JPS54141573A - Mask for exposure - Google Patents

Mask for exposure

Info

Publication number
JPS54141573A
JPS54141573A JP5052378A JP5052378A JPS54141573A JP S54141573 A JPS54141573 A JP S54141573A JP 5052378 A JP5052378 A JP 5052378A JP 5052378 A JP5052378 A JP 5052378A JP S54141573 A JPS54141573 A JP S54141573A
Authority
JP
Japan
Prior art keywords
mask
exposure
patterns
alignment
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5052378A
Other languages
Japanese (ja)
Inventor
Masatoshi Sudo
Yoshiaki Nishikubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP5052378A priority Critical patent/JPS54141573A/en
Publication of JPS54141573A publication Critical patent/JPS54141573A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To perform highly accurate alignment through simple operation without using any space holding device in mask alignment by a proximity method by constituting an exposure mask which gives a slight spacing between the exposure mask and substrate.
CONSTITUTION: In a method of positioning an exposure mask original plate 3 on a semiconductor substrate 2 coated with photosensitive agents 1, the mask patterns 4 by the material cutting off exposure rays are formed on the mask original plate 3 which transmits exposure rays and further protrusions 5 which are thicker than the thickness of the patterns 4 and give a spacing between the mask orginal plate 3 and substrate 2 are provided in the specified positions of the portions excluding the regions forming the patterns 4. And the difference between the patterns 4 and protrusions 5 are selected within a range of 0.05 to 100μm, whereby the operation of the mask alignment by a proximity method is simplified and the highly accurate alignment is made possible.
COPYRIGHT: (C)1979,JPO&Japio
JP5052378A 1978-04-26 1978-04-26 Mask for exposure Pending JPS54141573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5052378A JPS54141573A (en) 1978-04-26 1978-04-26 Mask for exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5052378A JPS54141573A (en) 1978-04-26 1978-04-26 Mask for exposure

Publications (1)

Publication Number Publication Date
JPS54141573A true JPS54141573A (en) 1979-11-02

Family

ID=12861333

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5052378A Pending JPS54141573A (en) 1978-04-26 1978-04-26 Mask for exposure

Country Status (1)

Country Link
JP (1) JPS54141573A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5878478A (en) * 1995-02-23 1999-03-09 Kabushiki-Kaisha Hasekou Seisakusho Method for attaching a seat belt cutter to a pad in a vehicle
JP2009109843A (en) * 2007-10-31 2009-05-21 Toppan Printing Co Ltd Photomask and method for manufacturing color filter substrate using the same
US20180348627A1 (en) * 2016-01-27 2018-12-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4936863B1 (en) * 1970-11-30 1974-10-03
JPS532082A (en) * 1976-06-28 1978-01-10 Nec Corp Photo etching mask
JPS533069A (en) * 1976-06-29 1978-01-12 Nec Corp Photoetching mask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4936863B1 (en) * 1970-11-30 1974-10-03
JPS532082A (en) * 1976-06-28 1978-01-10 Nec Corp Photo etching mask
JPS533069A (en) * 1976-06-29 1978-01-12 Nec Corp Photoetching mask

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5878478A (en) * 1995-02-23 1999-03-09 Kabushiki-Kaisha Hasekou Seisakusho Method for attaching a seat belt cutter to a pad in a vehicle
US5903942A (en) * 1995-02-23 1999-05-18 Kabushiki-Kaisha Hasekou Seisakusho Seat belt cutter and method for attaching the same
JP2009109843A (en) * 2007-10-31 2009-05-21 Toppan Printing Co Ltd Photomask and method for manufacturing color filter substrate using the same
US20180348627A1 (en) * 2016-01-27 2018-12-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) * 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

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