JPS5587149A - Photomask for preparation of semiconductor wafer - Google Patents

Photomask for preparation of semiconductor wafer

Info

Publication number
JPS5587149A
JPS5587149A JP16087278A JP16087278A JPS5587149A JP S5587149 A JPS5587149 A JP S5587149A JP 16087278 A JP16087278 A JP 16087278A JP 16087278 A JP16087278 A JP 16087278A JP S5587149 A JPS5587149 A JP S5587149A
Authority
JP
Japan
Prior art keywords
photomask
wafer
element patterns
pattern
indication
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16087278A
Other languages
Japanese (ja)
Inventor
Takeshi Sakashita
Yoshihiro Matsui
Isao Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16087278A priority Critical patent/JPS5587149A/en
Publication of JPS5587149A publication Critical patent/JPS5587149A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Abstract

PURPOSE:To enable a photomask used to be discriminated by sight when a wafer is observed, by forming a photomask so as to eneable element patterns as well as an information pattern to be transferred on the wafer. CONSTITUTION:A necessary number of element patterns connected to one another, for example, element patterns corresponding to chips 4 in the circumferential part of wafer 3 low in manufacture yield are selected from element patterns 2 drawn on the surface of photomask 1 to form indication (information) pattern 6 in place of them. Indication part 7 discriminable easily by sight is formed in addition to element pattern chips 4 on the wafer 3 printed using photomask 1 having element patterns 2 and indication pattern 6.
JP16087278A 1978-12-25 1978-12-25 Photomask for preparation of semiconductor wafer Pending JPS5587149A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16087278A JPS5587149A (en) 1978-12-25 1978-12-25 Photomask for preparation of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16087278A JPS5587149A (en) 1978-12-25 1978-12-25 Photomask for preparation of semiconductor wafer

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP112184A Division JPS59161030A (en) 1984-01-07 1984-01-07 Manufacture of semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS5587149A true JPS5587149A (en) 1980-07-01

Family

ID=15724183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16087278A Pending JPS5587149A (en) 1978-12-25 1978-12-25 Photomask for preparation of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5587149A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask
JPS62235952A (en) * 1986-04-08 1987-10-16 Agency Of Ind Science & Technol Mask for semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask
JPS62235952A (en) * 1986-04-08 1987-10-16 Agency Of Ind Science & Technol Mask for semiconductor device
JPH056176B2 (en) * 1986-04-08 1993-01-26 Kogyo Gijutsuin

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