JPS5532040A - Orientation-treating method of liquid crystal cell substrate - Google Patents
Orientation-treating method of liquid crystal cell substrateInfo
- Publication number
- JPS5532040A JPS5532040A JP10458578A JP10458578A JPS5532040A JP S5532040 A JPS5532040 A JP S5532040A JP 10458578 A JP10458578 A JP 10458578A JP 10458578 A JP10458578 A JP 10458578A JP S5532040 A JPS5532040 A JP S5532040A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- vapor
- angle
- orientation
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
- Physical Vapour Deposition (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
PURPOSE: To enable the good display in which the pretilt angle of liquid crystal molecules is nearly close to 0° and reverse tilt does not occur at the voltage application to be obtained by forming orientation-treating films through vapor deposition of two stages in which angles of vapor depositions are respectively specified.
CONSTITUTION: Substrates 83 are supported to a rotator 82 which rotates about a revolving shaft 81. Vapor flows 86 produced by a vapor source 84 are defined of the angle of vapor deposition within a fixed range by the holes 88, 89 of a mask member 87. In this way, the first vapor deposition in which the main angle of vapor deposition is set in the angle range of 75W30° and the second vapor deposition in which the main angle of vapor deposition is set at angles below 30° are accomplished. In addition, shutters 85a, 85b are provided to the holes 88, 89. If only one of the shutters is opened at the vapor deposition of the first layer of the orientation treatment layer and only the other shutter is opened at the vapor deposition of the second layer, then this method becomes suited for volume production as well.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10458578A JPS5532040A (en) | 1978-08-28 | 1978-08-28 | Orientation-treating method of liquid crystal cell substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10458578A JPS5532040A (en) | 1978-08-28 | 1978-08-28 | Orientation-treating method of liquid crystal cell substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5532040A true JPS5532040A (en) | 1980-03-06 |
Family
ID=14384504
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10458578A Pending JPS5532040A (en) | 1978-08-28 | 1978-08-28 | Orientation-treating method of liquid crystal cell substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5532040A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0286922U (en) * | 1988-12-23 | 1990-07-10 | ||
| JP2009080281A (en) * | 2007-09-26 | 2009-04-16 | Citizen Holdings Co Ltd | Method for manufacturing liquid crystal element |
| US7719648B2 (en) | 2005-07-14 | 2010-05-18 | Seiko Epson Corporation | Manufacturing apparatus for liquid crystal device, manufacturing method for liquid crystal device, liquid crystal device and electronic device |
-
1978
- 1978-08-28 JP JP10458578A patent/JPS5532040A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0286922U (en) * | 1988-12-23 | 1990-07-10 | ||
| US7719648B2 (en) | 2005-07-14 | 2010-05-18 | Seiko Epson Corporation | Manufacturing apparatus for liquid crystal device, manufacturing method for liquid crystal device, liquid crystal device and electronic device |
| JP2009080281A (en) * | 2007-09-26 | 2009-04-16 | Citizen Holdings Co Ltd | Method for manufacturing liquid crystal element |
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