JPS5680043A - Far ultraviolet exposing method - Google Patents
Far ultraviolet exposing methodInfo
- Publication number
- JPS5680043A JPS5680043A JP15768779A JP15768779A JPS5680043A JP S5680043 A JPS5680043 A JP S5680043A JP 15768779 A JP15768779 A JP 15768779A JP 15768779 A JP15768779 A JP 15768779A JP S5680043 A JPS5680043 A JP S5680043A
- Authority
- JP
- Japan
- Prior art keywords
- pulse
- exposure
- xenone
- far ultraviolet
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To shorten exposure time without requiring a cooling mechanism and an infrared filter by pulse-driving a long arc type xenone lamp with xenone gas of a specified pressure or above sealed to allow far ultraviolet light to be emitted.
CONSTITUTION: In a method of obtained a resist pattern having a submicron fine pattern by far ultravoilet exposure, long arc type xenone lamp 31 with xenone gas of ≥200mmHg sealed is pulse-actuated at ≤10% duty ratio to allow far ultraviolet light of 210W270nm to be emitted, and resist 35 of methacrylate polymer or the like between upper mask 34 and under wafer 36 is irradiated with the light through reflecting mirror 32 and quartz lens 33. Thus, a submicron fine pattern is obtd. with accuracy by exposure in a short time corresponding to ≤1/10 of the time required for exposure with a conventional deuterium lamp or the like. The pulse is one pulse/sec, the irradiation time is short, and the quantity of infrared rays irradiated is small, so a cooler and an infrared filter are made unnecessary, resulting in a lowered production cost.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15768779A JPS5680043A (en) | 1979-12-05 | 1979-12-05 | Far ultraviolet exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15768779A JPS5680043A (en) | 1979-12-05 | 1979-12-05 | Far ultraviolet exposing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5680043A true JPS5680043A (en) | 1981-07-01 |
JPS6229785B2 JPS6229785B2 (en) | 1987-06-29 |
Family
ID=15655186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15768779A Granted JPS5680043A (en) | 1979-12-05 | 1979-12-05 | Far ultraviolet exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5680043A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0762409A1 (en) * | 1995-08-15 | 1997-03-12 | Dainippon Ink And Chemicals, Inc. | Disc bonding method and device therefor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01160359A (en) * | 1987-12-16 | 1989-06-23 | Fuji Electric Co Ltd | Controlling method for dc/dc converter |
-
1979
- 1979-12-05 JP JP15768779A patent/JPS5680043A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0762409A1 (en) * | 1995-08-15 | 1997-03-12 | Dainippon Ink And Chemicals, Inc. | Disc bonding method and device therefor |
US5904795A (en) * | 1995-08-15 | 1999-05-18 | Dainippon Ink & Chemicals, Inc. | Disc bonding method and device therefor |
EP0935243A3 (en) * | 1995-08-15 | 1999-12-08 | Dainippon Ink And Chemicals, Inc. | Disc bonding method and device therefor |
US6334925B1 (en) | 1995-08-15 | 2002-01-01 | Dainippon Ink & Chemical, Inc. | Disc bonding method |
Also Published As
Publication number | Publication date |
---|---|
JPS6229785B2 (en) | 1987-06-29 |
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