JPS56136446A - Ion injector - Google Patents
Ion injectorInfo
- Publication number
- JPS56136446A JPS56136446A JP3887880A JP3887880A JPS56136446A JP S56136446 A JPS56136446 A JP S56136446A JP 3887880 A JP3887880 A JP 3887880A JP 3887880 A JP3887880 A JP 3887880A JP S56136446 A JPS56136446 A JP S56136446A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- deflection
- standard mark
- electron beam
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To irradiate a target accurately by previously scanning the standard mark with electron beam and ion beam to find any shift of the position, and effecting radiation with ion beam after setting the position with electron beam. CONSTITUTION:A signal from a deflection signal generator 25 is given to a deflection controller 26. The standard mark 15 is scanned with electron beam 6, and the second signal is detected by a detector 22A to fine the position of the standard mark. The position is stored in memory 27A. Next, injected particles are changed into ion beam 3 and ion beam is radiated in the same way to set the standard mark position. The position is stored in the memory 27B. Difference between them in the deflection data is stored in the memory 24. Then, the desirable position for the target is scanned with electron beam 6 and deflection amount of ion beam is measured by adding deflection correction amount to the deflection signal. Therefore ion beam can be accurately radiated only on the required part of the target.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3887880A JPS56136446A (en) | 1980-03-28 | 1980-03-28 | Ion injector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3887880A JPS56136446A (en) | 1980-03-28 | 1980-03-28 | Ion injector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56136446A true JPS56136446A (en) | 1981-10-24 |
Family
ID=12537471
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3887880A Pending JPS56136446A (en) | 1980-03-28 | 1980-03-28 | Ion injector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56136446A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5968159A (en) * | 1982-10-05 | 1984-04-18 | Seiko Instr & Electronics Ltd | Analyzer constituted by use of ion source |
JPS59121748A (en) * | 1982-09-17 | 1984-07-13 | イオン ビーム システムズ リミテッド | Ion beam device |
-
1980
- 1980-03-28 JP JP3887880A patent/JPS56136446A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59121748A (en) * | 1982-09-17 | 1984-07-13 | イオン ビーム システムズ リミテッド | Ion beam device |
JPS5968159A (en) * | 1982-10-05 | 1984-04-18 | Seiko Instr & Electronics Ltd | Analyzer constituted by use of ion source |
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