JPS5664342A - Photomask original plate having protective film on reverse side - Google Patents

Photomask original plate having protective film on reverse side

Info

Publication number
JPS5664342A
JPS5664342A JP13868379A JP13868379A JPS5664342A JP S5664342 A JPS5664342 A JP S5664342A JP 13868379 A JP13868379 A JP 13868379A JP 13868379 A JP13868379 A JP 13868379A JP S5664342 A JPS5664342 A JP S5664342A
Authority
JP
Japan
Prior art keywords
film
mold
protective film
preventing
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13868379A
Other languages
Japanese (ja)
Other versions
JPS622308B2 (en
Inventor
Chikara Hayashi
Kimitachi Yana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP13868379A priority Critical patent/JPS5664342A/en
Publication of JPS5664342A publication Critical patent/JPS5664342A/en
Publication of JPS622308B2 publication Critical patent/JPS622308B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To prevent mold growing during storage in the atmosphere by easy and low cost operation, using a protective film for preventing mold on one face of the glass substrate of a photomask original plate reverse to the light shielding layer of the glass substrate. CONSTITUTION:A protective film for preventing mold is provided on one surface of a glass substrate having a light shielding layer on the other side to form a photomask original plate. As a mold preventing protective film to be applied a film made of silicon dioxide or metallic chromium is recommended. These protective films can be applied by vapor deposition, ion plating, or the like. Before applying the protective film on the reverse face of the glass substrate, preferably a thin film of MgF2, TiO2, CeO2, or the like is attached to it as a reflection preventing film, and on this film the mold preventing film is applied, thus permitting prevention of mold growing, enhancement of optical characteristics of the mask, ad raise of effects of destaticization, etc.
JP13868379A 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side Granted JPS5664342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13868379A JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13868379A JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP61197286A Division JPS6258250A (en) 1986-08-25 1986-08-25 Photomask negative having protective film on rear face

Publications (2)

Publication Number Publication Date
JPS5664342A true JPS5664342A (en) 1981-06-01
JPS622308B2 JPS622308B2 (en) 1987-01-19

Family

ID=15227658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13868379A Granted JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Country Status (1)

Country Link
JP (1) JPS5664342A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917543A (en) * 1972-06-12 1974-02-16
JPS5023595A (en) * 1973-06-29 1975-03-13
JPS5193875A (en) * 1975-02-15 1976-08-17
JPS51139267A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Photo-mask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917543A (en) * 1972-06-12 1974-02-16
JPS5023595A (en) * 1973-06-29 1975-03-13
JPS5193875A (en) * 1975-02-15 1976-08-17
JPS51139267A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Photo-mask

Also Published As

Publication number Publication date
JPS622308B2 (en) 1987-01-19

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