JPS647619A - X-ray aligner - Google Patents
X-ray alignerInfo
- Publication number
- JPS647619A JPS647619A JP62161225A JP16122587A JPS647619A JP S647619 A JPS647619 A JP S647619A JP 62161225 A JP62161225 A JP 62161225A JP 16122587 A JP16122587 A JP 16122587A JP S647619 A JPS647619 A JP S647619A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- mirror
- mirrors
- reflected
- aligner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain an aligner which can expose an X-ray having uniform and large X-ray intensity by employing as X-ray mirrors both a vibrating X-ray mirror and a plurality of vertical mirrors disposed symmetrically with respect to an X-ray irradiation axis. CONSTITUTION:A radiation light irradiated from a synchrotron radiation light source 2 is reflected on an X-ray mirror, and irradiated on a workpiece 6 coated with X-ray resist 5 through an X-ray mask 4. As the X-ray mirror in such an X-ray aligner, a vibrating X-ray mirror 8 and a plurality of vertical mirrors 7a, 7b disposed symmetrically with respect to an X-ray irradiation axis are employed. Thus, the X-rays reflected on the mirrors 7a, 7b and the X-axis not reflected on the mirrors 7a, 7b are reflected on the mirror 8, completely superposed on the mask 4 and the resist film 5 on the workpiece to increase its intensity. Further, uniform exposure having no distortion is conducted by the mirror 8.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62161225A JPS647619A (en) | 1987-06-30 | 1987-06-30 | X-ray aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62161225A JPS647619A (en) | 1987-06-30 | 1987-06-30 | X-ray aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS647619A true JPS647619A (en) | 1989-01-11 |
Family
ID=15731005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62161225A Pending JPS647619A (en) | 1987-06-30 | 1987-06-30 | X-ray aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS647619A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0435016A (en) * | 1990-05-31 | 1992-02-05 | Toshiba Corp | Radiation exposure device |
JPH08148415A (en) * | 1994-11-24 | 1996-06-07 | Nikon Corp | Illuminator and exposure apparatus |
-
1987
- 1987-06-30 JP JP62161225A patent/JPS647619A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0435016A (en) * | 1990-05-31 | 1992-02-05 | Toshiba Corp | Radiation exposure device |
JPH08148415A (en) * | 1994-11-24 | 1996-06-07 | Nikon Corp | Illuminator and exposure apparatus |
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