JPS53135278A - Photomask for photomechanics - Google Patents

Photomask for photomechanics

Info

Publication number
JPS53135278A
JPS53135278A JP5043077A JP5043077A JPS53135278A JP S53135278 A JPS53135278 A JP S53135278A JP 5043077 A JP5043077 A JP 5043077A JP 5043077 A JP5043077 A JP 5043077A JP S53135278 A JPS53135278 A JP S53135278A
Authority
JP
Japan
Prior art keywords
photomask
photomechanics
chip groups
giving
enhance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5043077A
Other languages
Japanese (ja)
Inventor
Sunao Saishiyuu
Teruhiko Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP5043077A priority Critical patent/JPS53135278A/en
Publication of JPS53135278A publication Critical patent/JPS53135278A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To enhance a production efficiency by giving the best arrangement type of element chip groups to the arrangement shape of photomask chip groups for photomechanical process.
COPYRIGHT: (C)1978,JPO&Japio
JP5043077A 1977-04-30 1977-04-30 Photomask for photomechanics Pending JPS53135278A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5043077A JPS53135278A (en) 1977-04-30 1977-04-30 Photomask for photomechanics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5043077A JPS53135278A (en) 1977-04-30 1977-04-30 Photomask for photomechanics

Publications (1)

Publication Number Publication Date
JPS53135278A true JPS53135278A (en) 1978-11-25

Family

ID=12858642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5043077A Pending JPS53135278A (en) 1977-04-30 1977-04-30 Photomask for photomechanics

Country Status (1)

Country Link
JP (1) JPS53135278A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2461282A1 (en) * 1979-07-07 1981-01-30 Shinetsu Quartz Prod IMPROVED PHOTOGRAVING PROCESS USING TRANSFER COVERS ON SINGLE-CRYSTAL PELLETS
JPS58108741A (en) * 1981-12-23 1983-06-28 Hitachi Ltd Electron beam patterning device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2461282A1 (en) * 1979-07-07 1981-01-30 Shinetsu Quartz Prod IMPROVED PHOTOGRAVING PROCESS USING TRANSFER COVERS ON SINGLE-CRYSTAL PELLETS
JPS58108741A (en) * 1981-12-23 1983-06-28 Hitachi Ltd Electron beam patterning device

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