JPS56136446A - Ion injector - Google Patents

Ion injector

Info

Publication number
JPS56136446A
JPS56136446A JP3887880A JP3887880A JPS56136446A JP S56136446 A JPS56136446 A JP S56136446A JP 3887880 A JP3887880 A JP 3887880A JP 3887880 A JP3887880 A JP 3887880A JP S56136446 A JPS56136446 A JP S56136446A
Authority
JP
Japan
Prior art keywords
ion beam
deflection
standard mark
electron beam
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3887880A
Other languages
Japanese (ja)
Inventor
Kazumitsu Nakamura
Shinjiro Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3887880A priority Critical patent/JPS56136446A/en
Publication of JPS56136446A publication Critical patent/JPS56136446A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Abstract

PURPOSE:To irradiate a target accurately by previously scanning the standard mark with electron beam and ion beam to find any shift of the position, and effecting radiation with ion beam after setting the position with electron beam. CONSTITUTION:A signal from a deflection signal generator 25 is given to a deflection controller 26. The standard mark 15 is scanned with electron beam 6, and the second signal is detected by a detector 22A to fine the position of the standard mark. The position is stored in memory 27A. Next, injected particles are changed into ion beam 3 and ion beam is radiated in the same way to set the standard mark position. The position is stored in the memory 27B. Difference between them in the deflection data is stored in the memory 24. Then, the desirable position for the target is scanned with electron beam 6 and deflection amount of ion beam is measured by adding deflection correction amount to the deflection signal. Therefore ion beam can be accurately radiated only on the required part of the target.
JP3887880A 1980-03-28 1980-03-28 Ion injector Pending JPS56136446A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3887880A JPS56136446A (en) 1980-03-28 1980-03-28 Ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3887880A JPS56136446A (en) 1980-03-28 1980-03-28 Ion injector

Publications (1)

Publication Number Publication Date
JPS56136446A true JPS56136446A (en) 1981-10-24

Family

ID=12537471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3887880A Pending JPS56136446A (en) 1980-03-28 1980-03-28 Ion injector

Country Status (1)

Country Link
JP (1) JPS56136446A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968159A (en) * 1982-10-05 1984-04-18 Seiko Instr & Electronics Ltd Analyzer constituted by use of ion source
JPS59121748A (en) * 1982-09-17 1984-07-13 イオン　ビーム　システムズ　リミテッド Ion beam device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121748A (en) * 1982-09-17 1984-07-13 イオン　ビーム　システムズ　リミテッド Ion beam device
JPS5968159A (en) * 1982-10-05 1984-04-18 Seiko Instr & Electronics Ltd Analyzer constituted by use of ion source

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