JPS647619A - X-ray aligner - Google Patents

X-ray aligner

Info

Publication number
JPS647619A
JPS647619A JP62161225A JP16122587A JPS647619A JP S647619 A JPS647619 A JP S647619A JP 62161225 A JP62161225 A JP 62161225A JP 16122587 A JP16122587 A JP 16122587A JP S647619 A JPS647619 A JP S647619A
Authority
JP
Japan
Prior art keywords
ray
mirror
mirrors
reflected
aligner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62161225A
Other languages
Japanese (ja)
Inventor
Kiyoshi Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62161225A priority Critical patent/JPS647619A/en
Publication of JPS647619A publication Critical patent/JPS647619A/en
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain an aligner which can expose an X-ray having uniform and large X-ray intensity by employing as X-ray mirrors both a vibrating X-ray mirror and a plurality of vertical mirrors disposed symmetrically with respect to an X-ray irradiation axis. CONSTITUTION:A radiation light irradiated from a synchrotron radiation light source 2 is reflected on an X-ray mirror, and irradiated on a workpiece 6 coated with X-ray resist 5 through an X-ray mask 4. As the X-ray mirror in such an X-ray aligner, a vibrating X-ray mirror 8 and a plurality of vertical mirrors 7a, 7b disposed symmetrically with respect to an X-ray irradiation axis are employed. Thus, the X-rays reflected on the mirrors 7a, 7b and the X-axis not reflected on the mirrors 7a, 7b are reflected on the mirror 8, completely superposed on the mask 4 and the resist film 5 on the workpiece to increase its intensity. Further, uniform exposure having no distortion is conducted by the mirror 8.
JP62161225A 1987-06-30 1987-06-30 X-ray aligner Pending JPS647619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62161225A JPS647619A (en) 1987-06-30 1987-06-30 X-ray aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62161225A JPS647619A (en) 1987-06-30 1987-06-30 X-ray aligner

Publications (1)

Publication Number Publication Date
JPS647619A true JPS647619A (en) 1989-01-11

Family

ID=15731005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62161225A Pending JPS647619A (en) 1987-06-30 1987-06-30 X-ray aligner

Country Status (1)

Country Link
JP (1) JPS647619A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0435016A (en) * 1990-05-31 1992-02-05 Toshiba Corp Radiation exposure device
JPH08148415A (en) * 1994-11-24 1996-06-07 Nikon Corp Illuminator and exposure apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0435016A (en) * 1990-05-31 1992-02-05 Toshiba Corp Radiation exposure device
JPH08148415A (en) * 1994-11-24 1996-06-07 Nikon Corp Illuminator and exposure apparatus

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