JPS5459956A - Orientation treating method of liquid crystal cell substrates - Google Patents

Orientation treating method of liquid crystal cell substrates

Info

Publication number
JPS5459956A
JPS5459956A JP12617378A JP12617378A JPS5459956A JP S5459956 A JPS5459956 A JP S5459956A JP 12617378 A JP12617378 A JP 12617378A JP 12617378 A JP12617378 A JP 12617378A JP S5459956 A JPS5459956 A JP S5459956A
Authority
JP
Japan
Prior art keywords
vapor
vapor deposition
liquid crystal
rotator
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12617378A
Other languages
Japanese (ja)
Inventor
Kunio Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP12617378A priority Critical patent/JPS5459956A/en
Publication of JPS5459956A publication Critical patent/JPS5459956A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE: To make the pretilt angle of liquid crystal molecules close to 0° and obviate the occurrence of reverse tilt at the voltage application by evaporating an orientation treatment material onto the substrate surfaces from specific two directions simultaneously or repeatedly alternately.
CONSTITUTION: Substrates 43 of liquid crystal cells with their orientation treatment sides being faced outside are mounted to a rotator 42 which rotates about a rotating axis 14. A mask plate 44 which defines the angle of vapor deposition is provided between a vapor source 47 which produces vapor currents 48 and the rotator 42. This plate 44 is formed with a first vapor deposition hole 45 being in the direction inclined 80° from the normal of the substrate 43 and a second vapor deposition hole 46 being in the normal direction. Out of the vapor currents 48, only those which have passed through the holes 45, 46 deposit on the substrates 43 at the vapor deposition angle within a fixed range. As the rotator 42 rotates, the first and second vapor depositions take place alternately. Thereby, the repetitive stability of orientation characteristics in volume production is improved
COPYRIGHT: (C)1979,JPO&Japio
JP12617378A 1978-10-16 1978-10-16 Orientation treating method of liquid crystal cell substrates Pending JPS5459956A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12617378A JPS5459956A (en) 1978-10-16 1978-10-16 Orientation treating method of liquid crystal cell substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12617378A JPS5459956A (en) 1978-10-16 1978-10-16 Orientation treating method of liquid crystal cell substrates

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP9669877A Division JPS5430860A (en) 1977-04-20 1977-08-12 Method and apparatus for orientation treatment of liquid crystal cell substrates

Publications (1)

Publication Number Publication Date
JPS5459956A true JPS5459956A (en) 1979-05-15

Family

ID=14928478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12617378A Pending JPS5459956A (en) 1978-10-16 1978-10-16 Orientation treating method of liquid crystal cell substrates

Country Status (1)

Country Link
JP (1) JPS5459956A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330656A (en) * 2005-04-25 2006-12-07 Showa Shinku:Kk Vacuum deposition device for liquid crystal alignment layer and deposition method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330656A (en) * 2005-04-25 2006-12-07 Showa Shinku:Kk Vacuum deposition device for liquid crystal alignment layer and deposition method thereof

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