis (s-DCT) imaging

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