JPS54127285A - Electron-beam lithography unit - Google Patents
Electron-beam lithography unitInfo
- Publication number
- JPS54127285A JPS54127285A JP3418278A JP3418278A JPS54127285A JP S54127285 A JPS54127285 A JP S54127285A JP 3418278 A JP3418278 A JP 3418278A JP 3418278 A JP3418278 A JP 3418278A JP S54127285 A JPS54127285 A JP S54127285A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- electron
- beam lithography
- shield
- size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To seize the size of an electron beam by measuring the time which corresponds to the electric-current variation caused by a shift in the relative position between the electron beam and a shield.
CONSTITUTION: Electron-beam checker 16 is placed where an electron beam strikes, and in this state, the one-dimensional deflection of the electron beam is done. The electron beam is deflected to pass through the slit of shield 18, so that when the diameter of the slit opening is supposed to be greater than that of the electron beam, the waveform of the electronic current passing though the opening will be shown in the figure. Time t2-t1 or t4-t3 is in proportion to the size of the electron beam.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3418278A JPS54127285A (en) | 1978-03-27 | 1978-03-27 | Electron-beam lithography unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3418278A JPS54127285A (en) | 1978-03-27 | 1978-03-27 | Electron-beam lithography unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54127285A true JPS54127285A (en) | 1979-10-03 |
Family
ID=12407050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3418278A Pending JPS54127285A (en) | 1978-03-27 | 1978-03-27 | Electron-beam lithography unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54127285A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856418A (en) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | Electron beam exposure apparatus |
JPS6197914A (en) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | Charged particle beam lithography equipment |
US4608493A (en) * | 1983-05-09 | 1986-08-26 | Sony Corporation | Faraday cup |
CN102435128A (en) * | 2011-09-01 | 2012-05-02 | 上海显恒光电科技股份有限公司 | Device and method for measuring beam spot size of electron beam provided with double Faraday cups |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5468149A (en) * | 1977-11-11 | 1979-06-01 | Erionikusu Kk | Electron ray application device |
-
1978
- 1978-03-27 JP JP3418278A patent/JPS54127285A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5468149A (en) * | 1977-11-11 | 1979-06-01 | Erionikusu Kk | Electron ray application device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856418A (en) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | Electron beam exposure apparatus |
US4608493A (en) * | 1983-05-09 | 1986-08-26 | Sony Corporation | Faraday cup |
JPS6197914A (en) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | Charged particle beam lithography equipment |
CN102435128A (en) * | 2011-09-01 | 2012-05-02 | 上海显恒光电科技股份有限公司 | Device and method for measuring beam spot size of electron beam provided with double Faraday cups |
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