JPS5431282A - Pattern formation method - Google Patents

Pattern formation method

Info

Publication number
JPS5431282A
JPS5431282A JP9726377A JP9726377A JPS5431282A JP S5431282 A JPS5431282 A JP S5431282A JP 9726377 A JP9726377 A JP 9726377A JP 9726377 A JP9726377 A JP 9726377A JP S5431282 A JPS5431282 A JP S5431282A
Authority
JP
Japan
Prior art keywords
formation method
pattern formation
chip
reticule
repeat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9726377A
Other languages
Japanese (ja)
Inventor
Yasuo Kinoshita
Takashi Itasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9726377A priority Critical patent/JPS5431282A/en
Publication of JPS5431282A publication Critical patent/JPS5431282A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To produce a mask free from defect through step-and-repeat by using a reticule comprising the chip containing a desired pattern measurement and the chip the light shielding part enlarged on the same substrate.
COPYRIGHT: (C)1979,JPO&Japio
JP9726377A 1977-08-12 1977-08-12 Pattern formation method Pending JPS5431282A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9726377A JPS5431282A (en) 1977-08-12 1977-08-12 Pattern formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9726377A JPS5431282A (en) 1977-08-12 1977-08-12 Pattern formation method

Publications (1)

Publication Number Publication Date
JPS5431282A true JPS5431282A (en) 1979-03-08

Family

ID=14187644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9726377A Pending JPS5431282A (en) 1977-08-12 1977-08-12 Pattern formation method

Country Status (1)

Country Link
JP (1) JPS5431282A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679430A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor integrated circuit device
JPS57181490U (en) * 1981-05-11 1982-11-17
JPS58215026A (en) * 1982-06-08 1983-12-14 Fujitsu Ltd Formation of photo resist pattern
JPS599922A (en) * 1982-06-30 1984-01-19 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Exposure device
JPS59143324A (en) * 1983-02-03 1984-08-16 Oki Electric Ind Co Ltd Formation of pattern

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679430A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor integrated circuit device
JPS57181490U (en) * 1981-05-11 1982-11-17
JPH0120076Y2 (en) * 1981-05-11 1989-06-12
JPS58215026A (en) * 1982-06-08 1983-12-14 Fujitsu Ltd Formation of photo resist pattern
JPS6253937B2 (en) * 1982-06-08 1987-11-12 Fujitsu Ltd
JPS599922A (en) * 1982-06-30 1984-01-19 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Exposure device
JPH0141251B2 (en) * 1982-06-30 1989-09-04 Intaanashonaru Bijinesu Mashiinzu Corp
JPS59143324A (en) * 1983-02-03 1984-08-16 Oki Electric Ind Co Ltd Formation of pattern

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