JPS5680043A - Far ultraviolet exposing method - Google Patents

Far ultraviolet exposing method

Info

Publication number
JPS5680043A
JPS5680043A JP15768779A JP15768779A JPS5680043A JP S5680043 A JPS5680043 A JP S5680043A JP 15768779 A JP15768779 A JP 15768779A JP 15768779 A JP15768779 A JP 15768779A JP S5680043 A JPS5680043 A JP S5680043A
Authority
JP
Japan
Prior art keywords
pulse
exposure
xenone
far ultraviolet
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15768779A
Other languages
Japanese (ja)
Other versions
JPS6229785B2 (en
Inventor
Hitoshi Ito
Katsumi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP15768779A priority Critical patent/JPS5680043A/en
Publication of JPS5680043A publication Critical patent/JPS5680043A/en
Publication of JPS6229785B2 publication Critical patent/JPS6229785B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To shorten exposure time without requiring a cooling mechanism and an infrared filter by pulse-driving a long arc type xenone lamp with xenone gas of a specified pressure or above sealed to allow far ultraviolet light to be emitted.
CONSTITUTION: In a method of obtained a resist pattern having a submicron fine pattern by far ultravoilet exposure, long arc type xenone lamp 31 with xenone gas of ≥200mmHg sealed is pulse-actuated at ≤10% duty ratio to allow far ultraviolet light of 210W270nm to be emitted, and resist 35 of methacrylate polymer or the like between upper mask 34 and under wafer 36 is irradiated with the light through reflecting mirror 32 and quartz lens 33. Thus, a submicron fine pattern is obtd. with accuracy by exposure in a short time corresponding to ≤1/10 of the time required for exposure with a conventional deuterium lamp or the like. The pulse is one pulse/sec, the irradiation time is short, and the quantity of infrared rays irradiated is small, so a cooler and an infrared filter are made unnecessary, resulting in a lowered production cost.
COPYRIGHT: (C)1981,JPO&Japio
JP15768779A 1979-12-05 1979-12-05 Far ultraviolet exposing method Granted JPS5680043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15768779A JPS5680043A (en) 1979-12-05 1979-12-05 Far ultraviolet exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15768779A JPS5680043A (en) 1979-12-05 1979-12-05 Far ultraviolet exposing method

Publications (2)

Publication Number Publication Date
JPS5680043A true JPS5680043A (en) 1981-07-01
JPS6229785B2 JPS6229785B2 (en) 1987-06-29

Family

ID=15655186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15768779A Granted JPS5680043A (en) 1979-12-05 1979-12-05 Far ultraviolet exposing method

Country Status (1)

Country Link
JP (1) JPS5680043A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0762409A1 (en) * 1995-08-15 1997-03-12 Dainippon Ink And Chemicals, Inc. Disc bonding method and device therefor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01160359A (en) * 1987-12-16 1989-06-23 Fuji Electric Co Ltd Controlling method for dc/dc converter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0762409A1 (en) * 1995-08-15 1997-03-12 Dainippon Ink And Chemicals, Inc. Disc bonding method and device therefor
US5904795A (en) * 1995-08-15 1999-05-18 Dainippon Ink & Chemicals, Inc. Disc bonding method and device therefor
EP0935243A3 (en) * 1995-08-15 1999-12-08 Dainippon Ink And Chemicals, Inc. Disc bonding method and device therefor
US6334925B1 (en) 1995-08-15 2002-01-01 Dainippon Ink & Chemical, Inc. Disc bonding method

Also Published As

Publication number Publication date
JPS6229785B2 (en) 1987-06-29

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