JPS57192023A - Correcting device for photo-mask - Google Patents

Correcting device for photo-mask

Info

Publication number
JPS57192023A
JPS57192023A JP7652281A JP7652281A JPS57192023A JP S57192023 A JPS57192023 A JP S57192023A JP 7652281 A JP7652281 A JP 7652281A JP 7652281 A JP7652281 A JP 7652281A JP S57192023 A JPS57192023 A JP S57192023A
Authority
JP
Japan
Prior art keywords
mask
defect
photo
target
lens system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7652281A
Other languages
Japanese (ja)
Inventor
Takao Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7652281A priority Critical patent/JPS57192023A/en
Publication of JPS57192023A publication Critical patent/JPS57192023A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To eliminate a black point defect easily by movably mounting a target between a laser irradiating section and the photo-mask and forming a lens system so that laser beams can be condensed to the surface of the mask and the target. CONSTITUTION:The beam-condensing lens system 8, which can be moved to a desired plane position and the position of beam-condensing height thereof can be changed, is mounted to the upper section of a base 5. The target 12 moved through a supporting means 11 is disposed between the vertical space of the photo-mask 6 and the lens system 8. When eliminating the black point defect, the target 12 is retreated from the upper section of the photo-mask 6, the lens system 8 is positioned onto the defect 3, and laser beams are condensed to the defect. Accordingly, the chromium film of the defect is evaporated and removed by the thermal energy of laser beams, and the defect is corrected.
JP7652281A 1981-05-22 1981-05-22 Correcting device for photo-mask Pending JPS57192023A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7652281A JPS57192023A (en) 1981-05-22 1981-05-22 Correcting device for photo-mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7652281A JPS57192023A (en) 1981-05-22 1981-05-22 Correcting device for photo-mask

Publications (1)

Publication Number Publication Date
JPS57192023A true JPS57192023A (en) 1982-11-26

Family

ID=13607606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7652281A Pending JPS57192023A (en) 1981-05-22 1981-05-22 Correcting device for photo-mask

Country Status (1)

Country Link
JP (1) JPS57192023A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100437315C (en) * 2004-03-25 2008-11-26 株式会社东芝 Method and apparatus for correcting a defective pixel of a liquid crystal display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100437315C (en) * 2004-03-25 2008-11-26 株式会社东芝 Method and apparatus for correcting a defective pixel of a liquid crystal display

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