JPS5532088A - Photo mask forming method - Google Patents
Photo mask forming methodInfo
- Publication number
- JPS5532088A JPS5532088A JP10593578A JP10593578A JPS5532088A JP S5532088 A JPS5532088 A JP S5532088A JP 10593578 A JP10593578 A JP 10593578A JP 10593578 A JP10593578 A JP 10593578A JP S5532088 A JPS5532088 A JP S5532088A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photosensitive
- mask
- photo masks
- plates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE:To form photo masks of both negative and positive types from the same material, by providing a mask layer and a specified photosensitive resin omposition layer chiefly made of o-quinone diazide compound on a transparent supporting body. CONSTITUTION:In forming photo masks for micro-electronic contraction, a solution of photosensitive resin containing o-quinone diazide compound and secondary or tertiary amine of which boiling point is more than 200 deg.C is spread on a layer for mask which is prepared by commonly evaporating Al and Fe by the atomic number ratio of 98.5% to 1.5% on a glass substrate. Thus, a photosensitive layer is formed. By contact-exposing a chromium mask on this photosensitive layer, two photosensitive plates a, b are fabricated. The plate a is directly heated, while the plate b is heated after re-exposure. The plates a, b are developed in the same developer containing NaOH, and etched to obtain photo masks of positive and negative working.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10593578A JPS5532088A (en) | 1978-08-30 | 1978-08-30 | Photo mask forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10593578A JPS5532088A (en) | 1978-08-30 | 1978-08-30 | Photo mask forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5532088A true JPS5532088A (en) | 1980-03-06 |
Family
ID=14420697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10593578A Pending JPS5532088A (en) | 1978-08-30 | 1978-08-30 | Photo mask forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5532088A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204539A (en) * | 1981-06-11 | 1982-12-15 | Toyobo Co Ltd | Formation of metallic image and reducing method for metallic image |
JPS5879246A (en) * | 1981-11-05 | 1983-05-13 | Toyobo Co Ltd | Formation of metallic image and reducing method for metallic image |
JPS58114031A (en) * | 1981-12-23 | 1983-07-07 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of relief image |
JPS61229267A (en) * | 1985-04-02 | 1986-10-13 | Pioneer Electronic Corp | Disc player |
JPS61241745A (en) * | 1985-04-18 | 1986-10-28 | Oki Electric Ind Co Ltd | Negative type photoresist composition and formation of resist pattern |
JPS61186263U (en) * | 1985-05-09 | 1986-11-20 | ||
JPS6238448A (en) * | 1985-08-12 | 1987-02-19 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of negative image for positive type photographic material |
JPS63271442A (en) * | 1987-04-11 | 1988-11-09 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | Formation of image |
US4988609A (en) * | 1987-06-18 | 1991-01-29 | Kabushiki Kaisha Toshiba | Method of forming micro patterns |
US5725997A (en) * | 1995-07-26 | 1998-03-10 | Tdk Corporation | Method for preparing a resist pattern of t-shaped cross section |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
JPS50108002A (en) * | 1974-02-01 | 1975-08-26 | ||
JPS50155302A (en) * | 1974-06-10 | 1975-12-15 | ||
JPS51135641A (en) * | 1975-05-20 | 1976-11-24 | Kimoto & Co Ltd | Photosensitive film |
JPS526528A (en) * | 1975-06-30 | 1977-01-19 | Ibm | Method of forming resist film |
-
1978
- 1978-08-30 JP JP10593578A patent/JPS5532088A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
JPS50108002A (en) * | 1974-02-01 | 1975-08-26 | ||
JPS50155302A (en) * | 1974-06-10 | 1975-12-15 | ||
JPS51135641A (en) * | 1975-05-20 | 1976-11-24 | Kimoto & Co Ltd | Photosensitive film |
JPS526528A (en) * | 1975-06-30 | 1977-01-19 | Ibm | Method of forming resist film |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204539A (en) * | 1981-06-11 | 1982-12-15 | Toyobo Co Ltd | Formation of metallic image and reducing method for metallic image |
JPS5879246A (en) * | 1981-11-05 | 1983-05-13 | Toyobo Co Ltd | Formation of metallic image and reducing method for metallic image |
JPS58114031A (en) * | 1981-12-23 | 1983-07-07 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of relief image |
JPH0347493B2 (en) * | 1981-12-23 | 1991-07-19 | Hoechst Ag | |
JPS61229267A (en) * | 1985-04-02 | 1986-10-13 | Pioneer Electronic Corp | Disc player |
JPS61241745A (en) * | 1985-04-18 | 1986-10-28 | Oki Electric Ind Co Ltd | Negative type photoresist composition and formation of resist pattern |
JPS61186263U (en) * | 1985-05-09 | 1986-11-20 | ||
JPH0510373Y2 (en) * | 1985-05-09 | 1993-03-15 | ||
JPS6238448A (en) * | 1985-08-12 | 1987-02-19 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of negative image for positive type photographic material |
JPS63271442A (en) * | 1987-04-11 | 1988-11-09 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | Formation of image |
US4988609A (en) * | 1987-06-18 | 1991-01-29 | Kabushiki Kaisha Toshiba | Method of forming micro patterns |
US5725997A (en) * | 1995-07-26 | 1998-03-10 | Tdk Corporation | Method for preparing a resist pattern of t-shaped cross section |
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