JPS641923A - Measurement of temperature of sample for manufacture of semiconductor device - Google Patents
Measurement of temperature of sample for manufacture of semiconductor deviceInfo
- Publication number
- JPS641923A JPS641923A JP15690287A JP15690287A JPS641923A JP S641923 A JPS641923 A JP S641923A JP 15690287 A JP15690287 A JP 15690287A JP 15690287 A JP15690287 A JP 15690287A JP S641923 A JPS641923 A JP S641923A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- sample
- distance
- cassette
- marks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To achieve a highly accurate measurement of the temperature of a sample, by checking distance between marks arranged on a sample cassette at fixed intervals using a laser interference system to detect the temperature of the sample based on difference between the detection distance and a distance at a reference temperature.
CONSTITUTION: A wafer sample 4 is inserted into a cassette 1 to be fixed on a main stage 2 and two marks A and B are arranged on the cassette 1 at a fixed interval. To measure a distance XAT-XBT between the marks A and B at a temperature T°C, the mark B is irradiated with an electron ray of an electron ray source 7 and an X motor 10 is driven from the state at which a reflection electron signal 8 is generated to keep the stage 2 moving until the reflection electron signal of the mark A is detected in the direction X. Here, XAT-XBT is obtained from the frequency of changes in the intensity due to interference detected with a laser detector 16. Temperature of a cassette, namely, a sample temperature is determined from a difference between the distance between the marks thus obtained and a distance between the marks at a reference temperature T0 and a coefficient of thermal expansion of the cassette 1.
COPYRIGHT: (C)1989,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15690287A JPS641923A (en) | 1987-06-23 | 1987-06-23 | Measurement of temperature of sample for manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15690287A JPS641923A (en) | 1987-06-23 | 1987-06-23 | Measurement of temperature of sample for manufacture of semiconductor device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH011923A JPH011923A (en) | 1989-01-06 |
| JPS641923A true JPS641923A (en) | 1989-01-06 |
| JPH0583135B2 JPH0583135B2 (en) | 1993-11-24 |
Family
ID=15637896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15690287A Granted JPS641923A (en) | 1987-06-23 | 1987-06-23 | Measurement of temperature of sample for manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS641923A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008249537A (en) * | 2007-03-30 | 2008-10-16 | Tokyo Electron Ltd | Gas analyzer and substrate processing apparatus |
| JP2017092114A (en) * | 2015-11-04 | 2017-05-25 | 富士機械製造株式会社 | Substrate processing device and control method of the same |
-
1987
- 1987-06-23 JP JP15690287A patent/JPS641923A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008249537A (en) * | 2007-03-30 | 2008-10-16 | Tokyo Electron Ltd | Gas analyzer and substrate processing apparatus |
| JP2017092114A (en) * | 2015-11-04 | 2017-05-25 | 富士機械製造株式会社 | Substrate processing device and control method of the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0583135B2 (en) | 1993-11-24 |
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