JPS5453549A - Multilayer thin film optical system - Google Patents

Multilayer thin film optical system

Info

Publication number
JPS5453549A
JPS5453549A JP11969577A JP11969577A JPS5453549A JP S5453549 A JPS5453549 A JP S5453549A JP 11969577 A JP11969577 A JP 11969577A JP 11969577 A JP11969577 A JP 11969577A JP S5453549 A JPS5453549 A JP S5453549A
Authority
JP
Japan
Prior art keywords
thin film
mgf
tio
layer
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11969577A
Other languages
Japanese (ja)
Other versions
JPS6042445B2 (en
Inventor
Mitsuharu Sawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP52119695A priority Critical patent/JPS6042445B2/en
Publication of JPS5453549A publication Critical patent/JPS5453549A/en
Publication of JPS6042445B2 publication Critical patent/JPS6042445B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE: To suppress the absorption on the visible range short wavelength side and prevent the occurrence of film cracking by substituting at least one layer with a specific thin film layer in a thin film optical system formed through alternate vapor deposition and lamination of TiO2 and MgF2 at substrate temperatures below 230°C.
CONSTITUTION: In the thin film optical system which is formed through alternate vapor deposition and lamination of TiO2 and MgF2 on a substrate of 230°C or under and which does not have absorption on the visible range short wavelength side, at least one layer of the TiO2 films is substituted with the film of a compound, such as zinc sulfide, cerium dioxide or the like, having a refractive index close to that of TiO2 and yet having compressive stress, whereby the occurrence of film cracking is prevented. In lieu of said substitution, the substitution of at least one layer of the MgF2 films with the film of a compound, such as thorium fluoride, silicon dioxide or the like, having a refractive index close to that of MgF2 and yet having compressive stress, gives equally good results
COPYRIGHT: (C)1979,JPO&Japio
JP52119695A 1977-10-05 1977-10-05 Multilayer thin film optical system Expired JPS6042445B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52119695A JPS6042445B2 (en) 1977-10-05 1977-10-05 Multilayer thin film optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52119695A JPS6042445B2 (en) 1977-10-05 1977-10-05 Multilayer thin film optical system

Publications (2)

Publication Number Publication Date
JPS5453549A true JPS5453549A (en) 1979-04-26
JPS6042445B2 JPS6042445B2 (en) 1985-09-21

Family

ID=14767768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52119695A Expired JPS6042445B2 (en) 1977-10-05 1977-10-05 Multilayer thin film optical system

Country Status (1)

Country Link
JP (1) JPS6042445B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831307A (en) * 1981-08-20 1983-02-24 Tokyo Optical Co Ltd Interference filter
JPS62240903A (en) * 1986-04-14 1987-10-21 Toshiba Glass Co Ltd Multi-layered reflection mirror
WO2005114266A1 (en) * 2004-05-24 2005-12-01 Jenoptik Laser Optik Systeme Gmbh High-reflecting dielectric mirror and method for the production thereof
CN103233200A (en) * 2013-03-28 2013-08-07 同济大学 355 nm high threshold high reflection film preparation method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831307A (en) * 1981-08-20 1983-02-24 Tokyo Optical Co Ltd Interference filter
JPH031645B2 (en) * 1981-08-20 1991-01-11 Topukon Kk
JPS62240903A (en) * 1986-04-14 1987-10-21 Toshiba Glass Co Ltd Multi-layered reflection mirror
WO2005114266A1 (en) * 2004-05-24 2005-12-01 Jenoptik Laser Optik Systeme Gmbh High-reflecting dielectric mirror and method for the production thereof
CN103233200A (en) * 2013-03-28 2013-08-07 同济大学 355 nm high threshold high reflection film preparation method

Also Published As

Publication number Publication date
JPS6042445B2 (en) 1985-09-21

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