JPS54141573A - Mask for exposure - Google Patents
Mask for exposureInfo
- Publication number
- JPS54141573A JPS54141573A JP5052378A JP5052378A JPS54141573A JP S54141573 A JPS54141573 A JP S54141573A JP 5052378 A JP5052378 A JP 5052378A JP 5052378 A JP5052378 A JP 5052378A JP S54141573 A JPS54141573 A JP S54141573A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- exposure
- patterns
- alignment
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To perform highly accurate alignment through simple operation without using any space holding device in mask alignment by a proximity method by constituting an exposure mask which gives a slight spacing between the exposure mask and substrate.
CONSTITUTION: In a method of positioning an exposure mask original plate 3 on a semiconductor substrate 2 coated with photosensitive agents 1, the mask patterns 4 by the material cutting off exposure rays are formed on the mask original plate 3 which transmits exposure rays and further protrusions 5 which are thicker than the thickness of the patterns 4 and give a spacing between the mask orginal plate 3 and substrate 2 are provided in the specified positions of the portions excluding the regions forming the patterns 4. And the difference between the patterns 4 and protrusions 5 are selected within a range of 0.05 to 100μm, whereby the operation of the mask alignment by a proximity method is simplified and the highly accurate alignment is made possible.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5052378A JPS54141573A (en) | 1978-04-26 | 1978-04-26 | Mask for exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5052378A JPS54141573A (en) | 1978-04-26 | 1978-04-26 | Mask for exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54141573A true JPS54141573A (en) | 1979-11-02 |
Family
ID=12861333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5052378A Pending JPS54141573A (en) | 1978-04-26 | 1978-04-26 | Mask for exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54141573A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5878478A (en) * | 1995-02-23 | 1999-03-09 | Kabushiki-Kaisha Hasekou Seisakusho | Method for attaching a seat belt cutter to a pad in a vehicle |
JP2009109843A (en) * | 2007-10-31 | 2009-05-21 | Toppan Printing Co Ltd | Photomask and method for manufacturing color filter substrate using the same |
US20180348627A1 (en) * | 2016-01-27 | 2018-12-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
US10969686B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936863B1 (en) * | 1970-11-30 | 1974-10-03 | ||
JPS532082A (en) * | 1976-06-28 | 1978-01-10 | Nec Corp | Photo etching mask |
JPS533069A (en) * | 1976-06-29 | 1978-01-12 | Nec Corp | Photoetching mask |
-
1978
- 1978-04-26 JP JP5052378A patent/JPS54141573A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936863B1 (en) * | 1970-11-30 | 1974-10-03 | ||
JPS532082A (en) * | 1976-06-28 | 1978-01-10 | Nec Corp | Photo etching mask |
JPS533069A (en) * | 1976-06-29 | 1978-01-12 | Nec Corp | Photoetching mask |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5878478A (en) * | 1995-02-23 | 1999-03-09 | Kabushiki-Kaisha Hasekou Seisakusho | Method for attaching a seat belt cutter to a pad in a vehicle |
US5903942A (en) * | 1995-02-23 | 1999-05-18 | Kabushiki-Kaisha Hasekou Seisakusho | Seat belt cutter and method for attaching the same |
JP2009109843A (en) * | 2007-10-31 | 2009-05-21 | Toppan Printing Co Ltd | Photomask and method for manufacturing color filter substrate using the same |
US20180348627A1 (en) * | 2016-01-27 | 2018-12-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
US10969686B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
US11029596B2 (en) * | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
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