JPS53135278A - Photomask for photomechanics - Google Patents
Photomask for photomechanicsInfo
- Publication number
- JPS53135278A JPS53135278A JP5043077A JP5043077A JPS53135278A JP S53135278 A JPS53135278 A JP S53135278A JP 5043077 A JP5043077 A JP 5043077A JP 5043077 A JP5043077 A JP 5043077A JP S53135278 A JPS53135278 A JP S53135278A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- photomechanics
- chip groups
- giving
- enhance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To enhance a production efficiency by giving the best arrangement type of element chip groups to the arrangement shape of photomask chip groups for photomechanical process.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5043077A JPS53135278A (en) | 1977-04-30 | 1977-04-30 | Photomask for photomechanics |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5043077A JPS53135278A (en) | 1977-04-30 | 1977-04-30 | Photomask for photomechanics |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53135278A true JPS53135278A (en) | 1978-11-25 |
Family
ID=12858642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5043077A Pending JPS53135278A (en) | 1977-04-30 | 1977-04-30 | Photomask for photomechanics |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53135278A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2461282A1 (en) * | 1979-07-07 | 1981-01-30 | Shinetsu Quartz Prod | IMPROVED PHOTOGRAVING PROCESS USING TRANSFER COVERS ON SINGLE-CRYSTAL PELLETS |
JPS58108741A (en) * | 1981-12-23 | 1983-06-28 | Hitachi Ltd | Electron beam patterning device |
-
1977
- 1977-04-30 JP JP5043077A patent/JPS53135278A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2461282A1 (en) * | 1979-07-07 | 1981-01-30 | Shinetsu Quartz Prod | IMPROVED PHOTOGRAVING PROCESS USING TRANSFER COVERS ON SINGLE-CRYSTAL PELLETS |
JPS58108741A (en) * | 1981-12-23 | 1983-06-28 | Hitachi Ltd | Electron beam patterning device |
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